公开(公告)号：US11747796B2

公开(公告)日：2023-09-05

申请号：US17391381

申请日：2021-08-02

Applicant: XEROX CORPORATION

Inventor： Ion Matei ,  Jeng Ping Lu ,  Saigopal Nelaturi ,  Julie A. Bert ,  Lara S. Crawford ,  Armin R. Volkel ,  Eugene M. Chow

IPC: G05B19/418 ,  G05B17/02 ,  B01L3/00 ,  G06T7/194 ,  G06T7/73 ,  G06T7/155 ,  H04N7/18

CPC classification number: G05B19/41885 ,  B01L3/50273 ,  G05B17/02 ,  G06T7/155 ,  G06T7/194 ,  G06T7/74 ,  H04N7/183 ,  G05B2219/32359 ,  G06T2207/20021 ,  G06T2207/30164

Abstract: The system and method described allow for real-time control over positioning of a micro-object. A movement of at least one micro-object suspended in a medium can be induced by a generation of one or more forces by electrodes proximate to the micro-object. Prior to inducing the movement, a simulation is used to develop a model describing a parameter of an interaction between each of the electrodes and the micro-object. A function describing the forces generated by an electrode and an extent of the movement induced due to the forces is generated using the model. The function is used to design closed loop policy control scheme for moving the micro-object towards a desired position. The position of the micro-object is tracked and taken into account when generating voltage patterns in the scheme.

公开(公告)号：US11732362B2

公开(公告)日：2023-08-22

申请号：US16781813

申请日：2020-02-04

Applicant: Xerox Corporation ,  Palo Alto Research Center Incorporated

Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

IPC: H01L23/00 ,  H01L21/67 ,  B81B3/00 ,  C23C16/50

CPC classification number: C23C16/50 ,  B81B3/0018 ,  H01L21/67271 ,  H01L21/67282 ,  H01L21/67294 ,  H01L24/75 ,  H01L24/95 ,  H01L2224/95001 ,  H01L2224/95101 ,  H01L2224/95115 ,  H01L2224/95144 ,  H01L2224/95145 ,  H01L2924/10253 ,  H01L2924/1434 ,  H01L2924/1461

Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.

公开(公告)号：US20200173026A1

公开(公告)日：2020-06-04

申请号：US16781813

申请日：2020-02-04

Applicant: Xerox Corporation ,  Palo Alto Research Center Incorporated

Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

IPC: C23C16/50 ,  H01L23/00 ,  H01L21/67

Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.

公开(公告)号：US10604843B2

公开(公告)日：2020-03-31

申请号：US15591959

申请日：2017-05-10

Applicant: Xerox Corporation ,  Palo Alto Research Center Incorporated

Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

IPC: C23C16/50 ,  H01L23/00 ,  H01L21/67

Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.

公开(公告)号：US20230366093A1

公开(公告)日：2023-11-16

申请号：US18221302

申请日：2023-07-12

Applicant: Xerox Corporation

Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

IPC: C23C16/50 ,  B81B3/00 ,  H01L23/00 ,  H01L21/67

CPC classification number: C23C16/50 ,  B81B3/0018 ,  H01L24/95 ,  H01L24/75 ,  H01L21/67271 ,  H01L21/67294 ,  H01L21/67282 ,  H01L2224/95115 ,  H01L2224/95145 ,  H01L2224/95144 ,  H01L2924/1434 ,  H01L2224/95001 ,  H01L2224/95101 ,  H01L2924/1461 ,  H01L2924/10253

Abstract: Disclosed herein are techniques for transferring particles in a pattern. In one implementation, a particle-transferring system includes a first substrate comprising a first surface configured to support a plurality of particles in a non-uniform pattern, and a particle transfer unit configured to remove the plurality of particles from the first surface in response to the plurality of particles being within a first gap. The system also includes a second substrate configured to remove the plurality of particles from the particle transfer unit and secure the plurality of particles to the second surface in response to the plurality of particles being within a second gap. The particle transfer unit is configured to transfer the plurality of particles and maintain the non-uniform pattern regardless of the positions of the plurality of particles, which are not predefined to fit features of the particle transfer unit.

公开(公告)号：US12297538B2

公开(公告)日：2025-05-13

申请号：US18221302

申请日：2023-07-12

Applicant: Xerox Corporation

Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

IPC: H01L21/67 ,  B05B5/00 ,  B05D1/00 ,  B81B3/00 ,  C23C16/50 ,  H01L23/00

Abstract: Disclosed herein are techniques for transferring particles in a pattern. In one implementation, a particle-transferring system includes a first substrate comprising a first surface configured to support a plurality of particles in a non-uniform pattern, and a particle transfer unit configured to remove the plurality of particles from the first surface in response to the plurality of particles being within a first gap. The system also includes a second substrate configured to remove the plurality of particles from the particle transfer unit and secure the plurality of particles to the second surface in response to the plurality of particles being within a second gap. The particle transfer unit is configured to transfer the plurality of particles and maintain the non-uniform pattern regardless of the positions of the plurality of particles, which are not predefined to fit features of the particle transfer unit.

公开(公告)号：US20230418273A1

公开(公告)日：2023-12-28

申请号：US18460175

申请日：2023-09-01

Applicant: XEROX CORPORATION

Inventor： Ion Matei ,  Jeng Ping Lu ,  Saigopal Nelaturi ,  Julie A. Bert ,  Lara S. Crawford ,  Armin R. Volkel ,  Eugene M. Chow

IPC: G05B19/418 ,  G05B17/02 ,  B01L3/00 ,  G06T7/194 ,  G06T7/73 ,  G06T7/155 ,  H04N7/18

CPC classification number: G05B19/41885 ,  G05B17/02 ,  B01L3/50273 ,  G06T7/194 ,  G06T2207/30164 ,  G06T7/155 ,  H04N7/183 ,  G05B2219/32359 ,  G06T2207/20021 ,  G06T7/74

Abstract: The system and method described allow for real-time control over positioning of a micro-object. A movement of at least one micro-object suspended in a medium can be induced by a generation of one or more forces by electrodes proximate to the micro-object. Prior to inducing the movement, a simulation is used to develop a model describing a parameter of an interaction between each of the electrodes and the micro-object. A function describing the forces generated by an electrode and an extent of the movement induced due to the forces is generated using the model. The function is used to design closed loop policy control scheme for moving the micro-object towards a desired position. The position of the micro-object is tracked and taken into account when generating voltage patterns in the scheme.

公开(公告)号：US20180327905A1

公开(公告)日：2018-11-15

申请号：US15591959

申请日：2017-05-10

Applicant: Xerox Corporation ,  Palo Alto Research Center Incorporated

Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

IPC: C23C16/50

CPC classification number: H01L21/67271 ,  H01L21/67282 ,  H01L21/67294 ,  H01L24/75 ,  H01L24/81 ,  H01L24/95

Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.