公开(公告)号：US06857921B2

公开(公告)日：2005-02-22

申请号：US10448911

申请日：2003-05-30

申请人： Yoshimi Watanabe ,  Mitsuhiro Hayashi

发明人： Yoshimi Watanabe ,  Mitsuhiro Hayashi

IPC分类号： B63H20/08 ,  B63H20/10 ,  F16F9/46 ,  F16F9/56 ,  B63H5/125

CPC分类号： B63H20/10 ,  F16F9/462 ,  F16F9/56

摘要： In a marine gas cylinder apparatus provided with a switching valve apparatus capable of switching a communication state among a piston rod side oil chamber, a piston side oil chamber and a gas chamber, the switching valve apparatus is structured such that each of respective poppet valves are arranged in each of ports open to a communication chamber provided in a valve case, each of balls is held between a ball operation surface of a rotation plate supported to the valve case and each of the poppet valves. Each of the poppet valves is moved close to or apart from the corresponding port via each of the balls in accordance with a rotating operation of the rotation plate.

摘要翻译： 在具有能够切换活塞杆侧油室，活塞侧油室和气体室之间的连通状态的切换阀装置的船用气瓶装置中，切换阀装置构成为使各自的提升阀为 每个孔设置在设置在阀壳体中的连通室的每个开口中，每个球保持在支撑在阀壳体上的旋转板的球操作表面和每个提升阀之间。 根据旋转板的旋转操作，每个提升阀通过每个球体相对于相应的端口移动或分开。

公开(公告)号：US4879445A

公开(公告)日：1989-11-07

申请号：US184551

申请日：1988-04-14

申请人： Hitoshi Kawano ,  Mitsuhiro Hayashi ,  Yukio Yamamoto ,  Kunikatsu Ban

发明人： Hitoshi Kawano ,  Mitsuhiro Hayashi ,  Yukio Yamamoto ,  Kunikatsu Ban

IPC分类号： B23K11/06 ,  B23K11/30

CPC分类号： B23K11/309 ,  B23K11/063 ,  B23K2201/12

摘要： An apparatus for seam welding is disclosed, in which a metal plate or a surface-clad metal plate in a cylindrical form with a strip-like overlap section S constituted by two overlapping edge portions is passed as process material 4 between pair roller electrodes 1 and 2 via upper and lower wire electrodes 3 for seam welding of the overlap section between the roller electrodes and also between the upper and lower wire electrodes 3 under pressure applied to the section, and also which is provided with a welding current source 8 for supplying a welding current between the roller electrodes 1 and 2. The apparatus comprises a detector disposed at a position 6a a line upstream of connecting the axes 1a and 1b of rotation of said roller electrodes for detecting at least the front end 4a said process material 4 and a control circuit 7 connected to the output side of the detector for counting the start and stop timings of supply of welding current to the roller electrodes 1 and 2 and instructing the start and stop of the welding current supply to the welding current source 8 according to the counted start and stop of the welding current supply to the welding current source 8 according to the counted start and stop timings.

公开(公告)号：US5621982A

公开(公告)日：1997-04-22

申请号：US329904

申请日：1994-10-27

申请人： Teppei Yamashita ,  Masanao Murata ,  Tsuyoshi Tanaka ,  Teruya Morita ,  Hitoshi Kawano ,  Mitsuhiro Hayashi ,  Atsushi Okuno ,  Akio Nakamura

发明人： Teppei Yamashita ,  Masanao Murata ,  Tsuyoshi Tanaka ,  Teruya Morita ,  Hitoshi Kawano ,  Mitsuhiro Hayashi ,  Atsushi Okuno ,  Akio Nakamura

IPC分类号： H01L21/68 ,  F26B21/14 ,  F26B25/00 ,  H01L21/00 ,  H01L21/677 ,  F26B19/00

CPC分类号： F26B21/14 ,  F26B25/001 ,  H01L21/67057 ,  H01L21/67769 ,  H01L21/67772

摘要： Disclosed is an electronic substrate processing system comprising a processing equipment for processing electronic substrates including semiconductor wafers and liquid crystal substrates; a cleaning equipment for cleaning said electronic substrate in a predetermined processing step; a portable closed container for accommodating a cassette containing said electronic substrate; a purging station for gas-purging said portable closed containers; and a storage member for storing said portable closed containers, wherein said cassette accommodates said electronic substrates which have been cleaned by said cleaning equipment being set in said portable closed container and purged with an inert gas in said purging station, and said portable closed container or containers is stored in said storing section when necessary.

摘要翻译： 公开了一种电子基板处理系统，包括用于处理包括半导体晶片和液晶基板的电子基板的处理设备; 用于在预定处理步骤中清洁所述电子基板的清洁设备; 用于容纳包含所述电子基板的盒的便携式密闭容器; 用于吹扫所述便携式密闭容器的清洗站; 以及用于存储所述便携式封闭容器的存储构件，其中所述盒容纳已经被所述清洁设备清洁的所述电子基板设置在所述便携式密闭容器中并在所述清洗站中用惰性气体吹扫，并且所述便携式密闭容器或 必要时将容器储存在所述储存部分中。

公开(公告)号：US4249063A

公开(公告)日：1981-02-03

申请号：US2002

申请日：1979-01-09

申请人： Hitoshi Kawano ,  Kiyoshi Ikemura ,  Mitsuhiro Hayashi

发明人： Hitoshi Kawano ,  Kiyoshi Ikemura ,  Mitsuhiro Hayashi

IPC分类号： B23K9/073 ,  B23K9/09

CPC分类号： B23K9/092

摘要： A circuit for a high frequency arc welding apparatus which can control the welding current by keeping the peak value, that is the amplitude of the pulse component, of the welding current waveform constant and improve operating efficiency and reliability. The circuit includes a D.C. electrical source for welding and a condenser for regenerating. The welding current is controlled by controlling the voltage of the condenser. A low frequency switch periodically discharges the condenser to limit the voltage of the condenser and to transfer the stored energy of the condenser to the electrical source.

摘要翻译： 一种高频电弧焊接装置的电路，其可以通过保持焊接电流波形的峰值（即脉冲成分的振幅）恒定来提高操作效率和可靠性来控制焊接电流。 该电路包括用于焊接的直流电源和用于再生的冷凝器。 通过控制冷凝器的电压来控制焊接电流。 低频开关周期性地对冷凝器进行放电以限制冷凝器的电压并将冷凝器的储存能量传送到电源。

公开(公告)号：US5433574A

公开(公告)日：1995-07-18

申请号：US364003

申请日：1994-12-27

申请人： Hitoshi Kawano ,  Teppei Yamashita ,  Masanao Murata ,  Tsuyoshi Tanaka ,  Teruya Morita ,  Atsushi Okuno ,  Mitsuhiro Hayashi ,  Akio Nakamura

发明人： Hitoshi Kawano ,  Teppei Yamashita ,  Masanao Murata ,  Tsuyoshi Tanaka ,  Teruya Morita ,  Atsushi Okuno ,  Mitsuhiro Hayashi ,  Akio Nakamura

IPC分类号： F24F7/06 ,  B01L1/04 ,  B01L5/00 ,  B65G49/00 ,  H01L21/677 ,  B65B1/04

CPC分类号： B01L5/00 ,  B01L1/04 ,  Y10S414/14

摘要： A gas purge unit for a portable closed container is defined by a purge box including an opening, and a container stand around the opening on which a closed container is set; a gas supplying inlet coupled to a gas supplying source, and a gas discharging outlet; and a lifting mechanism for closing the opening from inside of the purge box and controlling the locking and unlocking operations of a locking mechanism provided in the lid of the container.

摘要翻译： 用于便携式密闭容器的气体净化单元由包括开口的清洗箱和围绕设置有密闭容器的开口的容器支架限定; 连接到气体供应源的气体供给入口和气体排出口; 以及用于从清洗箱内部关闭开口并控制设置在容器的盖中的锁定机构的锁定和解锁操作的提升机构。

公开(公告)号：US5303482A

公开(公告)日：1994-04-19

申请号：US826954

申请日：1992-01-28

申请人： Teppei Yamashita ,  Masanao Murata ,  Tsuyoshi Tanaka ,  Teruya Morita ,  Hitoshi Kawano ,  Atsushi Okuno ,  Masanori Tsuda ,  Mitsuhiro Hayashi ,  Hiromi Morita

发明人： Teppei Yamashita ,  Masanao Murata ,  Tsuyoshi Tanaka ,  Teruya Morita ,  Hitoshi Kawano ,  Atsushi Okuno ,  Masanori Tsuda ,  Mitsuhiro Hayashi ,  Hiromi Morita

IPC分类号： H01L21/677 ,  F26B21/06

CPC分类号： H01L21/67769 ,  Y10S414/14

摘要： A wafer keeping apparatus includes a closed wafer keeping space, and an arrangement for circulating an inert gas through a filter and then through the wafer keeping space. In one embodiment, several wafer keeping shelves are each provided within the space, and the inert gas is supplied through a respective filter to flow across each shelf. In another embodiment, a plurality of wafer keeping spaces are each accessible through a respective door which forms an airtight seal when it is closed, and respective filters are provided on opposite sides of the space, the inert gas being supplied to the space through one filter and exiting the space through the other filter. In a further embodiment, several of the wafer keeping spaces are provided at angularly and vertically spaced locations in a rotatable stocker body provided within a casing, and several vertically spaced doors are provided on the casing to provide access to respective wafer keeping spaces in the stocker body.

摘要翻译： 晶片保存装置包括封闭的晶片保持空间，以及用于使惰性气体通过过滤器然后通过晶片保持空间循环的装置。 在一个实施例中，在该空间内分别提供几个晶片保持架，并且惰性气体通过相应的过滤器供应流过每个搁架。 在另一个实施例中，多个晶片保持空间各自可通过相应的门接近，门在关闭时形成气密密封，并且各个过滤器设置在空间的相对侧上，惰性气体通过一个过滤器 并通过另一个过滤器离开空间。 在另一个实施例中，几个晶片保持空间设置在设置在壳体内的可转动的储带架主体中的角度和垂直间隔的位置处，并且几个垂直间隔的门设置在壳体上以提供对存储器中的相应晶片保持空间的访问 身体。

公开(公告)号：US5878009A

公开(公告)日：1999-03-02

申请号：US574867

申请日：1995-12-19

申请人： Mitsuhiro Hayashi

发明人： Mitsuhiro Hayashi

IPC分类号： G11B7/00 ,  G11B7/005 ,  G11B11/10 ,  G11B11/105 ,  G11B19/12 ,  G11B19/28 ,  G11B20/10 ,  G11B27/10

CPC分类号： G11B19/28 ,  G11B19/12 ,  G11B20/10009 ,  G11B7/005 ,  G11B11/10515 ,  G11B11/10595

摘要： The disk drive, which is used for performing at least a reproducing operation for a disk-shaped recording medium having a PEP region where information relating to the at least a reproducing operation is recorded, includes: a rotator for rotating the recording medium; a pickup for reading a signal from the recording medium; processing circuits for thresholding a length of a period in which the level of the signal remains unchanged; a demodulating circuit for receiving the thresholding result and for demodulating the signal to reproduce the information based on the thresholding result; a detector for detecting the rotation speed of the recording medium and for outputting a rotation speed signal indicative of it; correcting circuits for receiving the rotation speed signal, and for supplying a discrimination value in accordance with the rotation speed of the recording medium. The discrimination value is used for thresholding the length of the period. In the disk drive of the present invention, the signals are demodulated based on the thresholding result obtained using the discrimination value, whereby allowing the information to be reproduced correctly while the rotation speed of the recording medium changes.

摘要翻译： 用于至少对具有PEP区域的盘形记录介质进行至少一个再现操作的磁盘驱动器，其中记录与至少一个再现操作相关的信息，包括：旋转器，用于旋转记录介质; 用于从记录介质读取信号的拾取器; 处理电路，用于阈值化信号电平保持不变的周期的长度; 解调电路，用于接收所述阈值结果并用于解调所述信号以基于所述阈值结果再现所述信息; 检测器，用于检测记录介质的转速并输出表示该记录介质的转速信号; 用于接收转速信号的校正电路，以及用于根据记录介质的转速提供鉴别值。 判别值用于对周期的长度进行阈值处理。 在本发明的磁盘驱动器中，根据使用识别值获得的阈值结果对信号进行解调，由此允许在记录介质的转速改变时正确地再现信息。

公开(公告)号：US5746008A

公开(公告)日：1998-05-05

申请号：US803818

申请日：1997-02-24

申请人： Teppei Yamashita ,  Masanao Murata ,  Tsuyoshi Tanaka ,  Teruya Morita ,  Hitoshi Kawano ,  Mitsuhiro Hayashi ,  Atsushi Okuno ,  Akio Nakamura

发明人： Teppei Yamashita ,  Masanao Murata ,  Tsuyoshi Tanaka ,  Teruya Morita ,  Hitoshi Kawano ,  Mitsuhiro Hayashi ,  Atsushi Okuno ,  Akio Nakamura

IPC分类号： H01L21/00 ,  H01L21/677 ,  G26B19/00

CPC分类号： H01L21/67757 ,  H01L21/67057 ,  H01L21/67769 ,  H01L21/67772

摘要： Disclosed is an electronic substrate processing system comprising a processing equipment for processing electronic substrates including semiconductor wafers and liquid crystal substrates; a cleaning equipment for cleaning said electronic substrate in a predetermined processing step; a portable closed container for accommodating a cassette containing said electronic substrate; a purging station for gas-purging said portable closed containers; and a storage member for storing said portable closed containers, wherein said cassette accommodates said electronic substrates which have been cleaned by said cleaning equipment being set in said portable closed container and purged with an inert gas in said purging station, and said portable closed container or containers is stored in said storing section when necessary.

摘要翻译： 公开了一种电子基板处理系统，包括用于处理包括半导体晶片和液晶基板的电子基板的处理设备; 用于在预定处理步骤中清洁所述电子基板的清洁设备; 用于容纳包含所述电子基板的盒的便携式密闭容器; 用于吹扫所述便携式密闭容器的清洗站; 以及用于存储所述便携式封闭容器的存储构件，其中所述盒容纳已经被所述清洁设备清洁的所述电子基板设置在所述便携式密闭容器中并在所述清洗站中用惰性气体吹扫，并且所述便携式密闭容器或 必要时将容器储存在所述储存部分中。

公开(公告)号：US4868364A

公开(公告)日：1989-09-19

申请号：US70468

申请日：1987-07-07

申请人： Hitoshi Kawano ,  Mitsuhiro Hayashi ,  Yukio Yamamoto ,  Kunikatsu Ban

发明人： Hitoshi Kawano ,  Mitsuhiro Hayashi ,  Yukio Yamamoto ,  Kunikatsu Ban

IPC分类号： B23K11/24 ,  B23K11/06 ,  B23K11/25

CPC分类号： B23K11/256 ,  B23K11/06 ,  B23K11/063 ,  B23K11/257 ,  B23K2201/125

摘要： A seam welder with wire electrodes inserted between upper and lower roller electrodes to weld an overlap section of a cylinderical body formed of metal plate between the electrodes. The power supply for the welder includes a rectifying circuit for obtaining a dc voltage from an ac current source, a smoothing circuit for smoothing the dc voltage, a single converting circuit to convert the smoothed dc voltage into an alternating polarity pulse voltage, a transformer for applying this pulse voltage to the upper and lower electrodes and a capacitor connected between the primary side of the transformer and the output side of the converting circuit with a capacitance that produces resonance with the inductance of the transformer primary at the pulse voltage frequency.

公开(公告)号：US5389769A

公开(公告)日：1995-02-14

申请号：US037976

申请日：1993-03-26

申请人： Teppei Yamashita ,  Masanao Murata ,  Tsuyoshi Tanaka ,  Teruya Morita ,  Hitoshi Kawano ,  Atsushi Okuno ,  Masanori Tsuda ,  Mitsuhiro Hayashi

发明人： Teppei Yamashita ,  Masanao Murata ,  Tsuyoshi Tanaka ,  Teruya Morita ,  Hitoshi Kawano ,  Atsushi Okuno ,  Masanori Tsuda ,  Mitsuhiro Hayashi

IPC分类号： G06K17/00 ,  G06K19/10 ,  H01L21/02 ,  G06F15/46

CPC分类号： G06K17/00 ,  G06K2017/0045 ,  G06K2017/0087

摘要： An ID recognizing system for a semiconductor manufacturing system includes IC modules set in surfaces of containers which accommodate wafers and are conveyed from one device to another in the semiconductor manufacturing system. Each IC module is capable of transmitting and receiving signals from fixed stations and includes a reloadable memory. The semiconductor manufacturing system is made up of a number of devices for performing manufacturing operations on the wafers in the containers, and each of the devices include one of the fixed stations. The IC module is powered by the energy of radio waves received from the fixed station in the device in which said container has been placed for processing of the wafers therein. The radio communication is in the form of communication packets which include data on individual wafers in the cassettes so that the individual wafers can be processed separately. The position or off-set of the data within the packet indicates the position of the corresponding wafer within the container.

摘要翻译： 用于半导体制造系统的ID识别系统包括设置在容纳晶片的容器的表面中的IC模块，并且在半导体制造系统中从一个装置传送到另一个装置。 每个IC模块能够从固定站发送和接收信号，并且包括可重新加载的存储器。 半导体制造系统由用于对容器中的晶片进行制造操作的多个装置组成，并且每个装置包括固定站之一。 IC模块由在其中已经放置所述容器用于处理其中的晶片的装置中的固定站接收的无线电波的能量供电。 无线电通信是通信分组的形式，其包括在盒中的单个晶片上的数据，使得可以单独处理各个晶片。 分组内的数据的位置或偏移指示了相应晶片在容器内的位置。