Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout
    1.
    发明申请
    Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout 有权
    使用数据库快速识别和纠正布局中的制造问题区域的方法和装置

    公开(公告)号:US20070198958A1

    公开(公告)日:2007-08-23

    申请号:US11637424

    申请日:2006-12-12

    IPC分类号: G06F17/50

    摘要: One embodiment provides a system for using a database to quickly identify a manufacturing problem area in a layout. During operation, the system receives a first check-figure which identifies a first area in a first layout, wherein the first area is associated with a first feature. Next, the system determines a first sample using the first check-figure, wherein the first sample represents the first layout's geometry within a first ambit of the first check-figure, wherein the first sample's geometry is expected to affect the shape of the first feature. The system then performs a model-based simulation using the first sample to obtain a first simulation-result which indicates whether the first feature is expected to have manufacturing problems. Next, the system stores the first simulation-result in a database which is used to quickly determine whether a second feature is expected to have manufacturing problems.

    摘要翻译: 一个实施例提供了一种使用数据库来快速识别布局中的制造问题区域的系统。 在操作期间,系统接收第一检查图,其识别第一布局中的第一区域,其中第一区域与第一特征相关联。 接下来,系统使用第一检查图确定第一样本,其中第一样本表示第一检查图的第一范围内的第一布局的几何形状,其中预期第一样本的几何形状影响第一特征的形状 。 然后,系统使用第一样本执行基于模型的模拟,以获得第一模拟结果,其指示第一特征是否预期具有制造问题。 接下来,系统将第一模拟结果存储在用于快速确定第二特征是否期望具有制造问题的数据库中。

    Method and apparatus for determining an optical model that models the effects of optical proximity correction
    2.
    发明申请
    Method and apparatus for determining an optical model that models the effects of optical proximity correction 有权
    用于确定对光学邻近校正的影响进行建模的光学模型的方法和装置

    公开(公告)号:US20080235651A1

    公开(公告)日:2008-09-25

    申请号:US11726505

    申请日:2007-03-21

    CPC分类号: G03F1/36

    摘要: One embodiment provides a system that can enable a designer to determine the effects of subsequent processes at design time. During operation, the system may receive a test layout and an optical model that models an optical system, but which does not model the effects of subsequent processes, such as optical proximity correction (OPC). The system may generate a first dataset using the test layout and the optical model. Next, the system may apply OPC to the test layout, and generate a second dataset using the corrected test layout and the optical model. The system may then use the first dataset and the second dataset to adjust the optical model to obtain a second optical model that models the effects of subsequent processes.

    摘要翻译: 一个实施例提供了一种能够使设计者在设计时确定后续处理的效果的系统。 在操作期间,系统可以接收测试布局和对光学系统进行建模但不对后续过程的影响进行建模的光学模型,例如光学邻近校正(OPC)。 系统可以使用测试布局和光学模型生成第一个数据集。 接下来,系统可以将OPC应用于测试布局,并使用校正的测试布局和光学模型生成第二数据集。 然后,系统可以使用第一数据集和第二数据集来调整光学模型以获得对随后过程的影响进行建模的第二光学模型。

    Derivatives of hydroxyprimidines as leukotriene synthesis inhibitors
    3.
    发明授权
    Derivatives of hydroxyprimidines as leukotriene synthesis inhibitors 失效
    羟脯氨酸衍生物作为白三烯合成抑制剂

    公开(公告)号:US4940712A

    公开(公告)日:1990-07-10

    申请号:US358032

    申请日:1989-05-26

    摘要: 2-Amino and 2-thio-4-substituted-5-(hydroxy or alkoxy)-pyrimidines, which may be 6-substituted, and derivatives thereof are disclosed. The compounds are inhibitors of leukotriene synthesis and are, therefore, useful for the treatment of pulmonary, inflammatory, dermatological, allergic and cardiovascular diseases. The compounds are also cytoprotective and therefore, useful in the treatment of peptic ulcers.

    摘要翻译: 公开了可以是6-取代的2-氨基和2-硫代-4-取代-5-(羟基或烷氧基) - 嘧啶,及其衍生物。 这些化合物是白三烯合成的抑制剂,因此可用于治疗肺,炎症,皮肤病,过敏性和心血管疾病。 这些化合物也是细胞保护性的,因此可用于治疗消化性溃疡。

    Method and system for correlating physical model representation to pattern layout
    4.
    发明申请
    Method and system for correlating physical model representation to pattern layout 有权
    将物理模型表示与模式布局相关联的方法和系统

    公开(公告)号:US20080219590A1

    公开(公告)日:2008-09-11

    申请号:US11716511

    申请日:2007-03-09

    IPC分类号: G06K9/64

    CPC分类号: G02B27/0012 G03F1/36

    摘要: One embodiment of the present invention provides a system that reduces computational complexity in simulating an image resulting from an original mask and an optical transmission system. During operation, the system obtains a set transmission cross coefficient (TCC) kernel functions based on the optical transmission system, and obtains a set of transmission functions for a representative pattern which contains features representative of the original mask. The system constructs a new set of kernel functions based on the TCC kernel functions and the transmission functions for the representative pattern, wherein responses to the new kernel functions in a resulting image corresponding to the representative pattern are substantially uncorrelated with one another. The system further produces an intensity distribution of a resulting image corresponding to the original mask based on the new kernel functions, thereby facilitating prediction of a layout that can be produced from the original mask.

    摘要翻译: 本发明的一个实施例提供一种降低模拟由原始掩模和光传输系统产生的图像的计算复杂性的系统。 在运行过程中,系统基于光传输系统获得设置的传输交叉系数(TCC)核函数,并获得一组代表性模式的传输函数,其中代表性模式包含代表原始掩码的特征。 该系统基于TCC内核功能和代表性模式的传输功能构建新的一组内核函数,其中对应于代表性模式的所得图像中对新内核功能的响应基本上彼此不相关。 该系统进一步基于新的内核函数产生对应于原始掩码的结果图像的强度分布,从而有助于预测可以从原始掩模产生的布局。

    Method and apparatus for determining whether a sub-resolution assist feature will print
    5.
    发明申请
    Method and apparatus for determining whether a sub-resolution assist feature will print 有权
    用于确定子分辨率辅助特征是否将被打印的方法和装置

    公开(公告)号:US20070292777A1

    公开(公告)日:2007-12-20

    申请号:US11454439

    申请日:2006-06-15

    摘要: One embodiment of the present invention provides a system that determines whether a sub-resolution assist feature will print. During operation, the system receives a layout which contains a sub-resolution assist feature. Next, the system determines whether the sub-resolution assist feature will print using a process model and the layout. The process model is determined using first process data and second process data. The first process data is obtained using a first layout which is exposed using a first exposure level. The second process data is obtained using a second layout which is exposed using a second exposure level, which is different from the first exposure level. The second exposure level causes the sub-resolution assist features within the second layout to print.

    摘要翻译: 本发明的一个实施例提供一种确定副分辨率辅助特征是否将被打印的系统。 在操作期间,系统接收包含子分辨率辅助功能的布局。 接下来,系统确定子分辨率辅助功能是否使用过程模型和布局进行打印。 使用第一过程数据和第二过程数据确定过程模型。 使用使用第一曝光水平曝光的第一布局获得第一处理数据。 使用与第一曝光水平不同的第二曝光水平曝光的第二布局获得第二处理数据。 第二曝光水平导致第二布局中的分辨率辅助功能打印。

    Method and apparatus for determining a process model using a 2-D-pattern detecting kernel
    6.
    发明申请
    Method and apparatus for determining a process model using a 2-D-pattern detecting kernel 有权
    用于使用2-D图案检测内核确定过程模型的方法和装置

    公开(公告)号:US20080276211A1

    公开(公告)日:2008-11-06

    申请号:US11800171

    申请日:2007-05-04

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5068 G06F2217/10

    摘要: One embodiment provides a system for determining an improved process model that models one or more semiconductor manufacturing processes. During operation, the system can receive a first process model. Next, the system can receive a 2-D-pattern detecting kernel which can detect 2-D patterns. The system can then receive a second set of empirical data which is associated with 2-D patterns in a test layout. Next, the system can determine an improved process model using the first process model, the 2-D-pattern detecting kernel, the test layout, and the second set of empirical data.

    摘要翻译: 一个实施例提供了一种用于确定对一个或多个半导体制造工艺进行建模的改进的工艺模型的系统。 在运行过程中,系统可以接收第一个流程模型。 接下来,系统可以接收可以检测2-D图案的2-D图案检测内核。 然后,系统可以接收与测试布局中的2-D模式相关联的第二组经验数据。 接下来,系统可以使用第一过程模型,2-D模式检测内核,测试布局和第二组经验数据来确定改进的过程模型。

    Method and apparatus for determining an accurate photolithography process model
    7.
    发明申请
    Method and apparatus for determining an accurate photolithography process model 失效
    用于确定精确光刻工艺模型的方法和装置

    公开(公告)号:US20070283312A1

    公开(公告)日:2007-12-06

    申请号:US11443715

    申请日:2006-05-31

    IPC分类号: G06F17/50

    CPC分类号: G03F7/705

    摘要: One embodiment of the present invention provides a system that determines an accurate process model. During operation, the system receives process data. Next, the system receives an optical model which models an optical system of a photolithography process. The system then determines a stack model using the optical model, wherein the stack model models the effects of the photolithography process on the stack layers. Finally, the system determines a process model using the optical model, the stack model, and the process data.

    摘要翻译: 本发明的一个实施例提供一种确定精确过程模型的系统。 在操作期间,系统接收过程数据。 接下来,系统接收对光刻工艺的光学系统进行建模的光学模型。 系统然后使用光学模型确定堆叠模型,其中堆叠模型模拟光刻工艺对堆叠层的影响。 最后,系统使用光学模型,堆栈模型和过程数据确定过程模型。