On-press development of an overcoated lithographic plate
    1.
    发明授权
    On-press development of an overcoated lithographic plate 失效
    外涂平版印刷机的印刷机发展

    公开(公告)号:US5677110A

    公开(公告)日:1997-10-14

    申请号:US609057

    申请日:1996-02-29

    摘要: The present invention is directed to a method for the on-press development and printing of images. The method generally comprises the steps of providing a lithographic printing plate precursor element comprising a lithographic hydrophilic printing plate substrate, a photohardenable photoresist, and a layer of polymeric protective overcoat; imagewise exposing the precursor element to actinic radiation through said photoresist and overcoat layer sufficiently to photoharden the photoresist in exposed regions and provide a latent image in said photoresist layer; placing the precursor element onto a lithographic printing press; and running the press, whereby printing fluid effects removal of the overcoat and development of said latent image. In particular modes of practices, the method utilizes an overcoat having incorporated therein a water or fountain soluble or dispersible crystalline compound. The overcoat can be used as an oxygen barrier and/or to provide a non-tacky surface on the printing plate. By the incorporation of the crystalline compound, on-press removability of the overcoat is facilitated.

    摘要翻译: 本发明涉及图像的印刷机显影和印刷方法。 该方法通常包括提供平版印刷版前体元件的步骤,该平版印刷版前体元件包含平版印刷亲水印刷基板,可光硬化光致抗蚀剂和聚合物保护外涂层; 将前体元件成像曝光通过所述光致抗蚀剂和外涂层的光化辐射,以充分地曝光曝光区域中的光致抗蚀剂,并在所述光致抗蚀剂层中提供潜像; 将前体元件放置在平版印刷机上; 并且运行压机,由此打印流体实现了外涂层的去除和所述潜像的显影。 在具体的实践模式中,该方法利用其中掺入水或可溶性或可分散的结晶化合物的外涂层。 外涂层可用作氧阻隔层和/或在印刷板上提供非粘性表面。 通过引入结晶化合物,便于外涂层的印刷除去性。

    Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine
for lithographic printing plates
    3.
    发明授权
    Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates 失效
    用于平版印刷版的低挥发性取代的2-苯基-4,6-双(卤代甲基)-1,3,5-三嗪

    公开(公告)号:US5561029A

    公开(公告)日:1996-10-01

    申请号:US430461

    申请日:1995-04-28

    摘要: The present invention sets forth the incorporation of a substituted 2-phenyl-4,6-bis (trichloromethyl)-1,3,5-triazine in photoresists of lithographic printing plates for the purpose of promoting their shelf-life, room light stability, and developability. The present invention provides a photocurable composition comprising at least a photopolymerizable ethylenically unsaturated monomer having at least one terminal ethylenic group and capable of forming a polymer upon exposure to actinic radiation; and an s-triazine capable of initiating free radical polymerization of the photopolymerizable ethylenically unsaturated monomer and being represented by the following general formula [I]: ##STR1## wherein R.sub.1 is either OR.sub.4 or NR.sub.5 R.sub.6, wherein R.sub.5 and R.sub.6 may or may not be identical with each other, either R.sub.5 or R.sub.6 may represent hydrogen, and wherein R.sub.4 and at least one of R.sub.5 and R.sub.6 represent a ballast group capable of preventing the substantial volatilization of the s-triazine from the photoresist composition, the ballast group being a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group, the substituted or unsubstituted alkyl group having at least 4 carbon atoms, the substituted or unsubstituted aryl group having at least 6 carbon atoms; R.sub.2 and R.sub.3 may or may not be identical with each other and each represent hydrogen, halogen, phenyl, a substituted or unsubstituted alkyl group, or an alkoxyl group; X and Y may or may not be identical with each other and each represent chlorine or bromine; and m and n may or may not be identical with each other and are each an integer of 0, 1, or 2. Desirable compositions will further comprise at least one photooxidizable leuco triarylmethane dye.

    摘要翻译: 本发明阐述了取代的2-苯基-4,6-双(三氯甲基)-1,3,5-三嗪在平版印刷版的光致抗蚀剂中的引入,以促进其保质期,室内光稳定性, 和可开发性。 本发明提供一种可光固化组合物,其包含至少一种具有至少一个末端烯属基并可在暴露于光化辐射时形成聚合物的可光聚合的烯属不饱和单体; 和能够引发可光聚合的烯键式不饱和单体的自由基聚合并由以下通式[I]表示的均三嗪:其中R 5或R 6可以彼此相同或不同,R 5或R 6可以 表示氢,并且其中R 4和R 5和R 6中的至少一个表示能够防止光刻胶组合物中s-三嗪显着挥发的压载基团,该镇流基为取代或未取代的烷基,或取代或未取代的 具有至少4个碳原子的取代或未取代的烷基,取代或未取代的具有至少6个碳原子的芳基; R 2和R 3可以彼此相同或不同,分别代表氢,卤素,苯基,取代或未取代的烷基或烷氧基; X和Y可以相同也可以不相同,分别表示氯或溴; 并且m和n可以彼此相同也可以不相同,并且各自为0,1或2的整数。期望的组合物还将包含至少一种可光氧化的无色三芳基甲烷染料。

    On-press developable lithographic printing plate precursor
    4.
    发明授权
    On-press developable lithographic printing plate precursor 失效
    印刷机上可印刷的平版印刷版前体

    公开(公告)号:US5620827A

    公开(公告)日:1997-04-15

    申请号:US469475

    申请日:1995-06-06

    摘要: A lithographic printing plate precursor for use on a printing press, with minimal or no additional processing after exposure to actinic radiation, comprises a printing plate substrate, a polymeric resist layer capable of imagewise photodegradation or photohardening, and a plurality of microencapsulated developers capable of blanket-wise promoting the washing out of either exposed or unexposed areas of the polymeric resist. The microencapsulated developers may be integrated into the polymeric resist layer, or may form a separate layer deposited atop the polymeric resist layer, or may be coated onto a separate sheet support capable of being brought into face-to-face contact with conventional printing plates.

    摘要翻译: 用于印刷机的平版印刷版原版在曝光于光化辐射之后具有极少的或没有额外的处理,包括印版基板,能够成像光降解或光硬化的聚合抗蚀剂层,以及能够覆盖的多个微囊化显影剂 从而促进从聚合物抗蚀剂的暴露或未曝光区域的洗涤。 微囊化的显影剂可以整合到聚合物抗蚀剂层中,或者可以形成沉积在聚合物抗蚀剂层顶上的单独的层,或者可以涂覆到能够与常规印刷版面对面接触的单独的片材载体上。

    On-press developable lithographic printing plates with high plasticizer
content photoresists
    5.
    发明授权
    On-press developable lithographic printing plates with high plasticizer content photoresists 失效
    具有高增塑剂含量的光刻胶的印刷机可印刷的平版印刷版

    公开(公告)号:US5607816A

    公开(公告)日:1997-03-04

    申请号:US531853

    申请日:1995-09-21

    IPC分类号: B41C1/10 G03F7/027 G03F7/30

    摘要: Described is the use of a plasticizing-permeation enhancing additive in negative-working, on-press developable lithographic printing plates. Briefly, a plasticizer, which is dispersible or soluble in press fountain and ink solutions and soluble in acrylic monomers and oligomers, are incorporated into a plate's photoresist at concentrations sufficient to enhance said resist's permeability to or diffusion by press solutions. Such additives make the photoresist more permeable to fountain solution prior to crosslinking, while being easily extracted with ink and fountain solution after crosslinking. In certain embodiments, a surfactant is added to facilitate the dispersion of hydrophobic remnants of removed resist material in the fountain solution, and thereby reduce scumming. Lithium salts may also be incorporated into the photoresist to disrupt hydrogen bonding of, for example, urethane acrylate polymers which tend to associate by hydrogen bonding.

    摘要翻译: 描述的是增塑增透添加剂在负压,可印刷的平版印刷版中的用途。 简而言之,在压力喷泉和油墨溶液中可分散或可溶于可溶于丙烯酸单体和低聚物的增塑剂以足以增强抗蚀剂渗透性或通过压制溶液扩散的浓度掺入板的光致抗蚀剂中。 这种添加剂使得光致抗蚀剂在交联之前对润版液更具渗透性,同时在交联后容易地用油墨和润版液萃取。 在某些实施方案中,加入表面活性剂以促进去除的抗蚀剂材料的疏水残余物在润版液中的分散,从而减少浮渣。 锂盐也可以掺入光致抗蚀剂中以破坏例如倾向于通过氢键缔合的氨基甲酸酯丙烯酸酯聚合物的氢键。