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1.发明申请公开(公告)号：US20050200267A1
公开(公告)日：2005-09-15
申请号：US11127095
申请日：2005-05-12
申请人： Yoshimi Uda , Kazuya Ishiwata , Shinsaku Kubo , Yasuyuki Watanabe
发明人： Yoshimi Uda , Kazuya Ishiwata , Shinsaku Kubo , Yasuyuki Watanabe
CPC分类号： H05K1/0271 , H01J29/02 , H01J31/127 , H01J2329/0489 , H01J2329/861 , H05K1/092 , H05K3/248 , H05K2201/035 , H05K2201/09745 , H05K2203/0514 , Y10T29/49147 , Y10T29/49174 , Y10T29/53204 , Y10T29/53209
摘要： As a substrate having a fine line and capable of suppressing crack generation in the substrate and peeling of the fine line, the invention discloses a configuration in which plural recesses are arranged on the fine line, and particularly a configuration in which the interval of the plural recesses does not exceed 200 μm. There is also disclosed a configuration in which the plural recesses are arranged along a direction crossing the longitudinal direction of the fine line.
摘要翻译： 作为具有微细线且能够抑制基板中的裂纹产生和细线剥离的基板，本发明公开了一种在细线上布置多个凹槽的结构，特别是其中多个 凹槽不超过200毫米。 还公开了沿着与细线的长度方向交叉的方向配置多个凹部的结构。
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2.发明授权公开(公告)号：US07807334B2
公开(公告)日：2010-10-05
申请号：US11127095
申请日：2005-05-12
申请人： Yoshimi Uda , Kazuya Ishiwata , Shinsaku Kubo , Yasuyuki Watanabe
发明人： Yoshimi Uda , Kazuya Ishiwata , Shinsaku Kubo , Yasuyuki Watanabe
IPC分类号： G03F7/00
CPC分类号： H05K1/0271 , H01J29/02 , H01J31/127 , H01J2329/0489 , H01J2329/861 , H05K1/092 , H05K3/248 , H05K2201/035 , H05K2201/09745 , H05K2203/0514 , Y10T29/49147 , Y10T29/49174 , Y10T29/53204 , Y10T29/53209
摘要： As a substrate having a fine line and capable of suppressing crack generation in the substrate and peeling of the fine line, the invention discloses a configuration in which plural recesses are arranged on the fine line, and particularly a configuration in which the interval of the plural recesses does not exceed 200 μm. There is also disclosed a configuration in which the plural recesses are arranged along a direction crossing the longitudinal direction of the fine line.
摘要翻译： 作为具有微细线且能够抑制基板中的裂纹产生和细线剥离的基板，本发明公开了一种在细线上布置多个凹槽的结构，特别是其中多个 凹槽不超过200μm。 还公开了沿着与细线的长度方向交叉的方向配置多个凹部的结构。
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公开(公告)号：US07015637B2
公开(公告)日：2006-03-21
申请号：US10637624
申请日：2003-08-11
申请人： Yoshimi Uda , Kazuya Ishiwata , Shinsaku Kubo , Yasuyuki Watanabe
发明人： Yoshimi Uda , Kazuya Ishiwata , Shinsaku Kubo , Yasuyuki Watanabe
CPC分类号： H05K1/0271 , H01J29/02 , H01J31/127 , H01J2329/0489 , H01J2329/861 , H05K1/092 , H05K3/248 , H05K2201/035 , H05K2201/09745 , H05K2203/0514 , Y10T29/49147 , Y10T29/49174 , Y10T29/53204 , Y10T29/53209
摘要： As a substrate having a fine line and capable of suppressing crack generation in the substrate and peeling of the fine line, the invention discloses a configuration in which plural recesses are arranged on the fine line, and particularly a configuration in which the interval of the plural recesses does not exceed 200 μm. There is also disclosed a configuration in which the plural recesses are arranged along a direction crossing the longitudinal direction of the fine line.
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公开(公告)号：US07052825B2
公开(公告)日：2006-05-30
申请号：US10781790
申请日：2004-02-20
申请人： Yoshimi Uda , Kazuya Ishiwata , Shinsaku Kubo , Yasuyuki Watanabe
发明人： Yoshimi Uda , Kazuya Ishiwata , Shinsaku Kubo , Yasuyuki Watanabe
IPC分类号： G03F7/00
CPC分类号： H01J31/123 , H01J9/02 , H01J2217/49207 , H05K1/092 , H05K3/02
摘要： A substrate includes fine lines. The fine lines are obtained according to a fine-line forming process, which includes a process of projecting light from above the substrate onto predetermined regions on a photosensitive material provided on the substrate and a developing process after the light projection process. A narrow-width portion is provided at an end portion of each of the fine lines in a longitudinal direction of the fine line. The width of the narrow-width portion is smaller than the width of a portion adjacent to the narrow-width portion.
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5.发明申请公开(公告)号：US20050101051A1
公开(公告)日：2005-05-12
申请号：US10624546
申请日：2003-07-23
申请人： Yoshimi Uda , Kazuya Ishiwata , Shinsaku Kubo , Yasuyuki Watanabe
发明人： Yoshimi Uda , Kazuya Ishiwata , Shinsaku Kubo , Yasuyuki Watanabe
CPC分类号： H01J9/027 , H05K1/092 , H05K3/02 , H05K3/245 , H05K2203/0514 , H05K2203/1476
摘要： In a method of manufacturing an electroconductive film, a developing process is implemented on a photosensitive paste layer (12) having a height of about 13 μm in a state where exposure is repeated twice in FIG. 1D, and thereafter, a baking process is completed to form a wiring pattern (20). As a result, the curling of an edge formed in the wiring pattern (20) can be remarkably reduced.
摘要翻译： 在制造导电膜的方法中，在曝光重复两次的状态下，在具有约13μm的高度的感光性浆料层（12）上进行显影处理。 1D＆lt; / FIGREF＆gt;之后，完成烘烤处理以形成布线图案（20）。 结果，可以显着地减少形成在布线图案（20）中的边缘的卷曲。
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6.发明授权Method for forming patterned insulating elements and methods for making electron source and image display device 失效用于形成图案化绝缘元件的方法和用于制造电子源和图像显示装置的方法公开(公告)号：US06866989B2
公开(公告)日：2005-03-15
申请号：US10235757
申请日：2002-09-06
申请人： Yasuyuki Watanabe , Kazuya Ishiwata , Yoshimi Uda , Shinsaku Kubo
发明人： Yasuyuki Watanabe , Kazuya Ishiwata , Yoshimi Uda , Shinsaku Kubo
CPC分类号： H01J9/027 , G03F7/0035 , G03F7/0047 , G03F7/203 , H01J1/88 , H01J3/021 , H01J29/02 , H01J29/028 , H01J31/127 , H01J2201/3165 , H05K1/0306 , H05K3/0023
摘要： A method for forming patterned insulating elements on a substrate includes a plurality of exposure steps of exposing a photosensitive paste provided on the substrate through at least one mask having a predetermined pattern; a developing step of developing the exposed photosensitive paste to form a precursor pattern; and a firing step of firing the precursor pattern to form the patterned insulating elements. This method is applied to a method for forming an electron source and a method for forming an image display device including the electron source.
摘要翻译： 用于在衬底上形成图案化绝缘元件的方法包括多个曝光步骤，通过具有预定图案的至少一个掩模曝光设置在衬底上的感光膏; 显影步骤，用于显影曝光的感光浆料以形成前体图案; 以及烧制前体图案以形成图案化的绝缘元件的烧制步骤。 该方法适用于形成电子源的方法和用于形成包括该电子源的图像显示装置的方法。
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公开(公告)号：US07318996B2
公开(公告)日：2008-01-15
申请号：US10913331
申请日：2004-08-09
申请人： Yasuyuki Watanabe , Kazuya Ishiwata , Yoshimi Uda , Shinsaku Kubo
发明人： Yasuyuki Watanabe , Kazuya Ishiwata , Yoshimi Uda , Shinsaku Kubo
IPC分类号： G03F7/20
CPC分类号： H01J9/027 , G03F7/0035 , G03F7/0047 , G03F7/203 , H01J1/88 , H01J3/021 , H01J29/02 , H01J29/028 , H01J31/127 , H01J2201/3165 , H05K1/0306 , H05K3/0023
摘要： A method for forming patterned insulating elements on a substrate includes a plurality of exposure steps of exposing a photosensitive paste provided on the substrate through at least one mask having a predetermined pattern; a developing step of developing the exposed photosensitive paste to form a precursor pattern; and a firing step of firing the precursor pattern to form the patterned insulating elements. This method is applied to a method for forming an electron source and a method for forming an image display device including the electron source.
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公开(公告)号：US20060194156A1
公开(公告)日：2006-08-31
申请号：US11415071
申请日：2006-05-02
申请人： Yasuyuki Watanabe , Kazuya Ishiwata , Yoshimi Uda , Shinsaku Kubo
发明人： Yasuyuki Watanabe , Kazuya Ishiwata , Yoshimi Uda , Shinsaku Kubo
IPC分类号： G03F7/00
CPC分类号： H01J9/027 , G03F7/0035 , G03F7/0047 , G03F7/203 , H01J1/88 , H01J3/021 , H01J29/02 , H01J29/028 , H01J31/127 , H01J2201/3165 , H05K1/0306 , H05K3/0023
摘要： A method for forming patterned insulating elements on a substrate includes a plurality of exposure steps of exposing a photosensitive paste provided on the substrate through at least one mask having a predetermined pattern; a developing step of developing the exposed photosensitive paste to form a precursor pattern; and a firing step of firing the precursor pattern to form the patterned insulating elements. This method is applied to a method for forming an electron source and a method for forming an image display device including the electron source.
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9.发明授权公开(公告)号：US07052823B2
公开(公告)日：2006-05-30
申请号：US10624546
申请日：2003-07-23
申请人： Yoshimi Uda , Kazuya Ishiwata , Shinsaku Kubo , Yasuyuki Watanabe
发明人： Yoshimi Uda , Kazuya Ishiwata , Shinsaku Kubo , Yasuyuki Watanabe
CPC分类号： H01J9/027 , H05K1/092 , H05K3/02 , H05K3/245 , H05K2203/0514 , H05K2203/1476
摘要： A method of manufacturing an electroconductive film subject to edge curl due to volume contraction after baking includes sequentially repeating a film-forming step of forming a film containing a photosensitive material and an electroconductive material therein and an exposure step of irradiating a light onto a desired region of the film for a plurality of times to laminate the films. The latent images of the respective layers are integrated. The resulting latent image is developed by removing a non-latent image region of the laminate film after the laminate film is formed. Finally, the developed image is baked. The sequential repetition of the film-forming step and the exposure step act to counteract edge curl formed by volume contraction after baking.
摘要翻译： 制造由烘焙后的体积收缩引起的边缘卷曲的导电膜的方法包括：依次重复形成含有感光材料和导电材料的膜的成膜步骤，以及将光照射到所需区域上的曝光步骤 的膜多次以层压薄膜。 各层的潜像被集成。 在形成层压膜之后，通过去除层压膜的非潜像区域来显影所形成的潜像。 最后，开发的图像被烘烤。 成膜步骤和曝光步骤的顺序重复用于抵消烘烤后通过体积收缩形成的边缘卷曲。
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公开(公告)号：US20050019707A1
公开(公告)日：2005-01-27
申请号：US10913331
申请日：2004-08-09
申请人： Yasuyuki Watanabe , Kazuya Ishiwata , Yoshimi Uda , Shinsaku Kubo
发明人： Yasuyuki Watanabe , Kazuya Ishiwata , Yoshimi Uda , Shinsaku Kubo
IPC分类号： G03F7/004 , G03F7/20 , H01J1/88 , H01J3/02 , H01J9/02 , H01J29/02 , H05K1/03 , H05K3/00 , G03F7/00
CPC分类号： H01J9/027 , G03F7/0035 , G03F7/0047 , G03F7/203 , H01J1/88 , H01J3/021 , H01J29/02 , H01J29/028 , H01J31/127 , H01J2201/3165 , H05K1/0306 , H05K3/0023
摘要： A method for forming patterned insulating elements on a substrate includes a plurality of exposure steps of exposing a photosensitive paste provided on the substrate through at least one mask having a predetermined pattern; a developing step of developing the exposed photosensitive paste to form a precursor pattern; and a firing step of firing the precursor pattern to form the patterned insulating elements. This method is applied to a method for forming an electron source and a method for forming an image display device including the electron source.
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