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    Substrate plating device
    4.
    发明授权
    Substrate plating device 有权
    基板电镀装置

    公开(公告)号：US06365017B1

    公开(公告)日：2002-04-02

    申请号：US09530805

    申请日：2000-05-05

    申请人： Akihisa Hongo ,  Naoaki Ogure ,  Hiroyuki Ueyama ,  Junitsu Yamakawa ,  Mizuki Nagai ,  Kenichi Suzuki ,  Atsushi Chono ,  Satoshi Sendai ,  Koji Mishima

    发明人： Akihisa Hongo ,  Naoaki Ogure ,  Hiroyuki Ueyama ,  Junitsu Yamakawa ,  Mizuki Nagai ,  Kenichi Suzuki ,  Atsushi Chono ,  Satoshi Sendai ,  Koji Mishima

    IPC分类号： C25D1700

    CPC分类号： C25D21/14 ,  C25D7/123 ,  C25D17/001 ,  C25D17/002 ,  C25D17/02

    摘要： The present invention relates to a substrate plating apparatus for plating a substrate in a plating bath containing plating solution. An insoluble anode is disposed in the plating bath opposite the substrate. The substrate plating apparatus comprises a circulating vessel or dummy vessel provided separate from the plating bath, with a soluble anode and a cathode disposed in the circulating vessel or dummy vessel. An anion exchange film or selective cation exchange film is disposed between the anode and cathode and isolates the same, wherein metal ions are generated in the circulating vessel or dummy vessel by flowing current between the soluble anode and the cathode therein, and the generated metal ions are supplied to the plating bath. The substrate plating apparatus can also comprise an ion exchange film or neutral porous diaphragm disposed between the substrate and anode in the plating bath, wherein the ion exchange film or neutral porous diaphragm divides the plating bath into a substrate region and an anode region.

    摘要翻译： 本发明涉及一种用于在含有电镀液的电镀液中电镀基板的基板电镀装置。 不同的阳极设置在与基底相对的电镀槽中。 基板电镀装置包括与电镀槽分开设置的循环容器或虚拟容器，其中可溶性阳极和阴极设置在循环容器或假容器中。 阴极交换膜或选择性阳离子交换膜设置在阳极和阴极之间，并隔离其中，其中通过在可溶性阳极和阴极之间流动电流而在循环容器或虚拟容器中产生金属离子，并且所产生的金属离子 被供应到电镀浴。 基板电镀装置还可以包括设置在电镀槽中的基板和阳极之间的离子交换膜或中性多孔隔膜，其中离子交换膜或中性多孔隔膜将电镀槽分成衬底区域和阳极区域。

    Substrate plating apparatus and method
    5.
    发明授权
    Substrate plating apparatus and method 有权
    基板电镀装置及方法

    公开(公告)号：US06793794B2

    公开(公告)日：2004-09-21

    申请号：US10098415

    申请日：2002-03-18

    申请人： Akihisa Hongo ,  Naoaki Ogure ,  Hiroyuki Ueyama ,  Junitsu Yamakawa ,  Mizuki Nagai ,  Kenichi Suzuki ,  Atsushi Chono ,  Satoshi Sendai ,  Koji Mishima

    发明人： Akihisa Hongo ,  Naoaki Ogure ,  Hiroyuki Ueyama ,  Junitsu Yamakawa ,  Mizuki Nagai ,  Kenichi Suzuki ,  Atsushi Chono ,  Satoshi Sendai ,  Koji Mishima

    IPC分类号： C25D500

    CPC分类号： C25D21/14 ,  C25D7/12 ,  C25D17/001

    摘要： The present invention relates to a substrate plating apparatus for plating a substrate in a plating bath containing plating solution. An insoluble anode is disposed in the plating bath opposite the substrate. The substrate plating apparatus comprises a circulating vessel or dummy vessel provided separate from the plating bath, with a soluble anode and a cathode disposed in the circulating vessel or dummy vessel. An anion exchange film or selective cation exchange film is disposed between the anode and cathode and isolates the same, wherein metal ions are generated in the circulating vessel or dummy vessel by flowing current between the soluble anode and the cathode therein, and the generated metal ions are supplied to the plating bath. The substrate plating apparatus can also comprise an ion exchange film or neutral porous diaphragm disposed between the substrate and anode in the plating bath, wherein the ion exchange film or neutral porous diaphragm divides the plating bath into a substrate region and an anode region.

    摘要翻译： 本发明涉及一种用于在含有电镀液的电镀液中电镀基板的基板电镀装置。 不同的阳极设置在与基底相对的电镀槽中。 基板电镀装置包括与电镀槽分开设置的循环容器或虚拟容器，其中可溶性阳极和阴极设置在循环容器或假容器中。 阴极交换膜或选择性阳离子交换膜设置在阳极和阴极之间，并隔离其中，其中通过在可溶性阳极和阴极之间流动电流而在循环容器或虚拟容器中产生金属离子，并且所产生的金属离子 被供应到电镀浴。 基板电镀装置还可以包括设置在电镀槽中的基板和阳极之间的离子交换膜或中性多孔隔膜，其中离子交换膜或中性多孔隔膜将电镀槽分成衬底区域和阳极区域。

    Plating apparatus
    6.
    发明授权
    Plating apparatus 有权
    电镀装置

    公开(公告)号：US06379520B1

    公开(公告)日：2002-04-30

    申请号：US09601084

    申请日：2000-07-27

    申请人： Fumio Kuriyama ,  Hiroyuki Ueyama ,  Junitsu Yamakawa ,  Kenichi Suzuki ,  Atsushi Chono

    发明人： Fumio Kuriyama ,  Hiroyuki Ueyama ,  Junitsu Yamakawa ,  Kenichi Suzuki ,  Atsushi Chono

    IPC分类号： C25D2112

    CPC分类号： C25D21/14 ,  C25D17/001 ,  C25D21/16 ,  C25D21/18

    摘要： The plating apparatus has a plating section in which a plating process is performed and a control section for regulating the plating solution. The plating section includes a plating bath containing plating solution, an anode provided in the plating solution, and a plating object serving as a cathode placed in the plating solution opposite the anode. The control section includes a regulating tank for regulating the composition and/or concentration of the plating solution, and a replenishing tank for injecting solution into the plating solution in the regulating tank. The plating apparatus also includes a mechanism for circulating plating solution between the regulating tank in the control section and the plating bath in the plating section. The plating section is installed in a first room, while the control section is installed in a second room, which is separate from the first room Accordingly, contamination in the plating section is prevented.

    摘要翻译： 电镀装置具有执行电镀处理的电镀部分和用于调节电镀液的控制部分。 电镀部分包括含有电镀液的镀浴，设置在电镀液中的阳极，以及放置在与阳极相对的电镀溶液中的用作阴极的电镀对象。 控制部分包括用于调节电镀溶液的组成和/或浓度的调节罐，以及用于将溶液注入调节罐中的电镀溶液的补充槽。 电镀装置还包括用于在控制部分中的调节罐和电镀部分中的镀浴之间循环电镀液的机构。 电镀部分安装在第一房间中，而控制部分安装在与第一房间分开的第二房间中。因此，防止了电镀部分中的污染。

    Plating apparatus
    7.
    再颁专利
    Plating apparatus 有权

    公开(公告)号：USRE39123E1

    公开(公告)日：2006-06-13

    申请号：US10187801

    申请日：1999-11-26

    申请人： Fumio Kuriyama ,  Hiroyuki Ueyama ,  Junitsu Yamakawa ,  Kenichi Suzuki ,  Atsushi Chono

    发明人： Fumio Kuriyama ,  Hiroyuki Ueyama ,  Junitsu Yamakawa ,  Kenichi Suzuki ,  Atsushi Chono

    IPC分类号： C25D21/12 ,  C25B15/00 ,  C25B7/00

    CPC分类号： C25D21/14 ,  C25D17/001 ,  C25D21/16 ,  C25D21/18

    摘要： The plating apparatus has a plating section in which a plating process is performed and a control section for regulating the plating solution. The plating section includes a plating bath containing plating solution, an anode provided in the plating solution, and a plating object serving as a cathode placed in the plating solution opposite the anode. The control section includes a regulating tank for regulating the composition and/or concentration of the plating solution, and a replenishing tank for injecting solution into the plating solution in the regulating tank. The plating apparatus also includes a mechanism for circulating plating solution between the regulating tank in the control section and the plating bath in the plating section. The plating section is installed in a first room, while the control section is installed in a second room, which is separate from the first room Accordingly, contamination in the plating section is prevented.

    Hydrophilic polysiloxane macromonomer, and production and use of the same
    8.
    发明授权
    Hydrophilic polysiloxane macromonomer, and production and use of the same 有权
    亲水性聚硅氧烷大分子单体，并且生产和使用相同

    公开(公告)号：US08524850B2

    公开(公告)日：2013-09-03

    申请号：US13411709

    申请日：2012-03-05

    申请人： Hiroyuki Ueyama ,  Seiichiro Ikawa ,  Junichi Iwata

    发明人： Hiroyuki Ueyama ,  Seiichiro Ikawa ,  Junichi Iwata

    IPC分类号： C08G77/46 ,  C08G77/20

    CPC分类号： C08F283/12 ,  C08F8/42 ,  C08F290/06 ,  C08F290/061 ,  C08F290/068 ,  C08G77/38 ,  C08G77/46 ,  G02B1/043 ,  C08L83/12 ,  C08L51/085

    摘要： PROBLEM TO BE SOLVEDTo provide an ophthalmic lens, which can be more safely worn, that is, to provide a material, which is transparent and has high oxygen permeability and a high hydrophilic property, and to provide a novel monomer to be a raw material thereof.SOLUTIONA hydrophilic polysiloxane macromonomer contains polyoxyethylene as a hydrophilic side chains in a polysiloxane main chain, wherein transparency, oxygen permeability, and hydrophilic properties of the material are controlled by regulating the length of the polysiloxane main chain, the length of the hydrophilic polyoxyethylene side chains, and the number of the side chains.

    摘要翻译： 要解决的问题为了提供可以更安全地佩戴的眼用镜片，即提供透明且具有高透氧性和高亲水性的材料，并提供作为原料的新型单体 其中。 解决方案亲水性聚硅氧烷大分子单体在聚硅氧烷主链中含有聚氧乙烯作为亲水侧链，其中通过调节聚硅氧烷主链的长度，亲水性聚氧乙烯侧链的长度来控制材料的透明度，透氧性和亲水性 ，和侧链的数量。

    Hydrophilic Polysiloxane Macromonomer, And Production And Use Of The Same
    9.
    发明申请
    Hydrophilic Polysiloxane Macromonomer, And Production And Use Of The Same 有权
    亲水性聚硅氧烷大分子单体，以及其生产和使用

    公开(公告)号：US20120184698A1

    公开(公告)日：2012-07-19

    申请号：US13411709

    申请日：2012-03-05

    申请人： Hiroyuki Ueyama ,  Seiichiro Ikawa ,  Junichi Iwata

    发明人： Hiroyuki Ueyama ,  Seiichiro Ikawa ,  Junichi Iwata

    IPC分类号： C08G77/04 ,  C08G77/06

    CPC分类号： C08F283/12 ,  C08F8/42 ,  C08F290/06 ,  C08F290/061 ,  C08F290/068 ,  C08G77/38 ,  C08G77/46 ,  G02B1/043 ,  C08L83/12 ,  C08L51/085

    摘要： PROBLEM TO BE SOLVEDTo provide an ophthalmic lens, which can be more safely worn, that is, to provide a material, which is transparent and has high oxygen permeability and a high hydrophilic property, and to provide a novel monomer to be a raw material thereof.SOLUTIONA hydrophilic polysiloxane macromonomer contains polyoxyethylene as a hydrophilic side chains in a polysiloxane main chain, wherein transparency, oxygen permeability, and hydrophilic properties of the material are controlled by regulating the length of the polysiloxane main chain, the length of the hydrophilic polyoxyethylene side chains, and the number of the side chains.

    摘要翻译： 要解决的问题为了提供可以更安全地佩戴的眼用镜片，即提供透明且具有高透氧性和高亲水性的材料，并提供作为原料的新型单体 其中。 解决方案亲水性聚硅氧烷大分子单体在聚硅氧烷主链中含有聚氧乙烯作为亲水侧链，其中通过调节聚硅氧烷主链的长度，亲水性聚氧乙烯侧链的长度来控制材料的透明度，透氧性和亲水性 ，和侧链的数量。