公开(公告)号：US20090300561A1

公开(公告)日：2009-12-03

申请号：US12129617

申请日：2008-05-29

申请人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

发明人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that verifies an integrated circuit (IC) chip layout. During operation, the system receives a layout of an IC chip after the layout has gone through a place-and-route operation. Next, the system performs a lithography compliance checking (LCC) operation on the layout to detect lithography hotspots within the layout, wherein each lithography hotspot is associated with a local routing pattern around the lithography hotspot. Next, for each detected lithography hotspot, the system compares the associated local routing pattern against a hotspot database to determine if the local routing pattern matches an entry in the hotspot database, which stores a set of known hotspot configurations. If so, the system corrects the lithography hotspot using correction guidance information associated with the hotspot configuration stored in the hotspot database. Otherwise, the system corrects the lithography hotspot by performing a local rip-up and reroute on the local routing pattern, iteratively, until achieving convergence or given number of iterations.

摘要翻译： 本发明的一个实施例提供一种验证集成电路（IC）芯片布局的系统。 在操作过程中，系统在布局经过布线操作后接收IC芯片的布局。 接下来，系统在布局上执行光刻柔性检查（LCC）操作以检测布局内的光刻热点，其中每个光刻热点与光刻热点周围的局部布线图案相关联。 接下来，对于每个检测到的光刻热点，系统将相关联的本地路由模式与热点数据库进行比较，以确定本地路由模式是否匹配热点数据库中存储一组已知热点配置的条目。 如果是，则系统使用与存储在热点数据库中的热点配置相关联的校正指导信息来校正光刻热点。 否则，系统通过对本地路由模式执行局部的rip-up和重新路由来迭代地校正光刻热点，直到达到收敛或给定的迭代次数。

公开(公告)号：US08037428B2

公开(公告)日：2011-10-11

申请号：US12129617

申请日：2008-05-29

申请人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

发明人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that verifies an integrated circuit (IC) chip layout. During operation, the system receives a layout of an IC chip after the layout has gone through a place-and-route operation. Next, the system performs a lithography compliance checking (LCC) operation on the layout to detect lithography hotspots within the layout, wherein each lithography hotspot is associated with a local routing pattern around the lithography hotspot. Next, for each detected lithography hotspot, the system compares the associated local routing pattern against a hotspot database to determine if the local routing pattern matches an entry in the hotspot database, which stores a set of known hotspot configurations. If so, the system corrects the lithography hotspot using correction guidance information associated with the hotspot configuration stored in the hotspot database. Otherwise, the system corrects the lithography hotspot by performing a local rip-up and reroute on the local routing pattern, iteratively, until achieving convergence or given number of iterations.

摘要翻译： 本发明的一个实施例提供一种验证集成电路（IC）芯片布局的系统。 在操作过程中，系统在布局经过布线操作后接收IC芯片的布局。 接下来，系统在布局上执行光刻柔性检查（LCC）操作以检测布局内的光刻热点，其中每个光刻热点与光刻热点周围的局部布线图案相关联。 接下来，对于每个检测到的光刻热点，系统将相关联的本地路由模式与热点数据库进行比较，以确定本地路由模式是否匹配热点数据库中存储一组已知热点配置的条目。 如果是，则系统使用与存储在热点数据库中的热点配置相关联的校正指导信息来校正光刻热点。 否则，系统通过对本地路由模式执行局部的rip-up和重新路由来迭代地校正光刻热点，直到达到收敛或给定的迭代次数。

公开(公告)号：US08732629B2

公开(公告)日：2014-05-20

申请号：US13503748

申请日：2010-10-28

申请人： Yang-Shan Tong

发明人： Yang-Shan Tong

IPC分类号： G06F17/50

CPC分类号： G03F7/70433

摘要： Disclosed herein are correcting methods and devices for lithography hotspots of the post-routing layout, used for correcting lithography hotspots detected in the post-routing layout. At least one two-dimensional pattern of changeable size or position of the number of hotspots in the local area is selected and adjusted, so that the simulation value of the aerial image intensity of various local areas is optimized. The simulation value of the aerial image intensity is derived through calculation with respect to a set of optical simulation model cells that can be determined by the numerical value of distribution of the aerial image intensity of a number of basic two-dimensional patterns. After adjustment, the aerial image intensity of the local area can be calculated with respect to a set of optical simulation model cells, and a number of cells in the simulation model cells are selected to synthesize the two-dimensional pattern after the change.

摘要翻译： 这里公开了用于在路由后布局中检测的用于校正光刻热点的后路由布局的光刻热点的校正方法和装置。 选择和调整局部区域热点数量可变尺寸或位置的至少一个二维图案，从而优化各种局部区域的空间图像强度的模拟值。 通过对一组光学仿真模型单元进行计算，得出空间图像强度的模拟值，该单元可以由若干基本二维图案的空间图像强度的分布数值确定。 调整后，可以相对于一组光学模拟模型单元计算局部区域的空间图像强度，并且选择模拟模型单元中的多个单元以在变化之后合成二维图案。

公开(公告)号：US20120210280A1

公开(公告)日：2012-08-16

申请号：US13503748

申请日：2010-10-28

申请人： Yang-Shan Tong

发明人： Yang-Shan Tong

IPC分类号： G06F17/50

CPC分类号： G03F7/70433

摘要： Disclosed herein are correcting methods and devices for lithography hotspots of the post-routing layout, used for correcting lithography hotspots detected in the post-routing layout. At least one two-dimensional pattern of changeable size or position of the number of hotspots in the local area is selected and adjusted, so that the simulation value of the aerial image intensity of various local areas is optimized. The simulation value of the aerial image intensity is derived through calculation with respect to a set of optical simulation model cells that can be determined by the numerical value of distribution of the aerial image intensity of a number of basic two-dimensional patterns. After adjustment, the aerial image intensity of the local area can be calculated with respect to a set of optical simulation model cells, and a number of cells in the simulation model cells are selected to synthesize the two-dimensional pattern after the change.

摘要翻译： 这里公开了用于在路由后布局中检测的用于校正光刻热点的后路由布局的光刻热点的校正方法和装置。 选择和调整局部区域热点数量可变尺寸或位置的至少一个二维图案，从而优化各种局部区域的空间图像强度的模拟值。 通过对一组光学仿真模型单元进行计算，得出空间图像强度的模拟值，该单元可以由若干基本二维图案的空间图像强度的分布数值确定。 调整后，可以相对于一组光学模拟模型单元计算局部区域的空间图像强度，并且选择模拟模型单元中的多个单元以在变化之后合成二维图案。