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    Monochromator and scanning electron microscope using the same
    1.
    发明授权
    Monochromator and scanning electron microscope using the same 有权
    单色器和扫描电子显微镜使用相同

    公开(公告)号：US07838827B2

    公开(公告)日：2010-11-23

    申请号：US11987018

    申请日：2007-11-26

    申请人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

    发明人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

    IPC分类号： H01J37/05

    CPC分类号： H01J37/05 ,  H01J37/153 ,  H01J37/28

    摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

    摘要翻译： 本发明提供一种扫描电子显微镜，该扫描电子显微镜由能够高分辨率，单色化能量和降低色差的单色仪组成，而不会显着降低一次电子束的电流强度。 扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场，以聚焦电子束，然后通过狭缝限制能量宽度，并且安装相同形状的另一对扇形磁场和电场 在与包含狭缝的表面形成对称镜的位置处。 该结构用于抵消物点和对称镜位置的能量分散，并通过会聚透镜系统空间收缩点聚光点光束，提高扫描电子显微镜的图像分辨率。

    Scanning electron microscope
    2.
    发明授权
    Scanning electron microscope 失效
    扫描电子显微镜

    公开(公告)号：US5608218A

    公开(公告)日：1997-03-04

    申请号：US359761

    申请日：1994-12-20

    申请人： Mitsugu Sato ,  Yoichi Ose ,  Satoru Fukuhara ,  Hideo Todokoro ,  Makoto Ezumi

    发明人： Mitsugu Sato ,  Yoichi Ose ,  Satoru Fukuhara ,  Hideo Todokoro ,  Makoto Ezumi

    IPC分类号： H01J37/22 ,  H01J37/05 ,  H01J37/244 ,  H01J37/28

    CPC分类号： H01J37/28 ,  H01J2237/225 ,  H01J2237/24495 ,  H01J2237/281

    摘要： A scanning electron microscope suitable for producing an image of high resolution by detecting secondary electrons and backscattered electrons generated from a specimen at a low accelerating voltage in a separate or synthesis fashion. In the scanning electron microscope electric and magnetic fields for separating trajectories of backscattered electrons and secondary electrons generated from a specimen are established, and a backscattered electron detector for detecting generated backscattered electrons is disposed on the trajectory of the backscattered electrons. According to the microscope, since secondary electrons and backscattered electrons can be detected efficiently in a separate fashion even at a low accelerating voltage of several kilovolts or less and besides the detector does not exert the deflection action on a primary electron beam, backscattered and secondary electron images of high resolution can be obtained.

    摘要翻译： 一种扫描电子显微镜，其适用于通过以单独或合成的方式检测由低速加速电压下的样品产生的二次电子和反向散射电子来产生高分辨率的图像。 在扫描电子显微镜中，建立用于分离由样品产生的背散射电子和二次电子的轨迹的电场和磁场，并且用于检测产生的反向散射电子的反向散射电子检测器设置在背散射电子的轨迹上。 根据显微镜，由于二次电子和后向散射电子可以以几千伏或更小的低加速电压以单独的方式被有效地检测，此外，检测器不会对一次电子束，后向散射和二次电子施加偏转作用 可以获得高分辨率的图像。

    Monochromator and scanning electron microscope using the same
    4.
    发明授权
    Monochromator and scanning electron microscope using the same 有权
    单色器和扫描电子显微镜使用相同

    公开(公告)号：US07315024B2

    公开(公告)日：2008-01-01

    申请号：US11344529

    申请日：2006-02-01

    申请人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

    发明人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

    IPC分类号： G21K7/00 ,  G01N23/00

    CPC分类号： H01J37/05 ,  H01J37/153 ,  H01J37/28

    摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

    摘要翻译： 本发明提供一种扫描电子显微镜，该扫描电子显微镜由能够高分辨率，单色化能量和降低色差的单色仪组成，而不会显着降低一次电子束的电流强度。 扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场，以聚焦电子束，然后通过狭缝限制能量宽度，并且安装相同形状的另一对扇形磁场和电场 在与包含狭缝的表面形成对称镜的位置处。 该结构用于抵消物点和对称镜位置的能量分散，并通过会聚透镜系统空间收缩点聚光点光束，提高扫描电子显微镜的图像分辨率。

    Monochromator and scanning electron microscope using the same
    5.
    发明授权
    Monochromator and scanning electron microscope using the same 失效

    公开(公告)号：US07022983B2

    公开(公告)日：2006-04-04

    申请号：US10751907

    申请日：2004-01-07

    申请人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

    发明人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

    IPC分类号： H01J37/05

    CPC分类号： H01J37/05 ,  H01J37/153 ,  H01J37/28

    摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

    Scanning electron microscope
    6.
    发明申请
    Scanning electron microscope 失效
    扫描电子显微镜

    公开(公告)号：US20050139773A1

    公开(公告)日：2005-06-30

    申请号：US11064819

    申请日：2005-02-25

    申请人： Yoichi Ose ,  Hideo Todokoro ,  Makoto Ezumi ,  Mitsugu Sato

    发明人： Yoichi Ose ,  Hideo Todokoro ,  Makoto Ezumi ,  Mitsugu Sato

    IPC分类号： G01Q30/02 ,  G21K7/00 ,  H01J37/147 ,  H01J37/28 ,  G01N23/00

    CPC分类号： H01J37/147 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/1516 ,  H01J2237/244 ,  H01J2237/2817

    摘要： The present invention is intended to prevent the deterioration of resolution due to increase in off-axis aberration resulting from the deviation of a primary electron bean from the optical axis of a scanning electron microscope. A scanning electron microscope is provided with an image shifting deflector system including two deflectors disposed respectively at upper and lower stages. The deflector disposed at the lower stage is a multipole electrostatic deflecting electrode and is disposed in an objective. Even if the distance of image shifting is great, an image of a high resolution can be formed and dimensions can be measured in a high accuracy. The SEM is able to achieving precision inspection at a high throughput when applied to inspection in semiconductor device fabricating processes that process a wafer having a large area and provided with very minute circuit elements.

    摘要翻译： 本发明旨在防止由于一次电子束与扫描型电子显微镜的光轴的偏离引起的离轴像差的增加而导致的分辨率的劣化。 扫描电子显微镜设置有分别设置在上部和下部的两个偏转器的图像偏转偏转器系统。 设置在下级的偏转器是多极静电偏转电极，并且设置在物镜中。 即使图像偏移的距离大，也可以形成高分辨率的图像，并且可以高精度地测量尺寸。 当在用于处理具有大面积的晶片并且具有非常微小的电路元件的半导体器件制造工艺中进行检查时，SEM能够以高产量实现精密检查。

    Scanning electron microscope
    8.
    发明授权
    Scanning electron microscope 失效

    公开(公告)号：US06787772B2

    公开(公告)日：2004-09-07

    申请号：US09768356

    申请日：2001-01-25

    申请人： Yoichi Ose ,  Hideo Todokoro ,  Makoto Ezumi ,  Mitsugu Sato

    发明人： Yoichi Ose ,  Hideo Todokoro ,  Makoto Ezumi ,  Mitsugu Sato

    IPC分类号： H01J3728

    CPC分类号： H01J37/147 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/1516 ,  H01J2237/244 ,  H01J2237/2817

    摘要： The present invention is intended to prevent the deterioration of resolution due to increase in off-axis aberration resulting from the deviation of a primary electron bean from the optical axis of a scanning electron microscope. A scanning electron microscope is provided with an image shifting deflector system including two deflectors disposed respectively at upper and lower stages. The deflector disposed at the lower stage is a multipole electrostatic deflecting electrode and is disposed in an objective. Even if the distance of image shifting is great, an image of a high resolution can be formed and dimensions can be measured in a high accuracy. The SEM is able to achieving precision inspection at a high throughput when applied to inspection in semiconductor device fabricating processes that process a wafer having a large area and provided with very minute circuit elements.