公开(公告)号：US20100090133A1

公开(公告)日：2010-04-15

申请号：US12569194

申请日：2009-09-29

申请人： Akira ENDO ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

发明人： Akira ENDO ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

IPC分类号： G21K5/00

CPC分类号： G21K5/00 ,  G03F7/70033 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.

摘要翻译： 一种极紫外光源装置，其特征在于，所述极紫外光源装置包括：前脉冲激光光源，其产生前脉冲激光光源，所述极紫外光源装置包括：前脉冲激光光源，其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶， 在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体，在与目标区域不同的区域产生预等离子体，不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。

公开(公告)号：US20090261242A1

公开(公告)日：2009-10-22

申请号：US12406388

申请日：2009-03-18

申请人： Yoshifumi UENO ,  Osamu WAKABAYASHI ,  Tamotsu ABE ,  Akira SUMITANI ,  Hideo HOSHINO ,  Akira ENDO ,  Georg SOUMAGNE

发明人： Yoshifumi UENO ,  Osamu WAKABAYASHI ,  Tamotsu ABE ,  Akira SUMITANI ,  Hideo HOSHINO ,  Akira ENDO ,  Georg SOUMAGNE

IPC分类号： B01D59/44 ,  H01J49/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/093 ,  G21K2201/00 ,  H05G2/005 ,  H05G2/008

摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.

摘要翻译： 一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子， 其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

公开(公告)号：US20120217414A1

公开(公告)日：2012-08-30

申请号：US13465108

申请日：2012-05-07

申请人： Yoshifumi UENO ,  Osamu WAKABAYASHI ,  Tamotsu ABE ,  Akira SUMITANI ,  Hideo HOSHINO ,  Akira ENDO ,  Georg SOUMAGNE

发明人： Yoshifumi UENO ,  Osamu WAKABAYASHI ,  Tamotsu ABE ,  Akira SUMITANI ,  Hideo HOSHINO ,  Akira ENDO ,  Georg SOUMAGNE

IPC分类号： H01J1/50

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/093 ,  G21K2201/00 ,  H05G2/005 ,  H05G2/008

摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.

摘要翻译： 一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子， 其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

公开(公告)号：US20100213395A1

公开(公告)日：2010-08-26

申请号：US12646075

申请日：2009-12-23

申请人： Yoshifumi UENO ,  Georg Soumagne ,  Shinji NAGAI ,  Akira ENDO ,  Tatsuya YANAGIDA

发明人： Yoshifumi UENO ,  Georg Soumagne ,  Shinji NAGAI ,  Akira ENDO ,  Tatsuya YANAGIDA

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 20 is arranged for collecting the ion, and ion collision surfaces Sa and Sb of the ion collection cylinder 20 are provided with or coated with Si, which is a metal whose sputtering rate with respect to the ion is less than one atom/ion.

摘要翻译： 在极紫外光源装置中，通过用激光照射作为熔融Sn的液滴D而产生的等离子体产生极紫外光，并且控制在产生极紫外光时产生的离子的流动方向 通过磁场或电场照射光，离子收集筒20被布置成用于收集离子，离子收集筒20的离子碰撞表面Sa和Sb设置有或涂覆有Si，溅射速率 相对于离子小于一个原子/离子。

公开(公告)号：US20100090132A1

公开(公告)日：2010-04-15

申请号：US12559977

申请日：2009-09-15

申请人： Akira ENDO ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Akira ENDO ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.

摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动器激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。

公开(公告)号：US20120068091A1

公开(公告)日：2012-03-22

申请号：US13306358

申请日：2011-11-29

申请人： Akira ENDO ,  Krzysztof NOWAK ,  Hideo HOSHINO ,  Tatsuya ARIGA ,  Masato MORIYA ,  Osamu WAKABAYASHI

发明人： Akira ENDO ,  Krzysztof NOWAK ,  Hideo HOSHINO ,  Tatsuya ARIGA ,  Masato MORIYA ,  Osamu WAKABAYASHI

IPC分类号： G21K5/00 ,  H01S3/04

CPC分类号： H05G2/003 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/2316 ,  H05G2/008

摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.

摘要翻译： 本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。 可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。 来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。 混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。 混合气体通过排气管道排出，并被送到热交换器。 由热交换器冷却的混合气体通过循环泵送回到SA气室。

公开(公告)号：US20120121411A1

公开(公告)日：2012-05-17

申请号：US13292131

申请日：2011-11-09

申请人： Akira ENDO ,  Kazuyuki YAMAGUCHI ,  Yohei MAGARA ,  Toyomi YOSHIDA ,  Michiyuki TAKAGI ,  Kenichi MURATA ,  Takeshi KUDO

发明人： Akira ENDO ,  Kazuyuki YAMAGUCHI ,  Yohei MAGARA ,  Toyomi YOSHIDA ,  Michiyuki TAKAGI ,  Kenichi MURATA ,  Takeshi KUDO

IPC分类号： F01D11/00 ,  F16J15/447

CPC分类号： F01D11/02 ,  F05D2260/96

摘要： A labyrinth seal is provided that can suppress the occurrence of an unequal pressure pattern in the seal, suppress unstable vibration of a rotating shaft and ensure sealing performance.The labyrinth seal includes a seal ring 13 and a plurality of seal fins 11. Ring-like cavities 12 are defined on the outer circumference of the rotating shaft 2 with the seal ring 13 and the seal fins 11. The ring-like cavities 12 suppress a leakage flow LS moving along the outer circumference of the rotating shaft 2. Void portions 14 are each provided on the outer circumferential side of the cavity 12 in the seal ring 13 so as to extend in the circumferential direction of the rotating shaft 2 and communicate with the cavity 12 at circumferential intervals to temporarily relieve a leakage flow from inside the cavity in the circumferential direction.

摘要翻译： 提供了一种迷宫式密封件，可以抑制密封件中不均匀的压力图案的发生，抑制旋转轴的不稳定的振动并确保密封性能。 迷宫式密封件包括密封环13和多个密封翅片11.环形空腔12由密封环13和密封翅片11限定在旋转轴2的外圆周上。环状空腔12抑制 泄漏流LS沿着旋转轴2的外周移动。空隙部分14分别设置在密封环13中的空腔12的外周侧上，以沿着旋转轴2的圆周方向延伸并且连通 空腔12以周向间隔暂时缓解在圆周方向上的空腔内的泄漏流。

公开(公告)号：US20070168845A1

公开(公告)日：2007-07-19

申请号：US11278698

申请日：2006-04-05

申请人： Akira ENDO ,  Yuzo Nagai ,  Takeshi Inoue ,  Toshihiko Nawa ,  Keitaro Otsuka ,  Hitoshi Ando

发明人： Akira ENDO ,  Yuzo Nagai ,  Takeshi Inoue ,  Toshihiko Nawa ,  Keitaro Otsuka ,  Hitoshi Ando

IPC分类号： H03M13/03

CPC分类号： H03M13/4169

摘要： In the present invention, the most likely transition source state bits are selected according to the path metric of the state bits corresponding to the state bits that could be taken for the encoded bits to be input, and are stored in the survival path memory. Therefore in the trace back processing, the decoded bits can be output only by repeating the extraction of the most significant bit of the transition source state bits. As a consequence, trace back processing can be performed very simply, and decoding processing becomes possible in a short time even if a general purpose processor executes the software.

摘要翻译： 在本发明中，最可能的转换源状态位根据对应于要输入的编码位可采取的状态位的状态位的路径度量来选择，并存储在生存路径存储器中。 因此，在追溯处理中，仅通过重复提取转换源状态位的最高有效位才能输出解码位。 因此，即使通用处理器执行软件，也可以非常简单地执行回溯处理，并且可以在短时间内进行解码处理。

公开(公告)号：US20120253206A1

公开(公告)日：2012-10-04

申请号：US13427316

申请日：2012-03-22

申请人： Shinichi FUKUDA ,  Takayuki OGISO ,  Hideyuki KOGURE ,  Hiroaki NAKANO ,  Hirotaka MURAMATSU ,  Akira ENDO ,  Hiroyuki INO

发明人： Shinichi FUKUDA ,  Takayuki OGISO ,  Hideyuki KOGURE ,  Hiroaki NAKANO ,  Hirotaka MURAMATSU ,  Akira ENDO ,  Hiroyuki INO

IPC分类号： A61B5/0205 ,  A61B5/053 ,  A61B5/0402

CPC分类号： A61B5/0452 ,  A61B5/0428 ,  A61B5/053 ,  A61B2560/0468

摘要： A measurement apparatus includes a signal generation unit generating a measurement signal for measuring a bioelectrical impedance, a first electrode pair making contact with the left and right sides of a body of a person under measurement to supply the measurement signal generated to the body, a second electrode pair placed adjacent to the first electrode pair and making contact with the left and right sides of the body, a bioelectrical impedance measurement unit measuring the bioelectrical impedance of the person under measurement based on an electrical signal obtained from the second electrode pair in response to supplying of the measurement signal, and an electrocardiogram signal measurement unit measuring an electrocardiogram signal of the person under measurement based on the electrical signal obtained from the second electrode pair. The bioelectrical impedance measurement unit and the electrocardiogram signal measurement unit concurrently operate in parallel.

摘要翻译： 一种测量装置，包括产生用于测量生物电阻抗的测量信号的信号产生单元，与被测量人体的左侧和右侧接触以提供对身体产生的测量信号的第一电极对， 电极对，其与所述第一电极对相邻并且与所述主体的左侧和右侧接触;生物电阻抗测量单元，其基于从所述第二电极对获得的电信号响应于所述第一电极对测量所测量的生物电阻抗; 提供测量信号;以及心电图信号测量单元，其基于从第二电极对获得的电信号来测量被测者的心电图信号。 生物电阻抗测量单元和心电图信号测量单元并行并行操作。

公开(公告)号：US20110211601A1

公开(公告)日：2011-09-01

申请号：US13049374

申请日：2011-03-16

申请人： Tatsuya ARIGA ,  Hideo HOSHINO ,  Taisuke MIURA ,  Akira ENDO

发明人： Tatsuya ARIGA ,  Hideo HOSHINO ,  Taisuke MIURA ,  Akira ENDO

IPC分类号： H01S3/10

CPC分类号： H01S3/2308 ,  H01S3/005 ,  H01S3/2232 ,  H01S3/2366 ,  H01S2301/02

摘要： A driver laser for an extreme ultra violet light source device capable of suppressing self-oscillation light, amplifying a laser beam efficiently, and reducing a device size. The driver laser has an oscillator for generating a laser beam to output the generated laser beam, and at least one amplifier for amplifying the laser beam output from the oscillator to output the amplified laser beam. The amplifier includes a discharge unit which amplifies the laser beam by using energy of a laser medium excited by discharge, a feedback mirror which leads the laser beam output from the discharge unit to the discharge unit, a polarizer which leads the laser beam output from the oscillator into the discharge unit and also reflects the laser beam output from the discharge unit to a predetermined direction, and a self-oscillation light filter which attenuates self-oscillation light output from the discharge unit.

摘要翻译： 一种能够抑制自振荡的极紫外光源装置的驱动器激光器，有效地放大激光束并减小器件尺寸。 驱动激光器具有用于产生激光束以输出所产生的激光束的振荡器，以及用于放大从振荡器输出的激光束以输出放大的激光束的至少一个放大器。 放大器包括：放电单元，其通过使用通过放电激发的激光介质的能量放大激光束;反射镜，其将从放电单元输出的激光束导引到放电单元;偏振器，其将激光束从 振荡器进入放电单元并且还将从放电单元输出的激光束反射到预定方向，以及自激振荡滤光器，其衰减从放电单元输出的自振荡光。