公开(公告)号：US06823880B2

公开(公告)日：2004-11-30

申请号：US10131193

申请日：2002-04-25

申请人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

发明人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

IPC分类号： B08B1500

CPC分类号： H01L21/67017 ,  B08B7/0021 ,  H01L21/67126 ,  Y10S134/902

摘要： A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

摘要翻译： 高压处理装置包括：处理容器，其包括形成在其中的处理室，以对处理室中的物体执行一定的处理; 流体供给装置，其将高压流体供给到处理室中; 从处理室排出高压流体的流体排出装置; 搅拌单元，其布置在处理室中并且可操作以通过相对于处理容器的旋转将高压流体流过物体; 形成在所述处理容器中以在所述处理室内部和外部连通的连通通道; 旋转驱动构件，其经由设置在所述连通通道中的轴部联接到所述搅拌单元; 以及密封部，其设置在所述轴部和所述处理容器之间，以将所述处理室与所述旋转驱动构件断开。 流体排出装置包括形成在与密封部分相比更靠近处理室的连通通道的特定位置中以排出高压流体的流体排放口。

公开(公告)号：US20060032520A1

公开(公告)日：2006-02-16

申请号：US11249444

申请日：2005-10-14

申请人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

发明人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

IPC分类号： B08B3/00

CPC分类号： H01L21/67017 ,  B08B7/0021 ,  H01L21/67126 ,  Y10S134/902

摘要： A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

摘要翻译： 高压处理装置包括：处理容器，其包括形成在其中的处理室，以对处理室中的物体执行一定的处理; 流体供给装置，其将高压流体供给到处理室中; 从处理室排出高压流体的流体排出装置; 搅拌单元，其布置在处理室中并且可操作以通过相对于处理容器的旋转将高压流体流过物体; 形成在所述处理容器中以在所述处理室内部和外部连通的连通通道; 旋转驱动构件，其经由设置在所述连通通道中的轴部联接到所述搅拌单元; 以及密封部，其设置在所述轴部和所述处理容器之间，以将所述处理室与所述旋转驱动构件断开。 流体排出装置包括形成在与密封部分相比更靠近处理室的连通通道的特定位置中以排出高压流体的流体排放口。

公开(公告)号：US07252719B2

公开(公告)日：2007-08-07

申请号：US11249444

申请日：2005-10-14

申请人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

发明人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

IPC分类号： B08B3/02

CPC分类号： H01L21/67017 ,  B08B7/0021 ,  H01L21/67126 ,  Y10S134/902

摘要： A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

摘要翻译： 高压处理装置包括：处理容器，其包括形成在其中的处理室，以对处理室中的物体执行一定的处理; 流体供给装置，其将高压流体供给到处理室中; 从处理室排出高压流体的流体排出装置; 搅拌单元，其布置在处理室中并且可操作以通过相对于处理容器的旋转将高压流体流过物体; 形成在所述处理容器中以在所述处理室内部和外部连通的连通通道; 旋转驱动构件，其经由设置在所述连通通道中的轴部联接到所述搅拌单元; 以及密封部，其设置在所述轴部和所述处理容器之间，以将所述处理室与所述旋转驱动构件断开。 流体排出装置包括形成在与密封部分相比更靠近处理室的连通通道的特定位置中以排出高压流体的流体排放口。

公开(公告)号：US07000653B2

公开(公告)日：2006-02-21

申请号：US10826309

申请日：2004-04-19

申请人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

发明人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

IPC分类号： B65B1/30

CPC分类号： H01L21/67017 ,  B08B7/0021 ,  H01L21/67126 ,  Y10S134/902

摘要： A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

公开(公告)号：US07080651B2

公开(公告)日：2006-07-25

申请号：US10147742

申请日：2002-05-16

申请人： Ikuo Mizobata ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ryuji Kitakado ,  Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba

发明人： Ikuo Mizobata ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ryuji Kitakado ,  Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba

IPC分类号： B08B3/04

CPC分类号： B08B9/0321 ,  B08B7/0021 ,  Y10S134/902

摘要： When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and one valve is opened, to supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, supercritical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to separation/recovery bath 8 together with the flow.

摘要翻译： 当基板清洗室5的开口打开以接收基板时，某些阀关闭，并且一个阀打开以供应CO 2以清洗基板清洗室5并排除空气。 当舱口关闭时，打开另一个阀以排放基板清洗室5，使得CO 2从基板清洗室5和导管排出任何气体和不需要的空气。 此后，使用超临界CO 2 2洗涤基底并清洁循环线。 超临界CO 2 2的流动被送到衬底洗涤室5。 在流过包括循环通道11的循环管线之后，它通过旁路通道12到达减压器7。 残留在循环管线中的任何化学物质或有机物质与流动一起连续地送到分离/回收槽8中。

公开(公告)号：US07111630B2

公开(公告)日：2006-09-26

申请号：US10879318

申请日：2004-06-28

申请人： Ikuo Mizobata ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ryuji Kitakado ,  Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba

发明人： Ikuo Mizobata ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ryuji Kitakado ,  Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba

IPC分类号： B08B3/04

CPC分类号： B08B9/0321 ,  B08B7/0021 ,  Y10S134/902

摘要： When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and a valve is opened, supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, super critical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to a separation/recover bath 8 together with the flow.

摘要翻译： 当基板清洗室5的开口被打开以接收基板时，某些阀关闭，并且阀打开，供应CO 2以清洗基板清洗室5并排除空气。 当舱口关闭时，打开另一个阀以排放基板清洗室5，使得CO 2从基板清洗室5和导管排出任何气体和不需要的空气。 此后，使用超临界CO 2 2来洗涤基底并清洁循环线。 超临界CO 2 2的流动被送到衬底洗涤室5。 在流过包括循环通道11的循环管线之后，它通过旁路通道12到达减压器7。 残留在循环管线中的任何化学物质或有机物质与流体一起被连续地送到分离/回收槽8中。

公开(公告)号：US07384484B2

公开(公告)日：2008-06-10

申请号：US10700020

申请日：2003-11-03

申请人： Yusuke Muraoka ,  Kimitsugu Saito ,  Tomomi Iwata ,  Eiji Fukatsu ,  Ikuo Mizobata ,  Hiroyuki Ueno ,  Yasuo Okuyama ,  Takashi Gama ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Jun Munemasa ,  Hisanori Oshiba ,  Shogo Sarumaru

发明人： Yusuke Muraoka ,  Kimitsugu Saito ,  Tomomi Iwata ,  Eiji Fukatsu ,  Ikuo Mizobata ,  Hiroyuki Ueno ,  Yasuo Okuyama ,  Takashi Gama ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Jun Munemasa ,  Hisanori Oshiba ,  Shogo Sarumaru

IPC分类号： B05C13/02 ,  B05B1/26 ,  B05B7/00 ,  C23C14/00 ,  B08B3/00 ,  H01L21/677

CPC分类号： H01L21/67051 ,  G11B7/261 ,  G11B7/265 ,  H01L21/67028 ,  Y10S134/902

摘要： After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unit 10A, 10B, a substrate W wet with an anti-drying solution is wet-transported to a supercritical drying unit 20 by a primary transport robot 30. The supercritical drying unit 20 performs a high-pressure drying process (supercritical drying process) in a dedicated manner. Accordingly, by virtue of the presence of the anti-drying solution, the substrate W is effectively prevented from becoming air-dry during the transportation of the substrate W.

摘要翻译： 在显影单元10A，10B中经过显影处理之后，依次进行漂洗处理和替换处理，用防干燥溶液湿润的基板W通过初级干燥器湿式输送到超临界干燥单元20 运输机器人30。 超临界干燥单元20以专用的方式进行高压干燥处理（超临界干燥处理）。 因此，通过存在防干燥溶液，能够有效地防止基板W在基板W的输送过程中变得风干。

公开(公告)号：US06874513B2

公开(公告)日：2005-04-05

申请号：US10123252

申请日：2002-04-17

申请人： Masahiro Yamagata ,  Hisanori Oshiba ,  Yoshihiko Sakashita ,  Yoichi Inoue ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

发明人： Masahiro Yamagata ,  Hisanori Oshiba ,  Yoshihiko Sakashita ,  Yoichi Inoue ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

IPC分类号： H01L21/302 ,  B08B3/02 ,  B08B7/00

CPC分类号： B08B7/0021 ,  B08B3/02 ,  Y10S134/902

摘要： A high-pressure processing apparatus for removing unnecessary matters on objects to be processed by bringing a high-pressure fluid and a chemical liquid other than the high-pressure fluid into contact with the objects to be processed in a pressurized state is provided with a plurality of high-pressure processing chambers, a common high-pressure fluid supply unit for supplying the high-pressure fluid to each one of the high-pressure processing chambers, a common chemical liquid supply unit for supplying the chemical liquid to the each high-pressure processing chambers, and a separating unit for separating gaseous components from a mixture of the high-pressure fluid and the chemical liquid discharged from the high-pressure processing chambers after the objects are processed.Thus, a high-pressure processing apparatus which has such a compact construction as to be partly installable in a clean room and can stably perform a high-pressure processing can be provided.

摘要翻译： 通过使高压流体和高压流体以外的化学液体与加压状态下的被处理物体接触来除去被加工物上的不必要物质的高压处理装置，具有多个 的高压处理室，用于将高压流体供给到每个高压处理室的普通高压流体供给单元，用于向每个高压处理室供给化学液体的公共化学液体供给单元 处理室，以及分离单元，用于在物体被处理之后从高压流体和从高压处理室排出的化学液体的混合物中分离出气态成分。因此，具有这样的高压处理装置 可以提供可部分安装在洁净室中并可稳定地进行高压处理的紧凑结构。

公开(公告)号：US06703316B2

公开(公告)日：2004-03-09

申请号：US10132212

申请日：2002-04-26

申请人： Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Nobuyuki Kawakami ,  Takahiko Ishii ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Tomomi Iwata ,  Ikuo Mizobata ,  Takashi Miyake ,  Ryuji Kitakado

发明人： Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Nobuyuki Kawakami ,  Takahiko Ishii ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Tomomi Iwata ,  Ikuo Mizobata ,  Takashi Miyake ,  Ryuji Kitakado

IPC分类号： H01L21302

CPC分类号： H01L21/02052 ,  H01L21/67028

摘要： A method and system for processing a substrate includes performing a wet process by supplying a working liquid to a substrate in a wet processing apparatus, transferring the substrate in a non-dry state from the wet processing apparatus to a drying apparatus, and subjecting the substrate to a supercritical drying by a supercritical fluid in the drying apparatus.

摘要翻译： 用于处理衬底的方法和系统包括通过在湿法处理设备中将工作液体供应到衬底来进行湿法处理，将非干燥状态的衬底从湿法处理设备转移到干燥设备，并对衬底 在干燥装置中通过超临界流体进行超临界干燥。

公开(公告)号：US06691430B2

公开(公告)日：2004-02-17

申请号：US10382616

申请日：2003-03-04

申请人： Kimitsugu Saito ,  Yusuke Muraoka ,  Ryuji Kitakado ,  Takashi Miyake ,  Tomomi Iwata ,  Ikuo Mizobata

发明人： Kimitsugu Saito ,  Yusuke Muraoka ,  Ryuji Kitakado ,  Takashi Miyake ,  Tomomi Iwata ,  Ikuo Mizobata

IPC分类号： F26B700

CPC分类号： H01L21/67034 ,  Y10S134/902

摘要： Liquid for prevention of substrate drying is supplied into a processing chamber so that a pool of the liquid is created as an anti-drying atmosphere in advance inside a processing chamber, and substrates, as they are dipped in the pool, are kept on stand-by in a substrate board. In this manner, air drying of the substrates which are kept on stand-by is prevented. When the number of the substrates in the substrate board reaches a certain number, the anti-drying atmosphere is removed from the processing chamber, which is followed by introduction of an SCF into the processing chamber and supercritical drying (high pressure drying) of all of the plurality of substrates inside the processing chamber, namely, batch supercritical drying.

摘要翻译： 将用于防止基材干燥的液体供应到处理室中，使得在处理室内预先产生作为防干燥气氛的液体池，并且当浸入池中时，将基板保持在待机状态， 通过在衬底板中。 以这种方式，防止了保持待机的基板的空气干燥。 当基板中的基板数量达到一定数量时，从处理室中除去防干燥气氛，然后将SCF引入处理室，并将超临界干燥（高压干燥）全部 处理室内的多个基板，即分批超临界干燥。