公开(公告)号：US20110147676A1

公开(公告)日：2011-06-23

申请号：US12939403

申请日：2010-11-04

申请人： Yoshiyuki ABE ,  Riichiro Wake ,  Masakazu Kuwahara ,  Yasuyuki Maeno

发明人： Yoshiyuki ABE ,  Riichiro Wake ,  Masakazu Kuwahara ,  Yasuyuki Maeno

IPC分类号： H01B1/22

CPC分类号： H01B1/08 ,  C04B35/01 ,  C04B35/6261 ,  C04B2235/3229 ,  C04B2235/3286 ,  C04B2235/5445 ,  C04B2235/6562 ,  C04B2235/6565 ,  C04B2235/6585 ,  C04B2235/6586 ,  C04B2235/77 ,  C04B2235/786 ,  C23C14/0015 ,  C23C14/08

摘要： An oxide evaporation material in the present invention comprises a sintered body containing indium oxide as a main component thereof and cerium with the Ce/In atomic ratio of more than 0.110 and equal to or less than 0.538, and has an L* value of 62 to 95 in the CIE 1976 color space. The oxide evaporation material with the L* value of 62 to 95 has an optimal oxygen amount. Accordingly, even when a small amount of oxygen gas is introduced into a film-formation vacuum chamber, a high-refractive-index transparent film having a refractive index of 2.15 to 2.51 at a wavelength of 550 nm, a low resistance, and a high transmittance in the visible to near-infrared region is formed by vacuum deposition methods. Since the introduced oxygen gas amount is small, the difference in composition between the film and the evaporation material is made small.

摘要翻译： 本发明的氧化物蒸镀材料包含以氧化铟为主要成分的烧结体和Ce / In原子比大于0.110且等于或小于0.538的铈，其L *值为62〜 95在CIE 1976色彩空间。 L *值为62〜95的氧化物蒸发材料具有最佳的氧量。 因此，即使在成膜真空室中引入少量的氧气的情况下，在波长550nm下折射率为2.15〜2.51的高折射率透明膜，低电阻，高 通过真空沉积法形成可见光到近红外区域的透射率。 由于引入的氧气量少，所以膜和蒸发材料之间的组成差异变小。

公开(公告)号：US08343387B2

公开(公告)日：2013-01-01

申请号：US12939403

申请日：2010-11-04

申请人： Yoshiyuki Abe ,  Riichiro Wake ,  Masakazu Kuwahara ,  Yasuyuki Maeno

发明人： Yoshiyuki Abe ,  Riichiro Wake ,  Masakazu Kuwahara ,  Yasuyuki Maeno

IPC分类号： H01B1/08

CPC分类号： H01B1/08 ,  C04B35/01 ,  C04B35/6261 ,  C04B2235/3229 ,  C04B2235/3286 ,  C04B2235/5445 ,  C04B2235/6562 ,  C04B2235/6565 ,  C04B2235/6585 ,  C04B2235/6586 ,  C04B2235/77 ,  C04B2235/786 ,  C23C14/0015 ,  C23C14/08

摘要： An oxide evaporation material in the present invention comprises a sintered body containing indium oxide as a main component thereof and cerium with the Ce/In atomic ratio of more than 0.110 and equal to or less than 0.538, and has an L* value of 62 to 95 in the CIE 1976 color space. The oxide evaporation material with the L* value of 62 to 95 has an optimal oxygen amount. Accordingly, even when a small amount of oxygen gas is introduced into a film-formation vacuum chamber, a high-refractive-index transparent film having a refractive index of 2.15 to 2.51 at a wavelength of 550 nm, a low resistance, and a high transmittance in the visible to near-infrared region is formed by vacuum deposition methods. Since the introduced oxygen gas amount is small, the difference in composition between the film and the evaporation material is made small.

摘要翻译： 本发明的氧化物蒸镀材料包含以氧化铟为主要成分的烧结体和Ce / In原子比大于0.110且等于或小于0.538的铈，其L *值为62〜 95在CIE 1976色彩空间。 L *值为62〜95的氧化物蒸发材料具有最佳的氧量。 因此，即使在成膜真空室中引入少量的氧气的情况下，在波长550nm下折射率为2.15〜2.51的高折射率透明膜，低电阻，高 通过真空沉积法形成可见光到近红外区域的透射率。 由于引入的氧气量少，所以膜和蒸发材料之间的组成差异变小。

公开(公告)号：US08574464B2

公开(公告)日：2013-11-05

申请号：US12916952

申请日：2010-11-01

申请人： Yoshiyuki Abe ,  Riichiro Wake ,  Masakazu Kuwahara ,  Kentaro Sogabe ,  Azusa Oshiro ,  Hisaki Yada

发明人： Yoshiyuki Abe ,  Riichiro Wake ,  Masakazu Kuwahara ,  Kentaro Sogabe ,  Azusa Oshiro ,  Hisaki Yada

IPC分类号： H01B1/08

CPC分类号： H01B1/08 ,  C04B35/01 ,  C04B2235/3229 ,  C04B2235/3256 ,  C04B2235/3258 ,  C04B2235/3286 ,  C04B2235/3293 ,  C04B2235/5436 ,  C04B2235/5445 ,  C04B2235/608 ,  C04B2235/6562 ,  C04B2235/6565 ,  C04B2235/6567 ,  C04B2235/658 ,  C04B2235/6585 ,  C04B2235/6586 ,  C04B2235/77 ,  C04B2235/786 ,  C04B2235/9646 ,  C23C14/08 ,  C23C14/3414 ,  C23C30/005 ,  H01L31/022466 ,  H01L31/022475 ,  H01L31/0749 ,  H01L31/1884 ,  Y02E10/541

摘要： An oxide evaporation material according to the present invention includes a sintered body containing indium oxide as a main component thereof and cerium with a Ce/In atomic ratio of 0.001 to 0.110. The L* value in the CIE 1976 color space is 62 to 95. The oxide evaporation material with the L* value of 62 to 95 has an optimal oxygen amount. Accordingly, even when a small amount of an oxygen gas is introduced into a film-formation vacuum chamber, a transparent conducting film having a low resistance and a high transmittance in the visible to near-infrared region is formed by vacuum deposition methods. Since the amount of the oxygen gas introduced is small, the difference in composition between the film and the evaporation material is made small. This reduces the variations in composition and characteristics among films formed in large quantities.

公开(公告)号：US20120279564A1

公开(公告)日：2012-11-08

申请号：US13520640

申请日：2011-01-07

申请人： Yoshiyuki Abe ,  Riichiro Wake ,  Masakazu Kuwahara ,  Kentaro Sogabe ,  Azusa Oshiro ,  Hisaki Yada

发明人： Yoshiyuki Abe ,  Riichiro Wake ,  Masakazu Kuwahara ,  Kentaro Sogabe ,  Azusa Oshiro ,  Hisaki Yada

IPC分类号： H01B1/02 ,  H01L31/0224 ,  B32B3/02

CPC分类号： H01L31/022466 ,  C04B35/01 ,  C04B35/6261 ,  C04B35/638 ,  C04B2235/3229 ,  C04B2235/3286 ,  C04B2235/656 ,  C04B2235/6562 ,  C04B2235/6565 ,  C04B2235/6567 ,  C04B2235/6585 ,  C04B2235/6586 ,  C04B2235/75 ,  C04B2235/77 ,  C23C14/086 ,  C23C14/24 ,  H01L31/03923 ,  H01L31/0749 ,  Y02E10/541 ,  Y02P70/521 ,  Y10T428/21

摘要： Provided are an oxide tablet for vapor deposition (oxide evaporation material), and a vapor-deposited thin film and a solar cell formed using the same. The tablet comprises a sintered body which contains indium oxide as a main component and cerium and which is subjected to no surface grinding after sintering, in which CompS/CompA=0.9 to 1.1, where the content of cerium in a surface layer to a depth of 5 μm from a surface of the sintered body is represented by a Ce/In atomic ratio (CompS), and an average value of the content of cerium in the entire sintered body is represented by a Ce/In atomic ratio (CompA).

摘要翻译： 提供了一种用于气相沉积的氧化物片（氧化物蒸发材料）和使用其形成的气相沉积薄膜和太阳能电池。 片剂包含含有氧化铟作为主要成分和铈的烧结体，烧结后不进行表面研磨，其中CompS / CompA = 0.9〜1.1，其中表面层中的铈含量为 烧结体表面5μm的Ce / In原子比（CompS）表示，烧结体整体中铈的含量的平均值由Ce / In原子比（CompA）表示。

公开(公告)号：US08941002B2

公开(公告)日：2015-01-27

申请号：US13520640

申请日：2011-01-07

申请人： Yoshiyuki Abe ,  Riichiro Wake ,  Masakazu Kuwahara ,  Kentaro Sogabe ,  Azusa Oshiro ,  Hisaki Yada

发明人： Yoshiyuki Abe ,  Riichiro Wake ,  Masakazu Kuwahara ,  Kentaro Sogabe ,  Azusa Oshiro ,  Hisaki Yada

IPC分类号： H01B1/08 ,  H01L31/0224 ,  C04B35/01 ,  C04B35/626 ,  C04B35/638 ,  C23C14/08 ,  C23C14/24 ,  H01L31/0392 ,  H01L31/0749

CPC分类号： H01L31/022466 ,  C04B35/01 ,  C04B35/6261 ,  C04B35/638 ,  C04B2235/3229 ,  C04B2235/3286 ,  C04B2235/656 ,  C04B2235/6562 ,  C04B2235/6565 ,  C04B2235/6567 ,  C04B2235/6585 ,  C04B2235/6586 ,  C04B2235/75 ,  C04B2235/77 ,  C23C14/086 ,  C23C14/24 ,  H01L31/03923 ,  H01L31/0749 ,  Y02E10/541 ,  Y02P70/521 ,  Y10T428/21

摘要： Provided are an oxide tablet for vapor deposition (oxide evaporation material), and a vapor-deposited thin film and a solar cell formed using the same. The tablet comprises a sintered body which contains indium oxide as a main component and cerium and which is subjected to no surface grinding after sintering, in which CompS/CompA=0.9 to 1.1, where the content of cerium in a surface layer to a depth of 5 μm from a surface of the sintered body is represented by a Ce/In atomic ratio (CompS), and an average value of the content of cerium in the entire sintered body is represented by a Ce/In atomic ratio (CompA).

摘要翻译： 提供了一种用于气相沉积的氧化物片（氧化物蒸发材料）和使用其形成的气相沉积薄膜和太阳能电池。 片剂包含含有氧化铟作为主要成分和铈的烧结体，烧结后不进行表面研磨，其中CompS / CompA = 0.9〜1.1，其中表面层中的铈含量为 烧结体表面5μm的Ce / In原子比（CompS）表示，烧结体整体中铈的含量的平均值由Ce / In原子比（CompA）表示。

公开(公告)号：US20110126899A1

公开(公告)日：2011-06-02

申请号：US12916952

申请日：2010-11-01

申请人： Yoshiyuki ABE ,  Riichiro Wake ,  Masakazu Kuwahara ,  Kentaro Sogabe ,  Azusa Oshiro ,  Hisaki Yada

发明人： Yoshiyuki ABE ,  Riichiro Wake ,  Masakazu Kuwahara ,  Kentaro Sogabe ,  Azusa Oshiro ,  Hisaki Yada

IPC分类号： H01L31/0224 ,  H01L31/032 ,  H01B1/02

CPC分类号： H01B1/08 ,  C04B35/01 ,  C04B2235/3229 ,  C04B2235/3256 ,  C04B2235/3258 ,  C04B2235/3286 ,  C04B2235/3293 ,  C04B2235/5436 ,  C04B2235/5445 ,  C04B2235/608 ,  C04B2235/6562 ,  C04B2235/6565 ,  C04B2235/6567 ,  C04B2235/658 ,  C04B2235/6585 ,  C04B2235/6586 ,  C04B2235/77 ,  C04B2235/786 ,  C04B2235/9646 ,  C23C14/08 ,  C23C14/3414 ,  C23C30/005 ,  H01L31/022466 ,  H01L31/022475 ,  H01L31/0749 ,  H01L31/1884 ,  Y02E10/541

摘要： An oxide evaporation material according to the present invention includes a sintered body containing indium oxide as a main component thereof and cerium with a Ce/In atomic ratio of 0.001 to 0.110. The L* value in the CIE 1976 color space is 62 to 95. The oxide evaporation material with the L* value of 62 to 95 has an optimal oxygen amount. Accordingly, even when a small amount of an oxygen gas is introduced into a film-formation vacuum chamber, a transparent conducting film having a low resistance and a high transmittance in the visible to near-infrared region is formed by vacuum deposition methods. Since the amount of the oxygen gas introduced is small, the difference in composition between the film and the evaporation material is made small. This reduces the variations in composition and characteristics among films formed in large quantities.

摘要翻译： 根据本发明的氧化物蒸发材料包括以氧化铟为主要成分的烧结体和Ce / In原子比为0.001至0.110的铈。 CIE 1976色空间的L *值为62〜95.L *值为62〜95的氧化物蒸发材料具有最佳的氧量。 因此，即使少量的氧气被引入到成膜真空室中，也可以通过真空沉积法形成在可见光到近红外区域具有低电阻和高透射率的透明导电膜。 由于引入的氧气的量少，所以膜和蒸发材料之间的组成差异变小。 这减少了大量形成的膜之间的组成和特性的变化。

公开(公告)号：US07153453B2

公开(公告)日：2006-12-26

申请号：US11115971

申请日：2005-04-27

申请人： Yoshiyuki Abe ,  Tokuyuki Nakayama ,  Go Ohara ,  Riichiro Wake

发明人： Yoshiyuki Abe ,  Tokuyuki Nakayama ,  Go Ohara ,  Riichiro Wake

IPC分类号： H01B1/08 ,  B32B15/04 ,  C23C14/00

CPC分类号： C23C14/08 ,  C04B35/01 ,  C04B35/6261 ,  C04B35/62625 ,  C04B35/62655 ,  C04B35/64 ,  C04B37/026 ,  C04B2235/3258 ,  C04B2235/3284 ,  C04B2235/3286 ,  C04B2235/408 ,  C04B2235/5436 ,  C04B2235/5445 ,  C04B2235/656 ,  C04B2235/6584 ,  C04B2235/6586 ,  C04B2235/664 ,  C04B2235/77 ,  C04B2235/786 ,  C04B2235/96 ,  C04B2237/12 ,  C04B2237/124 ,  C04B2237/34 ,  C04B2237/403 ,  C23C14/3414 ,  Y10S428/918

摘要： There is provided an amorphous transparent conductive thin film with a low resistivity, a low absolute value for the internal stress of the film, and a high transmittance in the visible light range, an oxide sintered body for manufacturing the amorphous transparent conductive thin film, and a sputtering target obtained therefrom. An oxide sintered body is obtained by: preparing In2O3 powder, WO3 powder, and ZnO powder with an average grain size of less than 1 μm so that tungsten is at a W/In atomic number ratio of 0.004 to 0.023, and zinc is at a Zn/In atomic number ratio of 0.004 to 0.100; mixing the prepared powder for 10 to 30 hours; granulating the obtained mixed powder until the average grain size is 20 to 150 μm; molding the obtained granulated powder by a cold isostatic press with a pressure of 2 to 5 ton/cm2, and sintering the obtained compact at 1200 to 1500 degree.C. for 10 to 40 hours in an atmosphere where oxygen is introduced into the atmosphere of the sinter furnace at a rate of 50 to 250 liters/min per 0.1 m3 furnace volume.

摘要翻译： 提供一种具有低电阻率，薄膜内应力绝对值低，可见光范围高透射率的非晶透明导电薄膜，用于制造非晶透明导电薄膜的氧化物烧结体，以及 从其获得的溅射靶。 通过以下方法获得氧化物烧结体：制备In 2 N 3 O 3粉末WO 3 N 3粉末和平均晶粒尺寸较小的ZnO粉末 使得钨的W / In原子数比为0.004〜0.023，锌的Zn / In原子数比为0.004〜0.100; 将制备的粉末混合10至30小时; 将得到的混合粉末造粒直至平均粒径为20〜150μm; 通过2〜5吨/平方厘米压力的冷等静压机成型所获得的造粒粉末，并将所得成形体烧结在1200〜1500℃。 在每0.1m 3炉体积以50至250升/分的速率将氧气引入烧结炉的气氛中的气氛中进行10至40小时。

公开(公告)号：US08349220B2

公开(公告)日：2013-01-08

申请号：US13067261

申请日：2011-05-19

申请人： Yoshiyuki Abe ,  Tokuyuki Nakayama ,  Go Ohara ,  Riichiro Wake

发明人： Yoshiyuki Abe ,  Tokuyuki Nakayama ,  Go Ohara ,  Riichiro Wake

IPC分类号： H01B1/08 ,  C23C14/08

CPC分类号： H01B1/08 ,  C04B35/453 ,  C04B35/457 ,  C04B35/6261 ,  C04B2235/3217 ,  C04B2235/3232 ,  C04B2235/3251 ,  C04B2235/3256 ,  C04B2235/3258 ,  C04B2235/3284 ,  C04B2235/3286 ,  C04B2235/3293 ,  C04B2235/3294 ,  C04B2235/5436 ,  C04B2235/5445 ,  C04B2235/6562 ,  C04B2235/6565 ,  C04B2235/6567 ,  C04B2235/6585 ,  C04B2235/6586 ,  C04B2235/664 ,  C04B2235/80

摘要： An oxide sintered body substantially containing zinc, tin and oxygen; containing tin at an atomic number ratio, Sn/(Zn+Sn), of 0.23 to 0.50, and being composed mainly of a zinc oxide phase and at least one kind of zinc stannate compound phase, or being composed of at least one kind of zinc stannate compound phase; provided by a method for manufacturing the oxide sintered body by formulating an aqueous solvent to raw material powder containing powder of a zinc stannate compound, or mixed powder of tin oxide powder and zinc oxide powder, and after mixing the resulting slurry for equal to longer than 15 hours, by subjecting the slurry to solid-liquid separation, drying and granulation, and subsequently compacting by charging the granule into a mold, followed by sintering the resultant compact under sintering atmosphere at 1300 to 1500° C. for equal to or longer than 15 hours.

摘要翻译： 基本上含有锌，锡和氧的氧化物烧结体; 以锡原子数比计的锡，（Zn + Sn）为0.23〜0.50，主要由氧化锌相和至少一种锡酸锌化合物相组成，或由至少一种 锡酸锌复合相; 通过将含水溶剂配制成含有锡酸锌化合物的粉末的原料粉末，氧化锡粉末和氧化锌粉末的混合粉末，并将所得到的浆料混合等于长于 15小时，通过将浆料进行固液分离，干燥和造粒，然后通过将颗粒装入模具中随后压实，然后在1300〜1500℃的烧结气氛下烧结所得成形体等于或长于 15个小时。

公开(公告)号：US20050239660A1

公开(公告)日：2005-10-27

申请号：US11115971

申请日：2005-04-27

申请人： Yoshiyuki Abe ,  Tokuyuki Nakayama ,  Go Ohara ,  Riichiro Wake

发明人： Yoshiyuki Abe ,  Tokuyuki Nakayama ,  Go Ohara ,  Riichiro Wake

IPC分类号： H01L51/50 ,  B23K1/00 ,  C04B35/00 ,  C04B35/01 ,  C04B35/495 ,  C04B37/02 ,  C23C14/08 ,  C23C14/34 ,  H01B5/14 ,  H01B13/00 ,  H05B33/14 ,  H05B33/28

CPC分类号： C23C14/08 ,  C04B35/01 ,  C04B35/6261 ,  C04B35/62625 ,  C04B35/62655 ,  C04B35/64 ,  C04B37/026 ,  C04B2235/3258 ,  C04B2235/3284 ,  C04B2235/3286 ,  C04B2235/408 ,  C04B2235/5436 ,  C04B2235/5445 ,  C04B2235/656 ,  C04B2235/6584 ,  C04B2235/6586 ,  C04B2235/664 ,  C04B2235/77 ,  C04B2235/786 ,  C04B2235/96 ,  C04B2237/12 ,  C04B2237/124 ,  C04B2237/34 ,  C04B2237/403 ,  C23C14/3414 ,  Y10S428/918

摘要： There is provided an amorphous transparent conductive thin film with a low resistivity, a low absolute value for the internal stress of the film, and a high transmittance in the visible light range, an oxide sintered body for manufacturing the amorphous transparent conductive thin film, and a sputtering target obtained therefrom. An oxide sintered body is obtained by: preparing In2O3 powder, WO3 powder, and ZnO powder with an average grain size of less than 1 μm so that tungsten is at a W/In atomic number ratio of 0.004 to 0.023, and zinc is at a Zn/In atomic number ratio of 0.004 to 0.100; mixing the prepared powder for 10 to 30 hours; granulating the obtained mixed powder until the average grain size is 20 to 150 μm; molding the obtained granulated powder by a cold isostatic press with a pressure of 2 to 5 ton/cm2, and sintering the obtained compact at 1200 to 1500 degree.C. for 10 to 40 hours in an atmosphere where oxygen is introduced into the atmosphere of the sinter furnace at a rate of 50 to 250 liters/min per 0.1 m3 furnace volume.

摘要翻译： 提供一种具有低电阻率，薄膜内应力绝对值低，可见光范围高透射率的非晶透明导电薄膜，用于制造非晶透明导电薄膜的氧化物烧结体，以及 从其获得的溅射靶。 通过以下方法获得氧化物烧结体：制备In 2 N 3 O 3粉末WO 3 N 3粉末和平均晶粒尺寸较小的ZnO粉末 使得钨的W / In原子数比为0.004〜0.023，锌的Zn / In原子数比为0.004〜0.100; 将制备的粉末混合10至30小时; 将得到的混合粉末造粒直至平均粒径为20〜150μm; 通过2〜5吨/平方厘米压力的冷等静压机成型所获得的造粒粉末，并将所得成形体烧结在1200〜1500℃。 在每0.1m 3炉体积以50至250升/分的速率将氧气引入烧结炉的气氛中的气氛中进行10至40小时。

公开(公告)号：US20070215456A1

公开(公告)日：2007-09-20

申请号：US11716673

申请日：2007-03-12

申请人： Yoshiyuki Abe ,  Tokuyuki Nakayama ,  Go Ohara ,  Riichiro Wake

发明人： Yoshiyuki Abe ,  Tokuyuki Nakayama ,  Go Ohara ,  Riichiro Wake

IPC分类号： C23C14/00 ,  C23C14/32

CPC分类号： H01B1/08 ,  C04B35/453 ,  C04B35/457 ,  C04B35/6261 ,  C04B2235/3217 ,  C04B2235/3232 ,  C04B2235/3251 ,  C04B2235/3256 ,  C04B2235/3258 ,  C04B2235/3284 ,  C04B2235/3286 ,  C04B2235/3293 ,  C04B2235/3294 ,  C04B2235/5436 ,  C04B2235/5445 ,  C04B2235/6562 ,  C04B2235/6565 ,  C04B2235/6567 ,  C04B2235/6585 ,  C04B2235/6586 ,  C04B2235/664 ,  C04B2235/80

摘要： The present invention relates to the oxide sintered body substantially containing zinc, tin and oxygen, useful as a target, which can be sputtered under charging of high DC power, without generation of arcing or crack, and a manufacturing method for an oxide transparent conductive film formable in high-speed, and the oxide transparent conductive film excellent in chemical resistance. The oxide sintered body substantially containing zinc, tin and oxygen; containing tin at an atomic number ratio, Sn/(Zn+Sn), of 0.23 to 0.50, and being composed mainly of a zinc oxide phase and at least one kind of zinc stannate compound phase, or being composed of at least one kind of zinc stannate compound phase; provided by a method for manufacturing the oxide sintered body by formulating an aqueous solvent to raw material powder containing powder of a zinc stannate compound, or mixed powder of tin oxide powder and zinc oxide powder, and after mixing the resulting slurry for equal to longer than 15 hours, by subjecting the slurry to solid-liquid separation, drying and granulation, and subsequently compacting by charging the granule into a mold, followed by sintering the resultant compact under sintering atmosphere at 1300 to 1500° C. for equal to or longer than 15 hours.

摘要翻译： 本发明涉及基本上含有锌，锡和氧的氧化物烧结体，该氧化物烧结体可用作目标，可在高直流电力充电下溅射而不产生电弧或裂纹，以及氧化物透明导电膜的制造方法 高速成型，氧化物透明导电膜耐化学性优异。 基本上含有锌，锡和氧的氧化物烧结体; 以锡原子数比计的锡，（Zn + Sn）为0.23〜0.50，主要由氧化锌相和至少一种锡酸锌化合物相组成，或由至少一种 锡酸锌复合相; 通过将含水溶剂配制成含有锡酸锌化合物的粉末的原料粉末，氧化锡粉末和氧化锌粉末的混合粉末，并将所得到的浆料混合等于长于 15小时，通过将浆料进行固液分离，干燥和造粒，然后通过将颗粒装入模具中随后压实，然后在1300〜1500℃的烧结气氛下烧结所得成形体等于或长于 15个小时。