公开(公告)号：US5383482A

公开(公告)日：1995-01-24

申请号：US970471

申请日：1992-11-02

申请人： Yoshiaki Yamada ,  Junji Iwasaki ,  Masashi Ohmori

发明人： Yoshiaki Yamada ,  Junji Iwasaki ,  Masashi Ohmori

IPC分类号： H01L21/02 ,  H01L21/00 ,  H01L21/304 ,  H01L21/677 ,  B08B3/02

CPC分类号： H01L21/67173 ,  H01L21/67207 ,  H01L21/67276 ,  H01L21/67294 ,  H01L21/67778 ,  Y10S134/902

摘要： Semiconductor processing equipment includes an ID-card removing robot, an ID-card stocking device, and an ID-card attaching robot so that the management of ID cards is performed inside the equipment. Thus, the present invention makes it possible to reduce equipment size and achieve highly efficient factory automation. Furthermore, in a semiconductor processing equipment module according to the present invention, each item of semiconductor processing equipment has its own ID-card stocking device. As a result, the number of case carriers can be reduced and a space reduction with increased factory automation can be easily realized.

摘要翻译： 半导体处理设备包括ID卡去除机器人，ID卡放养设备和ID卡附着机器人，以便在设备内执行身份证的管理。 因此，本发明可以减小设备尺寸并实现高效率的工厂自动化。 此外，在本发明的半导体处理装置模块中，各项目的半导体处理装置具有自己的ID卡存放装置。 结果，可以容易地实现箱体承载体的数量并且可以容易地实现具有增加的工厂自动化的空间减小。

公开(公告)号：US5470392A

公开(公告)日：1995-11-28

申请号：US340350

申请日：1994-11-14

申请人： Yoshiaki Yamada ,  Junji Iwasaki ,  Masashi Ohmori

发明人： Yoshiaki Yamada ,  Junji Iwasaki ,  Masashi Ohmori

IPC分类号： H01L21/02 ,  H01L21/00 ,  H01L21/304 ,  H01L21/677 ,  G03D5/04

CPC分类号： H01L21/67173 ,  H01L21/67207 ,  H01L21/67276 ,  H01L21/67294 ,  H01L21/67778 ,  Y10S134/902

摘要： A semiconductor processing method includes the steps of carrying a case containing semiconductor wafers and to which an ID card is attached into semiconductor processing equipment at a first side of the semiconductor processing equipment; removing the ID card from the case; taking the semiconductor wafers out of the case; carrying the semiconductor wafers taken out of the case into a processing means on a second side, opposite to the first side, of the semiconductor processing equipment; processing the semiconductor wafers in the processing means; attaching the ID card corresponding to the semiconductor wafers to the case; taking the processed semiconductor wafers out of the processing means at the first side of the semiconductor processing equipment; putting the processed semiconductor wafers into the case to which the ID card is attached; and carrying the case outside the semiconductor equipment at the first side of the semiconductor equipment.

摘要翻译： 半导体处理方法包括以下步骤：在半导体处理设备的第一侧承载包含半导体晶片的壳体并将ID卡附着到半导体处理设备中; 从案件中取出身份证; 将半导体晶片从外壳中取出; 将从壳体取出的半导体晶片携带到半导体处理设备的与第一侧相对的第二侧的处理装置中; 处理所述处理装置中的半导体晶片; 将对应于半导体晶片的ID卡附接到壳体; 在半导体处理设备的第一侧将处理后的半导体晶片从处理装置中取出; 将经处理的半导体晶片放入附有ID卡的壳体中; 并且在半导体设备的第一侧将半导体设备外的外壳携带。

公开(公告)号：US20120065017A1

公开(公告)日：2012-03-15

申请号：US13320979

申请日：2009-11-18

申请人： Yoshiaki Yamada

发明人： Yoshiaki Yamada

IPC分类号： F16H3/72

CPC分类号： B60K6/387 ,  B60K6/365 ,  B60K6/48 ,  B60K2006/381 ,  B60K2006/4825 ,  F16H3/724 ,  Y02T10/6221 ,  Y02T10/6252

摘要： A proposition is to provide a power transmitting mechanism for a hybrid vehicle having improved energy utilization efficiency. A power transmitting mechanism for the hybrid vehicle using powers of the engine and the motor/generator in a combined manner, the mechanism includes an engine drive shaft coupled to an engine output shaft via a main clutch; a motor output shaft of a motor/generator rotatably supported separately from the engine drive shaft; a drive shaft brake releasing/fixing the engine drive shaft; a motor-brake releasing/fixing the motor output shaft; and a planetary gear mechanism.

摘要翻译： 提出一种具有提高的能量利用效率的混合动力车辆的动力传递机构。 一种用于混合动力车辆的动力传递机构，其以组合的方式使用发动机和电动机/发电机的动力，该机构包括经由主离合器联接到发动机输出轴的发动机驱动轴; 与发动机驱动轴分开旋转地支撑的电动机/发电机的电动机输出轴; 驱动轴制动器释放/固定发动机驱动轴; 释放/固定马达输出轴的马达制动器; 和行星齿轮机构。

公开(公告)号：US20110117492A1

公开(公告)日：2011-05-19

申请号：US12940101

申请日：2010-11-05

申请人： Yoshiaki Yamada ,  Yuichi Yamamoto ,  Hitoshi Kosugi

发明人： Yoshiaki Yamada ,  Yuichi Yamamoto ,  Hitoshi Kosugi

IPC分类号： G03F7/004 ,  C23C14/00

CPC分类号： H01L21/67109 ,  H01L21/67196 ,  H01L21/67201

摘要： A photoresist coating and developing apparatus 1 includes a photoresist film forming unit that forms a photoresist film on a substrate; a heat treatment unit that heats the substrate on which the photoresist film is formed by the photoresist film forming unit; a cooling unit that cools the substrate, on which the photoresist film is formed and which is heated by the heat treatment unit, to normal temperature; a heating unit 61 that heats the substrate, which is cooled to normal temperature by the cooling unit, to a predetermined temperature; a load-lock chamber L1 that unloads the substrate under depressurized atmosphere to expose the photoresist film; and a transfer device 62 that transfers the substrate from the heating unit 61 to the load-lock chamber L1.

摘要翻译： 光致抗蚀剂涂层显影装置1包括在基板上形成光致抗蚀剂膜的光致抗蚀剂膜形成单元; 热处理单元，其通过光致抗蚀剂膜形成单元加热其上形成有光致抗蚀剂膜的基板; 冷却单元，其将形成有光致抗蚀剂膜的基板和由热处理单元加热的基板冷却至常温; 加热单元61，其通过冷却单元将被冷却至常温的基板加热到预定温度; 负载锁定室L1，其在减压气氛下卸载基板以露出光致抗蚀剂膜; 以及将基板从加热单元61传递到加载锁定室L1的转移装置62。

公开(公告)号：US07667794B2

公开(公告)日：2010-02-23

申请号：US11038385

申请日：2005-01-21

申请人： Yoshiaki Yamada

发明人： Yoshiaki Yamada

IPC分类号： G02F1/1335

CPC分类号： G02B5/201

摘要： The color element-equipped substrate of the present invention has a support base, a bank formed on the base that demarcates a pixel region, and a color element formed in the pixel region by depositing droplets of a liquid material in the pixel region. The bank demarcates the pixel region such that the pixel region has a undulated portion. In the color element-equipped substrate, the liquid material can be applied to the entire pixel region.

摘要翻译： 本发明的配有色素元件的基板具有支撑基座，形成在基底上的划分像素区域的堤岸和通过在像素区域中沉积液体材料的液滴而形成在像素区域中的色素。 银行划分像素区域，使得像素区域具有起伏部分。 在配有颜色元件的基板中，可以将液体材料施加到整个像素区域。

公开(公告)号：US20090317752A1

公开(公告)日：2009-12-24

申请号：US12548698

申请日：2009-08-27

申请人： Masakazu Kobayashi ,  Hiroyuki Ichikawa ,  Yoshiaki Yamada ,  Keiichi Tanaka

发明人： Masakazu Kobayashi ,  Hiroyuki Ichikawa ,  Yoshiaki Yamada ,  Keiichi Tanaka

IPC分类号： G03F7/20

CPC分类号： H01L21/0273 ,  C11D1/72 ,  C11D11/0047 ,  G03F7/322

摘要： The present invention provide with a rinse solution for lithography and a resist pattern forming method using the same, which can prevent an inclination and peeling-off of a resist pattern and form a resist pattern having a high aspect ratio with high reproducibility. The rinse solution for lithography of the present invention comprises water and a nonionic surfactant having an ethyleneoxy group but not having a fluorine atom. The resist forming method of the present invention comprises the step of rinsing the pattern after development treatment with the rinse solution for lithography.

摘要翻译： 本发明提供了一种用于光刻的冲洗溶液和使用其的抗蚀剂图案形成方法，其可以防止抗蚀剂图案的倾斜和剥离，并以高重现性形成具有高纵横比的抗蚀剂图案。 本发明的光刻用冲洗液包含水和具有乙烯氧基但不具有氟原子的非离子表面活性剂。 本发明的抗蚀剂形成方法包括用用于光刻的冲洗溶液对显影处理后的图案进行漂洗的步骤。

公开(公告)号：US20080038671A1

公开(公告)日：2008-02-14

申请号：US11782233

申请日：2007-07-24

申请人： Taro YAMAMOTO ,  Hitoshi Kosugi ,  Yoshiaki Yamada ,  Yasuhito Saiga

发明人： Taro YAMAMOTO ,  Hitoshi Kosugi ,  Yoshiaki Yamada ,  Yasuhito Saiga

IPC分类号： G03B27/42 ,  G03C5/00

CPC分类号： G03F7/38 ,  G03F7/2041 ,  G03F7/70341

摘要： A pattern forming method includes forming a resist film or sequentially forming a resist film and a protection film in this order on a surface of a substrate; then, performing immersion light exposure that includes immersing the resist film or the resist film and the protection film formed on the substrate in a liquid during light exposure, thereby forming a predetermined light exposure pattern on the resist film; and performing a development process of the light exposure pattern by use of a development liquid, thereby forming a predetermined resist pattern. After the immersion light exposure and before the development process, the method further includes performing a hydrophilic process of turning a surface of the resist film or the protection film serving as a substrate surface into a hydrophilic state to allow the substrate surface to be wetted with the development liquid overall.

摘要翻译： 图案形成方法包括在基板的表面上依次形成抗蚀剂膜或依次形成抗蚀剂膜和保护膜; 然后，在曝光期间进行浸渍曝光，其中包括将抗蚀剂膜或抗蚀剂膜和形成在基板上的保护膜浸入液体中，从而在抗蚀剂膜上形成预定的曝光图案; 并通过使用显影液进行曝光图案的显影处理，由此形成预定的抗蚀剂图案。 在浸没曝光之后和显影处理之前，该方法还包括进行将抗蚀剂膜或用作基板表面的保护膜的表面转动成亲水性的亲水处理，以允许基板表面被 开发液体整体。

公开(公告)号：USD557332S1

公开(公告)日：2007-12-11

申请号：US29222350

申请日：2005-01-31

申请人： Shinichi Nakamura ,  Yoshiaki Yamada ,  Tsuyoshi Kitahara ,  Satoru Katagami

设计人： Shinichi Nakamura ,  Yoshiaki Yamada ,  Tsuyoshi Kitahara ,  Satoru Katagami

公开(公告)号：US20060250445A1

公开(公告)日：2006-11-09

申请号：US11484584

申请日：2006-07-12

申请人： Shinichi Nakamura ,  Yoshiaki Yamada ,  Tsuyoshi Kitahara ,  Satoru Katagami

发明人： Shinichi Nakamura ,  Yoshiaki Yamada ,  Tsuyoshi Kitahara ,  Satoru Katagami

IPC分类号： B05C5/00 ,  B41J2/16

CPC分类号： H01L51/0005 ,  B41J2/145 ,  B41J2202/09 ,  B41J2202/20

摘要： In an ink jet apparatus for manufacturing a color filter 1, ink jet heads 22 having a plurality of nozzle 27 are disposed in a linear manner. Filter element member is ejected to a motherboard 12 from a plurality of nozzles 27 four times so as to form the filter element 3 in a predetermined thickness. By doing this, it is possible to prevent difference in the thickness in a plurality of the filter elements 3 and to equalize light transparency in planar manner. Thus, in an ejecting apparatus, a color filter can be formed in more common way at low cost and more efficiently. Also, it is possible to provide an ejecting apparatus which can equalize factors such as electrooptical characteristics of the electrooptical members, color displaying characteristics by the liquid crystal apparatuses, and illuminating characteristics by an EL surface.

公开(公告)号：US07116348B2

公开(公告)日：2006-10-03

申请号：US11150104

申请日：2005-06-13

申请人： Shinichi Nakamura ,  Yoshiaki Yamada

发明人： Shinichi Nakamura ,  Yoshiaki Yamada

IPC分类号： B41J27/00 ,  B41J23/00

CPC分类号： H01L23/544 ,  H01L51/0005 ,  H01L2223/54473 ,  H01L2924/0002 ,  H01L2924/12044 ,  H01L2924/00

摘要： A method of manufacturing a device includes introducing each color of material into a plurality of liquid droplet ejection heads and scanning the plurality of liquid droplet ejection heads relative to a substrate through a head unit to selectively eject the material, wherein the head unit includes a carriage with two members recognized for alignment, each member being disposed in an object set in position and having formed therein a mark for image-wise recognition, each member comprising a member main body formed substantially in a columnar shape and having a mirror-finished front end surface, wherein the marks are formed into a depressed shape in a substantially central part of the front end surface of each member main body and the marks are disposed at a distance from each other, and the plurality of liquid droplet ejection heads mounted on the carriage.

摘要翻译： 一种制造装置的方法包括将每种颜色的材料引入多个液滴喷射头中，并通过头单元相对于基底扫描多个液滴喷射头以选择性地喷射材料，其中头部单元包括滑架 其中两个构件被识别用于对准，每个构件被布置在设置在适当位置的物体中并且在其中形成有用于图像识别的标记，每个构件包括构成主体，该构件主体形成为大致圆柱形并具有镜面前端 表面，其中标记在每个构件主体的前端表面的大致中心部分中形成为凹陷形状，并且标记彼此间隔设置，并且安装在托架上的多个液滴喷射头 。