公开(公告)号：US08126694B2

公开(公告)日：2012-02-28

申请号：US12114700

申请日：2008-05-02

申请人： Zhuan Liu ,  Jiangtao Hu ,  Yudong Hao

发明人： Zhuan Liu ,  Jiangtao Hu ,  Yudong Hao

IPC分类号： G06F17/50 ,  G06F17/00 ,  G06G7/62

CPC分类号： G01N21/211 ,  G01B11/0641

摘要： A model of a sample with a periodic or non-periodic pattern of conductive and transparent materials is produced based on the effect that the pattern has on TE polarized incident light. The model of the pattern may include a uniform film of the transparent material and an underlying uniform film of the conductive material. When the pattern has periodicity in two directions, the model may include a uniform film of the transparent material and an underlying portion that based on the physical characteristics of the periodic pattern in the TM polarization direction. When the sample includes an underlying periodic pattern that is orthogonal to the top periodic pattern, the sample may be modeled by modeling the physical characteristics of the top periodic pattern and the effect of the bottom periodic pattern. The model may be stored and used to determine a characteristic of the sample.

摘要翻译： 基于图案对TE偏振入射光的影响，产生具有导电和透明材料的周期性或非周期性图案的样品的模型。 图案的模型可以包括透明材料的均匀膜和导电材料的下面的均匀膜。 当图案在两个方向上具有周期性时，该模型可以包括透明材料的均匀膜和基于TM偏振方向上的周期性图案的物理特性的底层部分。 当样本包括与顶部周期性图案正交的下面的周期性图案时，可以通过对顶部周期性图案的物理特性和底部周期性图案的影响进行建模来对样本进行建模。 该模型可以被存储并用于确定样品的特性。

公开(公告)号：US20090276198A1

公开(公告)日：2009-11-05

申请号：US12114700

申请日：2008-05-02

申请人： Zhuan Liu ,  Jiangtao Hu ,  Yudong Hao

发明人： Zhuan Liu ,  Jiangtao Hu ,  Yudong Hao

IPC分类号： G06F17/00 ,  G06G7/48

CPC分类号： G01N21/211 ,  G01B11/0641

摘要： A model of a sample with a periodic or non-periodic pattern of conductive and transparent materials is produced based on the effect that the pattern has on TE polarized incident light. The model of the pattern may include a uniform film of the transparent material and an underlying uniform film of the conductive material. When the pattern has periodicity in two directions, the model may include a uniform film of the transparent material and an underlying portion that based on the physical characteristics of the periodic pattern in the TM polarization direction. When the sample includes an underlying periodic pattern that is orthogonal to the top periodic pattern, the sample may be modeled by modeling the physical characteristics of the top periodic pattern and the effect of the bottom periodic pattern. The model may be stored and used to determine a characteristic of the sample.

摘要翻译： 基于图案对TE偏振入射光的影响，产生具有导电和透明材料的周期性或非周期性图案的样品的模型。 图案的模型可以包括透明材料的均匀膜和导电材料的下面的均匀膜。 当图案在两个方向上具有周期性时，该模型可以包括透明材料的均匀膜和基于TM偏振方向上的周期性图案的物理特性的底层部分。 当样本包括与顶部周期性图案正交的下面的周期性图案时，可以通过对顶部周期性图案的物理特性和底部周期性图案的影响进行建模来对样本进行建模。 该模型可以被存储并用于确定样品的特性。

公开(公告)号：US07362448B1

公开(公告)日：2008-04-22

申请号：US10937248

申请日：2004-09-08

申请人： Zhuan Liu ,  Sangbong Lee ,  Jiangtao Hu ,  Chandra Saravanan

发明人： Zhuan Liu ,  Sangbong Lee ,  Jiangtao Hu ,  Chandra Saravanan

IPC分类号： G01B11/02

CPC分类号： G01B11/0625 ,  G01N21/31 ,  G01N21/9501

摘要： A residue detection system collects at least one of the spectrum and image from a measurement region on a sample. Spectral analysis is performed on the collected spectrum to determine whether residue is present and if so the thickness of the residue. The spectral analysis uses a calibration metric that correlates a monitoring parameter to the thickness of the residue. The monitoring parameter is at least one of the reflectance value at one or more of the local minima and maxima in the spectrum, the shape of one or more of the local minima and maxima in the spectrum, and the difference in reflectance values between at least two of the local minima and maxima in the spectrum. In one embodiment, imaging analysis is performed on the collected image of the measurement region if no residue is detected by the spectral analysis.

摘要翻译： 残留物检测系统从样品的测量区域收集至少一个光谱和图像。 对收集的光谱进行光谱分析，以确定残留物是否存在，如果是残留物的厚度。 光谱分析使用将监测参数与残留物厚度相关联的校准度量。 监测参数是光谱中局部最小值和最大值中的一个或多个的反射率值中的至少一个，光谱中的局部最小值和最大值中的一个或多个的形状，以及至少 光谱中的两个局部最小值和最大值。 在一个实施例中，如果通过光谱分析检测不到残留物，则对测量区域的所收集的图像执行成像分析。

公开(公告)号：US20090296075A1

公开(公告)日：2009-12-03

申请号：US12129448

申请日：2008-05-29

申请人： Jiangtao Hu ,  Chandra Saru Saravanan ,  Silvio J. Rabello ,  Zhuan Liu ,  Nigel P. Smith

发明人： Jiangtao Hu ,  Chandra Saru Saravanan ,  Silvio J. Rabello ,  Zhuan Liu ,  Nigel P. Smith

IPC分类号： G01N21/00

CPC分类号： G03F7/70633

摘要： An overlay error is determined using a diffraction based overlay target by generating a number of narrow band illumination beams that illuminate the overlay target. Each beam has a different range of wavelengths. Images of the overlay target are produced for each different range of wavelengths. An intensity value is then determined for each range of wavelengths. In an embodiment in which the overlay target includes a plurality of measurement pads, which may be illuminated and imaged simultaneously, an intensity value for each measurement pad in each image is determined. The intensity value may be determined statistically, such as by summing, finding the mean or median of the intensity values of pixels in the image. Spectra is then constructed using the determined intensity value, e.g., for each measurement pad. Using the constructed spectra, the overlay error may then be determined.

摘要翻译： 通过产生照亮覆盖目标的许多窄带照明光束，使用基于衍射的覆盖目标确定覆盖误差。 每个波束具有不同的波长范围。 为每个不同的波长范围产生覆盖目标的图像。 然后确定每个波长范围的强度值。 在其中覆盖目标包括可以同时照明和成像的多个测量焊盘的实施例中，确定每个图像中每个测量焊盘的强度值。 可以统计地确定强度值，例如通过求和，找到图像中的像素的强度值的平均值或中值。 然后使用确定的强度值构建光谱，例如，对于每个测量垫。 使用构造的光谱，可以确定覆盖误差。

公开(公告)号：US07450225B1

公开(公告)日：2008-11-11

申请号：US11735266

申请日：2007-04-13

申请人： Zhuan Liu ,  Yudong Hao ,  Ye Feng ,  Yongdong Liu

发明人： Zhuan Liu ,  Yudong Hao ,  Ye Feng ,  Yongdong Liu

IPC分类号： G01J1/00 ,  G01B9/00

CPC分类号： G01B11/0625

摘要： A metrology system performs optical metrology while holding a sample with an unknown focus offset. The measurements are corrected by fitting for the focus offset in a model regression analysis. Focus calibration is used to determine the optical response of the metrology device to the focus offset. The modeled data is adjusted based on the optical response to the focus offset and the model regression analysis fits for the focus offset as a variable parameter along with the sample characteristics that are to be measured. Once an adequate fit is determined, the values of the sample characteristics to be measured are reported. The adjusted modeled data may be stored in a library, or alternatively, modeled data may be adjusted in real-time.

摘要翻译： 测量系统执行光学测量，同时保持未知聚焦偏移的样本。 通过在模型回归分析中拟合聚焦偏移来校正测量值。 聚焦校准用于确定测量设备对焦偏移的光学响应。 基于对焦偏移的光学响应来调整建模数据，并且模型回归分析适合于将偏移量作为可变参数以及要测量的样本特征。 一旦确定了适当的拟合，就报告要测量的样品特性的值。 经调整的建模数据可以存储在库中，或者可以实时调整建模的数据。

公开(公告)号：US08501501B1

公开(公告)日：2013-08-06

申请号：US13559524

申请日：2012-07-26

申请人： Ye Feng ,  Zhuan Liu

发明人： Ye Feng ,  Zhuan Liu

IPC分类号： G01R31/26 ,  H01L21/66

CPC分类号： G01B11/0625

摘要： A sample with at least a first structure and a second structure is measured and a first model and a second model of the sample are generated. The first model models the first structure as an independent variable and models the second structure. The second model of the sample models the second structure as an independent variable. The measurement, the first model and the second model together to determine at least one desired parameter of the sample. For example, the first structure may be on a first layer and the second structure may be on a second layer that is under the first layer, and the processing of the sample may at least partially remove the first layer, wherein the second model models the first layer as having a thickness of zero.

摘要翻译： 测量具有至少第一结构和第二结构的样品，并且生成样品的第一模型和第二模型。 第一个模型将第一个结构模型化为独立变量，并对第二个结构进行建模。 样本的第二个模型将第二个结构模型作为一个独立变量。 测量，第一模型和第二模型一起确定样本的至少一个期望参数。 例如，第一结构可以在第一层上，并且第二结构可以在第一层下面的第二层上，并且样品的处理可以至少部分地去除第一层，其中第二模型将 第一层的厚度为零。

公开(公告)号：US08252608B1

公开(公告)日：2012-08-28

申请号：US13301317

申请日：2011-11-21

申请人： Ye Feng ,  Zhuan Liu

发明人： Ye Feng ,  Zhuan Liu

IPC分类号： G01R31/26 ,  H01L21/66

CPC分类号： G01B11/0625

摘要： A sample with at least a first structure and a second structure is measured and a first model and a second model of the sample are generated. The first model models the first structure as an independent variable and models the second structure. The second model of the sample models the second structure as an independent variable. The measurement, the first model and the second model together to determine at least one desired parameter of the sample. For example, the first structure may be on a first layer and the second structure may be on a second layer that is under the first layer, and the processing of the sample may at least partially remove the first layer, wherein the second model models the first layer as having a thickness of zero.

摘要翻译： 测量具有至少第一结构和第二结构的样品，并且生成样品的第一模型和第二模型。 第一个模型将第一个结构模型化为独立变量，并对第二个结构进行建模。 样本的第二个模型将第二个结构模型作为一个独立变量。 测量，第一模型和第二模型一起确定样本的至少一个期望参数。 例如，第一结构可以在第一层上，并且第二结构可以在第一层下面的第二层上，并且样品的处理可以至少部分地去除第一层，其中第二模型将 第一层的厚度为零。

公开(公告)号：US09239523B2

公开(公告)日：2016-01-19

申请号：US13053584

申请日：2011-03-22

申请人： Jie Li ,  Zhuan Liu ,  Silvio J. Rabello ,  Nigel P. Smith

发明人： Jie Li ,  Zhuan Liu ,  Silvio J. Rabello ,  Nigel P. Smith

IPC分类号： G03F7/20

CPC分类号： G03F7/70633

摘要： An empirical diffraction based overlay (eDBO) measurement of an overlay error is produced using diffraction signals from a plurality of diffraction based alignment pads from an alignment target. The linearity of the overlay error is tested using the same diffraction signals or a different set of diffraction signals from diffraction based alignment pads. Wavelengths that do not have a linear response to overlay error may be excluded from the measurement error.

摘要翻译： 使用来自对准靶的多个基于衍射的对准焊盘的衍射信号产生覆盖误差的经验衍射叠加（eDBO）测量。 使用相同的衍射信号或来自基于衍射的对准焊盘的不同衍射信号集来测试覆盖误差的线性。 不会对测量误差排除不具有重叠误差线性响应的波长。

公开(公告)号：US20130156325A1

公开(公告)日：2013-06-20

申请号：US13382750

申请日：2010-11-30

申请人： Zhuan Liu

发明人： Zhuan Liu

IPC分类号： G06T5/00

CPC分类号： G06T5/001 ,  G06T5/003 ,  G06T2207/20056 ,  G06T2207/20061 ,  G06T2207/20201

摘要： The method and apparatus for processing distorted image is provided by the present invention, and the distortion parameter of the distorted image is obtained after a terminal implements the image conversion processing for an obtained distorted image; the terminal implements recovery processing for the distorted image based on the distortion parameter. The method and apparatus of the present invention could ensure that the terminal recovers a distorted image to a clear image quickly and accurately, improving the user's experience.

摘要翻译： 通过本发明提供了用于处理失真图像的方法和装置，并且在终端对获得的失真图像执行图像转换处理之后获得失真图像的失真参数; 终端根据失真参数对失真图像进行恢复处理。 本发明的方法和装置可以确保终端快速准确地将失真的图像恢复到清晰的图像，从而改善用户的体验。

公开(公告)号：US20110238365A1

公开(公告)日：2011-09-29

申请号：US13053584

申请日：2011-03-22

申请人： Jie Li ,  Zhuan Liu ,  Silvio J. Rabello ,  Nigel P. Smith

发明人： Jie Li ,  Zhuan Liu ,  Silvio J. Rabello ,  Nigel P. Smith

IPC分类号： G06F15/00 ,  G01B11/00

CPC分类号： G03F7/70633

摘要： An empirical diffraction based overlay (eDBO) measurement of an overlay error is produced using diffraction signals from a plurality of diffraction based alignment pads from an alignment target. The linearity of the overlay error is tested using the same diffraction signals or a different set of diffraction signals from diffraction based alignment pads. Wavelengths that do not have a linear response to overlay error may be excluded from the measurement error.

摘要翻译： 使用来自对准靶的多个基于衍射的对准焊盘的衍射信号产生覆盖误差的经验衍射叠加（eDBO）测量。 使用相同的衍射信号或来自基于衍射的对准焊盘的不同衍射信号集来测试覆盖误差的线性。 不会对测量误差排除不具有重叠误差线性响应的波长。