公开(公告)号：US20060099746A1

公开(公告)日：2006-05-11

申请号：US10984792

申请日：2004-11-10

申请人： Yung Fu Wu ,  Chin Chen ,  Chen Chen

发明人： Yung Fu Wu ,  Chin Chen ,  Chen Chen

IPC分类号： H01L21/84

CPC分类号： H01L27/12 ,  H01L27/1248 ,  H01L27/1288

摘要： The present invention discloses a method of mask reduction of low-temperature polysilicon thin film transistor array by use of photo-sensitive low-K dielectric, which comprises the steps of: defining a polysilicon-island on a preprocessed glass substrate; forming a gate oxide layer and a first metal layer in sequence; patterning the first metal layer to define a gate; forming a photosensitive dielectric layer; patterning the photosensitive dielectric layer and the gate oxide layer to form a plurality of contact holes; forming a transmissive pixel layer and patterning the same; and forming a reflective pixel electrode layer and patterning the same.

摘要翻译： 本发明公开了一种通过使用光敏低K电介质来降低低温多晶硅薄膜晶体管阵列的方法，该方法包括以下步骤：在预处理的玻璃基板上限定多晶硅岛; 依次形成栅氧化层和第一金属层; 图案化第一金属层以限定栅极; 形成光敏介电层; 图案化光敏电介质层和栅极氧化物层以形成多个接触孔; 形成透射像素层并对其进行图案化; 并形成反射像素电极层并对其进行图案化。

公开(公告)号：US07566598B2

公开(公告)日：2009-07-28

申请号：US10984792

申请日：2004-11-10

申请人： Yung Fu Wu ,  Chin Chiang Chen ,  Chen Ming Chen

发明人： Yung Fu Wu ,  Chin Chiang Chen ,  Chen Ming Chen

IPC分类号： H01L21/00

CPC分类号： H01L27/12 ,  H01L27/1248 ,  H01L27/1288

摘要： The present invention discloses a method of mask reduction for producing a low-temperature polysilicon thin film transistor array by use of a photo-sensitive low-K dielectric, which comprises the steps of: defining a polysilicon-island on a preprocessed glass substrate; forming a gate oxide layer and a first metal layer in sequence; patterning the first metal layer to define a gate; forming a photosensitive dielectric layer; patterning the photosensitive dielectric layer and the gate oxide layer to form a plurality of contact holes, wherein said photo-sensitive low-K dielectric masks said gate oxide layer during said patterning of said gate oxide layer; forming a transmissive pixel layer and patterning the same; and forming a reflective pixel electrode layer and patterning the same.

摘要翻译： 本发明公开了一种通过使用光敏低K电介质制造低温多晶硅薄膜晶体管阵列的掩膜还原方法，其特征在于包括以下步骤：在预处理的玻璃基板上限定多晶硅岛; 依次形成栅氧化层和第一金属层; 图案化第一金属层以限定栅极; 形成光敏介电层; 图案化光敏电介质层和栅极氧化层以形成多个接触孔，其中所述光敏低K电介质在所述栅极氧化物层的图案化期间掩蔽所述栅极氧化物层; 形成透射像素层并对其进行图案化; 并形成反射像素电极层并对其进行图案化。

公开(公告)号：US07301531B2

公开(公告)日：2007-11-27

申请号：US10814147

申请日：2004-04-01

申请人： Yung Fu Wu

发明人： Yung Fu Wu

IPC分类号： G09G5/08

CPC分类号： G06F3/0317 ,  H05K1/0274 ,  H05K1/18 ,  H05K2201/09072 ,  H05K2201/10106 ,  H05K2201/10121 ,  H05K2201/10462

摘要： An optical mouse has a housing, a printed circuit board, a light source unit, a photodetector unit, a light-guiding unit and a lens unit. The light source unit has different colors of image light sources and is disposed on the printed circuit board. The light-guiding unit is arranged in the housing and adjacent to the light source unit for guiding a non-complementary color light relative to a reflection surface from one of the image light sources to the reflection surface. The lens unit is arranged in the housing and positioned below the photodetector unit for converging a reflected light reflected by the reflection surface into the photodetector unit. Furthermore, the optical mouse can be operated on various colors of reflection surfaces, and still retains better sensitivity.

摘要翻译： 光学鼠标具有壳体，印刷电路板，光源单元，光电检测器单元，导光单元和透镜单元。 光源单元具有不同的图像光源颜色，并且布置在印刷电路板上。 导光单元布置在壳体中并且与光源单元相邻，用于相对于从图像光源中的一个到反射表面的反射表面引导非互补色光。 透镜单元布置在壳体中并且位于光电检测器单元下方，用于将由反射表面反射的反射光会聚到光电检测器单元中。 此外，光学鼠标可以以各种颜色的反射表面操作，并且仍然保持更好的灵敏度。