Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same
    9.
    发明授权
    Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same 有权
    含氟化合物,含氟聚合物,负型抗蚀剂组合物和使用它们的图案化工艺

    公开(公告)号:US08513457B2

    公开(公告)日:2013-08-20

    申请号:US13474187

    申请日:2012-05-17

    IPC分类号: C07C59/58

    摘要: A fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.

    摘要翻译: 由式(1)表示的含氟不饱和羧酸,其中R 1表示可聚合双键的基团,R 3表示氟原子或含氟烷基,W表示二价连接基团。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物,并且含有式(2)所示的重复单元,其中R 3和W如上定义,各自为R 4,R 5和R 6 独立地表示氢原子,氟原子或一价有机基团,R4,R5和R6中的至少两个可以组合形成环。 该高分子化合物可以提供对KrF或ArF准分子激光透明的化学放大抗蚀剂组合物,并且具有高分辨率,并且能够形成具有无膨胀的矩形截面的图案。

    Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same
    10.
    发明授权
    Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same 有权
    含氟化合物,含氟聚合物,负型抗蚀剂组合物和使用它们的图案化工艺

    公开(公告)号:US08187787B2

    公开(公告)日:2012-05-29

    申请号:US12146889

    申请日:2008-06-26

    IPC分类号: G03C1/00 C08F16/24

    摘要: Disclosed is a fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.

    摘要翻译: 公开了式(1)表示的含氟不饱和羧酸,其中R1表示可聚合双键的基团,R3表示氟原子或含氟烷基,W表示二价连接基团。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物,并且含有式(2)所示的重复单元,其中R 3和W如上定义,各自为R 4,R 5和R 6 独立地表示氢原子,氟原子或一价有机基团,R4,R5和R6中的至少两个可以组合形成环。 该高分子化合物可以提供对KrF或ArF准分子激光透明的化学放大抗蚀剂组合物,并且具有高分辨率,并且能够形成具有无膨胀的矩形截面的图案。