摘要:
A radiation image storage panel having a phosphor layer which is composed of a phosphor having a matrix component and an activator component is prepared by the steps of forming on a substrate a lower prismatic crystalline layer composed of the matrix component by vapor deposition; and forming on the lower prismatic crystalline layer an upper prismatic crystalline layer composed of the matrix component and the activator component by vapor deposition.
摘要:
Fused solid of an europium halide containing a less amount of europium oxyhalide impurities is prepared by a process in which a starting europium halide is heated to fuse in the presence of a halogen source and then cooled to give the fused solid.
摘要:
Fused solid of an europium halide containing a less amount of europium oxyhalide impurities is prepared by a process in which a starting europium halide is heated to fuse in the presence of a halogen source and then cooled to give the fused solid.
摘要:
A phosphor layer of a radiation image storage panel produced by vapor phase deposition method under such condition that the phosphor layer is composed of a phosphor of a cesium chloride crystalline structure which is grown on a crystal face of (110) or (100) shows an increased sensitivity.
摘要:
The process and apparatus introduce a carrier gas into a vacuum evaporation chamber, evaporate a film forming material from a evaporation source and deposit the evaporated film forming material on a substrate in sheet form to form a stimulable phosphor layer, thereby producing a evaporated phosphor sheet having a stimulable phosphor layer formed on the substrate. The stimulable phosphor layer is formed with substantially all areas of the evaporation source except opening for evaporation being masked to block movement of heat toward the substrate. The evaporated phosphor sheet includes the substrate and a CsBr:Eu evaporated stimulable phosphor layer deposited on the substrate. A maximum intensity of instantaneous light emission from the stimulable phosphor layer at 640 nm upon excitation by uv radiation is lower than a maximum intensity of the instantaneous light emission at 440 nm.
摘要:
The process and apparatus introduce a carrier gas into a vacuum evaporation chamber, evaporate a film forming material from a evaporation source and deposit the evaporated film forming material on a substrate in sheet form to form a stimulable phosphor layer, thereby producing a evaporated phosphor sheet having a stimulable phosphor layer formed on the substrate. The stimulable phosphor layer is formed with substantially all areas of the evaporation source except opening for evaporation being masked to block movement of heat toward the substrate. The evaporated phosphor sheet includes the substrate and a CsBr:Eu evaporated stimulable phosphor layer deposited on the substrate. A maximum intensity of instantaneous light emission from the stimulable phosphor layer at 640 nm upon excitation by uv radiation is lower than a maximum intensity of the instantaneous light emission at 440 nm.
摘要:
In a radiation image storage panel having an energy storable phosphor layer formed by a gas phase-accumulation method, the energy storable phosphor layer gives off an emission having a luminescence width in terms of d in the range of 150 to 395 μm when it is exposed to radiation and then excited with a stimulating light of 50 μm half-width.
摘要:
There is disclosed a novel cerium activated rare earth oxyhalide phosphor which has the following formula (I):LnOX:xCe (I)in which Ln is Y, La, Gd or Lu; X is Cl, Br or I; and x is 0
摘要:
In a radiation image storage panel having an energy storable phosphor layer formed by a gas phase-accumulation method, the energy storable phosphor layer gives off an emission having a luminescence width in terms of d in the range of 150 to 395 μm when it is exposed to radiation and then excited with a stimulating light of 50 μm half-width.
摘要:
A radiation image storage panel is manufactured by the steps of heating and vaporizing an evaporation source comprising a phosphor or its starting materials and depositing the vaporized phosphor or materials on a substrate to form a phosphor layer in an evaporation-deposition apparatus, in which the steps are carried out at a pressure of 0.05 to 10 Pa and under the following condition: 0.3≦(T−S)/MFP≦300in which MFP stands for a mean free path (unit:meter) of the vaporized phosphor or materials, and T−S stands for a space (unit:meter) between the evaporation source and the substrate.