公开(公告)号：US5677755A

公开(公告)日：1997-10-14

申请号：US330726

申请日：1994-10-28

申请人： Yoshitada Oshida ,  Yasuhiko Nakayama ,  Masahiro Watanabe ,  Minoru Yoshida ,  Kenichirou Fukuda

发明人： Yoshitada Oshida ,  Yasuhiko Nakayama ,  Masahiro Watanabe ,  Minoru Yoshida ,  Kenichirou Fukuda

IPC分类号： G03F7/20 ,  H01L21/30

CPC分类号： G03F7/70566 ,  G03F7/70125 ,  G03F7/70241

摘要： A pattern exposure method including the steps of irradiating a mask or reticle having a desired original pattern written thereon with light with a desired directivity from an illuminating light source for exposure, and projecting a transmitted or reflected light from said mask to an object to be exposed through a projection optical system, wherein a pattern-dependent polarizing mask for giving polarization characteristics in compliance with the direction of the pattern on the mask to the illuminating light transmitted through the pattern; and a pattern exposure apparatus including a illuminating light for exposure, a mask or a reticle, an illumination optical system for irradiating the mask with light emitted from the light source, and a projection optical system for projecting the transmitted or reflected light from the mask onto the object to be exposed, further including polarizing unit for polarizing the illuminating light on the pupil of the projection optical system so as to be nearly rotationally symmetric with respect to the center of the pupil when the mask is not used; and a mask, used with said pattern exposure apparatus, for giving pattern-dependent polarization characteristics; and a semiconductor integrated circuit including fine patterns at least in two directions formed by the pattern exposure method using the pattern-dependent polarizing mask.

摘要翻译： 一种图案曝光方法，包括以下步骤：从用于曝光的照明光源照射具有期望的原始图案的具有期望的方向性的光的掩模或掩模版，并将来自所述掩模的透射或反射的光投射到待曝光的物体 通过投影光学系统，其中用于根据掩模上的图案的方向对透射通过图案的照明光提供偏振特性的图案相关偏光掩模; 以及包括用于曝光的照明光，掩模或掩模版，用于从光源发射的光照射掩模的照明光学系统的图案曝光装置，以及用于将来自掩模的透射或反射的光投射到 要曝光的物体，还包括偏振单元，用于使投影光学系统的光瞳上的照明光偏振，以便当不使用掩模时相对于瞳孔的中心几乎旋转对称; 以及与所述图案曝光装置一起使用的用于赋予图案相关偏振特性的掩模; 以及半导体集成电路，其包括通过使用图案相关偏光掩模的图案曝光方法形成的至少两个方向的精细图案。

公开(公告)号：US08253934B2

公开(公告)日：2012-08-28

申请号：US12649898

申请日：2009-12-30

申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

IPC分类号： G01N21/00

CPC分类号： G03F7/7065 ,  G01N21/95684

摘要： A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.

摘要翻译： 将深紫外光或紫外线照射到形成有图案的试样上的图案检查方法和装置形成了被深紫外线或紫外线照射的样本的图像，形成 使用对不大于400nm的波长敏感的背面照射型图像传感器来检测图像。 处理从图像传感器输出的信号，以便通过用A / D转换器将从图像传感器输出的模拟图像信号转换为数字图像信号来检测样本的缺陷，并且显示器显示检测到的缺陷的信息 。

公开(公告)号：US20070195316A1

公开(公告)日：2007-08-23

申请号：US11785432

申请日：2007-04-17

申请人： Minoru Yoshida ,  Shunji Maeda ,  Hidetoshi Nishiyama ,  Masahiro Watanabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Hidetoshi Nishiyama ,  Masahiro Watanabe

IPC分类号： G01N21/00

CPC分类号： G01N21/8806 ,  G01N21/956

摘要： The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.

公开(公告)号：US07205549B2

公开(公告)日：2007-04-17

申请号：US10765920

申请日：2004-01-29

申请人： Minoru Yoshida ,  Shunji Maeda ,  Hidetoshi Nishiyama ,  Masahiro Watanabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Hidetoshi Nishiyama ,  Masahiro Watanabe

IPC分类号： G01J1/42

CPC分类号： G01N21/8806 ,  G01N21/956

摘要： The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.

摘要翻译： 本发明的图案缺陷检查装置及其方法包括：配方设定单元，用于设定检查食谱和/或检查食谱; 一种照明光学系统，包括：用于发射紫外线激光的激光源; 光量调节单元，用于调节从激光光源发射的紫外激光的量; 以及照明范围形成单元，用于在样品上形成紫外激光的照明范围; 一致性降低系统; 以及检测光学系统，包括：聚光光学系统; 衍射光控制光学系统; 和检测单元。

公开(公告)号：US20100104173A1

公开(公告)日：2010-04-29

申请号：US12649898

申请日：2009-12-30

申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

IPC分类号： G06K9/62

CPC分类号： G03F7/7065 ,  G01N21/95684

摘要： A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.

摘要翻译： 将深紫外光或紫外线照射到形成有图案的试样上的图案检查方法和装置形成了被深紫外线或紫外线照射的样本的图像，形成 使用对不大于400nm的波长敏感的背面照射型图像传感器来检测图像。 处理从图像传感器输出的信号，以便通过用A / D转换器将从图像传感器输出的模拟图像信号转换为数字图像信号来检测样本的缺陷，并且显示器显示检测到的缺陷的信息 。

公开(公告)号：US08736830B2

公开(公告)日：2014-05-27

申请号：US13145968

申请日：2009-12-10

申请人： Masahiro Watanabe ,  Toshihiko Nakata ,  Yasuhiro Yoshitake ,  Hideaki Sasazawa ,  Minoru Yoshida

发明人： Masahiro Watanabe ,  Toshihiko Nakata ,  Yasuhiro Yoshitake ,  Hideaki Sasazawa ,  Minoru Yoshida

IPC分类号： G01N21/00

CPC分类号： G01Q60/22 ,  G01N21/95607 ,  G11B5/84

摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.

摘要翻译： 提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。 用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

公开(公告)号：US08410460B2

公开(公告)日：2013-04-02

申请号：US11785432

申请日：2007-04-17

申请人： Minoru Yoshida ,  Shunji Maeda ,  Hidetoshi Nishiyama ,  Masahiro Watanabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Hidetoshi Nishiyama ,  Masahiro Watanabe

IPC分类号： G01J3/10

CPC分类号： G01N21/8806 ,  G01N21/956

摘要： The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.

摘要翻译： 本发明的图案缺陷检查装置及其方法包括：配方设定单元，用于设定检查食谱和/或检查食谱; 一种照明光学系统，包括：用于发射紫外线激光的激光源; 光量调节单元，用于调节从激光光源发射的紫外激光的量; 以及照明范围形成单元，用于在样品上形成紫外激光的照明范围; 一致性降低系统; 以及检测光学系统，包括：聚光光学系统; 衍射光控制光学系统; 和检测单元。

公开(公告)号：US08359661B2

公开(公告)日：2013-01-22

申请号：US12649468

申请日：2009-12-30

申请人： Takehiro Tachizaki ,  Masahiro Watanabe ,  Hideaki Sasazawa ,  Minoru Yoshida ,  Tsuneo Nakagomi ,  Teruaki Tokutomi

发明人： Takehiro Tachizaki ,  Masahiro Watanabe ,  Hideaki Sasazawa ,  Minoru Yoshida ,  Tsuneo Nakagomi ,  Teruaki Tokutomi

IPC分类号： G01Q60/52

CPC分类号： G01Q60/54 ,  G01Q60/56 ,  G01Q70/12

摘要： Applying an alternating current to a magnetic head as a sample generates an alternate-current magnetic field from the sample. A cantilever includes a probe that is made of a magnetic material or is coated with a magnetic material. The cantilever is displaced when it approaches the sample. Detecting the displacement of the cantilever detects distribution of the magnetic field from the sample. It is possible to fast measure distribution of the magnetic field generated from the sample when a frequency of the alternating current applied to the sample differs from a resonance frequency of the cantilever.

摘要翻译： 以交替电流作为样品施加磁头会产生来自样品的交流磁场。 悬臂包括由磁性材料制成或涂覆有磁性材料的探针。 悬臂在接近样品时被移位。 检测悬臂的位移检测样品的磁场分布。 当施加到样品的交流电流的频率与悬臂的共振频率不同时，可以快速测量从样品产生的磁场的分布。

公开(公告)号：US20120013890A1

公开(公告)日：2012-01-19

申请号：US13145968

申请日：2009-12-10

申请人： Masahiro Watanabe ,  Toshihiko Nakata ,  Yasuhiro Yoshitake ,  Hideaki Sasazawa ,  Minoru Yoshida

发明人： Masahiro Watanabe ,  Toshihiko Nakata ,  Yasuhiro Yoshitake ,  Hideaki Sasazawa ,  Minoru Yoshida

IPC分类号： G01N21/956 ,  G01N21/47

CPC分类号： G01Q60/22 ,  G01N21/95607 ,  G11B5/84

摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.

摘要翻译： 提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。 用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

公开(公告)号：US20100205699A1

公开(公告)日：2010-08-12

申请号：US12649468

申请日：2009-12-30

申请人： Takehiro TACHIZAKI ,  Masahiro Watanabe ,  Hideaki Sasazawa ,  Minoru Yoshida ,  Tsuneo Nakagomi ,  Teruaki Tokutomi

发明人： Takehiro TACHIZAKI ,  Masahiro Watanabe ,  Hideaki Sasazawa ,  Minoru Yoshida ,  Tsuneo Nakagomi ,  Teruaki Tokutomi

IPC分类号： G01Q60/52 ,  G01Q60/50

CPC分类号： G01Q60/54 ,  G01Q60/56 ,  G01Q70/12

摘要： Applying an alternating current to a magnetic head as a sample generates an alternate-current magnetic field from the sample. A cantilever includes a probe that is made of a magnetic material or is coated with a magnetic material. The cantilever is displaced when it approaches the sample. Detecting the displacement of the cantilever detects distribution of the magnetic field from the sample. It is possible to fast measure distribution of the magnetic field generated from the sample when a frequency of the alternating current applied to the sample differs from a resonance frequency of the cantilever.

摘要翻译： 以交替电流作为样品施加磁头会产生来自样品的交流磁场。 悬臂包括由磁性材料制成或涂覆有磁性材料的探针。 悬臂在接近样品时被移位。 检测悬臂的位移检测样品的磁场分布。 当施加到样品的交流电流的频率与悬臂的共振频率不同时，可以快速测量从样品产生的磁场的分布。