公开(公告)号：US06788366B2

公开(公告)日：2004-09-07

申请号：US10327951

申请日：2002-12-26

申请人： Yutaka Sawayama ,  Kiyoshi Minoura ,  Ichiro Ihara ,  Koji Taniguchi ,  Sayuri Fujiwara

发明人： Yutaka Sawayama ,  Kiyoshi Minoura ,  Ichiro Ihara ,  Koji Taniguchi ,  Sayuri Fujiwara

IPC分类号： G02F11335

CPC分类号： G02F1/133553 ,  G02B5/124 ,  G02F1/134309

摘要： A display device includes a light modulating medium layer, a corner cube array and a reflective electrode layer. The corner cube array is provided on one side of the light modulating medium layer and includes multiple corner cubes as its unit elements. The reflective electrode layer is provided on the corner cube array and includes multiple reflective electrodes that are spaced apart from each other and that are used to apply a voltage to the light modulating medium layer. When the display device is viewed from over the corner cube array, an arrangement pattern of the corner cubes matches an arrangement pattern of the reflective electrodes in at least one direction.

摘要翻译： 显示装置包括光调制介质层，角立方体阵列和反射电极层。 角隅棱镜阵列设置在光调制介质层的一侧，并且包括多个角立方体作为其单元元件。 反射电极层设置在角立方体阵列上，并且包括彼此间隔开并且用于向光调制介质层施加电压的多个反射电极。 当从角立方体阵列观看显示装置时，角立方体的布置图案与至少一个方向上的反射电极的排列图案一致。

公开(公告)号：US07293884B2

公开(公告)日：2007-11-13

申请号：US11604856

申请日：2006-11-28

申请人： Yutaka Sawayama ,  Sayuri Fujiwara ,  Makoto Kanbe ,  Kiyoshi Minoura ,  Ichiro Ihara

发明人： Yutaka Sawayama ,  Sayuri Fujiwara ,  Makoto Kanbe ,  Kiyoshi Minoura ,  Ichiro Ihara

IPC分类号： G02B5/122

CPC分类号： G02B5/124 ,  G02F1/133553 ,  Y10S359/90

摘要： A corner cube reflector includes a two-dimensional arrangement of unit elements. The unit elements are arranged at a pitch of 200 μm or less. As viewed in a direction from which incoming light is coming, each unit element has a peak point and a bottom point. A peak portion, including the peak point, has an excessive portion and/or a missing portion as compared with an ideal peak portion of an ideal corner cube. The level of the peak point is lower than that of the ideal peak point of the ideal corner cube. An average level difference h2 between the level of the bottom point and that of an ideal bottom point of the ideal corner cube is smaller than an average level difference h1 between the level of the peak point and that of the ideal peak point.

公开(公告)号：US07188961B2

公开(公告)日：2007-03-13

申请号：US10968239

申请日：2004-10-20

申请人： Yutaka Sawayama ,  Sayuri Fujiwara ,  Makoto Kanbe ,  Kiyoshi Minoura ,  Ichiro Ihara

发明人： Yutaka Sawayama ,  Sayuri Fujiwara ,  Makoto Kanbe ,  Kiyoshi Minoura ,  Ichiro Ihara

IPC分类号： G02B5/124

CPC分类号： G02B5/124 ,  G02F1/133553 ,  Y10S359/90

摘要： A corner cube reflector includes a two-dimensional arrangement of unit elements. The unit elements are arranged at a pitch of 200 μm or less. As viewed in a direction from which incoming light is coming, each unit element has a peak point and a bottom point. A peak portion, including the peak point, has an excessive portion and/or a missing portion as compared with an ideal peak portion of an ideal corner cube. The level of the peak point is lower than that of the ideal peak point of the ideal corner cube. An average level difference h2 between the level of the bottom point and that of an ideal bottom point of the ideal corner cube is smaller than an average level difference h1 between the level of the peak point and that of the ideal peak point.

公开(公告)号：US20070081244A1

公开(公告)日：2007-04-12

申请号：US11604856

申请日：2006-11-28

申请人： Yutaka Sawayama ,  Sayuri Fujiwara ,  Makoto Kanbe ,  Kiyoshi Minoura ,  Ichiro Ihara

发明人： Yutaka Sawayama ,  Sayuri Fujiwara ,  Makoto Kanbe ,  Kiyoshi Minoura ,  Ichiro Ihara

IPC分类号： G02B5/124

CPC分类号： G02B5/124 ,  G02F1/133553 ,  Y10S359/90

摘要： A corner cube reflector includes a two-dimensional arrangement of unit elements. The unit elements are arranged at a pitch of 200 μm or less. As viewed in a direction from which incoming light is coming, each unit element has a peak point and a bottom point. A peak portion, including the peak point, has an excessive portion and/or a missing portion as compared with an ideal peak portion of an ideal corner cube. The level of the peak point is lower than that of the ideal peak point of the ideal corner cube. An average level difference h2 between the level of the bottom point and that of an ideal bottom point of the ideal corner cube is smaller than an average level difference h1 between the level of the peak point and that of the ideal peak point.

摘要翻译： 角立方反射器包括单元元件的二维排列。 单元元件以200μm或更小的间距排列。 从入射光的方向观察，每个单位元件具有峰值点和底点。 与理想的角立方体的理想峰部分相比，包括峰值点的峰部分具有过多的部分和/或缺失部分。 峰值点的水平低于理想角点立方体的理想峰值点。 在理想角隅棱镜的底点水平与理想底点点之间的平均水平差h <2 <2>小于平均水平差h <1> 峰值点和理想峰值点的水平。

公开(公告)号：US20050088743A1

公开(公告)日：2005-04-28

申请号：US10968239

申请日：2004-10-20

申请人： Yutaka Sawayama ,  Sayuri Fujiwara ,  Makoto Kanbe ,  Kiyoshi Minoura ,  Ichiro Ihara

发明人： Yutaka Sawayama ,  Sayuri Fujiwara ,  Makoto Kanbe ,  Kiyoshi Minoura ,  Ichiro Ihara

IPC分类号： G02B5/124 ,  G02F1/1335 ,  G02B5/122

CPC分类号： G02B5/124 ,  G02F1/133553 ,  Y10S359/90

摘要： A corner cube reflector includes a two-dimensional arrangement of unit elements. The unit elements are arranged at a pitch of 200 μm or less. As viewed in a direction from which incoming light is coming, each unit element has a peak point and a bottom point. A peak portion, including the peak point, has an excessive portion and/or a missing portion as compared with an ideal peak portion of an ideal corner cube. The level of the peak point is lower than that of the ideal peak point of the ideal corner cube. An average level difference h2 between the level of the bottom point and that of an ideal bottom point of the ideal corner cube is smaller than an average level difference h1 between the level of the peak point and that of the ideal peak point.

摘要翻译： 角立方反射器包括单元元件的二维排列。 单元元件以200μm或更小的间距排列。 从入射光的方向观察，每个单位元件具有峰值点和底点。 与理想的角立方体的理想峰部分相比，包括峰值点的峰部分具有过多的部分和/或缺失部分。 峰值点的水平低于理想角点立方体的理想峰值点。 在理想角隅棱镜的底点水平与理想底点点之间的平均水平差h <2 <2>小于平均水平差h <1> 峰值点和理想峰值点的水平。

公开(公告)号：US07360907B2

公开(公告)日：2008-04-22

申请号：US11489506

申请日：2006-07-20

申请人： Ichiro Ihara ,  Kiyoshi Minoura ,  Yutaka Sawayama

发明人： Ichiro Ihara ,  Kiyoshi Minoura ,  Yutaka Sawayama

IPC分类号： G02B5/124

CPC分类号： B81C1/00547 ,  G02B5/124 ,  G02B5/201 ,  G02B6/0053 ,  G02B6/0065 ,  G02F1/133504 ,  G02F1/133553 ,  H01L21/30621

摘要： A method of making a micro corner cube array includes the steps of: providing a substrate, at least a surface portion of which consists of cubic single crystals and which has a surface that is substantially parallel to {111} planes of the crystals; and dry-etching the surface of the substrate anisotropically with an etching gas that is reactive with the substrate, thereby forming a plurality of unit elements of the micro corner cube array on the surface of the substrate. Each of the unit elements is made up of a number of crystal planes that have been etched at a lower etch rate than the {111} planes of the crystals.

摘要翻译： 制造微角立方体阵列的方法包括以下步骤：提供基底，其至少其表面部分由立方单晶构成，并具有基本上平行于晶体的{111}面的表面; 并且用与基板反应的蚀刻气体各向异性地干蚀刻基板的表面，从而在基板的表面上形成多个单角元件。 每个单元元件由已经以比晶体的{111}面更低的蚀刻速率蚀刻的多个晶面组成。

公开(公告)号：US20060256438A1

公开(公告)日：2006-11-16

申请号：US11489506

申请日：2006-07-20

申请人： Ichiro Ihara ,  Kiyoshi Minoura ,  Yutaka Sawayama

发明人： Ichiro Ihara ,  Kiyoshi Minoura ,  Yutaka Sawayama

IPC分类号： G02B5/124

CPC分类号： B81C1/00547 ,  G02B5/124 ,  G02B5/201 ,  G02B6/0053 ,  G02B6/0065 ,  G02F1/133504 ,  G02F1/133553 ,  H01L21/30621

摘要： A method of making a micro corner cube array includes the steps of: providing a substrate, at least a surface portion of which consists of cubic single crystals and which has a surface that is substantially parallel to {111} planes of the crystals; and dry-etching the surface of the substrate anisotropically with an etching gas that is reactive with the substrate, thereby forming a plurality of unit elements of the micro corner cube array on the surface of the substrate. Each of the unit elements is made up of a number of crystal planes that have been etched at a lower etch rate than the {111} planes of the crystals.

公开(公告)号：US07098137B2

公开(公告)日：2006-08-29

申请号：US10315192

申请日：2002-12-10

申请人： Ichiro Ihara ,  Kiyoshi Minoura ,  Yutaka Sawayama

发明人： Ichiro Ihara ,  Kiyoshi Minoura ,  Yutaka Sawayama

IPC分类号： H01L21/302 ,  H01L21/3065 ,  C09K13/00

CPC分类号： B81C1/00547 ,  G02B5/124 ,  G02B5/201 ,  G02B6/0053 ,  G02B6/0065 ,  G02F1/133504 ,  G02F1/133553 ,  H01L21/30621

摘要： A method of making a micro corner cube array includes the steps of: providing a substrate, at least a surface portion of which consists of cubic single crystals and which has a surface that is substantially parallel to {111} planes of the crystals; and dry-etching the surface of the substrate anisotropically with an etching gas that is reactive with the substrate, thereby forming a plurality of unit elements of the micro corner cube array on the surface of the substrate. Each of the unit elements is made up of a number of crystal planes that have been etched at a lower etch rate than the {111} planes of the crystals.

公开(公告)号：US07045278B2

公开(公告)日：2006-05-16

申请号：US10603793

申请日：2003-06-26

申请人： Ichiro Ihara ,  Kiyoshi Minoura

发明人： Ichiro Ihara ,  Kiyoshi Minoura

IPC分类号： G02F1/1335

CPC分类号： G02B5/124 ,  Y10T428/1095 ,  Y10T428/24479

摘要： A method of making an array of corner cubes includes the steps of: preparing a substrate, at least a surface portion of which is made of a cubic crystalline material and which has a surface that is substantially parallel to {111} planes of the crystalline material; and patterning the surface of the substrate such that a plurality of solid shape elements defines a predetermined pattern on the surface of the substrate. Each of the solid shape elements is defined by a number of concave portions, a number of convex portions or a combination of concave and convex portions. The method further includes the step of supplying a first active species, including an element that is contained in the crystalline material, onto the substrate on which the solid shape elements have been formed.

摘要翻译： 制造角立方体阵列的方法包括以下步骤：制备基材，其至少其表面部分由立方晶体材料制成，并具有基本平行于结晶材料的{111}面的表面 ; 以及图案化所述基板的表面，使得多个固体形状元件在所述基板的表面上限定预定图案。 每个固体形状元件由多个凹部，多个凸部或凹凸部的组合构成。 该方法还包括将包含在结晶材料中的元素的第一活性物质提供到已经形成固体形状元素的基底上的步骤。

公开(公告)号：US08349227B2

公开(公告)日：2013-01-08

申请号：US12805189

申请日：2010-07-16

申请人： Ichiro Ihara

发明人： Ichiro Ihara

IPC分类号： B29D11/00

CPC分类号： G02B1/118 ,  B29C33/3842 ,  B29C33/424 ,  B29C33/56 ,  C25D1/10 ,  C25D11/04 ,  C25D11/12

摘要： A motheye mold fabrication method of at least one embodiment of the present invention includes the steps of: (a) preparing an Al base in which an Al content is less than 99.99 mass %; (b) partially anodizing the Al base to form a porous alumina layer which has a plurality of very small recessed portions; (c) after step (b), allowing the porous alumina layer to be in contact with an etchant which contains an anodic inhibitor, thereby enlarging the plurality of very small recessed portions of the porous alumina layer; and (d) after step (c), further anodizing the Al base to grow the plurality of very small recessed portions.

摘要翻译： 本发明的至少一个实施方案的飞蛾模具制造方法包括以下步骤：（a）制备Al含量小于99.99质量％的Al碱; （b）部分地阳极氧化Al碱以形成具有多个非常小的凹部的多孔氧化铝层; （c）在步骤（b）之后，使多孔氧化铝层与含有阳极抑制剂的蚀刻剂接触，从而扩大多孔氧化铝层的多个非常小的凹部; 和（d）在步骤（c）之后，进一步阳极氧化Al基底以使多个非常小的凹进部分生长。