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    Megasonic resonator for disk cleaning and method for use thereof
    8.
    发明授权
    Megasonic resonator for disk cleaning and method for use thereof 失效
    用于磁盘清洗的超声波谐振器及其使用方法

    公开(公告)号：US06460551B1

    公开(公告)日：2002-10-08

    申请号：US09430345

    申请日：1999-10-29

    申请人： Boris Fishkin ,  Alexander Lerner ,  Jianshe Tang ,  Brian J. Brown

    发明人： Boris Fishkin ,  Alexander Lerner ,  Jianshe Tang ,  Brian J. Brown

    IPC分类号： B08B312

    CPC分类号： H01L21/67057 ,  B08B3/12 ,  G10K11/28 ,  Y10S134/902

    摘要： A Megasonic cleaning apparatus having at least one reflector (e.g., a parabolic or paraboloid reflector) positioned to collect otherwise wasted cleaning energy and redirect that energy to one or a plurality of positions on a wafer's edge is provided. A first embodiment comprises a complex parabolic reflector which has a width greater than that of the wafer and a preferred length approximately equal to the diameter of the wafer, and which is shaped to provide focal points which vary along the length of the parabolic reflector, such that energy striking the reflector at different points along the reflector's length is directed to a plurality of different points along the wafer's edge. A second embodiment comprises a simple parabolic reflector having a width greater than that of the wafer and a preferred length less than the diameter of the wafer, and which is provided to focus at a cord along the wafer's surface, effectively focusing cleaning energy on two points along the wafer's edge at any given time. Yet another embodiment of the invention comprises a paraboloid reflector having a width greater than that of the wafer and a preferred length which is substantially less than the diameter of the wafer and which is shaped to focus all collected energy to a single point on the wafer's edge. Multiple such reflectors may be positioned in the cleaning tank to optimize energy usage and wafer cleaning.

    摘要翻译： 提供了一种具有至少一个反射器（例如，抛物面或抛物面反射器）的超声波清洗装置，其被定位成收集另外浪费的清洁能量并将该能量重定向到晶片边缘上的一个或多个位置。 第一实施例包括复杂的抛物面反射器，其宽度大于晶片的宽度，并且优选的长度近似等于晶片的直径，并且其被成形为提供沿着抛物面反射器的长度变化的焦点， 沿着反射器长度的不同点撞击反射器的能量被引导到沿着晶片边缘的多个不同点。 第二实施例包括具有大于晶片宽度的宽度的简单抛物面反射器，并且具有小于晶片直径的优选长度，并且其设置成沿着晶片表面聚焦在绳索处，有效地将清洁能量聚焦在两点上 在任何给定的时间沿晶圆的边缘。 本发明的另一个实施例包括具有大于晶片宽度的宽度的抛物面反射器，其优选长度基本上小于晶片的直径，并且其被成形为将所有收集的能量聚焦到晶片边缘上的单个点 。 可以将多个这样的反射器定位在清洁槽中以优化能量使用和晶片清洁。

    Method for managing a fluid level associated with a substrate processing tank
    9.
    发明授权
    Method for managing a fluid level associated with a substrate processing tank 失效
    用于管理与衬底处理槽相关联的液面的方法

    公开(公告)号：US06464799B1

    公开(公告)日：2002-10-15

    申请号：US09580881

    申请日：2000-05-30

    申请人： Alexander Lerner ,  Brian J. Brown ,  Boris Fishkin ,  Jonathan S. Frankel

    发明人： Alexander Lerner ,  Brian J. Brown ,  Boris Fishkin ,  Jonathan S. Frankel

    IPC分类号： B08B310

    CPC分类号： B08B3/00 ,  B08B3/12 ,  G05D9/12 ,  G05D21/02 ,  G05D23/19 ,  G05D27/02 ,  H01L21/67253

    摘要： An improved method and apparatus for adjusting chemistry concentrations and temperatures within a substrate processing tank is provided. A first aspect may include checking the fluid level within the tank, and, if the level is higher than a predetermined upper level, bleeding an amount of fluid from the tank; if the level is lower than a predetermined lower level, flowing an amount of fluid to the tank, and if the level is between the predetermined upper and lower levels, bleeding an amount of fluid from the tank and flowing an amount of fluid to the tank. A second aspect may include flowing water into the tank at a flow rate at least equivalent to the flow rate of water required to achieve a chemistry spike of a predetermined concentration and volume prior to beginning the flow of chemicals. A third aspect may include a method and apparatus for heating or cooling chemistry to a predetermined temperature as the chemistry is recirculated.

    摘要翻译： 提供了用于调整基板处理槽内的化学浓度和温度的改进方法和装置。 第一方面可以包括检查罐内的液位，并且如果液位高于预定的上限，则从罐中排出一定量的流体; 如果水平低于预定的较低水平，则将一定量的流体流向罐，并且如果水平在预定的上下水平之间，则从罐中排出一定量的流体并将一定量的流体流向罐 。 第二方面可以包括以至少等于在开始化学品流动之前实现预定浓度和体积的化学峰值所需的水的流速至少等于流量的水流入罐中。 第三方面可以包括当化学物质再循环时将化学物质加热或冷却至预定温度的方法和装置。

    Roller that avoids substrate slippage
    10.
    发明申请
    Roller that avoids substrate slippage 审中-公开
    避免衬底滑动的滚子

    公开(公告)号：US20060189465A1

    公开(公告)日：2006-08-24

    申请号：US11413257

    申请日：2006-04-28

    申请人： Brian Brown ,  Michael Sugarman ,  Makoto Inagawa ,  Daniel Ramar ,  Alexander Lerner

    发明人： Brian Brown ,  Michael Sugarman ,  Makoto Inagawa ,  Daniel Ramar ,  Alexander Lerner

    IPC分类号： F16C13/00 ,  B25F5/02

    CPC分类号： H01L21/67057

    摘要： A roller assembly is provided. The roller assembly comprises a groove that includes two opposing surfaces. The roller assembly comprises either frictional surfaces positioned along the groove, or O-ring(s) coupled to the groove. The frictional surfaces may be a plurality of holes at spaced intervals along the opposing surfaces of the groove, a plurality of holes, each hole sized so as to extend into the two opposing surfaces, at spaced intervals along the opposing surfaces of the groove, or may be a bead-blasted surface or a knurled surface positioned along the opposing surfaces of the groove.

    摘要翻译： 提供辊组件。 辊组件包括包括两个相对表面的凹槽。 辊组件包括沿着凹槽定位的摩擦表面或联接到凹槽的O形环。 所述摩擦表面可以是沿所述槽的相对表面间隔开的多个孔，多个孔，每个孔的尺寸设计成沿所述槽的相对表面以间隔开的间隔延伸到所述两个相对的表面中，或者 可以是沿着凹槽的相对表面定位的喷砂表面或滚花表面。