公开(公告)号：US20090300561A1

公开(公告)日：2009-12-03

申请号：US12129617

申请日：2008-05-29

申请人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

发明人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that verifies an integrated circuit (IC) chip layout. During operation, the system receives a layout of an IC chip after the layout has gone through a place-and-route operation. Next, the system performs a lithography compliance checking (LCC) operation on the layout to detect lithography hotspots within the layout, wherein each lithography hotspot is associated with a local routing pattern around the lithography hotspot. Next, for each detected lithography hotspot, the system compares the associated local routing pattern against a hotspot database to determine if the local routing pattern matches an entry in the hotspot database, which stores a set of known hotspot configurations. If so, the system corrects the lithography hotspot using correction guidance information associated with the hotspot configuration stored in the hotspot database. Otherwise, the system corrects the lithography hotspot by performing a local rip-up and reroute on the local routing pattern, iteratively, until achieving convergence or given number of iterations.

摘要翻译： 本发明的一个实施例提供一种验证集成电路（IC）芯片布局的系统。 在操作过程中，系统在布局经过布线操作后接收IC芯片的布局。 接下来，系统在布局上执行光刻柔性检查（LCC）操作以检测布局内的光刻热点，其中每个光刻热点与光刻热点周围的局部布线图案相关联。 接下来，对于每个检测到的光刻热点，系统将相关联的本地路由模式与热点数据库进行比较，以确定本地路由模式是否匹配热点数据库中存储一组已知热点配置的条目。 如果是，则系统使用与存储在热点数据库中的热点配置相关联的校正指导信息来校正光刻热点。 否则，系统通过对本地路由模式执行局部的rip-up和重新路由来迭代地校正光刻热点，直到达到收敛或给定的迭代次数。

公开(公告)号：US08037428B2

公开(公告)日：2011-10-11

申请号：US12129617

申请日：2008-05-29

申请人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

发明人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that verifies an integrated circuit (IC) chip layout. During operation, the system receives a layout of an IC chip after the layout has gone through a place-and-route operation. Next, the system performs a lithography compliance checking (LCC) operation on the layout to detect lithography hotspots within the layout, wherein each lithography hotspot is associated with a local routing pattern around the lithography hotspot. Next, for each detected lithography hotspot, the system compares the associated local routing pattern against a hotspot database to determine if the local routing pattern matches an entry in the hotspot database, which stores a set of known hotspot configurations. If so, the system corrects the lithography hotspot using correction guidance information associated with the hotspot configuration stored in the hotspot database. Otherwise, the system corrects the lithography hotspot by performing a local rip-up and reroute on the local routing pattern, iteratively, until achieving convergence or given number of iterations.

摘要翻译： 本发明的一个实施例提供一种验证集成电路（IC）芯片布局的系统。 在操作过程中，系统在布局经过布线操作后接收IC芯片的布局。 接下来，系统在布局上执行光刻柔性检查（LCC）操作以检测布局内的光刻热点，其中每个光刻热点与光刻热点周围的局部布线图案相关联。 接下来，对于每个检测到的光刻热点，系统将相关联的本地路由模式与热点数据库进行比较，以确定本地路由模式是否匹配热点数据库中存储一组已知热点配置的条目。 如果是，则系统使用与存储在热点数据库中的热点配置相关联的校正指导信息来校正光刻热点。 否则，系统通过对本地路由模式执行局部的rip-up和重新路由来迭代地校正光刻热点，直到达到收敛或给定的迭代次数。

公开(公告)号：US08578313B2

公开(公告)日：2013-11-05

申请号：US12109118

申请日：2008-04-24

申请人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

发明人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that generates a pattern-clip-based hotspot database for performing automatic pattern-clip-based layout verification. During operation, the system receives a list of pattern clips which specify manufacturing hotspots to be avoided in a layout, wherein each pattern clip comprises a set of geometries in proximity to each other. Next, for each pattern clip, the system perturbs the pattern clip to determine a first range of variations for the constituent set of geometries wherein the perturbed pattern clip no longer causes a manufacturing hotspot. The system then extracts a set of correction guidance descriptions from the first range of variations for correcting the pattern clip. Subsequently, the system stores the pattern clip and the set of correction guidance descriptions in the pattern-clip-based hotspot database.

摘要翻译： 本发明的一个实施例提供了一种生成用于执行基于模式片段的自动布局验证的基于模式片段的热点数据库的系统。 在操作期间，系统接收指定要在布局中避免的制造热点的图案片段的列表，其中每个图案剪辑包括彼此靠近的一组几何图形。 接下来，对于每个图案剪辑，系统扰乱图案剪辑以确定组件几何形状的第一变化范围，其中扰动的图案剪辑不再导致制造热点。 然后，系统从用于校正图案剪辑的第一变化范围中提取一组校正指导描述。 随后，系统将模式剪辑和一组校正指导描述存储在基于模式片段的热点数据库中。

公开(公告)号：US20090271749A1

公开(公告)日：2009-10-29

申请号：US12109118

申请日：2008-04-24

申请人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

发明人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that generates a pattern-clip-based hotspot database for performing automatic pattern-clip-based layout verification. During operation, the system receives a list of pattern clips which specify manufacturing hotspots to be avoided in a layout, wherein each pattern clip comprises a set of geometries in proximity to each other. Next, for each pattern clip, the system perturbs the pattern clip to determine a first range of variations for the constituent set of geometries wherein the perturbed pattern clip no longer causes a manufacturing hotspot. The system then extracts a set of correction guidance descriptions from the first range of variations for correcting the pattern clip. Subsequently, the system stores the pattern clip and the set of correction guidance descriptions in the pattern-clip-based hotspot database.

摘要翻译： 本发明的一个实施例提供了一种生成用于执行基于模式片段的自动布局验证的基于模式片段的热点数据库的系统。 在操作期间，系统接收指定要在布局中避免的制造热点的图案片段的列表，其中每个图案剪辑包括彼此靠近的一组几何图形。 接下来，对于每个图案剪辑，系统扰乱图案剪辑以确定组件几何形状的第一变化范围，其中扰动的图案剪辑不再导致制造热点。 然后，系统从用于校正图案剪辑的第一变化范围中提取一组校正指导描述。 随后，系统将模式剪辑和一组校正指导描述存储在基于模式片段的热点数据库中。