公开(公告)号：US07562663B2

公开(公告)日：2009-07-21

申请号：US10772546

申请日：2004-02-05

申请人： Yusuke Muraoka ,  Tomomi Iwata ,  Kimitsugu Saito ,  Masahiro Yamagata ,  Hisanori Oshiba ,  Shogo Sarumaru

发明人： Yusuke Muraoka ,  Tomomi Iwata ,  Kimitsugu Saito ,  Masahiro Yamagata ,  Hisanori Oshiba ,  Shogo Sarumaru

IPC分类号： B08B3/00 ,  B08B3/04

CPC分类号： B08B7/0021

摘要： A mixing valve assembly 42 is communicated with a dedicated tank 51D, storing therein a compatibilizer D, via an inlet valve 43 and is also communicated with dedicated tanks 51A-51C via three injection valves, the tanks storing therein auxiliaries A-C respectively. A chemical formulation is prepared by selectively injecting any one(s) of four chemical agents into the mixing valve assembly 42 by way of on-off control of the inlet valve 43 and the injection valves and blending together the injected chemical agents. Then, the chemical formulation is pumped into SCF by a high-pressure pump 45 such that the SCF and the chemical formulation are mixed together to form a process fluid. Thus, the number of components of a high-pressure portion can be reduced to achieve a cost reduction of an apparatus. Furthermore, a pipe line for pumping the chemical agents is simplified.

摘要翻译： 混合阀组件42与专用罐51D连通，经由入口阀43存储增容器D，并且还经由三个喷射阀与专用罐51A-51C连通，储罐分别存储辅助件A-C。 通过对入口阀43和喷射阀的开关控制并将注射的化学试剂混合在一起，通过选择性地将四种化学试剂中的一种或几种四种化学试剂注入混合阀组件42来制备化学制剂。 然后，通过高压泵45将化学制剂泵送到SCF中，使得SCF和化学制剂混合在一起以形成工艺流体。 因此，可以减少高压部分的部件的数量，以实现装置的成本降低。 此外，简化了用于泵送化学试剂的管线。

公开(公告)号：US07384484B2

公开(公告)日：2008-06-10

申请号：US10700020

申请日：2003-11-03

申请人： Yusuke Muraoka ,  Kimitsugu Saito ,  Tomomi Iwata ,  Eiji Fukatsu ,  Ikuo Mizobata ,  Hiroyuki Ueno ,  Yasuo Okuyama ,  Takashi Gama ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Jun Munemasa ,  Hisanori Oshiba ,  Shogo Sarumaru

发明人： Yusuke Muraoka ,  Kimitsugu Saito ,  Tomomi Iwata ,  Eiji Fukatsu ,  Ikuo Mizobata ,  Hiroyuki Ueno ,  Yasuo Okuyama ,  Takashi Gama ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Jun Munemasa ,  Hisanori Oshiba ,  Shogo Sarumaru

IPC分类号： B05C13/02 ,  B05B1/26 ,  B05B7/00 ,  C23C14/00 ,  B08B3/00 ,  H01L21/677

CPC分类号： H01L21/67051 ,  G11B7/261 ,  G11B7/265 ,  H01L21/67028 ,  Y10S134/902

摘要： After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unit 10A, 10B, a substrate W wet with an anti-drying solution is wet-transported to a supercritical drying unit 20 by a primary transport robot 30. The supercritical drying unit 20 performs a high-pressure drying process (supercritical drying process) in a dedicated manner. Accordingly, by virtue of the presence of the anti-drying solution, the substrate W is effectively prevented from becoming air-dry during the transportation of the substrate W.

摘要翻译： 在显影单元10A，10B中经过显影处理之后，依次进行漂洗处理和替换处理，用防干燥溶液湿润的基板W通过初级干燥器湿式输送到超临界干燥单元20 运输机器人30。 超临界干燥单元20以专用的方式进行高压干燥处理（超临界干燥处理）。 因此，通过存在防干燥溶液，能够有效地防止基板W在基板W的输送过程中变得风干。

公开(公告)号：US06823880B2

公开(公告)日：2004-11-30

申请号：US10131193

申请日：2002-04-25

申请人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

发明人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

IPC分类号： B08B1500

CPC分类号： H01L21/67017 ,  B08B7/0021 ,  H01L21/67126 ,  Y10S134/902

摘要： A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

摘要翻译： 高压处理装置包括：处理容器，其包括形成在其中的处理室，以对处理室中的物体执行一定的处理; 流体供给装置，其将高压流体供给到处理室中; 从处理室排出高压流体的流体排出装置; 搅拌单元，其布置在处理室中并且可操作以通过相对于处理容器的旋转将高压流体流过物体; 形成在所述处理容器中以在所述处理室内部和外部连通的连通通道; 旋转驱动构件，其经由设置在所述连通通道中的轴部联接到所述搅拌单元; 以及密封部，其设置在所述轴部和所述处理容器之间，以将所述处理室与所述旋转驱动构件断开。 流体排出装置包括形成在与密封部分相比更靠近处理室的连通通道的特定位置中以排出高压流体的流体排放口。

公开(公告)号：US07435396B2

公开(公告)日：2008-10-14

申请号：US10958224

申请日：2004-10-04

申请人： Yusuke Muraoka ,  Tomomi Iwata ,  Kimitsugu Saito ,  Masahiro Yamagata ,  Yoichi Inoue ,  Hisanori Oshiba

发明人： Yusuke Muraoka ,  Tomomi Iwata ,  Kimitsugu Saito ,  Masahiro Yamagata ,  Yoichi Inoue ,  Hisanori Oshiba

IPC分类号： B01J3/00 ,  B01J19/00 ,  B08B3/08 ,  H01L21/306

CPC分类号： G05D11/132 ,  Y10S134/902

摘要： Mixing baths 6A and 6B which temporarily hold chemical agents A and B respectively are disposed. The mixing baths 6A and 6B are each connected with a high-pressure fluid supplying unit 2. For surface treatment using a mixture of the chemical agent A and SCF (processing fluid), SCF is fed under pressure from the high-pressure fluid supplying unit 2 to the mixing bath 6A which already holds the chemical agent A, whereby the chemical agent A dissolves in SCF flowing into the mixing bath 6A and the mixture of the chemical agent A and SCF (processing fluid) is created. As a high-pressure valve (processing fluid introducing valve) 39 is opened, the processing fluid is sent into a pressure vessel 1. This achieves a predetermined surface treatment of a substrate which has been set inside the pressure vessel 1, using the processing fluid.

摘要翻译： 分别临时容纳化学试剂A和B的混合浴6A和6B。 混合槽6A和6B各自与高压流体供应单元2连接。 为了使用化学试剂A和SCF（加工液）的混合物的表面处理，将SCF从压力下从高压流体供给单元2供给已经保持化学试剂A的混合槽6A，由此化学试剂 A溶解流入混合槽6A的SCF，并且产生化学试剂A和SCF（加工流体）的混合物。 当打开高压阀（加工流体导入阀）39时，将处理流体送入压力容器1。 这使得使用处理流体对已经设置在压力容器1内部的基板进行预定的表面处理。

公开(公告)号：US20050079107A1

公开(公告)日：2005-04-14

申请号：US10958224

申请日：2004-10-04

申请人： Yusuke Muraoka ,  Tomomi Iwata ,  Kimitsugu Saito ,  Masahiro Yamagata ,  Yoichi Inoue ,  Hisanori Oshiba

发明人： Yusuke Muraoka ,  Tomomi Iwata ,  Kimitsugu Saito ,  Masahiro Yamagata ,  Yoichi Inoue ,  Hisanori Oshiba

IPC分类号： B08B3/08 ,  G05D11/13 ,  H01L21/304 ,  H01L21/306 ,  G05D9/00 ,  G05B1/00

CPC分类号： G05D11/132 ,  Y10S134/902

摘要： Mixing baths 6A and 6B which temporarily hold chemical agents A and B respectively are disposed. The mixing baths 6A and 6B are each connected with a high-pressure fluid supplying unit 2. For surface treatment using a mixture of the chemical agent A and SCF (processing fluid), SCF is fed under pressure from the high-pressure fluid supplying unit 2 to the mixing bath 6A which already holds the chemical agent A, whereby the chemical agent A dissolves in SCF flowing into the mixing bath 6A and the mixture of the chemical agent A and SCF (processing fluid) is created. As a high-pressure valve (processing fluid introducing valve) 39 is opened, the processing fluid is sent into a pressure vessel 1. This achieves a predetermined surface treatment of a substrate which has been set inside the pressure vessel 1, using the processing fluid.

摘要翻译： 分别临时容纳化学试剂A和B的混合浴6A和6B。 混合槽6A和6B各自与高压流体供应单元2连接。为了使用化学试剂A和SCF（处理流体）的混合物的表面处理，SCF在压力下从高压流体供应单元 2到已经保持化学试剂A的混合槽6A，由此化学试剂A溶解在流入混合槽6A的SCF中，并且产生化学试剂A和SCF（加工流体）的混合物。 当打开高压阀（加工流体导入阀）39时，处理流体被送入压力容器1中。这样就可以利用处理流体对设置在压力容器1内部的基板进行预定的表面处理 。

公开(公告)号：US20050005957A1

公开(公告)日：2005-01-13

申请号：US10886629

申请日：2004-07-09

申请人： Masahiro Yamagata ,  Hisanori Oshiba ,  Yoichi Inoue ,  Yusuke Muraoka ,  Tomomi Iwata ,  Kimitsugu Saito

发明人： Masahiro Yamagata ,  Hisanori Oshiba ,  Yoichi Inoue ,  Yusuke Muraoka ,  Tomomi Iwata ,  Kimitsugu Saito

IPC分类号： B08B3/08 ,  B08B7/00 ,  H01L21/00 ,  H01L21/027 ,  H01L21/304 ,  B08B3/00

CPC分类号： H01L21/67051 ,  B08B7/0021

摘要： Provided is a cleaning apparatus for cleaning an object to be treated by contacting the object to be treated with a high pressure fluid of a cleaning composition containing a cleaning component as an essential ingredient. The cleaning apparatus includes high pressure fluid supplying means for supplying the high pressure fluid of the cleaning composition, a high pressure washing vessel for removing unnecessary materials deposited on the object to be treated by contacting the object to be treated with the high pressure fluid of the cleaning composition therein, a storing vessel for storing a waste high pressure fluid of the cleaning composition carrying the unnecessary materials therein, and a sealed structure for sealably housing the high pressure fluid supplying means, the high pressure washing vessel, and the storing vessel therein. The sealed structure has first exhaust means for exhausting the gas remaining in the sealed structure therefrom.

摘要翻译： 本发明提供一种清洁装置，用于通过将含有清洁组分作为必要成分的清洁组合物的高压流体接触待处理物体来清洁待处理物体。 清洁装置包括用于供应清洁组合物的高压流体的高压流体供应装置，用于通过使待处理物体与待处理物体接触的待处理物体与所述待处理物体接触的高压流体来除去沉积在待处理物体上的不需要的材料的高压清洗容器 清洁组合物，用于储存载有不需要的材料的清洁组合物的废高压流体的储存容器，以及用于将高压流体供给装置，高压清洗容器和储存容器密封地容纳在其中的密封结构。 密封结构具有用于从其中排出残留在密封结构中的气体的第一排气装置。

公开(公告)号：US07252719B2

公开(公告)日：2007-08-07

申请号：US11249444

申请日：2005-10-14

申请人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

发明人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

IPC分类号： B08B3/02

CPC分类号： H01L21/67017 ,  B08B7/0021 ,  H01L21/67126 ,  Y10S134/902

摘要： A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

摘要翻译： 高压处理装置包括：处理容器，其包括形成在其中的处理室，以对处理室中的物体执行一定的处理; 流体供给装置，其将高压流体供给到处理室中; 从处理室排出高压流体的流体排出装置; 搅拌单元，其布置在处理室中并且可操作以通过相对于处理容器的旋转将高压流体流过物体; 形成在所述处理容器中以在所述处理室内部和外部连通的连通通道; 旋转驱动构件，其经由设置在所述连通通道中的轴部联接到所述搅拌单元; 以及密封部，其设置在所述轴部和所述处理容器之间，以将所述处理室与所述旋转驱动构件断开。 流体排出装置包括形成在与密封部分相比更靠近处理室的连通通道的特定位置中以排出高压流体的流体排放口。

公开(公告)号：US07000653B2

公开(公告)日：2006-02-21

申请号：US10826309

申请日：2004-04-19

申请人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

发明人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

IPC分类号： B65B1/30

CPC分类号： H01L21/67017 ,  B08B7/0021 ,  H01L21/67126 ,  Y10S134/902

摘要： A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

公开(公告)号：US20060032520A1

公开(公告)日：2006-02-16

申请号：US11249444

申请日：2005-10-14

申请人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

发明人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

IPC分类号： B08B3/00

CPC分类号： H01L21/67017 ,  B08B7/0021 ,  H01L21/67126 ,  Y10S134/902

摘要： A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

摘要翻译： 高压处理装置包括：处理容器，其包括形成在其中的处理室，以对处理室中的物体执行一定的处理; 流体供给装置，其将高压流体供给到处理室中; 从处理室排出高压流体的流体排出装置; 搅拌单元，其布置在处理室中并且可操作以通过相对于处理容器的旋转将高压流体流过物体; 形成在所述处理容器中以在所述处理室内部和外部连通的连通通道; 旋转驱动构件，其经由设置在所述连通通道中的轴部联接到所述搅拌单元; 以及密封部，其设置在所述轴部和所述处理容器之间，以将所述处理室与所述旋转驱动构件断开。 流体排出装置包括形成在与密封部分相比更靠近处理室的连通通道的特定位置中以排出高压流体的流体排放口。

公开(公告)号：US07080651B2

公开(公告)日：2006-07-25

申请号：US10147742

申请日：2002-05-16

申请人： Ikuo Mizobata ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ryuji Kitakado ,  Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba

发明人： Ikuo Mizobata ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ryuji Kitakado ,  Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba

IPC分类号： B08B3/04

CPC分类号： B08B9/0321 ,  B08B7/0021 ,  Y10S134/902

摘要： When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and one valve is opened, to supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, supercritical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to separation/recovery bath 8 together with the flow.

摘要翻译： 当基板清洗室5的开口打开以接收基板时，某些阀关闭，并且一个阀打开以供应CO 2以清洗基板清洗室5并排除空气。 当舱口关闭时，打开另一个阀以排放基板清洗室5，使得CO 2从基板清洗室5和导管排出任何气体和不需要的空气。 此后，使用超临界CO 2 2洗涤基底并清洁循环线。 超临界CO 2 2的流动被送到衬底洗涤室5。 在流过包括循环通道11的循环管线之后，它通过旁路通道12到达减压器7。 残留在循环管线中的任何化学物质或有机物质与流动一起连续地送到分离/回收槽8中。