Fabricating perpendicular write elements in perpendicular magnetic recording heads
    1.
    发明授权
    Fabricating perpendicular write elements in perpendicular magnetic recording heads 失效
    在垂直磁记录头中制造垂直写入元件

    公开(公告)号:US07648731B2

    公开(公告)日:2010-01-19

    申请号:US11380154

    申请日:2006-04-25

    IPC分类号: B05D5/12

    CPC分类号: G11B5/1278 G11B5/3163

    摘要: Methods of fabricating perpendicular write elements for perpendicular magnetic recording heads are discussed. In write element fabrication, write poles are fabricated according to one of many desired methods. The write poles during fabrication are typically covered by a hard mask and a photolithographic soft mask. According to the methods described herein, the soft mask is removed such as by chemical etching. The hard mask is then removed, such as by CMP and ion etching, to expose the write poles. Shield gap material may then be deposited on the write poles to define the shield gap between the write poles and the trailing shields. Trailing shield material may then be deposited on the shield gap material to form the trailing shields corresponding with the write poles.

    摘要翻译: 讨论了制造垂直磁记录头垂直写入元件的方法。 在写入元件制造中,根据许多期望的方法之一制造写入极。 制造期间的写入极通常被硬掩模和光刻软掩模覆盖。 根据本文描述的方法,例如通过化学蚀刻去除软掩模。 然后去除硬掩模,例如通过CMP和离子蚀刻,以暴露写入极。 然后可以将屏蔽间隙材料沉积在写入极上以限定写入极和后部屏蔽之间的屏蔽间隙。 然后可以将后挡板材料沉积在屏蔽间隙材料上以形成对应于写入极的后挡板。

    FABRICATING PERPENDICULAR WRITE ELEMENTS IN PERPENDICULAR MAGNETIC RECORDING HEADS
    2.
    发明申请
    FABRICATING PERPENDICULAR WRITE ELEMENTS IN PERPENDICULAR MAGNETIC RECORDING HEADS 失效
    在完整的磁记录头中制作完整的写入元素

    公开(公告)号:US20080145524A1

    公开(公告)日:2008-06-19

    申请号:US11380154

    申请日:2006-04-25

    IPC分类号: B05D5/12

    CPC分类号: G11B5/1278 G11B5/3163

    摘要: Methods of fabricating perpendicular write elements for perpendicular magnetic recording heads are discussed. In write element fabrication, write poles are fabricated according to one of many desired methods. The write poles during fabrication are typically covered by a hard mask and a photolithographic soft mask. According to the methods described herein, the soft mask is removed such as by chemical etching. The hard mask is then removed, such as by CMP and ion etching, to expose the write poles. Shield gap material may then be deposited on the write poles to define the shield gap between the write poles and the trailing shields. Trailing shield material may then be deposited on the shield gap material to form the trailing shields corresponding with the write poles.

    摘要翻译: 讨论了制造垂直磁记录头垂直写入元件的方法。 在写入元件制造中,根据许多期望的方法之一制造写入极。 制造期间的写入极通常被硬掩模和光刻软掩模覆盖。 根据本文描述的方法,例如通过化学蚀刻去除软掩模。 然后去除硬掩模,例如通过CMP和离子蚀刻,以暴露写入极。 然后可以将屏蔽间隙材料沉积在写入极上以限定写入极和后部屏蔽之间的屏蔽间隙。 然后可以将后挡板材料沉积在屏蔽间隙材料上以形成对应于写入极的后挡板。

    Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge
    8.
    发明申请
    Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge 有权
    具有磁写入磁极的垂直磁性写头具有凹形后缘

    公开(公告)号:US20070258167A1

    公开(公告)日:2007-11-08

    申请号:US11411556

    申请日:2006-04-25

    IPC分类号: G11B5/147

    摘要: A magnetic write head for perpendicular magnetic recording having a write pole with a concave trailing edge. The magnetic write pole can have a trapezoidal shape with first and second laterally opposed sides that are further apart at the trailing edge than at the leading edge. The write head may or may not include a magnetic trailing shield, and if a trailing shield is included it is separated from the trailing edge by a non-magnetic write gap layer. The concave trailing edge improves magnetic performance such as by improving the transition curvature. A method for constructing the write head includes forming a magnetic write pole by forming a mask structure over a deposited write pole material, the mask structure having an alumina hard mask and an image transfer layer such as DURAMIDE®. An alumina fill layer is then deposited and a chemical mechanical polish is performed to open up the image transfer layer. A reactive on etch is performed to remove the image transfer layer and a reactive ion mill or reactive ion etch is performed to remove the alumina hard mask and form a concave surface on the write pole.

    摘要翻译: 用于垂直磁记录的磁写头,具有带有凹后缘的写极。 磁性写入极可以具有梯形形状,其中第一和第二横向相对侧在后缘处比在前缘处更远地分开。 写头可以包括或可以不包括磁性后屏蔽,并且如果包括后屏蔽,则其通过非磁性写间隙层与后缘分离。 凹形后边缘提高磁性能,例如通过改善转变曲率。 构成写入头的方法包括通过在沉积的写入极材料上形成掩模结构来形成磁性写入极,掩模结构具有氧化铝硬掩模和诸如DURAMIDE的图像转移层。 然后沉积氧化铝填充层,并执行化学机械抛光以打开图像转印层。 执行反应性蚀刻以去除图像转印层,并且执行反应性离子磨或反应离子蚀刻以除去氧化铝硬掩模并在写入极上形成凹面。

    Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge
    9.
    发明授权
    Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge 有权
    具有磁写入磁极的垂直磁性写头具有凹形后缘

    公开(公告)号:US07576951B2

    公开(公告)日:2009-08-18

    申请号:US11411556

    申请日:2006-04-25

    IPC分类号: G11B5/127

    摘要: A magnetic write head for perpendicular magnetic recording having a write pole with a concave trailing edge. The magnetic write pole can have a trapezoidal shape with first and second laterally opposed sides that are further apart at the trailing edge than at the leading edge. The write head may or may not include a magnetic trailing shield, and if a trailing shield is included it is separated from the trailing edge by a non-magnetic write gap layer. The concave trailing edge improves magnetic performance such as by improving the transition curvature. A method for constructing the write head includes forming a magnetic write pole by forming a mask structure over a deposited write pole material, the mask structure having an alumina hard mask and an image transfer layer such as DURAMIDE®. An alumina fill layer is then deposited and a chemical mechanical polish is performed to open up the image transfer layer. A reactive on etch is performed to remove the image transfer layer and a reactive ion mill or reactive ion etch is performed to remove the alumina hard mask and form a concave surface on the write pole.

    摘要翻译: 用于垂直磁记录的磁写头,具有带有凹后缘的写极。 磁性写入极可以具有梯形形状,其中第一和第二横向相对侧在后缘处比在前缘处更远地分开。 写头可以包括或可以不包括磁性后屏蔽,并且如果包括后屏蔽,则其通过非磁性写间隙层与后缘分离。 凹形后边缘提高磁性能,例如通过改善转变曲率。 构成写入头的方法包括通过在沉积的写入极材料上形成掩模结构来形成磁性写入极,掩模结构具有氧化铝硬掩模和诸如DURAMIDE的图像转移层。 然后沉积氧化铝填充层,并执行化学机械抛光以打开图像转印层。 执行反应性蚀刻以去除图像转印层,并且执行反应性离子磨或反应离子蚀刻以除去氧化铝硬掩模并在写入极上形成凹面。