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公开(公告)号:US06759655B2
公开(公告)日:2004-07-06
申请号:US09832220
申请日:2001-04-11
申请人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa
发明人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa
IPC分类号: G01N23225
CPC分类号: G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.
摘要翻译: 设置用于电路图案的检查方法,装置和系统,其中当通过使用通过照射白光形成的图像,激光束或带电粒子束来检查精细电路图案的情况下需要各种条件时, 其运行效率可以提高。 显示检查对象基板的检查对象区域,并且指定区域的指定地图画面和光学显微镜或电子束显微镜的图像并行显示,从而能够将缺陷分布和缺陷图像 同时看到。 检查条件的项目名称和显示,输入或指示检查条件内容的画面被整合,这些内容与图像平面重叠,层叠显示,并且所有项目名称均以 选项卡格式在内容的图片平面的上部。 当点击所需的项目名称时,切换画面并显示与点击的项目名称对应的内容。
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公开(公告)号:US06493082B2
公开(公告)日:2002-12-10
申请号:US10116134
申请日:2002-04-05
申请人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa , Maki Ito
发明人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa , Maki Ito
IPC分类号: G01B1100
CPC分类号: G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.
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公开(公告)号:US06480279B2
公开(公告)日:2002-11-12
申请号:US09832217
申请日:2001-04-11
申请人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi
发明人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi
IPC分类号: G01B1100
CPC分类号: G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.
摘要翻译: 设置用于电路图案的检查方法,装置和系统,其中当通过使用通过照射白光形成的图像,激光束或带电粒子束来检查精细电路图案的情况下需要各种条件时, 其运行效率可以提高。 显示检查对象基板的检查对象区域,并且指定区域的指定地图画面和光学显微镜或电子束显微镜的图像并行显示,从而能够将缺陷分布和缺陷图像 同时看到。 检查条件的项目名称和显示,输入或指示检查条件内容的画面被整合,这些内容与图像平面重叠,层叠显示,并且所有项目名称均以 选项卡格式在内容的图片平面的上部。 当点击所需的项目名称时,切换画面并显示与点击的项目名称对应的内容。
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公开(公告)号:US06919564B2
公开(公告)日:2005-07-19
申请号:US10116059
申请日:2002-04-05
申请人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa , Maki Ito
发明人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa , Maki Ito
CPC分类号: G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.
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公开(公告)号:US06903821B2
公开(公告)日:2005-06-07
申请号:US10287706
申请日:2002-11-05
申请人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa , Maki Ito
发明人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa , Maki Ito
CPC分类号: G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.
摘要翻译: 设置用于电路图案的检查方法,装置和系统,其中当通过使用通过照射白光形成的图像,激光束或带电粒子束来检查精细电路图案的情况下需要各种条件时, 其运行效率可以提高。 显示检查对象基板的检查对象区域,并且指定区域的指定地图画面和光学显微镜或电子束显微镜的图像并行显示,从而能够将缺陷分布和缺陷图像 同时看到。 检查条件的项目名称和显示,输入或指示检查条件内容的画面被整合,这些内容与图像平面重叠,层叠显示,并且所有项目名称均以 选项卡格式在内容的图片平面的上部。 当点击所需的项目名称时,切换画面并显示与点击的项目名称对应的内容。
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公开(公告)号:US06421122B2
公开(公告)日:2002-07-16
申请号:US09832219
申请日:2001-04-11
申请人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa , Maki Ito
发明人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa , Maki Ito
IPC分类号: G01B1100
CPC分类号: G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.
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公开(公告)号:US06388747B2
公开(公告)日:2002-05-14
申请号:US09832222
申请日:2001-04-11
申请人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi
发明人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi
IPC分类号: G01B1100
CPC分类号: G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.
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公开(公告)号:US06504609B2
公开(公告)日:2003-01-07
申请号:US10115079
申请日:2002-04-04
申请人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi
发明人: Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi
IPC分类号: G01B1100
CPC分类号: G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要: Inspection method, apparatus, and system for a circuit pattern in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.
摘要翻译: 设置电路图案的检查方法,装置和系统,其中当通过使用通过照射白光,激光束或带电粒子束形成的图像检查精细电路图案所需的各种条件被设置时,其 可以提高运行效率。 显示检查对象基板的检查对象区域,并且指定区域的指定地图画面和光学显微镜或电子束显微镜的图像并行显示,从而能够将缺陷分布和缺陷图像 同时看到。 检查条件的项目名称和显示,输入或指示检查条件内容的画面被整合,这些内容与图像平面重叠,层叠显示,并且所有项目名称均以 选项卡格式在内容的图片平面的上部。 当点击所需的项目名称时,切换画面并显示与点击的项目名称对应的内容。
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公开(公告)号:US06975754B2
公开(公告)日:2005-12-13
申请号:US09802693
申请日:2001-03-08
申请人: Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Asahiro Kuni , Maki Tanaka , Hiroshi Miyai , Yasuhiko Nara , Mari Nozoe
发明人: Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Asahiro Kuni , Maki Tanaka , Hiroshi Miyai , Yasuhiko Nara , Mari Nozoe
IPC分类号: G01N21/956 , G06T7/00 , G06K9/00
CPC分类号: G06T7/001 , G01N21/95607 , G01N2021/95615 , G06T2207/10056 , G06T2207/30148
摘要: The present invention provides techniques, including a method and system, for inspecting for defects in a circuit pattern on a semi-conductor material. One specific embodiment provides a trial inspection threshold setup method, where the initial threshold is modified after a defect analysis of trial inspection stored data. The modified threshold is then used as the threshold in actual inspection.
摘要翻译: 本发明提供了用于检查半导体材料上的电路图案中的缺陷的方法和系统的技术。 一个具体实施例提供了一种试验检查阈值设置方法,其中初始阈值在试验检查存储数据的缺陷分析之后被修改。 然后将修改的阈值用作实际检查中的阈值。
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公开(公告)号:US06898305B2
公开(公告)日:2005-05-24
申请号:US09791911
申请日:2001-02-22
申请人: Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Asahiro Kuni , Maki Tanaka , Hiroshi Miyai , Yasuhiko Nara , Mari Nozoe
发明人: Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Asahiro Kuni , Maki Tanaka , Hiroshi Miyai , Yasuhiko Nara , Mari Nozoe
IPC分类号: G01N23/225 , G01N21/956 , G06T1/00 , G06T7/00 , H01L21/66 , G06K9/00
CPC分类号: G06T7/001 , G01N21/95684 , G06T2207/10056 , G06T2207/30148
摘要: The present invention provides techniques, including a method and system, for inspecting for defects in a circuit pattern on a semi-conductor material. One specific embodiment provides a trial inspection threshold setup method, where the initial threshold is modified after a defect analysis of trial inspection stored data. The modified threshold is then used as the threshold in actual inspection.
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