Positioning apparatus, exposure apparatus, and device manufacturing method
    1.
    发明授权
    Positioning apparatus, exposure apparatus, and device manufacturing method 失效
    定位装置,曝光装置和装置制造方法

    公开(公告)号:US07312848B2

    公开(公告)日:2007-12-25

    申请号:US11378511

    申请日:2006-03-17

    IPC分类号: G03B27/42 G03B27/52

    CPC分类号: G03F7/70725 G03F7/70875

    摘要: This invention discloses an apparatus having a base and a movable body which is driven to move along the base. The apparatus includes a generator configured to generate a driving signal for the movable body, a temperature adjusting mechanism configured to adjust temperature of the base, and a controller configured to control a manipulated variable for the temperature control mechanism based on the generated driving signal.

    摘要翻译: 本发明公开了一种具有基座和可移动体的装置,该移动体被驱动沿着底座移动。 该装置包括:发电机,其被配置为产生用于可移动体的驱动信号;温度调节机构,被配置为调节基座的温度;以及控制器,被配置为基于所产生的驱动信号来控制温度控制机构的操纵变量。

    Stage apparatus, exposure apparatus, and device manufacturing method
    2.
    发明授权
    Stage apparatus, exposure apparatus, and device manufacturing method 失效
    舞台装置,曝光装置和装置的制造方法

    公开(公告)号:US07321418B2

    公开(公告)日:2008-01-22

    申请号:US11249700

    申请日:2005-10-13

    CPC分类号: G03F7/70766

    摘要: A stage apparatus includes a base, a stage movable on the base in first and second directions, a first member movable relative to the base in the first direction, and a second member movable relative to the base in the second direction. The first member is placed on the second member. With this arrangement, drive reaction-forces generated due to movement of the stage can be canceled by moving the first and second members, resulting in a smaller space needed for accommodating a canceling mechanism.

    摘要翻译: 舞台装置包括基座,可在第一和第二方向上在基座上移动的台架,可在第一方向上相对于基座移动的第一构件,以及可相对于基座沿第二方向移动的第二构件。 第一个成员放置在第二个成员上。 通过这种布置,可以通过移动第一和第二构件来消除由于台的移动产生的驱动反作用力,导致容纳取消机构所需的较小的空间。

    Substrate holding technique
    3.
    发明授权
    Substrate holding technique 失效
    基材保持技术

    公开(公告)号:US07212277B2

    公开(公告)日:2007-05-01

    申请号:US10941962

    申请日:2004-09-16

    IPC分类号: G03B27/62 G03B27/58 H01F7/20

    摘要: An object holding apparatus including a chuck for holding an object, a holder configured to hold the chuck, a generator provided in the holder and configured to generate a field related to an attraction force, a member provided in the chuck and configured to be attracted by the generator in accordance with the field, and a support configured to support one of the generator and the member. The support is configured to allow the one to move toward the other and away from the other, and the support includes a leaf spring.

    摘要翻译: 一种物体保持装置,包括用于保持物体的卡盘,被构造成保持卡盘的保持器,设置在保持器中并被配置为产生与吸引力相关的场的发生器的发生器,设置在卡盘中的构件, 根据现场的发电机,以及被配置为支撑发电机和所述部件中的一个的支撑件。 支撑件被构造成允许该支撑件朝着另一个移动并远离另一个,并且支撑件包括板簧。

    Substrate holding technique
    4.
    发明申请
    Substrate holding technique 失效
    基材保持技术

    公开(公告)号:US20050093666A1

    公开(公告)日:2005-05-05

    申请号:US10941962

    申请日:2004-09-16

    摘要: Disclosed is technology for holding a substrate and, specifically, an object holding apparatus including a chuck for holding an object, a holding unit for holding the chuck, a generating unit provided in the holding unit, for generating a field related to an attraction force, a member provided in the chuck and attracted by the generating unit in accordance with the field, and a supporting unit for supporting one of the generating unit and the member, for movement at least in a direction nearing the other and in a direction away from the other.

    摘要翻译: 公开了用于保持基板的技术,具体地,包括用于保持物体的夹头的物体保持装置,用于保持卡盘的保持单元,设置在保持单元中的用于产生与吸引力有关的场的发生单元, 设置在卡盘中并被根据现场被发电单元吸引的构件,以及用于支撑发电单元和构件中的一个的支撑单元,用于至少沿着接近另一方的方向并且沿远离 其他。

    Substrate holding technique
    5.
    发明授权
    Substrate holding technique 失效
    基材保持技术

    公开(公告)号:US07999919B2

    公开(公告)日:2011-08-16

    申请号:US11675868

    申请日:2007-02-16

    IPC分类号: G03B27/62 G03B27/58 H01F7/20

    摘要: Disclosed is technology for holding a substrate and, specifically, an object holding apparatus including a chuck for holding an object, a holding unit for holding the chuck, a generating unit provided in the holding unit, for generating a field related to an attraction force, a member provided in the chuck and attracted by the generating unit in accordance with the field, and a supporting unit for supporting one of the generating unit and the member, for movement at least in a direction nearing the other and in a direction away from the other.

    摘要翻译: 公开了用于保持基板的技术,具体地,包括用于保持物体的夹头的物体保持装置,用于保持卡盘的保持单元,设置在保持单元中的用于产生与吸引力有关的场的发生单元, 设置在卡盘中并被根据现场被发电单元吸引的构件,以及用于支撑发电单元和构件中的一个的支撑单元,用于至少沿着接近另一方的方向并且沿远离 其他。

    Positioning apparatus, exposure apparatus, and device manufacturing method
    8.
    发明申请
    Positioning apparatus, exposure apparatus, and device manufacturing method 失效
    定位装置,曝光装置和装置制造方法

    公开(公告)号:US20060209287A1

    公开(公告)日:2006-09-21

    申请号:US11378511

    申请日:2006-03-17

    CPC分类号: G03F7/70725 G03F7/70875

    摘要: This invention discloses an apparatus having a base and a movable body which is driven to move along the base. The apparatus includes a generator configured to generate a driving signal for the movable body, a temperature adjusting mechanism configured to adjust temperature of the base, and a controller configured to control a manipulated variable for the temperature control mechanism based on the generated driving signal.

    摘要翻译: 本发明公开了一种具有基座和可移动体的装置,该移动体被驱动沿着底座移动。 该装置包括:发电机,其被配置为产生用于可移动体的驱动信号;温度调节机构,被配置为调节基座的温度;以及控制器,被配置为基于所产生的驱动信号来控制温度控制机构的操纵变量。

    Stage apparatus, exposure apparatus, and device manufacturing method
    9.
    发明申请
    Stage apparatus, exposure apparatus, and device manufacturing method 失效
    舞台装置,曝光装置和装置的制造方法

    公开(公告)号:US20060082754A1

    公开(公告)日:2006-04-20

    申请号:US11249700

    申请日:2005-10-13

    IPC分类号: G03B27/58

    CPC分类号: G03F7/70766

    摘要: A stage apparatus includes a base, a stage movable on the base in first and second directions, a first member movable relative to the base in the first direction, and a second member movable relative to the base in the second direction. The first member is placed on the second member. With this arrangement, drive reaction-forces generated due to movement of the stage can be canceled by moving the first and second members, resulting in a smaller space needed for accommodating a canceling mechanism.

    摘要翻译: 舞台装置包括基座,可在第一和第二方向上在基座上移动的台架,可在第一方向上相对于基座移动的第一构件,以及可相对于基座沿第二方向移动的第二构件。 第一个成员放置在第二个成员上。 通过这种布置,可以通过移动第一和第二构件来消除由于台的移动产生的驱动反作用力,导致容纳取消机构所需的较小的空间。

    Substrate-holding technique
    10.
    发明授权
    Substrate-holding technique 失效
    基板保持技术

    公开(公告)号:US07379162B2

    公开(公告)日:2008-05-27

    申请号:US11002900

    申请日:2004-12-03

    IPC分类号: G03B27/58 G03B27/62

    摘要: A substrate holding apparatus contacts an undersurface of a substrate and holds the substrate. At least a portion of a top surface of the substrate is to be immersed in liquid. The apparatus includes a chuck unit to attract the substrate and a preventing system to prevent the liquid from reaching the undersurface of the substrate.

    摘要翻译: 基板保持装置接触基板的下表面并保持基板。 将衬底的顶表面的至少一部分浸入液体中。 该装置包括吸引基板的卡盘单元和防止液体到达基板的下表面的防止系统。