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    METHOD FOR MANUFACTURING ULTRA LOW EXPANSION GLASS MIRROR SUBSTRATES
    2.
    发明申请
    METHOD FOR MANUFACTURING ULTRA LOW EXPANSION GLASS MIRROR SUBSTRATES 审中-公开
    制造超低透光度玻璃基板的方法

    公开(公告)号：US20150056415A1

    公开(公告)日：2015-02-26

    申请号：US14162829

    申请日：2014-01-24

    Applicant: Goodrich Corporation

    Inventor： Bari Marc Southard

    IPC: C03B19/01 ,  G02B5/08 ,  G02B5/10

    CPC classification number: C03B19/01 ,  B33Y10/00 ,  B33Y80/00 ,  C03C17/04 ,  C03C23/0025 ,  G02B5/08 ,  G02B5/10 ,  Y10T428/24521 ,  Y10T428/24612

    Abstract: A method of manufacturing a mirror substrate that includes the steps of providing a polishable substrate surface layer formed from ultra low expansion (ULE) glass, depositing successive layers of powdered ULE glass onto the polishable substrate surface layer, and selectively lasing each successive layer of powdered ULE glass to produce successive fused layers of ULE glass joined to one another to form a mirror substrate having an optimized three-dimensional topology. A mirror substrate manufactured according to the prescribed method is also disclosed.

    Abstract translation: 一种制造镜面基板的方法，包括以下步骤：提供由超低膨胀（ULE）玻璃形成的可抛光的基底表面层，将连续的粉末状ULE玻璃层沉积到可抛光的基底表面层上，并且选择性地激发每个连续的粉末状层 ULE玻璃以产生彼此连接的ULE玻璃的连续熔融层，以形成具有优化的三维拓扑的反射镜基板。 还公开了根据规定方法制造的镜面基板。

    Method for producing a cylinder from synthetic quartz glass
    3.
    发明授权
    Method for producing a cylinder from synthetic quartz glass 有权
    从合成石英玻璃制造圆筒的方法

    公开(公告)号：US08245542B2

    公开(公告)日：2012-08-21

    申请号：US12801378

    申请日：2010-06-04

    Applicant: Stefan Ochs ,  Steffen Zwarg ,  Mirko Wittrin ,  Martin Trommer

    Inventor： Stefan Ochs ,  Steffen Zwarg ,  Mirko Wittrin ,  Martin Trommer

    IPC: C03B37/018

    CPC classification number: C03B19/01 ,  C03B19/1453 ,  C03B37/01446 ,  C03B2201/04

    Abstract: A known method for producing synthetic quartz glass comprises the method steps: (a) forming a cylindrical SiO2 soot body having an inner portion and at least one free cylinder jacket surface surrounding the inner portion; (b) thermally drying the porous soot body; and (c) vitrifying the dried soot body with formation of the cylinder from synthetic quartz glass. Starting therefrom, to indicate a method which permits a particularly flat radial distribution in the inner portion of the cylinder, it is suggested according to the invention that the dried SiO2 soot body that is present after method step b) should be subjected to a homogenizing method prior to vitrification, the homogenizing method comprising the following steps: (I) heating the soot body to a consolidation temperature to form a sealing layer in the area of the at least one cylinder jacket, the sealing layer sealing the inner portion to the outside; (II) cooling the soot body from the consolidation temperature; and (III) annealing the soot body in the range of a homogenization temperature during a period of at least 5 hours so that the radial profile of the hydroxyl group concentration flattens in the inner portion.

    Abstract translation: 用于生产合成石英玻璃的已知方法包括以下方法步骤：（a）形成具有内部部分和围绕内部部分的至少一个自由圆筒形护套表面的圆柱形SiO 2烟灰体; （b）热干燥多孔烟炱体; 和（c）通过合成石英玻璃形成圆筒来使干燥的烟灰体玻璃化。 从此开始，为了表示允许气缸内部特别平坦的径向分布的方法，根据本发明，建议在方法步骤b）之后存在的干燥的SiO 2烟炱体应经受均匀化方法 在玻璃化之前，均化方法包括以下步骤：（I）将烟灰体加热至固化温度，以在至少一个气缸套的区域中形成密封层，密封层将内部部分密封到外部; （II）从固结温度冷却烟灰体; 和（III）在均匀化温度范围内在至少5小时的时间内使烟灰体退火，使得羟基浓度的径向分布在内部变平。

    METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS
    4.
    发明申请
    METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS 审中-公开
    生产合成石英玻璃的方法

    公开(公告)号：US20110059837A1

    公开(公告)日：2011-03-10

    申请号：US12736398

    申请日：2009-03-25

    Applicant: Waltraud Werdecker

    Inventor： Waltraud Werdecker

    IPC: C03C3/04

    CPC classification number: C03B19/01 ,  C03B19/1415 ,  Y02P40/57

    Abstract: In a known exterior deposition method for producing synthetic quartz glass, amorphous quartz glass powder particles (13) are fed to a reaction zone (12), the quartz glass powder particles are heated in the reaction zone (12) and deposited on the exterior side of a carrier (10) rotating about an axis of rotation. In order, proceeding from this, to specify a method which is distinguished by a high deposition efficiency, according to the invention it is proposed that amorphous quartz glass powder particles having a particle size of at least 3 μm together with a silicon-containing starting substance (14) are fed to the reaction zone (12), wherein the silicon-containing starting substance (14) is converted to SiO2 particles in the reaction zone, and the SiO2 particles are deposited in Co-15 deposition with the quartz glass powder particles on the carrier to form an SiO2-containing layer (11) in which the quartz glass powder particles (13) make up a proportion by weight of SiO2 in the range of 30% to 95%.

    Abstract translation: 在已知的用于制造合成石英玻璃的外部沉积方法中，将无定形石英玻璃粉末颗粒（13）进料到反应区域（12）中，将石英玻璃粉末颗粒在反应区域（12）中加热并沉积在外部 的绕旋转轴线旋转的载体（10）。 为此，为了指出以高沉积效率区分的方法，根据本发明，提出了具有至少3μm的粒度的无定形石英玻璃粉末颗粒和含硅起始物质 （14）进料到反应区（12），其中在反应区中将含硅起始物质（14）转化为SiO 2颗粒，并将SiO 2颗粒沉积在Co-15沉积物中，石英玻璃粉末颗粒 在载体上形成含SiO 2的层（11），其中石英玻璃粉末颗粒（13）占SiO 2重量比在30％至95％的范围内。

    Method of making extreme ultraviolet lithography glass substrates
    9.
    发明申请
    Method of making extreme ultraviolet lithography glass substrates 审中-公开
    制造极紫外光刻玻璃基板的方法

    公开(公告)号：US20040025542A1

    公开(公告)日：2004-02-12

    申请号：US10456318

    申请日：2003-06-05

    Inventor： Laura J. Ball ,  Sylvain Rakotoarison

    IPC: C03B019/06 ,  C03B037/018

    CPC classification number: C03B19/143 ,  C03B19/01 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/28 ,  C03B2201/30 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/42

    Abstract: A method for making extreme ultraviolet lithography tool glass substrates includes generating a plasma, delivering reactants comprising a silica precursor and a titania precursor into the plasma to produce titania and silica particles, and depositing the titania and silica particles on a deposition surface to form a homogeneous titania-doped silica. The invention provides for homogeneous glass substrates that are free of striae variations and provides for beneficial extreme ultraviolet lithography reflective optics.

    Abstract translation: 用于制造极紫外光刻工具玻璃基板的方法包括产生等离子体，将包含二氧化硅前体和二氧化钛前体的反应物输送到等离子体中以产生二氧化钛和二氧化硅颗粒，并将二氧化钛和二氧化硅颗粒沉积在沉积表面上以形成均匀的 二氧化钛掺杂二氧化硅。 本发明提供了不含条纹变化的均匀玻璃基底，并提供有益的极紫外光刻反射光学器件。

    Method of purifying natural or synthetic silica, and application thereof to depositing purified natural or synthetic silica on an optical fiber preform
    10.
    发明授权
    Method of purifying natural or synthetic silica, and application thereof to depositing purified natural or synthetic silica on an optical fiber preform 失效
    纯化天然或合成二氧化硅的方法及其在光纤预型体上沉积纯化天然或合成二氧化硅的应用

    公开(公告)号：US06477864B2

    公开(公告)日：2002-11-12

    申请号：US09035146

    申请日：1998-03-05

    Applicant: Alain Drouart ,  Benoît Gouez ,  Yves Lumineau ,  Pierre Ripoche ,  Jean-Florent Campion

    Inventor： Alain Drouart ,  Benoît Gouez ,  Yves Lumineau ,  Pierre Ripoche ,  Jean-Florent Campion

    IPC: C03B3718

    CPC classification number: C01B33/12 ,  C03B19/01 ,  C03B37/01291 ,  C03C1/022

    Abstract: Natural or synthetic silica is deposited on a preform set into rotation in front of a plasma torch which moves back and forth substantially parallel to a longitudinal direction of the preform, a first feed duct feeds the plasma with grains of natural or synthetic silica while a second feed duct feeds the plasma with a fluorine or chlorine compound, preferably a fluorine compound, mixed with a carrier gas. Any sodium or lithium contained in the grains of natural or synthetic silica react with the fluorine or chlorine of the fluorine or chlorine compound, thereby making it possible to improve the optical quality of fibers drawn from a preform built up with natural or synthetic silica, and to do so at reduced cost.

    Abstract translation: 将天然或合成二氧化硅沉积在等离子体焰炬的前面的预制件上，所述等离子体焰炬基本上平行于预成型件的纵向方向前后移动，第一进料管将天然或合成二氧化硅颗粒供给等离子体，而第二 进料管用与载气混合的氟或氯化合物，优选氟化合物来供给等离子体。 天然或合成二氧化硅颗粒中所含的任何钠或锂与氟或氯化合物的氟或氯反应，从而可以提高由天然或合成二氧化硅构成的预成型体所拉伸的纤维的光学品质， 以降低成本来做到这一点。

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