摘要:
An exposure apparatus transfers a pattern of a mask onto a substrate and includes a covering member which is disposed in the exposure apparatus and which substantially isolates a predetermined spacing from outside gas. The covering member includes a first thin film made of a first material which blocks penetration of the outside gas with respect to the predetermined spacing and a second thin film having a low degasification property and made of a second material of at least one of a metal and an inorganic substance. An exposure method transfers a pattern of a mask onto a substrate and includes the steps of isolating a part spacing of an optical path spacing for an exposure beam which transfers the pattern of the mask onto the substrate from outside gas by using such a covering member.
摘要:
Provided is a separator for non-aqueous batteries, capable of being usefully used in non-aqueous batteries, and a non-aqueous battery equipped with this separator. The separator for non-aqueous batteries includes: a base layer comprising a fiber aggregate, and an electrolyte-swellable resin layer formed on at least one surface of the base layer, the resin layer comprising a urethane resin (C) obtained by reacting a polyol (A) including a vinyl polymer (a1) and a polyether polyol (a2) with a polyisocyanate (B). The vinyl polymer (a1) has as a main chain a vinyl polymer (a1′) having two hydroxyl groups at one of the termini of the main chain, and a polyoxyethylene chain having a number average molecular weight of 200 to 800 as a side chain, the percentage of the polyoxyethylene chain based on the vinyl polymer (a1) being within the range of 70 mass % to 98 mass %.
摘要:
A field effect transistor has an insulating substrate, a semiconductor thin film formed on the insulating substrate, and a gate insulating film on the semiconductor thin film. A first gate electrode is formed on the gate insulating film. A first region and a second region having a first conductivity type are formed on or in a surface of the semiconductor film on opposite sides of the first gate electrode in a length direction thereof. A third region having a second conductivity type opposite the first conductivity type is arranged on or in the semiconductor film side by side with the second region in a width direction of the first gate electrode. The third region and the second region are in contact with each other and make a low resistance junction. A second gate electrode is formed on the gate insulating film along the second region. A fourth region having the first conductivity type is formed on or in the semiconductor film on an opposite side of the second region with respect to the second gate electrode. One of the first and the fourth regions is used as an output region according to a circuit operation.
摘要:
Disclosed is a memory cell array including word and first bit lines and second bit lines respectively connected to memory cells, wherein each memory cell includes a MOS transistor and switching element having first and second conductive layers and a gap in which a resistance value changes by applying a predetermined voltage, and data is written by specifying the first bit line to connect it to a ground, specifying the word line and supplying a write voltage to the second bit lines, and read by specifying the first bit line to connect it to the sense amplifier, specifying the word line and supplying a read voltage lower than the write voltage to the second bit lines, and the word line is specified when the word line voltage becomes a gate threshold value voltage or more and a sum of a drive voltage and the gate threshold value voltage or less.
摘要:
A memory device (1) includes at least a first semiconductor region (100) having a length, a first surface, and a cross section surrounded by the first surface, a memory means (300) provided on the first surface, and a gate (400) provided on the memory means (300), and an equivalent sectional radius of the cross section of the first semiconductor region (100) is set to be equal to or smaller than an equivalent silicon oxide film thickness of the memory means (300) to realize low program voltage. The equivalent sectional radius r of the cross section is set to be 10 nm or less and the gate length is set to be 20 nm or less so that multi-level interval converted to gate voltage becomes a specific value which can be identified under the room temperature.
摘要:
Disclosed is a memory cell array including word and first bit lines and second bit lines respectively connected to memory cells, wherein each memory cell includes a MOS transistor and switching element having first and second conductive layers and a gap in which a resistance value changes by applying a predetermined voltage, and data is written by specifying the first bit line to connect it to a ground, specifying the word line and supplying a write voltage to the second bit lines, and read by specifying the word line, and specifying the first bit line to supply a read voltage lower than the write voltage to the second bit lines, and the word line is specified when the voltage of the word line becomes a gate threshold value voltage or more and a sum of a drive voltage and the gate threshold value voltage or less.
摘要:
A high voltage operating field effect transistor has a substrate, a source region and a drain region which are spaced apart from each other in a surface of the substrate, a semiconductor channel formation region disposed in the surface of the substrate between the source region and the drain region, a gate region disposed above the channel formation region, and a gate insulating film region disposed between the channel formation region and the gate region. At least one of a signal electric potential and a signal current is supplied to the source region, and a bias electric potential having an absolute value equal to or larger than a first constant electric potential which changes according to an increase or decrease in a drain electric potential is supplied to the gate region. One end of a rectifying device is connected to the gate region, and a second constant electric potential is supplied to the other end of the rectifying device.
摘要:
A high voltage operating field effect transistor has a source region and a drain region spaced apart from each other in a surface of a substrate. The source region is operative to receive at least one of a signal electric potential and a signal current. A semiconductor channel formation region is disposed in the surface of the substrate between the source region and the drain region. A gate region is disposed above the channel formation region and is operative to receive a bias electric potential having an absolute value equal to or larger than a first constant electric potential which changes according to an increase or decrease in a drain electric potential. A gate insulating film region is disposed between the channel formation region and the gate region.
摘要:
A field effect transistor has an insulating substrate, a semiconductor thin film formed on the insulating substrate, and a gate insulating film formed on the semiconductor thin film. A first gate electrode is formed on the gate insulating film. A first region and a second region having a first conductivity type are formed on or in a surface of the semiconductor thin film on opposite sides of the first gate electrode in a length direction thereof. A third region having a second conductivity type opposite the first conductivity type is arranged on or in the semiconductor film side by side with the second region in a width direction of the first gate electrode. A conductive thin film is connected with the second region and the third region. A second gate electrode is formed on the gate insulating film along the second region. A fourth region having the first conductivity type is formed on or in the semiconductor film on an opposite side of the second region with respect to the second gate electrode. One of the first and the fourth regions is used as an output region according to a circuit operation and without application of a fixed bias potential to the third region.
摘要:
According to the present invention, there is provided a bearing apparatus for a wheel of vehicle comprising a hub wheel integrally formed therewith a wheel mounting flange on the periphery at one end thereof, and a double row rolling bearing, the double row rolling bearing comprising an outer member integrally formed therewith a body mounting flange on the periphery thereof and also formed therewith double row outer raceway surfaces, an inner member including said hub wheel and formed therewith double row inner raceway surfaces each arranged opposite to each of said double row outer surfaces, and double row rolling elements freely rotatably contained between said double row outer and second raceway surfaces, said double row rolling bearing being adapted to be applied a predetermined preload characterized in that: there are arranged a separate outer or inner ring on at least one of said outer and inner members, and a preload varying means arranged at an abutting portion between said outer and inner members for varying the preload applied to the bearing, said preload varying means can be extended or contracted based on an output signal from a detecting sensor for detecting the running condition of vehicle.