公开(公告)号：US20090300561A1

公开(公告)日：2009-12-03

申请号：US12129617

申请日：2008-05-29

申请人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

发明人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that verifies an integrated circuit (IC) chip layout. During operation, the system receives a layout of an IC chip after the layout has gone through a place-and-route operation. Next, the system performs a lithography compliance checking (LCC) operation on the layout to detect lithography hotspots within the layout, wherein each lithography hotspot is associated with a local routing pattern around the lithography hotspot. Next, for each detected lithography hotspot, the system compares the associated local routing pattern against a hotspot database to determine if the local routing pattern matches an entry in the hotspot database, which stores a set of known hotspot configurations. If so, the system corrects the lithography hotspot using correction guidance information associated with the hotspot configuration stored in the hotspot database. Otherwise, the system corrects the lithography hotspot by performing a local rip-up and reroute on the local routing pattern, iteratively, until achieving convergence or given number of iterations.

摘要翻译： 本发明的一个实施例提供一种验证集成电路（IC）芯片布局的系统。 在操作过程中，系统在布局经过布线操作后接收IC芯片的布局。 接下来，系统在布局上执行光刻柔性检查（LCC）操作以检测布局内的光刻热点，其中每个光刻热点与光刻热点周围的局部布线图案相关联。 接下来，对于每个检测到的光刻热点，系统将相关联的本地路由模式与热点数据库进行比较，以确定本地路由模式是否匹配热点数据库中存储一组已知热点配置的条目。 如果是，则系统使用与存储在热点数据库中的热点配置相关联的校正指导信息来校正光刻热点。 否则，系统通过对本地路由模式执行局部的rip-up和重新路由来迭代地校正光刻热点，直到达到收敛或给定的迭代次数。

公开(公告)号：US08037428B2

公开(公告)日：2011-10-11

申请号：US12129617

申请日：2008-05-29

申请人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

发明人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that verifies an integrated circuit (IC) chip layout. During operation, the system receives a layout of an IC chip after the layout has gone through a place-and-route operation. Next, the system performs a lithography compliance checking (LCC) operation on the layout to detect lithography hotspots within the layout, wherein each lithography hotspot is associated with a local routing pattern around the lithography hotspot. Next, for each detected lithography hotspot, the system compares the associated local routing pattern against a hotspot database to determine if the local routing pattern matches an entry in the hotspot database, which stores a set of known hotspot configurations. If so, the system corrects the lithography hotspot using correction guidance information associated with the hotspot configuration stored in the hotspot database. Otherwise, the system corrects the lithography hotspot by performing a local rip-up and reroute on the local routing pattern, iteratively, until achieving convergence or given number of iterations.

摘要翻译： 本发明的一个实施例提供一种验证集成电路（IC）芯片布局的系统。 在操作过程中，系统在布局经过布线操作后接收IC芯片的布局。 接下来，系统在布局上执行光刻柔性检查（LCC）操作以检测布局内的光刻热点，其中每个光刻热点与光刻热点周围的局部布线图案相关联。 接下来，对于每个检测到的光刻热点，系统将相关联的本地路由模式与热点数据库进行比较，以确定本地路由模式是否匹配热点数据库中存储一组已知热点配置的条目。 如果是，则系统使用与存储在热点数据库中的热点配置相关联的校正指导信息来校正光刻热点。 否则，系统通过对本地路由模式执行局部的rip-up和重新路由来迭代地校正光刻热点，直到达到收敛或给定的迭代次数。

公开(公告)号：US08578313B2

公开(公告)日：2013-11-05

申请号：US12109118

申请日：2008-04-24

申请人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

发明人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that generates a pattern-clip-based hotspot database for performing automatic pattern-clip-based layout verification. During operation, the system receives a list of pattern clips which specify manufacturing hotspots to be avoided in a layout, wherein each pattern clip comprises a set of geometries in proximity to each other. Next, for each pattern clip, the system perturbs the pattern clip to determine a first range of variations for the constituent set of geometries wherein the perturbed pattern clip no longer causes a manufacturing hotspot. The system then extracts a set of correction guidance descriptions from the first range of variations for correcting the pattern clip. Subsequently, the system stores the pattern clip and the set of correction guidance descriptions in the pattern-clip-based hotspot database.

摘要翻译： 本发明的一个实施例提供了一种生成用于执行基于模式片段的自动布局验证的基于模式片段的热点数据库的系统。 在操作期间，系统接收指定要在布局中避免的制造热点的图案片段的列表，其中每个图案剪辑包括彼此靠近的一组几何图形。 接下来，对于每个图案剪辑，系统扰乱图案剪辑以确定组件几何形状的第一变化范围，其中扰动的图案剪辑不再导致制造热点。 然后，系统从用于校正图案剪辑的第一变化范围中提取一组校正指导描述。 随后，系统将模式剪辑和一组校正指导描述存储在基于模式片段的热点数据库中。

公开(公告)号：US20090271749A1

公开(公告)日：2009-10-29

申请号：US12109118

申请日：2008-04-24

申请人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

发明人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that generates a pattern-clip-based hotspot database for performing automatic pattern-clip-based layout verification. During operation, the system receives a list of pattern clips which specify manufacturing hotspots to be avoided in a layout, wherein each pattern clip comprises a set of geometries in proximity to each other. Next, for each pattern clip, the system perturbs the pattern clip to determine a first range of variations for the constituent set of geometries wherein the perturbed pattern clip no longer causes a manufacturing hotspot. The system then extracts a set of correction guidance descriptions from the first range of variations for correcting the pattern clip. Subsequently, the system stores the pattern clip and the set of correction guidance descriptions in the pattern-clip-based hotspot database.

摘要翻译： 本发明的一个实施例提供了一种生成用于执行基于模式片段的自动布局验证的基于模式片段的热点数据库的系统。 在操作期间，系统接收指定要在布局中避免的制造热点的图案片段的列表，其中每个图案剪辑包括彼此靠近的一组几何图形。 接下来，对于每个图案剪辑，系统扰乱图案剪辑以确定组件几何形状的第一变化范围，其中扰动的图案剪辑不再导致制造热点。 然后，系统从用于校正图案剪辑的第一变化范围中提取一组校正指导描述。 随后，系统将模式剪辑和一组校正指导描述存储在基于模式片段的热点数据库中。

公开(公告)号：US08566754B2

公开(公告)日：2013-10-22

申请号：US12275887

申请日：2008-11-21

申请人： Kent Y. Kwang ,  Daniel Zhang ,  Zongwu Tang ,  Subarnarekha Sinha

发明人： Kent Y. Kwang ,  Daniel Zhang ,  Zongwu Tang ,  Subarnarekha Sinha

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that automatically processes manufacturing hotspot information. During operation, the system receives a pattern clip associated with a manufacturing hotspot in a layout, wherein the pattern clip comprises a set of polygons in proximity to the manufacturing hotspot's location. Next, the system determines if the pattern clip matches a known manufacturing hotspot configuration. If the pattern clip does not match a known manufacturing hotspot configuration, the system then performs a perturbation process on the pattern clip to determine a set of correction recommendations to eliminate the manufacturing hotspot. By performing the perturbation process, the system additionally determines ranges of perturbation to the set of polygons wherein the perturbed pattern clip does not eliminate the manufacturing hotspot. Subsequently, the system stores the set of correction recommendations and the ranges of perturbation into a manufacturing hotspot database.

摘要翻译： 本发明的一个实施例提供一种自动处理制造热点信息的系统。 在操作期间，系统接收与布局中的制造热点相关联的图案剪辑，其中图案剪辑包括靠近制造热点位置的一组多边形。 接下来，系统确定模式剪辑是否匹配已知的制造热点配置。 如果图案剪辑与已知的制造热点配置不匹配，则系统然后对图案剪辑执行扰动处理，以确定一组校正建议以消除制造热点。 通过执行扰动过程，系统另外确定对该组多边形的扰动范围，其中扰动图案片不消除制造热点。 随后，系统将修正建议的集合和扰动范围存储到制造热点数据库中。

公开(公告)号：US20090268958A1

公开(公告)日：2009-10-29

申请号：US12275887

申请日：2008-11-21

申请人： Kent Y. Kwang ,  Daniel Zhang ,  Zongwu Tang ,  Subarnarekha Sinha

发明人： Kent Y. Kwang ,  Daniel Zhang ,  Zongwu Tang ,  Subarnarekha Sinha

IPC分类号： G06K9/00

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that automatically processes manufacturing hotspot information. During operation, the system receives a pattern clip associated with a manufacturing hotspot in a layout, wherein the pattern clip comprises a set of polygons in proximity to the manufacturing hotspot's location. Next, the system determines if the pattern clip matches a known manufacturing hotspot configuration. If the pattern clip does not match a known manufacturing hotspot configuration, the system then performs a perturbation process on the pattern clip to determine a set of correction recommendations to eliminate the manufacturing hotspot. By performing the perturbation process, the system additionally determines ranges of perturbation to the set of polygons wherein the perturbed pattern clip does not eliminate the manufacturing hotspot. Subsequently, the system stores the set of correction recommendations and the ranges of perturbation into a manufacturing hotspot database.

摘要翻译： 本发明的一个实施例提供一种自动处理制造热点信息的系统。 在操作期间，系统接收与布局中的制造热点相关联的图案剪辑，其中图案剪辑包括靠近制造热点位置的一组多边形。 接下来，系统确定模式剪辑是否匹配已知的制造热点配置。 如果图案剪辑与已知的制造热点配置不匹配，则系统然后对图案剪辑执行扰动处理，以确定一组校正建议以消除制造热点。 通过执行扰动过程，系统另外确定对该组多边形的扰动范围，其中扰动图案片不消除制造热点。 随后，系统将修正建议的集合和扰动范围存储到制造热点数据库中。

公开(公告)号：US07191428B2

公开(公告)日：2007-03-13

申请号：US11142789

申请日：2005-05-31

申请人： ZongWu Tang ,  Juhwan Kim ,  Daniel Zhang ,  Haiqing Wei ,  Gang Huang

发明人： ZongWu Tang ,  Juhwan Kim ,  Daniel Zhang ,  Haiqing Wei ,  Gang Huang

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： A method for performing layout verification involves identifying feature centerlines in a mask layout, and then performing lithography simulation along the centerlines to generate a set of intensity distributions. At each local maxima or minima in the intensity distributions, further lithography simulation can be performed to determine an exposure pattern width at those local maxima/minima (check positions). The exposure pattern widths can then be evaluated to determine whether an actual pinch or bridge defect will be generated at those locations. If defect generation is likely (based on the lithographical simulation) at a particular location, the corresponding portion of the mask layout can be redesigned to avoid defect generation during actual production. In this method, accurate layout verification can be performed with a minimum of time-consuming lithography modeling.

摘要翻译： 用于执行布局验证的方法涉及识别掩模布局中的特征中心线，然后沿着中心线执行光刻模拟以生成一组强度分布。 在强度分布的每个局部最大值或最小值处，可以进行进一步的光刻模拟，以确定那些局部最大值/最小值（检查位置）处的曝光图案宽度。 然后可以评估曝光图案宽度，以确定在这些位置是否将产生实际的夹点或桥接缺陷。 如果在特定位置可能存在缺陷产生（基于光刻模拟），则可以重新设计掩模布局的相应部分，以避免在实际生产期间产生缺陷。 在这种方法中，可以用最少的耗时的光刻建模来执行精确的布局验证。

公开(公告)号：US20060271906A1

公开(公告)日：2006-11-30

申请号：US11142789

申请日：2005-05-31

申请人： ZongWu Tang ,  Juhwan Kim ,  Daniel Zhang ,  Haiqing Wei ,  Gang Huang

发明人： ZongWu Tang ,  Juhwan Kim ,  Daniel Zhang ,  Haiqing Wei ,  Gang Huang

IPC分类号： G06F17/50 ,  G03F1/00

CPC分类号： G03F1/36

摘要： A method for performing layout verification involves identifying feature centerlines in a mask layout, and then performing lithography simulation along the centerlines to generate a set of intensity distributions. At each local maxima or minima in the intensity distributions, further lithography simulation can be performed to determine an exposure pattern width at those local maxima/minima (check positions). The exposure pattern widths can then be evaluated to determine whether an actual pinch or bridge defect will be generated at those locations. If defect generation is likely (based on the lithographical simulation) at a particular location, the corresponding portion of the mask layout can be redesigned to avoid defect generation during actual production. In this method, accurate layout verification can be performed with a minimum of time-consuming lithography modeling.

摘要翻译： 用于执行布局验证的方法涉及识别掩模布局中的特征中心线，然后沿着中心线执行光刻模拟以生成一组强度分布。 在强度分布的每个局部最大值或最小值处，可以进行进一步的光刻模拟，以确定那些局部最大值/最小值（检查位置）处的曝光图案宽度。 然后可以评估曝光图案宽度，以确定在这些位置是否将产生实际的夹点或桥接缺陷。 如果在特定位置可能存在缺陷产生（基于光刻模拟），则可以重新设计掩模布局的相应部分，以避免在实际生产期间产生缺陷。 在这种方法中，可以用最少的耗时的光刻建模来执行精确的布局验证。

公开(公告)号：US20050144566A1

公开(公告)日：2005-06-30

申请号：US10508757

申请日：2003-03-05

申请人： Daniel Zhang

发明人： Daniel Zhang

IPC分类号： G06F17/21 ,  G06F3/00 ,  G06F3/01 ,  G06F3/02 ,  G06F3/023 ,  G06F3/041 ,  H03M11/04 ,  H04M1/247

CPC分类号： G06F3/018 ,  G06F3/0237

摘要： In a method of entering text into an electronic communications device by means of a keypad having a number of keys, each key representing a plurality of letters and/or phonetic symbols, entered text is displayed on a display on the device. Possible phonetic syllables corresponding to an activated key sequence are generated. These are compared with a stored vocabulary comprising syllables and corresponding characters occurring in a given language. Those stored syllables and corresponding characters that match the possible syllables are pre-selected; and a number of these are presented in a separate first graphical object arranged predominantly on the display. Characters corresponding to one of the syllables in the first object are simultaneously presented in a second graphical object. Thus, there is provided a way of entering text with characters having a phonetic representation by means of keys representing a plurality of letters or phonetic symbols, which may be easier to use even in the case where a phonetic syllable corresponds to several characters.

摘要翻译： 在通过具有多个键的键盘将文本输入到电子通信设备的方法中，每个键表示多个字母和/或语音符号，输入的文本被显示在设备上的显示器上。 生成对应于激活的键序列的可能的语音音节。 这些与包含音节和存在于给定语言中的相应字符的存储词汇进行比较。 那些存储的音节和与可能音节相匹配的相应字符是预选的; 并且其中许多显示在主要布置在显示器上的单独的第一图形对象中。 与第一对象中的一个音节对应的字符同时呈现在第二图形对象中。 因此，提供了一种通过表示多个字母或语音符号的键具有语音表示的字符输入文本的方式，即使在语音音节对应于几个字符的情况下也可以更容易使用。

公开(公告)号：US20150271408A1

公开(公告)日：2015-09-24

申请号：US14220744

申请日：2014-03-20

申请人： Ramon Cancel Olmo ,  Kunjal Parikh ,  Rajashree Baskaran ,  Daniel Zhang

发明人： Ramon Cancel Olmo ,  Kunjal Parikh ,  Rajashree Baskaran ,  Daniel Zhang

IPC分类号： H04N5/232 ,  G06F3/01

CPC分类号： G06F3/013 ,  G06F1/1626 ,  G06F1/1686 ,  G06F1/1694 ,  G06F2200/1637 ,  H04N5/23219 ,  H04N5/23293

摘要： Various embodiments are generally directed to an apparatus and method for determining when an eye is focused on a display scene and determining movement of the eye based on image information when the eye is focused on the display scene. Various embodiments may also include detecting motion of an apparatus based on motion information and adjusting at least one of a position and a size of a frame in the display scene based on at least one of the movement of the eye and the motion of the apparatus.

摘要翻译： 各种实施例通常涉及用于当眼睛聚焦在显示场景时确定眼睛何时聚焦在显示场景上并基于图像信息确定眼睛的移动的装置和方法。 各种实施例还可以包括基于运动信息来检测装置的运动，并且基于眼睛的运动和装置的运动中的至少一个来调整显示场景中的帧的位置和尺寸中的至少一个。