摘要:
The present invention provides high temperature strength and fire-resistant steel superior in weld joint reheat embrittlement resistance and toughness which is produced using steel of a room temperature strength of the 400 to 600N/mm2 class containing as main ingredients C: 0.010% to less than 0.05%, Si: 0.01 to 0.50%, Mn: 0.80 to 2.00%, Cr: 0.50% to less than 2.00%, V: 0.03 to 0.30%, Nb: 0.01 to 0.10%, N: 0.001 to 0.010%, and Al: 0.005 to 0.10%, limiting the contents of Ni, Cu, Mo, and B, and satisfying the relationship of 4Cr[%]-5Mo[%]-10Ni[%]-2Cu[%]-Mn[%]>0.
摘要:
The present invention provides high temperature strength and fire-resistant steel superior in weld joint reheat embrittlement resistance and toughness which is produced using steel of a room temperature strength of the 400 to 600N/mm2 class containing as main ingredients C: 0.010% to less than 0.05%, Si: 0.01 to 0.50%, Mn: 0.80 to 2.00%, Cr: 0.50% to less than 2.00%, V: 0.03 to 0.30%, Nb: 0.01 to 0.10%, N: 0.001 to 0.010%, and Al: 0.005 to 0.10%, limiting the contents of Ni, Cu, Mo, and B, and satisfying the relationship of 4Cr[%]-5Mo[%]-10Ni[%]-2Cu[%]-Mn[%]>0.
摘要:
The present invention provides a fire-resistant steel material superior in weld heat affected zone reheat embrittlement resistance and low temperature toughness when welded by large heat input and exposed to fire and a method of production of the same, that is, a material containing C: 0.012 to 0.050%, Mn: 0.80 to 2.00%, Cr: 0.80 to 1.90%, and Nb: 0.01 to less than 0.05%, restricting Cu to 0.10% or less, containing suitable quantities of Si, N, Ti, and Al, restricting the contents of Mo, B, P, S, and O, and having a balance of Fe and unavoidable impurities, having contents of C, Mn, Cr, Nb, and Cu satisfying −1200C−20Mn+30Cr−330Nb−120Cu≧−80, having a steel structure as observed by an optical microscope of an area fraction of 80% or more of a ferrite phase, and having a balance of the steel structure of a bainite phase, martensite phase, and mixed martensite-austenite structure.
摘要:
A photodetecting device 1 includes a photodiode PDm,n, a switch SWm,n for the photodiode, an integrating circuit 12m, and a noise removing circuit 13m. The integrating circuit 12m accumulates in a capacitor Cfk an electric charge input from the photodiode PDm,n through the switch SWm,n for the photodiode, and outputs a voltage value according to the amount of the accumulated electric charge. The noise removing circuit 13m includes an amplifier A3, five switches SW31 to SW35, four capacitors C31 to C34, and a power supply V3. The noise removing circuit 13m takes in a voltage value that is output from the integrating circuit 12m at a time where the switch SW31 is first turned from a closed state to an open state, and after the time, outputs a voltage value according to a difference between the voltage value that is output from the integrating circuit 12m and the voltage value previously taken in.
摘要:
A photodetecting device 1 includes a photodiode PDm,n, a switch SWm,n for the photodiode, an integrating circuit 12m, and a noise removing circuit 13m. The integrating circuit 12m accumulates in a capacitor Cfk an electric charge input from the photodiode PDm,n through the switch SWm,n for the photodiode, and outputs a voltage value according to the amount of the accumulated electric charge. The noise removing circuit 13m includes an amplifier A3, five switches SW31 to SW35, four capacitors C31 to C34, and a power supply V3. The noise removing circuit 13m takes in a voltage value that is output from the integrating circuit 12m at a time where the switch SW31 is first turned from a closed state to an open state, and after the time, outputs a voltage value according to a difference between the voltage value that is output from the integrating circuit 12m and the voltage value previously taken in.
摘要:
The A/D converting circuit 20 is provided with a differential amplifying portion 21, a first variable capacitance portion 22A, a second variable capacitance portion 22B, a comparing portion 23, a connection controlling portion 24, a first feedback portion 25A and a second feedback portion 25B. Voltage values output as a differential signal from the first output terminal and the second output terminal of the differential amplifying portion 21 are converted to 6-bit digital values by a successive approximation type A/D converting circuit (made up of a first variable capacitance portion 22A, a second variable capacitance portion 22B, a comparing portion 23 and a connection controlling portion 24) and output. A difference in potential between the first common point P1 and the second common point P2 is fed back to the differential amplifying portion 21 by the first feedback portion 25A and the second feedback portion 25B, and again converted to a 6-bit digital value by the successive approximation type A/D converting circuit and output.
摘要:
The A/D converting circuit 20 is provided with a differential amplifying portion 21, a first variable capacitance portion 22A, a second variable capacitance portion 22B, a comparing portion 23, a connection controlling portion 24, a first feedback portion 25A and a second feedback portion 25B. Voltage values output as a differential signal from the first output terminal and the second output terminal of the differential amplifying portion 21 are converted to 6-bit digital values by a successive approximation type A/D converting circuit (made up of a first variable capacitance portion 22A, a second variable capacitance portion 22B, a comparing portion 23 and a connection controlling portion 24) and output. A difference in potential between the first common point P1 and the second common point P2 is fed back to the differential amplifying portion 21 by the first feedback portion 25A and the second feedback portion 25B, and again converted to a 6-bit digital value by the successive approximation type A/D converting circuit and output.
摘要:
The present invention relates to a solid-state image pickup apparatus which allows, when being applied as an element of a solid-state image pickup array, to reduce a non-sensitive region between the adjacent devices, and can thus obtain more accurate imaging results. The solid-state image pickup apparatus comprises a photodetecting section, an output section, a row selecting section, and a column selecting section, and further comprises M waveform shaping circuits as waveform shaping means for shaping the waveforms of row selecting signals. A row selecting signal outputted from the row selecting section is shaped by the waveform shaping circuit and is then inputted into N pixels that constitute an mth row of the photodetecting section.
摘要:
The present invention relates to a solid-state image pickup apparatus which allows, when being applied as an element of a solid-state image pickup array, to reduce a non-sensitive region between the adjacent devices, and can thus obtain more accurate imaging results. The solid-state image pickup apparatus comprises a photodetecting section, an output section, a row selecting section, and a column selecting section, and further comprises M waveform shaping circuits as waveform shaping means for shaping the waveforms of row selecting signals. A row selecting signal outputted from the row selecting section is shaped by the waveform shaping circuit and is then inputted into N pixels that constitute an mth row of the photodetecting section.