RESISTIVE MEMORY AND METHOD FOR CONTROLLING OPERATIONS OF THE SAME
    2.
    发明申请
    RESISTIVE MEMORY AND METHOD FOR CONTROLLING OPERATIONS OF THE SAME 有权
    电阻记忆及其控制方法

    公开(公告)号:US20110242874A1

    公开(公告)日:2011-10-06

    申请号:US12753316

    申请日:2010-04-02

    IPC分类号: G11C11/00 H01L45/00

    摘要: A resistive memory and a method for controlling operations of the resistive memory are provided. The resistive memory has a first memory layer, a second memory layer and a medium layer. Each of the first memory layer and the second memory layer is used to store data. The medium layer is formed between the first memory layer and the second memory layer. The method comprises at least a step of measuring a resistance between the first memory layer and the second memory layer, and determining which one of a first state, a second state and a third state is a state of the resistive memory according to the measured resistance.

    摘要翻译: 提供了一种用于控制电阻性存储器的操作的电阻性存储器和方法。 电阻性存储器具有第一存储器层,第二存储器层和介质层。 第一存储器层和第二存储器层中的每一个用于存储数据。 介质层形成在第一存储层和第二存储层之间。 该方法至少包括测量第一存储层和第二存储层之间的电阻的步骤,以及根据测得的电阻确定第一状态,第二状态和第三状态中的哪一种是电阻性存储器的状态 。

    Resistive memory and method for controlling operations of the same
    3.
    发明授权
    Resistive memory and method for controlling operations of the same 有权
    电阻记忆及其控制方法

    公开(公告)号:US08295075B2

    公开(公告)日:2012-10-23

    申请号:US12753316

    申请日:2010-04-02

    IPC分类号: G11C11/00

    摘要: A resistive memory and a method for controlling operations of the resistive memory are provided. The resistive memory has a first memory layer, a second memory layer and a medium layer. Each of the first memory layer and the second memory layer is used to store data. The medium layer is formed between the first memory layer and the second memory layer. The method comprises at least a step of measuring a resistance between the first memory layer and the second memory layer, and determining which one of a first state, a second state and a third state is a state of the resistive memory according to the measured resistance.

    摘要翻译: 提供了一种用于控制电阻性存储器的操作的电阻性存储器和方法。 电阻性存储器具有第一存储器层,第二存储器层和介质层。 第一存储器层和第二存储器层中的每一个用于存储数据。 介质层形成在第一存储层和第二存储层之间。 该方法至少包括测量第一存储层和第二存储层之间的电阻的步骤,以及根据测得的电阻确定第一状态,第二状态和第三状态中的哪一种是电阻性存储器的状态 。

    Nonvolatile memory device
    4.
    发明授权
    Nonvolatile memory device 有权
    非易失性存储器件

    公开(公告)号:US08149610B2

    公开(公告)日:2012-04-03

    申请号:US12778533

    申请日:2010-05-12

    IPC分类号: G11C11/00

    摘要: A memory device comprises an array of memory cells each capable of storing multiple bits of data. Each memory cell includes a programmable transistor in series with a resistance switching device. The transistor is switchable between a plurality of different threshold voltages associated with respective memory states. The resistance switching device is configured to be switchable between a plurality of different resistances associated with respective memory states.

    摘要翻译: 存储器件包括每个能够存储多个数据位的存储器单元的阵列。 每个存储单元包括与电阻切换装置串联的可编程晶体管。 晶体管可在与各个存储器状态相关联的多个不同阈值电压之间切换。 电阻切换装置被配置为可在与各个存储器状态相关联的多个不同电阻之间切换。

    NONVOLATILE MEMORY DEVICE
    5.
    发明申请
    NONVOLATILE MEMORY DEVICE 有权
    非易失性存储器件

    公开(公告)号:US20110280058A1

    公开(公告)日:2011-11-17

    申请号:US12778533

    申请日:2010-05-12

    IPC分类号: G11C11/00 G11C7/00

    摘要: A memory device comprises an array of memory cells each capable of storing multiple bits of data. Each memory cell includes a programmable transistor in series with a resistance switching device. The transistor is switchable between a plurality of different threshold voltages associated with respective memory states. The resistance switching device is configured to be switchable between a plurality of different resistances associated with respective memory states.

    摘要翻译: 存储器件包括每个能够存储多个数据位的存储器单元的阵列。 每个存储单元包括与电阻切换装置串联的可编程晶体管。 晶体管可在与各个存储器状态相关联的多个不同阈值电压之间切换。 电阻切换装置被配置为可在与各个存储器状态相关联的多个不同电阻之间切换。

    PROGRAMMABLE METALLIZATION CELL WITH ION BUFFER LAYER
    8.
    发明申请
    PROGRAMMABLE METALLIZATION CELL WITH ION BUFFER LAYER 有权
    具有离子缓冲层的可编程金属化电池

    公开(公告)号:US20110180775A1

    公开(公告)日:2011-07-28

    申请号:US12692861

    申请日:2010-01-25

    IPC分类号: H01L45/00 H01L29/18 H01L21/06

    摘要: A programmable metallization device, comprises a first electrode; a memory layer electrically coupled to the first electrode and adapted for electrolytic formation and destruction of a conducting bridge therethrough; an ion-supplying layer containing a source of ions of a first metal element capable of diffusion into and out of the memory layer; a conductive ion buffer layer between the ion-supplying layer and the memory layer, and which allows diffusion therethrough of said ions; and a second electrode electrically coupled to the ion-supplying layer. Circuitry is coupled to the device to apply bias voltages to the first and second electrodes to induce creation and destruction of conducting bridges including the first metal element in the memory layer. The ion buffer layer can improve retention of the conducting bridge by reducing the likelihood that the first metallic element will be absorbed into the ion supplying layer.

    摘要翻译: 可编程金属化器件,包括第一电极; 存储层,其电耦合到所述第一电极并适于通过其导电桥的电解形成和破坏; 离子供给层,其含有能够扩散到所述存储层中的第一金属元素的离子源; 在离子供给层和存储层之间的导电离子缓冲层,并且允许所述离子的扩散; 以及电耦合到所述离子供应层的第二电极。 电路耦合到器件以向第一和第二电极施加偏置电压,以引起包括存储器层中的第一金属元件的导电桥的产生和破坏。 离子缓冲层可以通过降低第一金属元素被吸收到离子供给层中的可能性来改善导电桥的保留。

    Programmable metallization cell with ion buffer layer
    10.
    发明授权
    Programmable metallization cell with ion buffer layer 有权
    可编程金属化电池与离子缓冲层

    公开(公告)号:US08134139B2

    公开(公告)日:2012-03-13

    申请号:US12692861

    申请日:2010-01-25

    IPC分类号: H01L29/18 H01L21/06 H01L45/00

    摘要: A programmable metallization device, comprises a first electrode; a memory layer electrically coupled to the first electrode and adapted for electrolytic formation and destruction of a conducting bridge therethrough; an ion-supplying layer containing a source of ions of a first metal element capable of diffusion into and out of the memory layer; a conductive ion buffer layer between the ion-supplying layer and the memory layer, and which allows diffusion therethrough of said ions; and a second electrode electrically coupled to the ion-supplying layer. Circuitry is coupled to the device to apply bias voltages to the first and second electrodes to induce creation and destruction of conducting bridges including the first metal element in the memory layer. The ion buffer layer can improve retention of the conducting bridge by reducing the likelihood that the first metallic element will be absorbed into the ion supplying layer.

    摘要翻译: 可编程金属化器件,包括第一电极; 存储层,其电耦合到所述第一电极并适于通过其导电桥的电解形成和破坏; 离子供给层,其含有能够扩散到所述存储层中的第一金属元素的离子源; 在离子供给层和存储层之间的导电离子缓冲层,并且允许所述离子的扩散; 以及电耦合到所述离子供应层的第二电极。 电路耦合到器件以向第一和第二电极施加偏置电压,以引起包括存储器层中的第一金属元件的导电桥的产生和破坏。 离子缓冲层可以通过降低第一金属元素被吸收到离子供给层中的可能性来改善导电桥的保留。