公开(公告)号：US08901522B2

公开(公告)日：2014-12-02

申请号：US13196311

申请日：2011-08-02

申请人： Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

发明人： Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

IPC分类号： H05G2/00 ,  G21K5/00 ,  G03F7/20

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/008

摘要： A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux.

摘要翻译： 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，从激光装置输出的激光束通过该入口进入室; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 用于在预定区域中产生磁场的磁场产生单元; 以及带电粒子收集单元，其设置在所述磁场的磁通方向上，用于收集带电粒子，所述带电粒子是当所述靶材料被所述腔室内的所述激光束照射并且沿着所述磁通量行进时产生的。

公开(公告)号：US08399867B2

公开(公告)日：2013-03-19

申请号：US12566170

申请日：2009-09-24

申请人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

发明人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

IPC分类号： H04H1/04

CPC分类号： H05G2/003 ,  H05G2/001 ,  H05G2/008

摘要： An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.

摘要翻译： EUV光源装置，可以抑制光学元件和其他元件被碎屑污染或损坏，从而实现更长寿命。 EUV光源装置是通过在室内产生目标材料的等离子体来辐射极紫外光的装置，包括：第一激光单元，用于向目标材料施加第一激光束以产生预等离子体; 用于将第二激光束施加到所述预等离子体以产生用于辐射所述极紫外光的主等离子体的第二激光单元; 以及用于在所述室内产生磁场以控制所述预等离子体和所述主等离子体中的至少一个的状态的磁场产生单元。

公开(公告)号：US20110284775A1

公开(公告)日：2011-11-24

申请号：US13196311

申请日：2011-08-02

申请人： Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

发明人： Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

IPC分类号： G01J3/10 ,  G21K5/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/008

摘要： A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux.

摘要翻译： 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，从激光装置输出的激光束通过该入口进入室; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 用于在预定区域中产生磁场的磁场产生单元; 以及带电粒子收集单元，其设置在所述磁场的磁通方向上，用于收集带电粒子，所述带电粒子是当所述靶材料被所述腔室内的所述激光束照射并且沿着所述磁通量行进时产生的。

公开(公告)号：US20100078579A1

公开(公告)日：2010-04-01

申请号：US12566170

申请日：2009-09-24

申请人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

发明人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  H05G2/001 ,  H05G2/008

摘要： An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.

摘要翻译： EUV光源装置，可以抑制光学元件和其他元件被碎屑污染或损坏，从而实现更长寿命。 EUV光源装置是通过在室内产生目标材料的等离子体来辐射极紫外光的装置，包括：第一激光单元，用于向目标材料施加第一激光束以产生预等离子体; 用于将第二激光束施加到所述预等离子体以产生用于辐射所述极紫外光的主等离子体的第二激光单元; 以及用于在所述室内产生磁场以控制所述预等离子体和所述主等离子体中的至少一个的状态的磁场产生单元。

公开(公告)号：US08164076B2

公开(公告)日：2012-04-24

申请号：US12569194

申请日：2009-09-29

申请人： Akira Endo ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

发明人： Akira Endo ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

IPC分类号： H05G2/00

CPC分类号： G21K5/00 ,  G03F7/70033 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.

摘要翻译： 一种极紫外光源装置，其特征在于，所述极紫外光源装置包括：前脉冲激光光源，其产生前脉冲激光光源，所述极紫外光源装置包括：前脉冲激光光源，其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶， 在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体，在与目标区域不同的区域产生预等离子体，不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。

公开(公告)号：US08455850B2

公开(公告)日：2013-06-04

申请号：US13416884

申请日：2012-03-09

申请人： Akira Endo ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

发明人： Akira Endo ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

IPC分类号： H05G2/00

CPC分类号： G21K5/00 ,  G03F7/70033 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.

摘要翻译： 一种极紫外光源装置，其特征在于，所述极紫外光源装置包括：前脉冲激光光源，其产生前脉冲激光光源，所述极紫外光源装置包括：前脉冲激光光源，其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶， 在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体，在与目标区域不同的区域产生预等离子体，不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。

公开(公告)号：US20120161040A1

公开(公告)日：2012-06-28

申请号：US13416884

申请日：2012-03-09

申请人： Akira Endo ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

发明人： Akira Endo ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

IPC分类号： G21K5/00

CPC分类号： G21K5/00 ,  G03F7/70033 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.

摘要翻译： 一种极紫外光源装置，其特征在于，所述极紫外光源装置包括：前脉冲激光光源，其产生前脉冲激光光源，所述极紫外光源装置包括：前脉冲激光光源，其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶， 在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体，在与目标区域不同的区域产生预等离子体，不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。

公开(公告)号：US20100192973A1

公开(公告)日：2010-08-05

申请号：US12688139

申请日：2010-01-15

申请人： Yoshifumi Ueno ,  Osamu Wakabayashi

发明人： Yoshifumi Ueno ,  Osamu Wakabayashi

IPC分类号： B08B7/00 ,  H05H1/00 ,  B05D3/06

CPC分类号： G02B27/0006 ,  B08B7/0042 ,  G02B19/0028 ,  G02B19/0052 ,  G02B19/0095 ,  G02B26/101 ,  G02B27/0955 ,  G02B27/20 ,  G03F7/70033 ,  G03F7/70525 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70941 ,  H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus that can eliminate debris adhering to a component such as optical elements provided within a chamber. The extreme ultraviolet light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target material supply unit for supplying a target material into the chamber; a driver laser unit for irradiating the target material with a driver pulse laser beam to generate plasma; a cleaning laser unit for emitting a cleaning pulse laser beam; and a control unit for controlling an irradiation position of the cleaning pulse laser beam emitted from the cleaning laser unit so as to irradiate a component provided within the chamber with the cleaning pulse laser beam to remove debris adhering to a surface of the component.

摘要翻译： 一种极紫外光源装置，其可以消除附着在诸如设置在室内的光学元件的部件的碎屑。 所述极紫外光源装置具有：产生极紫外光的室; 目标材料供应单元，用于将目标材料供应到所述室中; 用于用驱动脉冲激光束照射目标材料以产生等离子体的驱动器激光单元; 用于发射清洁脉冲激光束的清洁激光单元; 以及控制单元，用于控制从清洁激光单元发射的清洁脉冲激光束的照射位置，以便用清洁脉冲激光束照射设置在室内的部件，以去除附着在部件表面上的碎屑。

公开(公告)号：US08288743B2

公开(公告)日：2012-10-16

申请号：US12406388

申请日：2009-03-18

申请人： Yoshifumi Ueno ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Akira Sumitani ,  Hideo Hoshino ,  Akira Endo ,  Georg Soumagne

发明人： Yoshifumi Ueno ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Akira Sumitani ,  Hideo Hoshino ,  Akira Endo ,  Georg Soumagne

IPC分类号： B01D59/44

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/093 ,  G21K2201/00 ,  H05G2/005 ,  H05G2/008

摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.

摘要翻译： 一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子， 其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

公开(公告)号：US20100090133A1

公开(公告)日：2010-04-15

申请号：US12569194

申请日：2009-09-29

申请人： Akira ENDO ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

发明人： Akira ENDO ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

IPC分类号： G21K5/00

CPC分类号： G21K5/00 ,  G03F7/70033 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.

摘要翻译： 一种极紫外光源装置，其特征在于，所述极紫外光源装置包括：前脉冲激光光源，其产生前脉冲激光光源，所述极紫外光源装置包括：前脉冲激光光源，其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶， 在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体，在与目标区域不同的区域产生预等离子体，不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。