公开(公告)号：US08846534B1

公开(公告)日：2014-09-30

申请号：US13269453

申请日：2011-10-07

申请人： Yunfei Li ,  Ge Yi ,  Dujiang Wan ,  Guanghong Luo ,  Lijie Zhao ,  Yanfeng Chen ,  Lily Yao ,  Ming Jiang

发明人： Yunfei Li ,  Ge Yi ,  Dujiang Wan ,  Guanghong Luo ,  Lijie Zhao ,  Yanfeng Chen ,  Lily Yao ,  Ming Jiang

IPC分类号： H01L21/302

CPC分类号： G11B5/3163

摘要： Embodiments of the present invention relate to reducing the size variation on a wafer fabrication. In some embodiments, at least a portion the backfill material over features larger than a threshold size is etched or milled to provide backfill protrusions over those features. The backfill protrusions are configured to reduce the size variation across the fabrication. Embodiments of the invention may be used in fabrication of many types of devices, such as tapered wave guides (TWG), near-field transducers (NFT), MEMS devices, EAMR optical devices, optical structures, bio-optical devices, micro-fluidic devices, and magnetic writers.

摘要翻译： 本发明的实施例涉及减小晶片制造的尺寸变化。 在一些实施例中，至少一部分覆盖材料超过阈值尺寸的特征被蚀刻或研磨以在这些特征上提供回填突起。 回填突起构造成减小制造过程中的尺寸变化。 本发明的实施例可用于制造诸如锥形波导（TWG），近场换能器（NFT），MEMS装置，EAMR光学装置，光学结构，生物光学装置，微流体 设备和磁性作者。

公开(公告)号：US08191237B1

公开(公告)日：2012-06-05

申请号：US12470385

申请日：2009-05-21

申请人： Guanghong Luo ,  Ge Yi ,  Dujiang Wan ,  Lei Wang ,  Xiaohai Xiang ,  Ming Jiang

发明人： Guanghong Luo ,  Ge Yi ,  Dujiang Wan ,  Lei Wang ,  Xiaohai Xiang ,  Ming Jiang

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A method for providing a structure in a magnetic transducer is described. The method includes performing a first planarization that exposes a top surface of the magnetic transducer. This first planarization also terminates before a portion of a first planarization buffer layer is removed. The method also includes providing a second planarization buffer layer after the first planarization is performed. The second planarization buffer layer is above the first planarization buffer layer. The method also includes performing a second planarization. This second planarization does not completely remove the second planarization buffer layer. The method also includes performing a third planarization terminating after the first planarization buffer layer is exposed and before the first planarization buffer layer is completely removed.

摘要翻译： 描述了一种用于在磁换能器中提供结构的方法。 该方法包括执行暴露磁换能器的顶表面的第一平面化。 该第一平面化还在第一平坦化缓冲层的一部分被去除之前终止。 该方法还包括在执行第一平面化之后提供第二平坦化缓冲层。 第二平坦化缓冲层在第一平坦化缓冲层之上。 该方法还包括执行第二平面化。 该第二平面化不能完全去除第二平坦化缓冲层。 该方法还包括在第一平坦化缓冲层暴露之后并且在第一平坦化缓冲层被完全去除之前执行终止的第三平坦化。

公开(公告)号：US08413317B1

公开(公告)日：2013-04-09

申请号：US12945681

申请日：2010-11-12

申请人： Dujiang Wan ,  Hai Sun ,  Ge Yi ,  Wei Gao ,  Hong Zhang ,  Guanghong Luo ,  Yunjun Tang ,  Tiffany Yun Wen Jiang ,  Zhigang Zhou ,  Wencheng Su

发明人： Dujiang Wan ,  Hai Sun ,  Ge Yi ,  Wei Gao ,  Hong Zhang ,  Guanghong Luo ,  Yunjun Tang ,  Tiffany Yun Wen Jiang ,  Zhigang Zhou ,  Wencheng Su

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3163 ,  G11B2005/0021 ,  Y10T29/49039 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A method and system for fabricating a microelectric device are described. A write pole of an energy assisted magnetic recording head or a capacitor might be fabricated. The method includes depositing a resist film and curing the resist film at a temperature of at least 180 degrees centigrade. A cured resist film capable of supporting a line having an aspect ratio of at least ten is thus provided. A portion of the cured resist film is removed. A remaining portion of the resist film forms the line. An insulating or nonmagnetic layer is deposited after formation of the line. The line is removed to provide a trench in the insulating or nonmagnetic layer. The trench has a height and a width. The height divided by the width corresponds to the aspect ratio. At least part of the structure is provided in the trench.

摘要翻译： 描述了一种用于制造微电子器件的方法和系统。 可以制造能量辅助磁记录头或电容器的写极。 该方法包括在至少180摄氏度的温度下沉积抗蚀剂膜并固化抗蚀剂膜。 因此提供了能够支撑纵横比至少为10的线的固化的抗蚀剂膜。 去除一部分固化的抗蚀剂膜。 抗蚀剂膜的剩余部分形成线。 在形成线之后沉积绝缘或非磁性层。 去除线以在绝缘或非磁性层中提供沟槽。 沟槽具有高度和宽度。 高度除以宽度对应于纵横比。 该结构的至少一部分设置在沟槽中。

公开(公告)号：US08404128B1

公开(公告)日：2013-03-26

申请号：US12391095

申请日：2009-02-23

申请人： Hong Zhang ,  Ge Yi ,  Lei Wang ,  Dujiang Wan ,  Guanghong Luo ,  Xiaohai Xiang

发明人： Hong Zhang ,  Ge Yi ,  Lei Wang ,  Dujiang Wan ,  Guanghong Luo ,  Xiaohai Xiang

IPC分类号： G11B5/127

CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163 ,  Y10T29/4902 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A method and system for providing a magnetic recording transducer having a pole are disclosed. The pole has side(s), a bottom, and a top wider than the bottom. The method and system include providing at least one side gap layer that covers the side(s) and the top of the pole. At least one sacrificial layer is provided on the side gap layer(s). The sacrificial layer(s) are wet etchable and cover the side gap layer(s). The magnetic recording transducer is planarized after the sacrificial layer(s) are provided. Thus, a portion of the side gap and sacrificial layer(s) is removed. A remaining portion of the sacrificial layer(s) is thus left. The method and system also include wet etching the sacrificial layer(s) to remove the remaining portion of the sacrificial layer(s). A wrap around shield is provided after the remaining portion of the sacrificial layer(s) is removed.

摘要翻译： 公开了一种用于提供具有极点的磁记录换能器的方法和系统。 电极具有侧面，底部和顶部比底部更宽。 该方法和系统包括提供覆盖极的侧面和顶部的至少一个侧面间隙层。 在侧间隙层上提供至少一个牺牲层。 牺牲层是可湿蚀刻的并且覆盖侧间隙层。 在提供牺牲层之后，磁记录传感器被平坦化。 因此，侧面间隙和牺牲层的一部分被去除。 因此留下牺牲层的剩余部分。 该方法和系统还包括湿蚀刻牺牲层以去除牺牲层的剩余部分。 在除去牺牲层的剩余部分之后提供环绕护罩。

公开(公告)号：US08506828B1

公开(公告)日：2013-08-13

申请号：US13171242

申请日：2011-06-28

申请人： Masahiro Osugi ,  Guanghong Luo ,  Ronghui Zhou ,  Danning Yang ,  Dujiang Wan ,  Ming Jiang

发明人： Masahiro Osugi ,  Guanghong Luo ,  Ronghui Zhou ,  Danning Yang ,  Dujiang Wan ,  Ming Jiang

IPC分类号： B44C1/22

CPC分类号： G11B5/3932 ,  G11B5/3163 ,  G11B5/3909 ,  Y10T29/49043

摘要： A method and system for fabricating a read sensor on a substrate for a read transducer is described. A read sensor stack is deposited on the substrate. A mask is provided on the on the read sensor stack. The mask has a pattern that covers a first portion of the read sensor stack corresponding to the read sensor, covers a second portion of the read sensor stack distal from the read sensor, and exposes a third portion of the read sensor stack between the first and second portions. The read sensor is defined from the read sensor stack. A hard bias layer is deposited. An aperture free mask layer including multiple thicknesses is provided. A focused ion beam scan (FIBS) polishing step is performed on the mask and hard bias layers to remove a portion of the mask and hard bias layers based on the thicknesses.

摘要翻译： 描述了用于在读取换能器的基板上制造读取传感器的方法和系统。 读取传感器堆叠沉积在衬底上。 在读取传感器堆叠上提供掩模。 掩模具有覆盖对应于读取传感器的读取传感器堆叠的第一部分的图案，其覆盖远离读取传感器的读取传感器堆叠的第二部分，并将读取传感器堆叠的第三部分暴露在第一和第 第二部分。 读取传感器由读取传感器堆栈定义。 沉积硬偏压层。 提供包括多个厚度的无孔掩模层。 在掩模和硬偏压层上执行聚焦离子束扫描（FIBS）抛光步骤，以基于厚度去除掩模和硬偏压层的一部分。

公开(公告)号：US08375564B1

公开(公告)日：2013-02-19

申请号：US12633562

申请日：2009-12-08

申请人： Guanghong Luo ,  Danning Yang ,  Weimin Si ,  Dujiang Wan ,  Yun-Fei Li ,  Lijie Guan ,  Ming Jiang

发明人： Guanghong Luo ,  Danning Yang ,  Weimin Si ,  Dujiang Wan ,  Yun-Fei Li ,  Lijie Guan ,  Ming Jiang

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/1278 ,  G11B5/3116 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A method provides a pole of magnetic recording transducer. A nonmagnetic stop layer having a thickness and a top surface is provided. A depression that forms a bevel is provided in the stop layer. The bevel has a depth less than the thickness and a bevel angle with respect to a remaining portion of the top surface. The bevel angle is greater than zero and less than ninety degrees. An intermediate layer having a substantially flat top surface is provided over the stop layer. A trench is formed in the intermediate layer via a removal process. The trench has a profile corresponding to the pole. The stop layer is a stop for the removal process. The method also includes providing the pole in the trench. The pole has a leading edge bevel corresponding to the bevel in the stop layer.

摘要翻译： 一种方法提供磁记录传感器的极点。 提供具有厚度和顶表面的非磁性停止层。 形成斜面的凹陷设置在停止层中。 该斜面具有小于该厚度的深度和相对于顶部表面的剩余部分的斜角。 斜角大于零，小于九十度。 具有基本上平坦的顶表面的中间层设置在停止层上。 通过去除工艺在中间层中形成沟槽。 沟槽具有对应于极点的轮廓。 停止层是移除过程的停止点。 该方法还包括在沟槽中设置极点。 极具有对应于停止层中的斜面的前缘斜面。

公开(公告)号：US08480911B1

公开(公告)日：2013-07-09

申请号：US13173846

申请日：2011-06-30

申请人： Masahiro Osugi ,  Guanghong Luo ,  Lily Yao ,  Ming Jiang

发明人： Masahiro Osugi ,  Guanghong Luo ,  Lily Yao ,  Ming Jiang

IPC分类号： B44C1/22

CPC分类号： G11B5/398 ,  G01R33/0052 ,  G01R33/093 ,  G11B5/3163 ,  G11B5/3169 ,  G11B5/3932

摘要： A read sensor for a read transducer is fabricated. The read transducer has field and device regions. A read sensor stack is deposited. A mask covering part of the stack corresponding to the read sensor is provided. The read sensor having inboard and outboard junction angles is defined from the stack in a track width direction. A critical junction (CJ) focused ion beam scan (FIBS) polishing that removes part of the read sensor based on the junction angles is performed. A hard bias structure is deposited and the transducer planarized. A remaining portion of the mask is removed. A stripe height mask covering part of the read sensor and hard bias structure in a stripe height direction is provided. The read sensor stripe height is defined. A tunneling magnetoresistance (TMR) FIBS polishing that removes part of the stack in the field region is performed. An insulating layer is provided.

摘要翻译： 制造用于读取换能器的读取传感器。 读取传感器具有现场和设备区域。 读取传感器堆栈。 提供覆盖对应于读取传感器的堆叠部分的掩模。 具有内侧和外侧接合角的读取传感器从堆叠沿轨道宽度方向限定。 执行基于结合角去除部分读取传感器的临界结（CJ）聚焦离子束扫描（FIBS）抛光。 沉积硬偏压结构，并将传感器平坦化。 去除掩模的剩余部分。 提供覆盖读取传感器的一部分并且条带高度方向上的硬偏置结构的条纹高度掩模。 读取传感器条纹高度被定义。 执行去除场区域中的一部分堆叠的隧道磁阻（TMR）FIBS抛光。 提供绝缘层。

公开(公告)号：US08790527B1

公开(公告)日：2014-07-29

申请号：US13069023

申请日：2011-03-22

申请人： Guanghong Luo ,  Ming Jiang ,  Danning Yang ,  Yunfei Li

发明人： Guanghong Luo ,  Ming Jiang ,  Danning Yang ,  Yunfei Li

IPC分类号： H01L21/302 ,  H01L21/461 ,  B29D11/00 ,  C03C15/00 ,  C03C25/68

CPC分类号： B29D11/00663

摘要： A method for providing waveguide structures for an energy assisted magnetic recording (EAMR) transducer is described. The waveguide structures have a plurality of widths. At least one waveguide layer is provided. Mask structure(s) corresponding to the waveguide structures and having a pattern are provided on the waveguide layer(s). The mask structure(s) include a planarization stop layer, a planarization assist layer on the planarization stop layer, and a hard mask layer on the planarization assist layer. The planarization assist layer has a low density. The pattern of the mask structure(s) is transferred to the waveguide layer(s). Optical material(s) that cover the waveguide layer(s) and a remaining portion of the mask structure(s) are provided. The optical material(s) have a density that is at least twice the low density of the planarization assist layer. The method also includes performing a planarization configured to remove at least a portion of the optical material(s).

摘要翻译： 描述了一种用于提供能量辅助磁记录（EAMR）换能器的波导结构的方法。 波导结构具有多个宽度。 提供至少一个波导层。 对应于波导结构并具有图案的掩模结构设置在波导层上。 掩模结构包括平坦化停止层，平坦化停止层上的平坦化辅助层和平坦化辅助层上的硬掩模层。 平坦化助剂层具有低密度。 掩模结构的图案被传送到波导层。 提供了覆盖波导层和掩模结构的剩余部分的光学材料。 光学材料的密度至少是平坦化辅助层的低密度的两倍。 该方法还包括执行被配置为去除至少一部分光学材料的平坦化。

公开(公告)号：US08790524B1

公开(公告)日：2014-07-29

申请号：US12880484

申请日：2010-09-13

申请人： Guanghong Luo ,  Danning Yang ,  Ming Jiang

发明人： Guanghong Luo ,  Danning Yang ,  Ming Jiang

IPC分类号： G11B5/127 ,  G11B5/31 ,  G11B5/11

CPC分类号： G11B5/3116 ,  G11B5/112 ,  G11B5/3163 ,  G11B5/3903 ,  G11B5/3932

摘要： A method and system for fabricating a magnetic transducer is described. The transducer has device and field regions, and a magnetoresistive stack. Hard mask layer and wet-etchable layers are provided on the magnetoresistive stack and hard mask layer, respectively. A hard mask and a wet-etchable mask are formed from the hard mask and the wet-etchable layers, respectively. The hard and wet-etchable masks each includes a sensor portion and a line frame. The sensor portion covers part of the magnetoresistive stack corresponding to a magnetoresistive structure. The line frame covers a part of the magnetoresistive stack in the device region. The magnetoresistive structure is defined in a track width direction. Hard bias material(s) are then provided. Part of the hard bias material(s) is adjacent to the magnetoresistive structure in the track width direction. The wet-etchable sensor portion and line frame, and hard bias material(s) thereon, are removed.

摘要翻译： 描述了用于制造磁换能器的方法和系统。 传感器具有器件和场区域以及磁阻堆叠。 硬掩模层和湿蚀刻层分别设置在磁阻堆叠和硬掩模层上。 分别由硬掩模和湿蚀刻层形成硬掩模和湿蚀刻掩模。 硬和湿可蚀刻掩模各自包括传感器部分和线框架。 传感器部分覆盖对应于磁阻结构的磁阻堆叠的一部分。 线框架覆盖设备区域中的磁阻堆叠的一部分。 磁阻结构被定义在磁道宽度方向上。 然后提供硬偏置材料。 硬偏置材料的一部分在磁道宽度方向上与磁阻结构相邻。 湿式可蚀刻传感器部分和线框架以及其上的硬偏移材料被去除。

公开(公告)号：US08578594B2

公开(公告)日：2013-11-12

申请号：US13154191

申请日：2011-06-06

申请人： Ming Jiang ,  Ronghui Zhou ,  Guanghong Luo ,  Masahiro Osugi ,  Danning Yang

发明人： Ming Jiang ,  Ronghui Zhou ,  Guanghong Luo ,  Masahiro Osugi ,  Danning Yang

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163

摘要： A process for fabricating a magnetic recording transducer for use in a data storage system comprises providing a substrate, an underlayer and a first nonmagnetic intermediate layer deposited to a first thickness on and in contact with the underlayer, performing a first scanning polishing on a first section of the first intermediate layer to planarize the first section of the first intermediate layer to a second thickness, providing a main pole in the planarized first section of the first intermediate layer, providing a first pattern of photoresist on and in contact with the first section of the first intermediate layer, the pattern comprising an aperture to define a side shield trench, performing a wet etch to remove at least a portion of the first intermediate layer thereby exposing at least one of the plurality of main pole sides, and depositing side shield material in the side shield trench.

摘要翻译： 一种用于制造用于数据存储系统的磁记录传感器的方法包括提供在底层上沉积到第一厚度并与底层接触的基底，底层和第一非磁性中间层，在第一部分上进行第一扫描抛光 将所述第一中间层的第一部分平坦化为第二厚度，在所述第一中间层的平坦化的第一部分中提供主极，在所述第一中间层的所述第一部分的第一部分上提供第一图案， 第一中间层，图案包括用于限定侧屏蔽沟槽的孔，执行湿蚀刻以去除第一中间层的至少一部分，从而暴露多个主极侧中的至少一个，以及沉积侧屏蔽材料 在侧盾沟。