公开(公告)号：US20110117492A1

公开(公告)日：2011-05-19

申请号：US12940101

申请日：2010-11-05

申请人： Yoshiaki Yamada ,  Yuichi Yamamoto ,  Hitoshi Kosugi

发明人： Yoshiaki Yamada ,  Yuichi Yamamoto ,  Hitoshi Kosugi

IPC分类号： G03F7/004 ,  C23C14/00

CPC分类号： H01L21/67109 ,  H01L21/67196 ,  H01L21/67201

摘要： A photoresist coating and developing apparatus 1 includes a photoresist film forming unit that forms a photoresist film on a substrate; a heat treatment unit that heats the substrate on which the photoresist film is formed by the photoresist film forming unit; a cooling unit that cools the substrate, on which the photoresist film is formed and which is heated by the heat treatment unit, to normal temperature; a heating unit 61 that heats the substrate, which is cooled to normal temperature by the cooling unit, to a predetermined temperature; a load-lock chamber L1 that unloads the substrate under depressurized atmosphere to expose the photoresist film; and a transfer device 62 that transfers the substrate from the heating unit 61 to the load-lock chamber L1.

摘要翻译： 光致抗蚀剂涂层显影装置1包括在基板上形成光致抗蚀剂膜的光致抗蚀剂膜形成单元; 热处理单元，其通过光致抗蚀剂膜形成单元加热其上形成有光致抗蚀剂膜的基板; 冷却单元，其将形成有光致抗蚀剂膜的基板和由热处理单元加热的基板冷却至常温; 加热单元61，其通过冷却单元将被冷却至常温的基板加热到预定温度; 负载锁定室L1，其在减压气氛下卸载基板以露出光致抗蚀剂膜; 以及将基板从加热单元61传递到加载锁定室L1的转移装置62。

公开(公告)号：US08376637B2

公开(公告)日：2013-02-19

申请号：US12940101

申请日：2010-11-05

申请人： Yoshiaki Yamada ,  Yuichi Yamamoto ,  Hitoshi Kosugi ,  Seiji Fujimoto

发明人： Yoshiaki Yamada ,  Yuichi Yamamoto ,  Hitoshi Kosugi ,  Seiji Fujimoto

IPC分类号： G03D5/00

CPC分类号： H01L21/67109 ,  H01L21/67196 ,  H01L21/67201

摘要： A photoresist coating and developing apparatus 1 includes a photoresist film forming unit that forms a photoresist film on a substrate; a heat treatment unit that heats the substrate on which the photoresist film is formed by the photoresist film forming unit; a cooling unit that cools the substrate, on which the photoresist film is formed and which is heated by the heat treatment unit, to normal temperature; a heating unit 61 that heats the substrate, which is cooled to normal temperature by the cooling unit, to a predetermined temperature; a load-lock chamber L1 that unloads the substrate under depressurized atmosphere to expose the photoresist film; and a transfer device 62 that transfers the substrate from the heating unit 61 to the load-lock chamber L1.

摘要翻译： 光致抗蚀剂涂层显影装置1包括在基板上形成光致抗蚀剂膜的光致抗蚀剂膜形成单元; 热处理单元，其通过光致抗蚀剂膜形成单元加热其上形成有光致抗蚀剂膜的基板; 冷却单元，其将形成有光致抗蚀剂膜的基板和由热处理单元加热的基板冷却至常温; 加热单元61，其通过冷却单元将被冷却至常温的基板加热到预定温度; 负载锁定室L1，其在减压气氛下卸载基板以露出光致抗蚀剂膜; 以及将基板从加热单元61传递到加载锁定室L1的转移装置62。

公开(公告)号：US20090185151A1

公开(公告)日：2009-07-23

申请号：US12302853

申请日：2007-06-15

申请人： Yuichi Yamamoto ,  Tadayuki Yamaguchi ,  Yasuhito Saiga ,  Yoshiaki Yamada

发明人： Yuichi Yamamoto ,  Tadayuki Yamaguchi ,  Yasuhito Saiga ,  Yoshiaki Yamada

IPC分类号： G03B27/42 ,  G03B27/32

CPC分类号： H01L21/67225 ,  G03F7/70525 ,  G03F7/7075 ,  G03F7/70991 ,  H01L21/67727 ,  H01L21/67733 ,  Y10S414/135

摘要： A substrate processing system (100) includes a first automated substrate transfer line or main transfer line (20) configured to transfer wafers (W) over the entire system and to transfer wafers to and from respective process sections, and a second automated substrate transfer line or auxiliary transfer line (30) configured to transfer wafers (W) inside a photolithography process section (1a). The auxiliary transfer line (30) is disposed as a transfer mechanism independent of the main transfer line (20). An OHT (31) is configured to travel around on the auxiliary transfer line (30) having a loop shape, so as to transfer wafers (W) to and from and among the respective process apparatuses in the photolithography process section (1a).

摘要翻译： 衬底处理系统（100）包括第一自动化衬底传送线或主传输线（20），其被配置为在整个系统上传送晶片（W）并将晶片传送到相应工艺部分和从相应工艺部分传送晶片，以及第二自动衬底传送线 或辅助传输线（30），其配置成在光刻工艺部分（1a）内转移晶片（W）。 辅助传输线（30）被设置为独立于主传输线（20）的传送机构。 OHT（31）构造成在具有环形的辅助传输线（30）周围行进，以便在光刻处理部分（1a）中将晶片（W）传送到各自的处理装置之间和之间。

公开(公告)号：US08702370B2

公开(公告)日：2014-04-22

申请号：US13495611

申请日：2012-06-13

申请人： Yuichi Yamamoto ,  Tadayuki Yamaguchi ,  Yasuhito Saiga ,  Yoshiaki Yamada

发明人： Yuichi Yamamoto ,  Tadayuki Yamaguchi ,  Yasuhito Saiga ,  Yoshiaki Yamada

IPC分类号： H01L21/677

CPC分类号： H01L21/67225 ,  G03F7/70525 ,  G03F7/7075 ,  G03F7/70991 ,  H01L21/67727 ,  H01L21/67733 ,  Y10S414/135

摘要： A substrate transfer method for transferring target substrates proceeds in a substrate processing system for performing processes including a photolithography sequence on the target substrates. The system includes a first automated substrate transfer line configured to transfer the target substrates among a plurality of process sections for respectively performing processes on the target substrates, and a second automated substrate transfer line of a cyclical type dedicated to a plurality of process apparatuses of a photolithography process section, which are configured to perform a series of processes in the photolithography sequence, the second automated substrate transfer line being located relative to the first automated substrate transfer line so as for the target substrates to be transferred therebetween. The method includes, in order to proceed with the photolithography sequence, transferring the target substrates among the process apparatuses in the photolithography process section by use of the second automated substrate transfer line.

摘要翻译： 用于转移目标衬底的衬底转移方法在用于在目标衬底上执行包括光刻序列的处理的衬底处理系统中进行。 该系统包括：第一自动化基板传送线，其被配置为在用于分别在目标基板上执行处理的多个处理部中传送目标基板;以及专用于多个处理装置的循环型第二自动基板传送线 光刻处理部分，被配置为在光刻序列中执行一系列处理，第二自动化基板传送线相对于第一自动基板传送线定位，以使目标基板在其间传输。 该方法包括为了继续进行光刻顺序，通过使用第二自动基板传送线在光刻处理部中的处理装置之间传送目标基板。

公开(公告)号：US20120251957A1

公开(公告)日：2012-10-04

申请号：US13495611

申请日：2012-06-13

申请人： Yuichi Yamamoto ,  Tadayuki Yamaguchi ,  Yasuhito Saiga ,  Yoshiaki Yamada

发明人： Yuichi Yamamoto ,  Tadayuki Yamaguchi ,  Yasuhito Saiga ,  Yoshiaki Yamada

IPC分类号： H01L21/677 ,  G03F7/20

CPC分类号： H01L21/67225 ,  G03F7/70525 ,  G03F7/7075 ,  G03F7/70991 ,  H01L21/67727 ,  H01L21/67733 ,  Y10S414/135

摘要： A substrate transfer method for transferring target substrates proceeds in a substrate processing system for performing processes including a photolithography sequence on the target substrates. The system includes a first automated substrate transfer line configured to transfer the target substrates among a plurality of process sections for respectively performing processes on the target substrates, and a second automated substrate transfer line of a cyclical type dedicated to a plurality of process apparatuses of a photolithography process section, which are configured to perform a series of processes in the photolithography sequence, the second automated substrate transfer line being located relative to the first automated substrate transfer line so as for the target substrates to be transferred therebetween. The method includes, in order to proceed with the photolithography sequence, transferring the target substrates among the process apparatuses in the photolithography process section by use of the second automated substrate transfer line.

摘要翻译： 用于转移目标衬底的衬底转移方法在用于在目标衬底上执行包括光刻序列的处理的衬底处理系统中进行。 该系统包括：第一自动化基板传送线，其被配置为在用于分别在目标基板上执行处理的多个处理部中传送目标基板;以及专用于多个处理装置的循环型第二自动基板传送线 光刻处理部分，被配置为在光刻序列中执行一系列处理，第二自动化基板传送线相对于第一自动基板传送线定位，以使目标基板在其间传输。 该方法包括为了继续进行光刻顺序，通过使用第二自动基板传送线在光刻处理部中的处理装置之间传送目标基板。

公开(公告)号：US08236132B2

公开(公告)日：2012-08-07

申请号：US12302853

申请日：2007-06-15

申请人： Yuichi Yamamoto ,  Tadayuki Yamaguchi ,  Yasuhito Saiga ,  Yoshiaki Yamada

发明人： Yuichi Yamamoto ,  Tadayuki Yamaguchi ,  Yasuhito Saiga ,  Yoshiaki Yamada

IPC分类号： B65G49/07

CPC分类号： H01L21/67225 ,  G03F7/70525 ,  G03F7/7075 ,  G03F7/70991 ,  H01L21/67727 ,  H01L21/67733 ,  Y10S414/135

摘要： A substrate processing system (100) includes a first automated substrate transfer line or main transfer line (20) configured to transfer wafers (W) over the entire system and to transfer wafers to and from respective process sections, and a second automated substrate transfer line or auxiliary transfer line (30) configured to transfer wafers (W) inside a photolithography process section (1a). The auxiliary transfer line (30) is disposed as a transfer mechanism independent of the main transfer line (20). An OHT (31) is configured to travel around on the auxiliary transfer line (30) having a loop shape, so as to transfer wafers (W) to and from and among the respective process apparatuses in the photolithography process section (1a).

摘要翻译： 衬底处理系统（100）包括第一自动化衬底传送线或主传输线（20），其被配置为在整个系统上传送晶片（W）并将晶片传送到相应工艺部分和从相应工艺部分传送晶片，以及第二自动衬底传送线 或辅助传输线（30），其配置成在光刻工艺部分（1a）内转移晶片（W）。 辅助传输线（30）被设置为独立于主传输线（20）的传送机构。 OHT（31）构造成在具有环形的辅助传输线（30）周围行进，以便在光刻处理部分（1a）中将晶片（W）传送到各自的处理装置之间和从各个处理装置传送晶片（W）。

公开(公告)号：US08818242B2

公开(公告)日：2014-08-26

申请号：US13193708

申请日：2011-07-29

申请人： Yuichi Yamamoto ,  Hajime Kaji

发明人： Yuichi Yamamoto ,  Hajime Kaji

IPC分类号： G03G15/00 ,  G03G15/01

CPC分类号： G03G15/0131 ,  G03G15/5008 ,  G03G2215/0129 ,  G03G2215/0158

摘要： An image forming apparatus capable of preventing degradation of image quality and reducing time required for rotational phase control. Toner images different in color are formed on a plurality of photosensitive drums, respectively. The toner images are transferred onto an intermediate transfer belt in superimposed relation. A motor controller performs phase control for bringing phases of the respective photosensitive drums into predetermined relation based on a rotational phase difference detected using phase detection sensors. When the rotational phase difference is out of a predetermined range, the motor controller performs the phase control with the photosensitive drums and the intermediate transfer belt separated from each other, whereas when the rotational phase difference is within the predetermined range, the motor controller performs the phase control with the photosensitive drums and the intermediate transfer belt in contact with each other.

摘要翻译： 一种能够防止图像质量劣化并减少转动相位控制所需的时间的图像形成装置。 分别在多个感光鼓上形成颜色不同的调色剂图像。 调色剂图像以叠加的关系转印到中间转印带上。 电动机控制器根据使用相位检测传感器检测到的旋转相位差，执行相位控制，以使各个感光鼓的相位达到预定的关系。 当旋转相位差超出预定范围时，电动机控制器执行相互控制，其中感光鼓和中间转印带彼此分离，而当旋转相位差在预定范围内时，电动机控制器执行 感光鼓和中间转印带彼此接触的相位控制。

公开(公告)号：US20130257567A1

公开(公告)日：2013-10-03

申请号：US13885094

申请日：2012-04-03

申请人： Kouetsu Takaya ,  Yasuhiro Naka ,  Kenji Suzuki ,  Yuichi Yamamoto ,  Yuji Shiba

发明人： Kouetsu Takaya ,  Yasuhiro Naka ,  Kenji Suzuki ,  Yuichi Yamamoto ,  Yuji Shiba

IPC分类号： H01H1/06

CPC分类号： H01H1/06 ,  H01H9/443 ,  H01H50/14 ,  H01H50/163 ,  H01H50/22 ,  H01H50/38 ,  H01H50/42 ,  H01H51/065 ,  H03K17/68

摘要： An electromagnetic contactor has a contact device having a pair of fixed contacts and a movable contact; and an electromagnet unit including an exciting coil driving a movable plunger connected through a connecting shaft. The contact device is configured such that L-shaped portions have a contact portion formed in the pair of fixed contacts fixed maintaining a predetermined interval, and two ends of the movable contact are disposed to be capable of contacting to and separating from the contact portions of the L-shaped portion on a side opposite to that of the electromagnet unit. The electromagnet unit includes a magnetic yoke enclosing a plunger drive portion, a movable plunger having a leading end protruding through an aperture formed in the magnetic yoke and urged by a return spring, and a ring-form permanent magnet magnetized in a movable direction of the movable plunger and fixed to enclose a peripheral flange portion.

摘要翻译： 电磁接触器具有接触装置，该触点装置具有一对固定触头和可动触点; 以及包括驱动通过连接轴连接的活动柱塞的励磁线圈的电磁体单元。 接触装置被构造成使得L形部分具有形成在一对固定触点中的接触部分，固定保持预定间隔，并且可动触头的两端设置成能够接触和分离接触部分的接触部分 在与电磁体单元相反的一侧的L形部分。 电磁体单元包括一个包围柱塞驱动部分的磁轭，一​​个可移动的柱塞，其前端通过形成在磁轭中的孔而突出，并由复位弹簧推动，以及沿着可移动方向被磁化的环形永磁体 活动柱塞并固定以包围周边凸缘部分。

公开(公告)号：US08420486B2

公开(公告)日：2013-04-16

申请号：US12182322

申请日：2008-07-30

申请人： Yuichi Yamamoto

发明人： Yuichi Yamamoto

IPC分类号： H01L21/8234 ,  H01L21/338 ,  H01L21/336

CPC分类号： H01L21/823456 ,  H01L29/66545 ,  H01L29/7843

摘要： In the present invention, there is provided a method for manufacturing a semiconductor device that has on a semiconductor substrate first and second transistor groups having different operating voltages respectively, the first transistor group having a first gate electrode, the second transistor group having a second gate electrode, the method including the steps of: forming the silicide layer on the first gate electrode of the first transistor group after setting a height of the first gate electrode smaller than a height of a dummy gate electrode formed in a dummy gate part; and forming a gate forming trench by removing the dummy gate part after forming an interlayer insulating film that covers a silicide layer and planarizing a surface of the interlayer insulating film.

摘要翻译： 在本发明中，提供了一种制造半导体器件的方法，该半导体器件在半导体衬底上具有分别具有不同工作电压的第一和第二晶体管组，第一晶体管组具有第一栅电极，第二晶体管组具有第二栅极 电极，该方法包括以下步骤：在将第一栅电极的高度设置为比形成在虚拟栅极部分中的虚设栅电极的高度之后，在第一晶体管组的第一栅电极上形成硅化物层; 以及在形成覆盖硅化物层并平面化层间绝缘膜的表面的层间绝缘膜之后，通过去除伪栅极部分来形成栅极形成沟槽。

公开(公告)号：US08206076B2

公开(公告)日：2012-06-26

申请号：US12137076

申请日：2008-06-11

申请人： Issei Ueda ,  Yasushi Hayashida ,  Akira Miyata ,  Kensei Yamamoto ,  Yuichi Yamamoto ,  Michiaki Matsushita

发明人： Issei Ueda ,  Yasushi Hayashida ,  Akira Miyata ,  Kensei Yamamoto ,  Yuichi Yamamoto ,  Michiaki Matsushita

IPC分类号： H01L21/677

CPC分类号： H01L21/67769 ,  Y10S414/139

摘要： A cassette waiting block is connected to a transfer in/out block of a coating and developing treatment system, and in the cassette waiting block, a cassette transfer in/out unit, a cassette waiting unit, a cassette delivery unit, and a substrate processing unit are provided. In the cassette waiting block, a cassette transfer unit for transferring the cassette between the cassette transfer in/out unit, the cassette waiting unit, and the cassette deliver unit, and a transfer unit for transferring the substrate between the cassette in the cassette waiting unit and the substrate processing unit are provided. Each cassette waiting unit has an opening mechanism for opening a port of the cassette.

摘要翻译： 盒式等待块连接到涂覆和显影处理系统的转移输入/输出块，并且在盒式等待块中，盒式磁带传送入/出单元，盒式磁带等待单元，盒传送单元和基板处理 提供单位。 在盒式磁带等待块中，用于在磁带盒输入/输出单元，磁带盒等待单元和磁带盒传送单元之间传送磁带的盒式磁带传送单元，以及用于在盒式磁带等待单元中的盒之间传送基板的传送单元 并提供基板处理单元。 每个盒式待机单元具有用于打开盒的端口的打开机构。