利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

38 条记录 (耗时 0.026 秒)

    High-pressure processing apparatus and high-pressure processing method
    1.
    发明授权
    High-pressure processing apparatus and high-pressure processing method 失效
    高压加工设备及高压加工方法

    公开(公告)号：US07435396B2

    公开(公告)日：2008-10-14

    申请号：US10958224

    申请日：2004-10-04

    申请人： Yusuke Muraoka ,  Tomomi Iwata ,  Kimitsugu Saito ,  Masahiro Yamagata ,  Yoichi Inoue ,  Hisanori Oshiba

    发明人： Yusuke Muraoka ,  Tomomi Iwata ,  Kimitsugu Saito ,  Masahiro Yamagata ,  Yoichi Inoue ,  Hisanori Oshiba

    IPC分类号： B01J3/00 ,  B01J19/00 ,  B08B3/08 ,  H01L21/306

    CPC分类号： G05D11/132 ,  Y10S134/902

    摘要： Mixing baths 6A and 6B which temporarily hold chemical agents A and B respectively are disposed. The mixing baths 6A and 6B are each connected with a high-pressure fluid supplying unit 2. For surface treatment using a mixture of the chemical agent A and SCF (processing fluid), SCF is fed under pressure from the high-pressure fluid supplying unit 2 to the mixing bath 6A which already holds the chemical agent A, whereby the chemical agent A dissolves in SCF flowing into the mixing bath 6A and the mixture of the chemical agent A and SCF (processing fluid) is created. As a high-pressure valve (processing fluid introducing valve) 39 is opened, the processing fluid is sent into a pressure vessel 1. This achieves a predetermined surface treatment of a substrate which has been set inside the pressure vessel 1, using the processing fluid.

    摘要翻译： 分别临时容纳化学试剂A和B的混合浴6A和6B。 混合槽6A和6B各自与高压流体供应单元2连接。 为了使用化学试剂A和SCF（加工液）的混合物的表面处理，将SCF从压力下从高压流体供给单元2供给已经保持化学试剂A的混合槽6A，由此化学试剂 A溶解流入混合槽6A的SCF，并且产生化学试剂A和SCF（加工流体）的混合物。 当打开高压阀（加工流体导入阀）39时，将处理流体送入压力容器1。 这使得使用处理流体对已经设置在压力容器1内部的基板进行预定的表面处理。

    High-pressure processing apparatus and high-pressure processing method
    2.
    发明申请
    High-pressure processing apparatus and high-pressure processing method 失效
    高压加工设备及高压加工方法

    公开(公告)号：US20050079107A1

    公开(公告)日：2005-04-14

    申请号：US10958224

    申请日：2004-10-04

    申请人： Yusuke Muraoka ,  Tomomi Iwata ,  Kimitsugu Saito ,  Masahiro Yamagata ,  Yoichi Inoue ,  Hisanori Oshiba

    发明人： Yusuke Muraoka ,  Tomomi Iwata ,  Kimitsugu Saito ,  Masahiro Yamagata ,  Yoichi Inoue ,  Hisanori Oshiba

    IPC分类号： B08B3/08 ,  G05D11/13 ,  H01L21/304 ,  H01L21/306 ,  G05D9/00 ,  G05B1/00

    CPC分类号： G05D11/132 ,  Y10S134/902

    摘要： Mixing baths 6A and 6B which temporarily hold chemical agents A and B respectively are disposed. The mixing baths 6A and 6B are each connected with a high-pressure fluid supplying unit 2. For surface treatment using a mixture of the chemical agent A and SCF (processing fluid), SCF is fed under pressure from the high-pressure fluid supplying unit 2 to the mixing bath 6A which already holds the chemical agent A, whereby the chemical agent A dissolves in SCF flowing into the mixing bath 6A and the mixture of the chemical agent A and SCF (processing fluid) is created. As a high-pressure valve (processing fluid introducing valve) 39 is opened, the processing fluid is sent into a pressure vessel 1. This achieves a predetermined surface treatment of a substrate which has been set inside the pressure vessel 1, using the processing fluid.

    摘要翻译： 分别临时容纳化学试剂A和B的混合浴6A和6B。 混合槽6A和6B各自与高压流体供应单元2连接。为了使用化学试剂A和SCF（处理流体）的混合物的表面处理，SCF在压力下从高压流体供应单元 2到已经保持化学试剂A的混合槽6A，由此化学试剂A溶解在流入混合槽6A的SCF中，并且产生化学试剂A和SCF（加工流体）的混合物。 当打开高压阀（加工流体导入阀）39时，处理流体被送入压力容器1中。这样就可以利用处理流体对设置在压力容器1内部的基板进行预定的表面处理 。

    Cleaning apparatus for cleaning objects to be treated with use of cleaning composition
    3.
    发明申请
    Cleaning apparatus for cleaning objects to be treated with use of cleaning composition 审中-公开
    使用清洁剂清洁待处理物体的清洁装置

    公开(公告)号：US20050005957A1

    公开(公告)日：2005-01-13

    申请号：US10886629

    申请日：2004-07-09

    申请人： Masahiro Yamagata ,  Hisanori Oshiba ,  Yoichi Inoue ,  Yusuke Muraoka ,  Tomomi Iwata ,  Kimitsugu Saito

    发明人： Masahiro Yamagata ,  Hisanori Oshiba ,  Yoichi Inoue ,  Yusuke Muraoka ,  Tomomi Iwata ,  Kimitsugu Saito

    IPC分类号： B08B3/08 ,  B08B7/00 ,  H01L21/00 ,  H01L21/027 ,  H01L21/304 ,  B08B3/00

    CPC分类号： H01L21/67051 ,  B08B7/0021

    摘要： Provided is a cleaning apparatus for cleaning an object to be treated by contacting the object to be treated with a high pressure fluid of a cleaning composition containing a cleaning component as an essential ingredient. The cleaning apparatus includes high pressure fluid supplying means for supplying the high pressure fluid of the cleaning composition, a high pressure washing vessel for removing unnecessary materials deposited on the object to be treated by contacting the object to be treated with the high pressure fluid of the cleaning composition therein, a storing vessel for storing a waste high pressure fluid of the cleaning composition carrying the unnecessary materials therein, and a sealed structure for sealably housing the high pressure fluid supplying means, the high pressure washing vessel, and the storing vessel therein. The sealed structure has first exhaust means for exhausting the gas remaining in the sealed structure therefrom.

    摘要翻译： 本发明提供一种清洁装置，用于通过将含有清洁组分作为必要成分的清洁组合物的高压流体接触待处理物体来清洁待处理物体。 清洁装置包括用于供应清洁组合物的高压流体的高压流体供应装置，用于通过使待处理物体与待处理物体接触的待处理物体与所述待处理物体接触的高压流体来除去沉积在待处理物体上的不需要的材料的高压清洗容器 清洁组合物，用于储存载有不需要的材料的清洁组合物的废高压流体的储存容器，以及用于将高压流体供给装置，高压清洗容器和储存容器密封地容纳在其中的密封结构。 密封结构具有用于从其中排出残留在密封结构中的气体的第一排气装置。

    High pressure processing apparatus and method
    4.
    发明授权
    High pressure processing apparatus and method 失效
    高压加工设备及方法

    公开(公告)号：US07080651B2

    公开(公告)日：2006-07-25

    申请号：US10147742

    申请日：2002-05-16

    申请人： Ikuo Mizobata ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ryuji Kitakado ,  Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba

    发明人： Ikuo Mizobata ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ryuji Kitakado ,  Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba

    IPC分类号： B08B3/04

    CPC分类号： B08B9/0321 ,  B08B7/0021 ,  Y10S134/902

    摘要： When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and one valve is opened, to supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, supercritical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to separation/recovery bath 8 together with the flow.

    摘要翻译： 当基板清洗室5的开口打开以接收基板时，某些阀关闭，并且一个阀打开以供应CO 2以清洗基板清洗室5并排除空气。 当舱口关闭时，打开另一个阀以排放基板清洗室5，使得CO 2从基板清洗室5和导管排出任何气体和不需要的空气。 此后，使用超临界CO 2 2洗涤基底并清洁循环线。 超临界CO 2 2的流动被送到衬底洗涤室5。 在流过包括循环通道11的循环管线之后，它通过旁路通道12到达减压器7。 残留在循环管线中的任何化学物质或有机物质与流动一起连续地送到分离/回收槽8中。

    High pressure processing apparatus and method
    5.
    发明授权
    High pressure processing apparatus and method 失效
    高压加工设备及方法

    公开(公告)号：US07111630B2

    公开(公告)日：2006-09-26

    申请号：US10879318

    申请日：2004-06-28

    申请人： Ikuo Mizobata ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ryuji Kitakado ,  Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba

    发明人： Ikuo Mizobata ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ryuji Kitakado ,  Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba

    IPC分类号： B08B3/04

    CPC分类号： B08B9/0321 ,  B08B7/0021 ,  Y10S134/902

    摘要： When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and a valve is opened, supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, super critical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to a separation/recover bath 8 together with the flow.

    摘要翻译： 当基板清洗室5的开口被打开以接收基板时，某些阀关闭，并且阀打开，供应CO 2以清洗基板清洗室5并排除空气。 当舱口关闭时，打开另一个阀以排放基板清洗室5，使得CO 2从基板清洗室5和导管排出任何气体和不需要的空气。 此后，使用超临界CO 2 2来洗涤基底并清洁循环线。 超临界CO 2 2的流动被送到衬底洗涤室5。 在流过包括循环通道11的循环管线之后，它通过旁路通道12到达减压器7。 残留在循环管线中的任何化学物质或有机物质与流体一起被连续地送到分离/回收槽8中。

    High pressure processing apparatus
    6.
    发明授权
    High pressure processing apparatus 失效
    高压加工设备

    公开(公告)号：US06874513B2

    公开(公告)日：2005-04-05

    申请号：US10123252

    申请日：2002-04-17

    申请人： Masahiro Yamagata ,  Hisanori Oshiba ,  Yoshihiko Sakashita ,  Yoichi Inoue ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

    发明人： Masahiro Yamagata ,  Hisanori Oshiba ,  Yoshihiko Sakashita ,  Yoichi Inoue ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

    IPC分类号： H01L21/302 ,  B08B3/02 ,  B08B7/00

    CPC分类号： B08B7/0021 ,  B08B3/02 ,  Y10S134/902

    摘要： A high-pressure processing apparatus for removing unnecessary matters on objects to be processed by bringing a high-pressure fluid and a chemical liquid other than the high-pressure fluid into contact with the objects to be processed in a pressurized state is provided with a plurality of high-pressure processing chambers, a common high-pressure fluid supply unit for supplying the high-pressure fluid to each one of the high-pressure processing chambers, a common chemical liquid supply unit for supplying the chemical liquid to the each high-pressure processing chambers, and a separating unit for separating gaseous components from a mixture of the high-pressure fluid and the chemical liquid discharged from the high-pressure processing chambers after the objects are processed.Thus, a high-pressure processing apparatus which has such a compact construction as to be partly installable in a clean room and can stably perform a high-pressure processing can be provided.

    摘要翻译： 通过使高压流体和高压流体以外的化学液体与加压状态下的被处理物体接触来除去被加工物上的不必要物质的高压处理装置，具有多个 的高压处理室，用于将高压流体供给到每个高压处理室的普通高压流体供给单元，用于向每个高压处理室供给化学液体的公共化学液体供给单元 处理室，以及分离单元，用于在物体被处理之后从高压流体和从高压处理室排出的化学液体的混合物中分离出气态成分。因此，具有这样的高压处理装置 可以提供可部分安装在洁净室中并可稳定地进行高压处理的紧凑结构。

    Image processing device suitable for obtaining the volume and center of gravity of a three-dimensional binary image
    10.
    发明授权
    Image processing device suitable for obtaining the volume and center of gravity of a three-dimensional binary image 失效
    适用于获得三维二值图像的体积和重心的图像处理装置

    公开(公告)号：US4975973A

    公开(公告)日：1990-12-04

    申请号：US198442

    申请日：1988-05-25

    申请人： Akira Kasano ,  Yoichi Inoue

    发明人： Akira Kasano ,  Yoichi Inoue

    IPC分类号： G06T5/40 ,  G06T7/60

    CPC分类号： G06T7/606 ,  G06T7/602 ,  G06T2207/10081 ,  G06T2207/20021

    摘要： A first memory stores a divided three-dimensional binary image as image data j of p bits. A second memory, equal to the first memory in size, stores data k of q bits, representing the section number of a corresponding memory section of the first memory. A histogram computing circuit concatenates data j and data k and obtains a histogram for the concatenated data. A computing unit computes a marginal distribution of the three-dimensional image on the basis of the histogram. A data conversion unit converts the p bit data to a first data image. An adder unit obtains from the first image a second image representing the marginal distribution P(x,y). The computing unit computes a marginal distribution P(x) and a marginal distribution P(y) from the second image, and also computes the volume and center of gravity of the three-dimensional binary image.

    摘要翻译： 第一存储器将分割的三维二进制图像存储为p位的图像数据j。 等于第一存储器大小的第二存储器存储q位的数据k，表示第一存储器的相应存储器部分的段号。 直方图计算电路连接数据j和数据k，并获得连接数据的直方图。 计算单元基于直方图计算三维图像的边际分布。 数据转换单元将p位数据转换为第一数据图像。 加法器单元从第一图像获得表示边际分布P（x，y）的第二图像。 计算单元从第二图像计算边际分布P（x）和边际分布P（y），并且还计算三维二值图像的体积和重心。