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公开(公告)号：US5080796A
公开(公告)日：1992-01-14
申请号：US478624
申请日：1990-02-12
CPC分类号： A61M1/369 , A61M1/3472 , A61M1/3482 , B01D61/18 , B01D2313/22 , B01D2313/38 , Y10S210/905 , Y10S210/908
摘要： A method for more selectively removing macromolecules from a plasma solution, whereby plasma containing the macromolecules to be removed is provided and heated to a temperature near or above normal body temperature but below the boiling point of the plasma solution. The heated plasma solution is filtered while at a temperature near or above normal body temperature but below its boiling point with a membrane filter to remove selectively macromolecules from the plasma solution. An apparatus for accomplishing the foregoing is also provided.
摘要翻译： 一种用于从血浆溶液中更有选择地除去大分子的方法，由此提供含有要除去的大分子的等离子体并将其加热至接近或高于正常体温但低于等离子体溶液的沸点的温度。 加热的等离子体溶液在温度接近或高于正常体温但低于其沸点的同时用膜过滤器过滤以从血浆溶液中选择性地除去大分子。 还提供了一种用于实现前述的装置。
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公开(公告)号：US4966709A
公开(公告)日：1990-10-30
申请号：US220919
申请日：1988-07-18
CPC分类号： A61M1/369 , A61M1/3472 , A61M1/3482 , B01D61/14 , B01D2313/22 , Y10S210/905 , Y10S210/908
摘要： A method for more selectively removing macromolecules from a plasma solution, whereby plasma containing the macromolecules to be removed is provided and heated to a temperature near or above normal body temperature but below the boiling point of the plasma solution. The heated plasma solution is filtered while at a temperature near or above normal body temperature but below its boiling point with a membrane filter to remove selectively macromolecules from the plasma solution. An apparatus for accomplishing the foregoing is also provided.
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3.发明授权Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method 有权基板输送装置及基板输送方法，曝光装置及曝光方法，装置的制造方法公开(公告)号：US09110381B2
公开(公告)日：2015-08-18
申请号：US13067845
申请日：2011-06-29
申请人： Atsushi Ohta , Takashi Horiuchi
发明人： Atsushi Ohta , Takashi Horiuchi
CPC分类号： G03F7/70341 , G03B27/42 , G03D3/00 , G03F7/2041 , G03F7/7075
摘要： A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed. A device manufacturing method includes projecting, using a projection system of a lithographic apparatus, a patterned beam of radiation through a liquid onto a substrate, the substrate being held by a substrate table, and, after the projecting is complete, detecting residual liquid on the substrate and/or the substrate table.
摘要翻译： 光刻投影装置包括：被配置为保持基板的基板台;布置成将图案化的辐射束投射到基板上的投影系统;配置成将液体供应到投影系统和基板之间的空间的液体供应系统;以及 剩余液体检测器被配置为在曝光完成之后检测残留在基板和/或基板台上的液体。 一种器件制造方法包括使用光刻设备的投影系统将图案化的辐射束通过液体投影到衬底上，衬底由衬底台保持，并且在突出完成之后，检测残留液体 衬底和/或衬底台。
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4.发明授权Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table after exposure 有权浸渍曝光装置和方法，其在曝光后检测由基板台保持的基板上的残留液体公开(公告)号：US08767168B2
公开(公告)日：2014-07-01
申请号：US13067842
申请日：2011-06-29
申请人： Hiroaki Takaiwa , Takashi Horiuchi
发明人： Hiroaki Takaiwa , Takashi Horiuchi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/7085 , G03F7/70916
摘要： A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed.
摘要翻译： 光刻投影装置包括：被配置为保持基板的基板台;布置成将图案化的辐射束投射到基板上的投影系统;配置成将液体供应到投影系统和基板之间的空间的液体供应系统，以及 剩余液体检测器被配置为在曝光完成之后检测残留在基板和/或基板台上的液体。
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5.发明授权Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method 有权基板输送装置及基板输送方法，曝光装置及曝光方法，装置的制造方法公开(公告)号：US08107055B2
公开(公告)日：2012-01-31
申请号：US11889288
申请日：2007-08-10
申请人： Atsushi Ohta , Takashi Horiuchi
发明人： Atsushi Ohta , Takashi Horiuchi
IPC分类号： G03B27/32
CPC分类号： G03F7/70341 , G03B27/42 , G03D3/00 , G03F7/2041 , G03F7/7075
摘要： A method of pattern forming includes forming a resist film on a substrate, transferring a pattern onto the resist film by an immersion lithography method using a liquid immersion fluid to form a latent image on the resist film, conducting a first inspection to inspect whether or not the liquid immersion fluid remains on the resist film after said forming the latent image, developing the resist film after the first inspection, and performing predetermined processing when residual of the liquid immersion fluid is found in the first inspection.
摘要翻译： 图案形成的方法包括在基板上形成抗蚀剂膜，通过浸渍式光刻法使用液浸液将抗蚀剂图案转印到抗蚀膜上，在抗蚀剂膜上形成潜像，进行第一次检查，检查是否 在形成潜像之后，液浸液体保留在抗蚀剂膜上，在第一次检查之后显影抗蚀剂膜，并且在第一次检查中发现残留的液浸液体时进行预定处理。
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6.发明授权Immersion exposure apparatus and device manufacturing method with liquid detection apparatus 有权浸液曝光装置及液体检测装置的装置制造方法公开(公告)号：US07990516B2
公开(公告)日：2011-08-02
申请号：US10587268
申请日：2005-01-28
申请人： Hiroaki Takaiwa , Takashi Horiuchi
发明人： Hiroaki Takaiwa , Takashi Horiuchi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/7085 , G03F7/70916
摘要： An exposure apparatus for exposing a substrate by emitting exposure light thereto through a projection optical system and liquid, has a detection apparatus that detects whether the liquid is present on an object disposed lower than a front end of the projection optical system. Another detection apparatus has an emitting portion that emits detection light to an immersion area between the projection optical system and an object disposed on an image plane side thereof, and a light-receiving portion disposed at a predetermined position for the detection light; therein, at least one of size and shape of the immersion area is obtained based on light receiving results. The detection apparatus is used to detect the presence of liquid on such lower-disposed object, the state of the immersion area, or shape or contact angle of the liquid. Optimal measures are taken, based on detection results, for maintaining high exposure and measurement accuracies.
摘要翻译： 一种用于通过投影光学系统和液体向其发射曝光的曝光基板的曝光装置，具有检测装置，其检测液体是否存在于投影光学系统的前端下方的物体上。 另一种检测装置具有发射部分，其向投影光学系统和设置在其图像平面侧的物体之间的浸没区域发射检测光;以及光接收部分，设置在用于检测光的预定位置; 其中，基于光接收结果获得浸渍区域的尺寸和形状中的至少一个。 该检测装置用于检测这种下位物体上的液体的存在，浸渍区域的状态，或液体的形状或接触角。 基于检测结果，采取最佳措施，保持高曝光和测量精度。
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7.发明申请Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method 有权基板输送装置及方法，曝光装置及曝光方法以及装置的制造方法公开(公告)号：US20110122393A1
公开(公告)日：2011-05-26
申请号：US12929591
申请日：2011-02-02
申请人： Nobuyoshi Tanno , Takashi Horiuchi
发明人： Nobuyoshi Tanno , Takashi Horiuchi
IPC分类号： G03B27/32
CPC分类号： G03F7/70341 , G03F7/7075 , G03F7/70925 , H01L21/67051 , H01L21/68707
摘要： A method for exposing a substrate includes holding the substrate on a substrate holding member, irradiating, via a liquid, a light beam to the substrate on the substrate holding member, and removing, after the exposure of the substrate via the liquid, a liquid remained on the substrate before supporting the substrate by a transferring member. The transferring member transfers the exposed substrate from the substrate holding member to outside of the substrate holding member.
摘要翻译： 曝光基板的方法包括将基板保持在基板保持部件上，经由液体将光束照射在基板保持部件上的基板上，在基板经由液体曝光后，除去液体残留 在通过转印构件支撑衬底之前在衬底上。 转印构件将暴露的基板从基板保持构件转移到基板保持构件的外部。
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公开(公告)号：US07673012B2
公开(公告)日：2010-03-02
申请号：US10375197
申请日：2003-02-28
IPC分类号： G06F15/16 , G06F15/177
CPC分类号： H04L29/06 , H04L67/1097 , H04L69/329
摘要： A system renting out file servers to many companies in a data center has a security problem so that the user cannot perform operation needing manager authorization in the file servers. An OS provides execution administrative area information of an application program designated by process information which can specify the range of an accessible device to operate the server system of the customer in the administrative area information.
摘要翻译： 向数据中心的许多公司出租文件服务器的系统存在安全问题，因此用户无法在文件服务器中执行需要管理员授权的操作。 OS提供由处理信息指定的应用程序的执行管理区域信息，该处理信息可以指定在管理区域信息中操作客户的服务器系统的可访问设备的范围。
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公开(公告)号：US07558024B2
公开(公告)日：2009-07-07
申请号：US11332745
申请日：2006-01-13
申请人： Hajime Tada , Masao Hanya , Takashi Horiuchi , Noriyuki Saito
发明人： Hajime Tada , Masao Hanya , Takashi Horiuchi , Noriyuki Saito
IPC分类号： G11B5/54
CPC分类号： G11B5/54
摘要： A load/unload-type head suspension is capable of suppressing frictional coefficient variations. The head suspension has a head and a tab that is slid and guided along a ramp block in a read/write apparatus, to move the head away from a hard disk to a retract position. The tab is provided with microscopic irregularities to suppress frictional coefficient variations when the tab is guided along the ramp block. A center line average roughness (Ra) of the microscopic irregularities being greater than 0.2 μm or smaller than 0.6 μm.
摘要翻译： 负载/卸载型头悬挂能够抑制摩擦系数变化。 头悬挂具有头部和突出部，其沿着读/写装置中的斜坡块滑动和引导，以将头部从硬盘移动到缩回位置。 突片具有微小的不规则性，以当拉片沿着斜坡块被引导时抑制摩擦系数变化。 微观凹凸的中心线平均粗糙度（Ra）大于0.2μm或小于0.6μm。
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公开(公告)号：US20090091858A1
公开(公告)日：2009-04-09
申请号：US12286074
申请日：2008-09-26
申请人： Akira Nojima , Takashi Horiuchi
发明人： Akira Nojima , Takashi Horiuchi
CPC分类号： G11B5/4833 , G11B5/4826 , Y10T29/49032
摘要： A method of manufacturing a load beam precisely positions a slider on a dimple of a load beam according to precisely obtained positional data of the dimple, the method includes preparing a work which is a flat plate and serves as the load beam, irradiating at least a part of the work where the dimple is formed with a laser beam, to form a modified part at the irradiated part, carrying out plastic working on the modified part, to form the dimple having a concave curved surface at the modified part, taking an image of the concave curved surface of the dimple, obtaining the positional data of the dimple from the image, and positioning the slider on the dimple according to the positional data.
摘要翻译： 制造负载光束的方法根据精确获得的凹坑的位置数据将滑块精确地定位在负载光束的凹坑上，该方法包括准备作为平板的作为负载光束的工件，至少照射 通过激光束形成凹坑的工作的一部分，在被照射部分形成修改部分，对修改部分进行塑性加工，形成在修改部分具有凹曲面的凹坑，拍摄图像 从该图像获得凹坑的位置数据，并根据位置数据将滑块定位在凹坑上。
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