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公开(公告)号:US20110127541A1
公开(公告)日:2011-06-02
申请号:US13008874
申请日:2011-01-18
申请人: Yifeng Wu , Umesh Mishra , Primit Parikh , Rongming Chu , Ilan Ben-Yaacov , Likun Shen
发明人: Yifeng Wu , Umesh Mishra , Primit Parikh , Rongming Chu , Ilan Ben-Yaacov , Likun Shen
IPC分类号: H01L29/02
CPC分类号: H01L29/0615 , H01L27/0629 , H01L29/2003 , H01L29/205 , H01L29/4236 , H01L29/778 , H01L29/7786 , H01L29/7787 , H01L29/872
摘要: Planar Schottky diodes for which the semiconductor material includes a heterojunction which induces a 2DEG in at least one of the semiconductor layers. A metal anode contact is on top of the upper semiconductor layer and forms a Schottky contact with that layer. A metal cathode contact is connected to the 2DEG, forming an ohmic contact with the layer containing the 2DEG.
摘要翻译: 平面肖特基二极管,其半导体材料包括在至少一个半导体层中诱导2DEG的异质结。 金属阳极触点位于上半导体层的顶部,与该层形成肖特基接触。 金属阴极接触件连接到2DEG,与包含2DEG的层形成欧姆接触。
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公开(公告)号:US20100140660A1
公开(公告)日:2010-06-10
申请号:US12332284
申请日:2008-12-10
申请人: Yifeng Wu , Umesh Mishra , Primit Parikh , Rongming Chu , Ilan Ben-Yaacov , Likun Shen
发明人: Yifeng Wu , Umesh Mishra , Primit Parikh , Rongming Chu , Ilan Ben-Yaacov , Likun Shen
IPC分类号: H01L29/872
CPC分类号: H01L29/0615 , H01L27/0629 , H01L29/2003 , H01L29/205 , H01L29/4236 , H01L29/778 , H01L29/7786 , H01L29/7787 , H01L29/872
摘要: Planar Schottky diodes for which the semiconductor material includes a heterojunction which induces a 2DEG in at least one of the semiconductor layers. A metal anode contact is on top of the upper semiconductor layer and forms a Schottky contact with that layer. A metal cathode contact is connected to the 2DEG, forming an ohmic contact with the layer containing the 2DEG.
摘要翻译: 平面肖特基二极管,其半导体材料包括在至少一个半导体层中诱导2DEG的异质结。 金属阳极触点位于上半导体层的顶部,与该层形成肖特基接触。 金属阴极接触件连接到2DEG,与包含2DEG的层形成欧姆接触。
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公开(公告)号:US08541818B2
公开(公告)日:2013-09-24
申请号:US13533339
申请日:2012-06-26
申请人: Yifeng Wu , Umesh Mishra , Primit Parikh , Ilan Ben-Yaacov
发明人: Yifeng Wu , Umesh Mishra , Primit Parikh , Ilan Ben-Yaacov
IPC分类号: H01L33/00 , H01L29/739
CPC分类号: H01L29/0615 , H01L27/0629 , H01L29/2003 , H01L29/205 , H01L29/4236 , H01L29/778 , H01L29/7786 , H01L29/7787 , H01L29/872
摘要: Planar Schottky diodes for which the semiconductor material includes a heterojunction which induces a 2 DEG in at least one of the semiconductor layers. A metal anode contact is on top of the upper semiconductor layer and forms a Schottky contact with that layer. A metal cathode contact is connected to the 2 DEG, forming an ohmic contact with the layer containing the 2 DEG.
摘要翻译: 平面肖特基二极管,其半导体材料包括在至少一个半导体层中诱导2°的异质结。 金属阳极触点位于上半导体层的顶部,与该层形成肖特基接触。 金属阴极接触器连接到2°,与含有2°的层形成欧姆接触。
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公开(公告)号:US08237198B2
公开(公告)日:2012-08-07
申请号:US13008874
申请日:2011-01-18
申请人: Yifeng Wu , Rongming Chu , Primit Parikh , Umesh Mishra , Ilan Ben-Yaacov , Likun Shen
发明人: Yifeng Wu , Rongming Chu , Primit Parikh , Umesh Mishra , Ilan Ben-Yaacov , Likun Shen
IPC分类号: H01L33/00 , H01L29/739
CPC分类号: H01L29/0615 , H01L27/0629 , H01L29/2003 , H01L29/205 , H01L29/4236 , H01L29/778 , H01L29/7786 , H01L29/7787 , H01L29/872
摘要: Planar Schottky diodes for which the semiconductor material includes a heterojunction which induces a 2DEG in at least one of the semiconductor layers. A metal anode contact is on top of the upper semiconductor layer and forms a Schottky contact with that layer. A metal cathode contact is connected to the 2DEG, forming an ohmic contact with the layer containing the 2DEG.
摘要翻译: 平面肖特基二极管,其半导体材料包括在至少一个半导体层中诱导2DEG的异质结。 金属阳极触点位于上半导体层的顶部,与该层形成肖特基接触。 金属阴极接触件连接到2DEG,与包含2DEG的层形成欧姆接触。
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公开(公告)号:US20120267640A1
公开(公告)日:2012-10-25
申请号:US13533339
申请日:2012-06-26
申请人: Yifeng Wu , Umesh Mishra , Primit Parikh , Ilan Ben-Yaacov
发明人: Yifeng Wu , Umesh Mishra , Primit Parikh , Ilan Ben-Yaacov
IPC分类号: H01L29/20
CPC分类号: H01L29/0615 , H01L27/0629 , H01L29/2003 , H01L29/205 , H01L29/4236 , H01L29/778 , H01L29/7786 , H01L29/7787 , H01L29/872
摘要: Planar Schottky diodes for which the semiconductor material includes a heterojunction which induces a 2DEG in at least one of the semiconductor layers. A metal anode contact is on top of the upper semiconductor layer and forms a Schottky contact with that layer. A metal cathode contact is connected to the 2DEG, forming an ohmic contact with the layer containing the 2DEG.
摘要翻译: 平面肖特基二极管,其半导体材料包括在至少一个半导体层中诱导2DEG的异质结。 金属阳极触点位于上半导体层的顶部,与该层形成肖特基接触。 金属阴极接触件连接到2DEG,与包含2DEG的层形成欧姆接触。
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公开(公告)号:US07898004B2
公开(公告)日:2011-03-01
申请号:US12332284
申请日:2008-12-10
申请人: Yifeng Wu , Umesh Mishra , Primit Parikh , Rongming Chu , Ilan Ben-Yaacov , Likun Shen
发明人: Yifeng Wu , Umesh Mishra , Primit Parikh , Rongming Chu , Ilan Ben-Yaacov , Likun Shen
IPC分类号: H01L29/739 , H01L33/00
CPC分类号: H01L29/0615 , H01L27/0629 , H01L29/2003 , H01L29/205 , H01L29/4236 , H01L29/778 , H01L29/7786 , H01L29/7787 , H01L29/872
摘要: Planar Schottky diodes for which the semiconductor material includes a heterojunction which induces a 2DEG in at least one of the semiconductor layers. A metal anode contact is on top of the upper semiconductor layer and forms a Schottky contact with that layer. A metal cathode contact is connected to the 2DEG, forming an ohmic contact with the layer containing the 2DEG.
摘要翻译: 平面肖特基二极管,其半导体材料包括在至少一个半导体层中诱导2DEG的异质结。 金属阳极触点位于上半导体层的顶部,与该层形成肖特基接触。 金属阴极接触件连接到2DEG,与包含2DEG的层形成欧姆接触。
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公开(公告)号:US08519438B2
公开(公告)日:2013-08-27
申请号:US12108449
申请日:2008-04-23
申请人: Umesh Mishra , Robert Coffie , Likun Shen , Ilan Ben-Yaacov , Primit Parikh
发明人: Umesh Mishra , Robert Coffie , Likun Shen , Ilan Ben-Yaacov , Primit Parikh
IPC分类号: H01L29/66
CPC分类号: H01L29/7784 , H01L21/0217 , H01L21/0254 , H01L29/0847 , H01L29/1033 , H01L29/2003 , H01L29/205 , H01L29/207 , H01L29/365 , H01L29/4236 , H01L29/518 , H01L29/66431 , H01L29/66462 , H01L29/7783 , H01L29/7787 , H01L29/7788
摘要: A III-N semiconductor device that includes a substrate and a nitride channel layer including a region partly beneath a gate region, and two channel access regions on opposite sides of the part beneath the gate. The channel access regions may be in a different layer from the region beneath the gate. The device includes an AlXN layer adjacent the channel layer wherein X is gallium, indium or their combination, and a preferably n-doped GaN layer adjacent the AlXN layer in the areas adjacent to the channel access regions. The concentration of Al in the AlXN layer, the AlXN layer thickness and the n-doping concentration in the n-doped GaN layer are selected to induce a 2DEG charge in channel access regions without inducing any substantial 2DEG charge beneath the gate, so that the channel is not conductive in the absence of a switching voltage applied to the gate.
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公开(公告)号:US20090267078A1
公开(公告)日:2009-10-29
申请号:US12108449
申请日:2008-04-23
申请人: Umesh Mishra , Robert Coffie , Likun Shen , Ilan Ben-Yaacov , Primit Parikh
发明人: Umesh Mishra , Robert Coffie , Likun Shen , Ilan Ben-Yaacov , Primit Parikh
IPC分类号: H01L29/778 , H01L21/338
CPC分类号: H01L29/7784 , H01L21/0217 , H01L21/0254 , H01L29/0847 , H01L29/1033 , H01L29/2003 , H01L29/205 , H01L29/207 , H01L29/365 , H01L29/4236 , H01L29/518 , H01L29/66431 , H01L29/66462 , H01L29/7783 , H01L29/7787 , H01L29/7788
摘要: A III-N semiconductor device that includes a substrate and a nitride channel layer including a region partly beneath a gate region, and two channel access regions on opposite sides of the part beneath the gate. The channel access regions may be in a different layer from the region beneath the gate. The device includes an AlXN layer adjacent the channel layer wherein X is gallium, indium or their combination, and a preferably n-doped GaN layer adjacent the AlXN layer in the areas adjacent to the channel access regions. The concentration of Al in the AlXN layer, the AlXN layer thickness and the n-doping concentration in the n-doped GaN layer are selected to induce a 2DEG charge in channel access regions without inducing any substantial 2DEG charge beneath the gate, so that the channel is not conductive in the absence of a switching voltage applied to the gate.
摘要翻译: 一种III-N半导体器件,其包括衬底和包括部分在栅极区域下方的区域的氮化物沟道层,以及在栅极下方的部分的相对侧上的两个沟道存取区域。 通道接入区域可以在与栅极下方的区域不同的层中。 该器件包括与沟道层相邻的AlXN层,其中X是镓,铟或它们的组合,以及在与沟道接入区相邻的区域中与AlXN层相邻的优选n掺杂GaN层。 选择AlXN层中的Al的浓度,n掺杂GaN层中的AlXN层厚度和n掺杂浓度,以在沟道接入区域中引起2DEG电荷,而不在栅极下方引起任何实质的2DEG电荷,使得 在没有施加到栅极的开关电压的情况下,通道不导通。
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公开(公告)号:US20090065810A1
公开(公告)日:2009-03-12
申请号:US12209581
申请日:2008-09-12
申请人: James Honea , Primit Parikh , Yifeng Wu , Ilan Ben-Yaacov
发明人: James Honea , Primit Parikh , Yifeng Wu , Ilan Ben-Yaacov
IPC分类号: H01L29/00
CPC分类号: H01L29/7787 , H01L27/0605 , H01L29/1033 , H01L29/1066 , H01L29/2003 , H01L29/402 , H01L29/42316 , H01L29/7781
摘要: Bidirectional switches are described. The bidirectional switches include first and a second III-N based high electron mobility transistor. In some embodiments, the source of the first transistor is in electrical contact with a source of the second transistor. In some embodiments, the drain of the first transistor is in electrical contact with a drain of the second transistor. In some embodiments, the two transistors share a drift region and the switch is free of a drain contact between the two transistors. Matrix converters can be formed from the bidirectional switches.
摘要翻译: 描述了双向开关。 双向开关包括第一和第二III-N基高电子迁移率晶体管。 在一些实施例中,第一晶体管的源极与第二晶体管的源电接触。 在一些实施例中,第一晶体管的漏极与第二晶体管的漏极电接触。 在一些实施例中,两个晶体管共享漂移区,并且开关在两个晶体管之间没有漏极接触。 矩阵转换器可以由双向开关形成。
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公开(公告)号:US07875907B2
公开(公告)日:2011-01-25
申请号:US12209581
申请日:2008-09-12
申请人: James Honea , Primit Parikh , Yifeng Wu , Ilan Ben-Yaacov
发明人: James Honea , Primit Parikh , Yifeng Wu , Ilan Ben-Yaacov
IPC分类号: H01L29/66
CPC分类号: H01L29/7787 , H01L27/0605 , H01L29/1033 , H01L29/1066 , H01L29/2003 , H01L29/402 , H01L29/42316 , H01L29/7781
摘要: Bidirectional switches are described. The bidirectional switches include first and a second III-N based high electron mobility transistor. In some embodiments, the source of the first transistor is in electrical contact with a source of the second transistor. In some embodiments, the drain of the first transistor is in electrical contact with a drain of the second transistor. In some embodiments, the two transistors share a drift region and the switch is free of a drain contact between the two transistors. Matrix converters can be formed from the bidirectional switches.
摘要翻译: 描述了双向开关。 双向开关包括第一和第二III-N基高电子迁移率晶体管。 在一些实施例中,第一晶体管的源极与第二晶体管的源电接触。 在一些实施例中,第一晶体管的漏极与第二晶体管的漏极电接触。 在一些实施例中,两个晶体管共享漂移区,并且开关在两个晶体管之间没有漏极接触。 矩阵转换器可以由双向开关形成。
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