摘要:
In a semiconductor device including a plurality of memory cells, a deposition preventing film is formed on an interlayer insulating film in which a plurality of holes are formed, or a seed film is selectively formed on the interlayer insulating film and on an inner surface and a bottom surface of the holes. A film of Ru, Ir or Pt is deposited by chemical vapor deposition on the deposition preventing film, or on the interlayer insulating film by utilizing the seed film, under the condition where underlayer dependency occurs. In consequence, lower electrodes are formed in accordance with a pattern of the deposition preventing film or the seed film. A dielectric film is formed on the lower electrodes and the deposition preventing film at a predetermined temperature. The material of the lower electrodes does not lose conduction even when exposed to the predetermined temperature employed for forming the dielectric film. Upper electrodes are further formed on the dielectric film. The upper and lower electrodes and an oxide dielectric film together constitute capacitors of the memory cells.
摘要:
In a semiconductor device including a plurality of memory cells, a deposition preventing film is formed on an interlayer insulating film in which a plurality of holes are formed, or a seed film is selectively formed on the interlayer insulating film and on an inner surface and a bottom surface of the holes. A film of Ru, Ir or Pt is deposited by chemical vapor deposition on the deposition preventing film, or on the interlayer insulating film by utilizing the seed film, under the condition where underlayer dependency occurs. In consequence, lower electrodes are formed in accordance with a pattern of the deposition preventing film or the seed film.
摘要:
In a semiconductor device including a plurality of memory cells, a deposition preventing film is formed on an interlayer insulating film in which a plurality of holes are formed, or a seed film is selectively formed on the interlayer insulating film and on an inner surface and a bottom surface of the holes. A film of Ru, Ir or Pt is deposited by chemical vapor deposition on the deposition preventing film, or on the interlayer insulating film by utilizing the seed film, under the condition where underlayer dependency occurs. In consequence, lower electrodes are formed in accordance with a pattern of the deposition preventing film or the seed film. A dielectric film is formed on the lower electrodes and the deposition preventing film at a predetermined temperature. The material of the lower electrodes does not lose conduction even when exposed to the predetermined temperature employed for forming the dielectric film. Upper electrodes are further formed on the dielectric film. The upper and lower electrodes and an oxide dielectric film together constitute capacitors of the memory cells.
摘要:
In a semiconductor device including a plurality of memory cells, a deposition preventing film is formed on an interlayer insulating film in which a plurality of holes are formed, or a seed film is selectively formed on the interlayer insulating film and on an inner surface and a bottom surface of the holes. A film of Ru, Ir or Pt is deposited by chemical vapor deposition on the deposition preventing film, or on the interlayer insulating film by utilizing the seed film, under the condition where underlayer dependency occurs. In consequence, lower electrodes are formed in accordance with a pattern of the deposition preventing film or the seed film. A dielectric film is formed on the lower electrodes and the deposition preventing film at a predetermined temperature. The material of the lower electrodes does not lose conduction even when exposed to the predetermined temperature employed for forming the dielectric film. Upper electrodes are further formed on the dielectric film. The upper and lower electrodes and an oxide dielectric film together constitute capacitors of the memory cells.
摘要:
Plug electrodes of silicon are formed so as to be buried in through holes in a first insulating film, the plug electrodes being electrically connected to the source and drain regions of a MISFET on the main surface of a semiconductor substrate. Then, a second insulating film is deposited thereon and holes are formed therein such that the plug electrodes of silicon are exposed. A barrier film is formed on the surfaces of the silicon plugs, and in the holes a dielectric is formed to form lower electrodes of the capacitor elements and an upper electrode therefor.
摘要:
A probiotic lactobacillus was discovered from lactobacilli of the Lactobacillus genus independently isolated from human adult feces. The probiotic lactobacillus was selected from other bacterial strains for: (1) being highly resistant to gastric acid/bile acid; (2) having a high promoting activity on IL-12 production from mouse derived spleen cells and a high Th1/Th2 balance-improving effect; (3) having a high ability to inhibit the production of antigen-specific IgE induced by intraperitoneally administering ovalbumin to BALB/c mice; (4) having a high ability to inhibit the production of antigen-specific IgE induced by orally administering a food antigen to C57BL/6N mice; (5) having a high Natural Killer cell-activating ability; (6) having a high IL-12 production-promoting activity on spleen cells and mesenteric lymph node cells derived from mice immunized with ovalbumin and a high Th1/Th2 balance-improving effect; and (7) having a high ability to suppress eosinophilia induced by a cedar pollen-extracted antigen. This discovery led to the completion of the present invention.
摘要:
The determination of deterioration of a NOx storage reduction catalyst (4) is carried out more accurately. When a reducing agent is supplied from a supply device (5) to the NOx catalyst (4), a first supply of the reducing agent and a second supply of the reducing agent are carried out in a sequential manner by adjusting an amount of the reducing agent in such a manner that an air fuel ratio of the exhaust gas becomes a predetermined rich air fuel ratio, and a determination whether or not the NOx catalyst (4) has deteriorated is made based on a detected value of a detection device (8), which detects NH3 in the exhaust gas at the downstream side of the NOx catalyst (4), after a predetermined period of time has elapsed from the start of the first supply of the reducing agent, and after the start of the second supply of the reducing agent.
摘要:
According to a method of generating a key of the present invention, a first device and a second device are first brought into contact with one vibrator. In this state, the vibrator generates vibration. A first acceleration sensor provided in the first device and a second acceleration sensor provided in the second device detect the vibration. Subsequently, the first device notifies the second device of a first feature value based upon the detection result of the first acceleration sensor. The second device notifies the first device of a second feature value based upon the detection result of the second acceleration sensor. Then the first device compares the notified second feature value with the first feature value and generates a key based upon the comparison result. The second device compares the notified first feature value with the second feature value and generates a key based upon the comparison result.
摘要:
Provided are a piezoelectric thin film having good piezoelectricity in which a rhombohedral structure and a tetragonal structure are mixed, and a piezoelectric element using the piezoelectric thin film. The piezoelectric thin film includes a perovskite type metal oxide, in which the perovskite type metal oxide is a mixed crystal system of at least a rhombohedral structure and a tetragonal structure, and a ratio between an a-axis lattice parameter and a c-axis lattice parameter of the tetragonal structure satisfies 1.15≦c/a≦1.30. The piezoelectric element includes on a substrate: the above-mentioned piezoelectric thin film; and a pair of electrodes provided in contact with the piezoelectric thin film.
摘要翻译:提供一种压电薄膜,其具有混合菱方结构和四边形结构的压电性,以及使用压电薄膜的压电元件。 压电薄膜包括钙钛矿型金属氧化物,其中钙钛矿型金属氧化物是至少具有菱方结构和四方结构的混晶系统,a轴晶格参数与c轴晶格之比 四方结构的参数满足1.15≦̸ c / a≦̸ 1.30。 压电元件包括在基底上:上述压电薄膜; 以及设置成与压电薄膜接触的一对电极。
摘要:
The present inventors discovered that microfiltration retentates of whey, and products obtained by treating whey using centrifugation and/or ammonium sulfate precipitation, have the activity of inhibiting rotavirus infection.