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    RADIATION-SENSITIVE RESIN COMPOSITION
    3.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION 有权
    辐射敏感性树脂组合物

    公开(公告)号：US20120219903A1

    公开(公告)日：2012-08-30

    申请号：US13427952

    申请日：2012-03-23

    申请人： Mitsuo SATO ,  Kazuo Nakahara ,  Hiromitsu Nakashima

    发明人： Mitsuo SATO ,  Kazuo Nakahara ,  Hiromitsu Nakashima

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0045

    摘要： The radiation-sensitive resin composition includes a compound represented by a following formula (1), and a resin. The resin has an acid-dissociable group, is insoluble or hardly soluble in an alkali, and turns to be soluble in an alkali when the acid-dissociable group is dissociated. R represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms, R1 represents a hydrocarbon group having 1 to 20 carbon atoms or the like, R2 to R5 each independently represent an alkyl group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 4 to 20 carbon atoms, or the like, and R6 represents a halogen atom or the like.

    摘要翻译： 辐射敏感性树脂组合物包括由下式（1）表示的化合物和树脂。 该树脂具有酸解离基团，在碱中不溶或几乎不溶，当酸解离基团解离时，其变成可溶于碱。 R表示氢原子或碳原子数1〜20的烃基，R1表示碳原子数1〜20的烃基等，R2〜R5各自独立地表示碳原子数1〜4的烷基，脂环式烃 具有4〜20个碳原子的基团等，R6表示卤素原子等。

    Radiation-sensitive resin composition
    4.
    发明授权
    Radiation-sensitive resin composition 有权
    辐射敏感树脂组合物

    公开(公告)号：US08895223B2

    公开(公告)日：2014-11-25

    申请号：US13427952

    申请日：2012-03-23

    申请人： Mitsuo Sato ,  Kazuo Nakahara ,  Hiromitsu Nakashima

    发明人： Mitsuo Sato ,  Kazuo Nakahara ,  Hiromitsu Nakashima

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/0397 ,  G03F7/0045

    摘要： The radiation-sensitive resin composition includes a compound represented by a following formula (1), and a resin. The resin has an acid-dissociable group, is insoluble or hardly soluble in an alkali, and turns to be soluble in an alkali when the acid-dissociable group is dissociated. R represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms, R1 represents a hydrocarbon group having 1 to 20 carbon atoms or the like, R2 to R5 each independently represent an alkyl group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 4 to 20 carbon atoms, or the like, and R6 represents a halogen atom or the like.

    摘要翻译： 辐射敏感性树脂组合物包括由下式（1）表示的化合物和树脂。 该树脂具有酸解离基团，在碱中不溶或几乎不溶，当酸解离基团解离时，其变成可溶于碱。 R表示氢原子或碳原子数1〜20的烃基，R1表示碳原子数1〜20的烃基等，R2〜R5各自独立地表示碳原子数1〜4的烷基，脂环式烃 具有4〜20个碳原子的基团等，R6表示卤素原子等。

    Radiation-sensitive resin composition, method for forming resist pattern and polymer
    5.
    发明授权
    Radiation-sensitive resin composition, method for forming resist pattern and polymer 有权
    辐射敏感树脂组合物，抗蚀剂图案和聚合物的形成方法

    公开(公告)号：US08609318B2

    公开(公告)日：2013-12-17

    申请号：US13204555

    申请日：2011-08-05

    申请人： Kazuo Nakahara ,  Hiromitsu Nakashima ,  Reiko Kimura

    发明人： Kazuo Nakahara ,  Hiromitsu Nakashima ,  Reiko Kimura

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/028 ,  G03F7/20

    CPC分类号： G03F7/0046 ,  C08F220/24 ,  C08F220/28 ,  C08F220/30 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

    摘要： A radiation-sensitive resin composition includes (A) a polymer that includes a structural unit (I) including a group shown by the following formula (i), (B) a photoacid generator, and (C) a polymer that has a fluorine atom content lower than that of the polymer (A), and includes an acid-labile group. The polymer (A) preferably includes a structural unit shown by the following formula (1) as the structural unit (I). It is preferable that X in the formula (1) represent a divalent or trivalent chain-like hydrocarbon group or alicyclic hydrocarbon group.

    摘要翻译： 辐射敏感性树脂组合物包含（A）包含结构单元（I）的聚合物，其包含下式（i）所示的基团，（B）光酸产生剂，和（C）具有氟原子的聚合物 含量低于聚合物（A），含有酸不稳定基团。 聚合物（A）优选包括作为结构单元（I）的由下式（1）表示的结构单元。 式（1）中的X优选为二价或三价链状烃基或脂环式烃基。

    Radiation-sensitive resin composition and compound
    6.
    发明授权
    Radiation-sensitive resin composition and compound 有权
    辐射敏感性树脂组合物和化合物

    公开(公告)号：US08273521B2

    公开(公告)日：2012-09-25

    申请号：US12846836

    申请日：2010-07-30

    申请人： Mitsuo Sato ,  Kazuo Nakahara ,  Hiromitsu Nakashima ,  Takanori Nakano ,  Makoto Sugiura

    发明人： Mitsuo Sato ,  Kazuo Nakahara ,  Hiromitsu Nakashima ,  Takanori Nakano ,  Makoto Sugiura

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/028

    CPC分类号： C07D211/48 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397

    摘要： A radiation-sensitive resin composition includes a compound shown by a formula (1) in which R1 represents a divalent hydrocarbon group having 1 to 20 carbon atoms and R2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms, or R1 and R2 form a heterocyclic structure having 4 to 20 carbon atoms, R3 represents a monovalent acid-dissociable group, n is an integer from 1 to 6, each of R4A, R4B, and R4C represents one of an alkyl group having 1 to 4 carbon atoms and a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or R4A represents one of an alkyl group having 1 to 4 carbon atoms and a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and R4B and R4C form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms.

    摘要翻译： 辐射敏感性树脂组合物包括式（1）所示的化合物，其中R1表示碳原子数1〜20的二价烃基，R2表示氢原子或碳原子数1〜20的一价烃基，R1 R2表示碳原子数为4〜20的杂环结构，R3表示一价酸解离基，n表示1〜6的整数，R4A，R4B，R4C各自表示碳原子数为1〜4的烷基 原子和碳原子数为4〜20的一价脂环式烃基，或者R4A表示碳原子数1〜4的烷基和碳原子数4〜20的一价脂环式烃基，R4B和R4C形成二价脂环式烃基 具有4至20个碳原子。

    Radiation-sensitive resin composition and compound
    8.
    发明授权
    Radiation-sensitive resin composition and compound 有权
    辐射敏感性树脂组合物和化合物

    公开(公告)号：US08697335B2

    公开(公告)日：2014-04-15

    申请号：US13351586

    申请日：2012-01-17

    申请人： Kazuo Nakahara ,  Mitsuo Sato

    发明人： Kazuo Nakahara ,  Mitsuo Sato

    IPC分类号： G03F7/039 ,  G03F7/004 ,  C07D211/44 ,  H01L21/027

    CPC分类号： C07D211/44 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： A radiation-sensitive resin composition includes a compound, a resin and a radiation-sensitive acid generator. The compound has a structure in which a group represented by a following formula (1) is bound to a nitrogen atom. The resin has an acid-dissociative dissolution-controlling group and has a property such that alkali solubility of the resin increases by an action of an acid. In the formula (1), Y is a monovalent group having 5 to 20 carbon atoms, and “*” represents a bonding hand with the nitrogen atom. In the formula (i), R1, R2 and R3 each independently represent a linear or branched alkyl group having 1 to 4 carbon atoms or a monovalent alicyclic hydrocarbon group having 4 to 12 carbon atoms, or R1 and R2 are linked with each other to form a bivalent alicyclic hydrocarbon group, and “*” represents a bonding hand with the oxygen atom.

    摘要翻译： 辐射敏感性树脂组合物包括化合物，树脂和辐射敏感性酸产生剂。 该化合物具有其中由下式（1）表示的基团与氮原子结合的结构。 该树脂具有酸解离溶解控制基团，并且具有通过酸的作用使树脂的碱溶性增加的性质。 式（1）中，Y为碳原子数为5〜20的一价基团，“*”表示与氮原子的键合键。 式（i）中，R 1，R 2和R 3各自独立地表示碳原子数1〜4的直链或支链烷基或碳原子数4〜12的1价脂环式烃基，或者， 形成二价脂环烃基，“*”表示与氧原子的键合。