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    Process for self-aligned flare point and shield throat definition prior to main pole patterning
    6.
    发明授权
    Process for self-aligned flare point and shield throat definition prior to main pole patterning 有权
    在主极图案化之前，自对准耀斑和屏蔽喉定义的过程

    公开(公告)号：US07881010B2

    公开(公告)日：2011-02-01

    申请号：US11956277

    申请日：2007-12-13

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    IPC分类号： G11B5/187

    CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/315

    摘要： A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.

    摘要翻译： 一种用于制造具有定义二次闪光点的具有扩口步骤特征的写极的磁写头的方法。 该方法包括将磁性写入极材料沉积在衬底上，然后将磁性材料沉积在写入极材料上，随后是非磁性材料。 形成第一掩模，其具有前边缘以限定次级火炬点的位置，并且使用一个或多个材料去除过程来去除未被该第一掩模保护的磁性层和非磁性层的部分。 第一个掩模由配置为定义写入极的第二个掩模代替，并且执行离子铣削来定义写入极点。 从磁性层和非磁性层的阴影形成扩张的次级耀斑点。

    Perpendicular magnetic recording write head with trailing shield having notch and throat height defined by nonmagnetic pad layer
    7.
    发明授权
    Perpendicular magnetic recording write head with trailing shield having notch and throat height defined by nonmagnetic pad layer 有权
    垂直磁记录写头，后挡板具有由非磁性垫层限定的凹口和喉部高度

    公开(公告)号：US07768743B2

    公开(公告)日：2010-08-03

    申请号：US11747656

    申请日：2007-05-11

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Changqing Shi

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Changqing Shi

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/315

    摘要： A perpendicular magnetic recording write head supported on an air-bearing slider has a magnetic write pole (WP) with a WP end at the air-bearing surface (ABS) having a width generally equal to the data track width and a trailing shield (TS) with a TS end generally coplanar with the WP end. The TS has a first portion with a width at the TS end substantially wider than the width of the WP end and a TS notch (TSN) portion with a width at the TS end generally equal to the width of the WP end. The TS first portion has a height in a direction perpendicular to the ABS, and the TSN portion has a throat height (TH) in a direction perpendicular to the ABS that is less than the height of the TS first portion. A nonmagnetic gap layer separates the WP from the TSN portion and a nonmagnetic pad layer separates the WP from the TS first portion. The pad layer has a front edge generally parallel to and recessed from the ABS that defines the TH of the TSN portion, and a thickness that defines the length of the TSN portion in the along-the-track direction.

    摘要翻译： 支撑在空气轴承滑块上的垂直磁记录写头具有在空气轴承表面（ABS）上具有WP端的磁性写入极（WP），其宽度大体上等于数据磁道宽度和后屏蔽（TS ），其TS端通常与WP端共面。 TS具有第一部分，其宽度在TS端大大宽于WP端的宽度，TS陷口（TSN）部分的宽度在TS端大致等于WP端的宽度。 TS第一部分具有垂直于ABS的方向的高度，并且TSN部分在垂直于ABS的方向上具有小于TS第一部分的高度的喉部高度（TH）。 非磁隙层将WP与TSN部分分开，非磁性垫层将WP与TS第一部分分离。 衬垫层具有大致平行于ABS并且从ABS凹入的前边缘，其限定TSN部分的TH，以及限定沿着轨道方向的TSN部分的长度的厚度。

    METHOD FOR MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD WITH WRAP AROUND MAGNETIC TRAILING AND SIDE SHIELDS
    8.
    发明申请
    METHOD FOR MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD WITH WRAP AROUND MAGNETIC TRAILING AND SIDE SHIELDS 有权
    用于制作带磁带跟踪和边缘的扁平磁头写头的方法

    公开(公告)号：US20090128964A1

    公开(公告)日：2009-05-21

    申请号：US11944125

    申请日：2007-11-21

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Changqing Shi ,  Sue Siyang Zhang

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Changqing Shi ,  Sue Siyang Zhang

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3116 ,  G11B5/1278 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49798

    摘要： A method for manufacturing a magnetic write head having a wrap around magnetic shield. The method allows a highly accurate short wavelength such as 193 mm photolithography to be used to accurately define the placement and critical dimension of wrap around magnetic shield. The method includes the formation of a magnetic write pole, top gap, and side gap and the deposition of a RIEable fill layer thereover, and CMP to planarization. A 193 nm photolithography and ion milling is used to form a mask over the RIEable layer and one or more reactive ion etching processes are performed to pattern the RIEable layer through 193 nm photolithography mask. A wrap around shield can then be electroplated into the opening formed in the RIEable layer.

    摘要翻译： 一种用于制造具有围绕磁屏蔽的磁性写入头的方法。 该方法允许使用高精度的短波长（例如193mm光刻）来精确地定义磁屏蔽环绕的放置和临界尺寸。 该方法包括形成磁性写入极，顶部间隙和侧面间隙以及在其上沉积RIEable填充层，并将CMP平坦化。 使用193nm光刻和离子研磨在RIEable层上形成掩模，并且执行一个或多个反应离子蚀刻工艺以通过193nm光刻掩模对RIEable层进行图案化。 然后可以将环绕的护罩电镀到形成在RIEable层中的开口中。

    Method for fabricating thin film magnetic heads using CMP with polishing stop layer
    10.
    发明申请
    Method for fabricating thin film magnetic heads using CMP with polishing stop layer 失效
    使用具有抛光停止层的CMP制造薄膜磁头的方法

    公开(公告)号：US20060043060A1

    公开(公告)日：2006-03-02

    申请号：US10928002

    申请日：2004-08-27

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Hong Zhang

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Hong Zhang

    IPC分类号： B44C1/22 ,  C23F1/00

    CPC分类号： B82Y25/00 ,  G11B5/3163 ,  G11B5/3169

    摘要： A method is described for thin film processing using a selected CMP slurry with a silicon dioxide stop layer. The slurry includes an abrasive, preferably alumina, a corrosion inhibitor, preferably benzotriazole (BTA), and an oxidizer preferably hydrogen peroxide. The method is particularly useful for fabricating thin film heads where alumina is used as the dielectric. The method can be used to planarize metal structures surrounded by alumina in magnetic heads. The alumina refill is deposited to the final target height which is slightly below the height of the metal. A thin silicon dioxide stop layer is deposited over the alumina. The CMP is executed using the selected slurry to planarize the wafer down to the stop layer. Preferably only a negligible amount of the stop layer remains and the height of the metal structure is essentially the same as the deposited height of the refilled alumina.

    摘要翻译： 描述了使用具有二氧化硅停止层的所选CMP浆料进行薄膜处理的方法。 浆料包括研磨剂，优选氧化铝，腐蚀抑制剂，优选苯并三唑（BTA）和优选过氧化氢的氧化剂。 该方法对于制造其中使用氧化铝作为电介质的薄膜头特别有用。 该方法可用于平面化由磁头中的氧化铝包围的金属结构。 氧化铝填充物沉积到稍低于金属高度的最终目标高度。 在氧化铝上沉积薄的二氧化硅阻挡层。 使用所选择的浆料执行CMP以将晶片平坦化到停止层。 优选地，仅剩下可忽略量的止挡层，并且金属结构的高度与再填充氧化铝的沉积高度基本相同。