公开(公告)号：US20030221454A1

公开(公告)日：2003-12-04

申请号：US10302364

申请日：2002-11-22

Inventor： Bradley F. Bowden ,  Seann M. Bishop ,  Kenneth E. Hrdina ,  John F. Wight JR.

IPC: C03B019/06

CPC classification number: C03B19/06 ,  C03B2201/42

Abstract: A method for forming EUV Lithography straie-free glass structures is disclosed which includes forming a mixture of silica soot. The homogenized mixture is extruded into a flat planar pre-form, and the extruded pre-form is then consolidated by, heating into a substantially full density, substantially striae-free lithography glass substrate structure.

Abstract translation: 公开了一种形成EUV平版印刷无石英玻璃结构的方法，其包括形成二氧化硅烟灰的混合物。 将均化的混合物挤出成平坦的预成型体，然后通过加热到基本上全密度，基本上无条纹的平版印刷玻璃基底结构来固化挤出的预成型体。

公开(公告)号：US20030056538A1

公开(公告)日：2003-03-27

申请号：US10255723

申请日：2002-09-25

Inventor： Thomas A. Collins ,  Chunhong He ,  Christine E. Heckle ,  Raymond E. Lindner ,  Michael H. Wasilewski

IPC: C03B019/06

CPC classification number: C03B19/1423 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/32 ,  C03B2207/42

Abstract: Burners and methods for producing fused silica members. The burner includes seven gas-emitting regions, including four regions for emitting a mixture of oxygen and combustible gas.

Abstract translation: 燃烧器和生产熔凝石英件的方法。 燃烧器包括七个气体发射区域，包括用于发射氧气和可燃气体的混合物的四个区域。

公开(公告)号：US20030029195A1

公开(公告)日：2003-02-13

申请号：US10200069

申请日：2002-07-19

Inventor： Hiroyuki Watanabe

IPC: C03B019/06

CPC classification number: C03B19/095

Abstract: A method and an apparatus for producing a quartz glass crucible for pulling up a silicon single crystal capable of effectively reducing the content of bubbles by reducing the bubble diameters of the outer layer of the crucible are proposed. The method comprises the method step that during heat-melting of a porous outer molding a processing gas is supplied for flowing through the porous molding, whereby the processing gas preferably contains less nitrogen than air or less oxygen than air.

Abstract translation: 提出了一种通过降低坩埚外层的气泡直径来制造用于提升能够有效降低气泡含量的硅单晶的石英玻璃坩埚的方法和装置。 该方法包括以下方法步骤：在多孔外部模制品的加热熔化期间，提供处理气体流过多孔模制物，由此处理气体优选包含比空气少的氧或比空气少的氧。

公开(公告)号：US20020157420A1

公开(公告)日：2002-10-31

申请号：US09844081

申请日：2001-04-27

Inventor： Kenneth E. Hrdina ,  Nikki J. Russo ,  Michael H. Wasilewski

IPC: C03B019/06 ,  C03B019/14

CPC classification number: C03B19/1453 ,  C03B19/1407 ,  C03B19/1484 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/42 ,  C03B2207/32

Abstract: A method for forming a fused silica glass includes delivering a silica precursor to a burner and passing the silica precursor through the flame of the burner to form silica particles, depositing the silica particles on a planar surface to form a flat, porous preform, dehydrating the porous preform, and consolidating the porous preform into a flat, dense glass.

Abstract translation: 用于形成熔融石英玻璃的方法包括将二氧化硅前体输送到燃烧器并使二氧化硅前体通过燃烧器的火焰以形成二氧化硅颗粒，将二氧化硅颗粒沉积在平坦表面上以形成平坦多孔的预制件，使 多孔预制件，并将多孔预成型件固结成平坦，致密的玻璃。

公开(公告)号：US20020148256A1

公开(公告)日：2002-10-17

申请号：US10161433

申请日：2002-05-30

Applicant: Schott ML GmbH

Inventor： Frank Coriand ,  Andreas Menzel ,  Andreas Voitsch

IPC: C03B019/06

CPC classification number: C03C4/0085 ,  C03B19/1407 ,  C03B19/1423 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/62 ,  C03C3/06 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40

Abstract: A synthetic quartz glass preform is produced by flame hydrolysis with subsequent cooling and is suitable for the application of high-energy DUV radiation in the wave length range under 250 nm. The preform has a core area which contains null1150 ppm OH, a strain double refraction of null5 nm/cm and a resistance to high-energy DUV radiation as a result of a transmission reduction of nullTnull0.1%/cm thickness. The quartz glass has been exposed to the following radiation: wavelength null1null248 nm, laser shot frequencynull300 Hz, laser shot valuenull109 and luminationnull10 mJ/cm2, and wavelength null2null193 nm, laser shot frequencynull300 Hz, laser shot valuenull109 and lumination

Abstract translation: 合成石英玻璃预成型体通过随后的冷却通过火焰水解制备，并且适用于在250nm以下的波长范围内应用高能DUV辐射。 预成型体具有包含> = 1150ppm OH的核心区域，<= 5nm / cm的应变双折射和由于DELTAT <= 0.1％/ cm厚度的透射率降低而导致的高能量DUV辐射的耐受性 。 石英玻璃暴露于以下辐射：波长lambd1 = 248nm，激光射击频率> = 300Hz，激光射击值> = 109和照明<= 10mJ / cm 2，波长lambd2 = 193nm，激光射击频率 > = 300Hz，激光拍摄值> = 109和照度<5mJ / cm 2。 用于生产预成型件的装置包括水平定位的具有彼此面对的两个不同尺寸开口的马弗。 较大的开口用于去除预制件，较小的开口用于引入燃烧器。 马弗炉的内腔从较大的开口变窄到较小的开口。

公开(公告)号：US20020092324A1

公开(公告)日：2002-07-18

申请号：US10006983

申请日：2001-12-04

Inventor： Rahul Ganguli ,  Steven Colbern

IPC: C03B019/06 ,  C03B020/00

CPC classification number: C04B35/624 ,  C04B35/14 ,  C04B35/62218 ,  C04B35/64

Abstract: A new method is disclosed for producing thin plates by sintering a thin gel plate (e.g., silica) made using a sol-gel process, which substantially eliminates warpage of the plate during the sintering step. Sintering a sol-gel based silica plate to a dense glass typically causes significant shrinkage, and this can cause the plate to curl, especially around its edges. This phenomenon is referred to as warpage. In the method of the invention, the sintering step is performed while the gel plate is mounted on a support surface, separated by a thin layer of refractory powder. At the high sintering temperature, the powder partially fuses and sticks to both the gel plate and the support surface, which prevents non-uniform stresses in the gel plate from warping the plate.

Abstract translation: 公开了通过烧结使用溶胶 - 凝胶法制造的薄凝胶板（例如二氧化硅）来制造薄板的新方法，其基本上消除了在烧结步骤期间板的翘曲。 将溶胶 - 凝胶基二氧化硅板烧结到致密的玻璃上通常会导致明显的收缩，并且这可能导致板卷曲，特别是在其边缘周围。 这种现象被称为翘曲。 在本发明的方法中，在将凝胶板安装在由难熔粉末薄层分离的支撑表面上的同时进行烧结步骤。 在高烧结温度下，粉末部分地熔化并粘附到凝胶板和支撑表面上，这防止凝胶板中的不均匀应力翘曲板。

公开(公告)号：US20040025542A1

公开(公告)日：2004-02-12

申请号：US10456318

申请日：2003-06-05

Inventor： Laura J. Ball ,  Sylvain Rakotoarison

IPC: C03B019/06 ,  C03B037/018

CPC classification number: C03B19/143 ,  C03B19/01 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/28 ,  C03B2201/30 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/42

Abstract: A method for making extreme ultraviolet lithography tool glass substrates includes generating a plasma, delivering reactants comprising a silica precursor and a titania precursor into the plasma to produce titania and silica particles, and depositing the titania and silica particles on a deposition surface to form a homogeneous titania-doped silica. The invention provides for homogeneous glass substrates that are free of striae variations and provides for beneficial extreme ultraviolet lithography reflective optics.

Abstract translation: 用于制造极紫外光刻工具玻璃基板的方法包括产生等离子体，将包含二氧化硅前体和二氧化钛前体的反应物输送到等离子体中以产生二氧化钛和二氧化硅颗粒，并将二氧化钛和二氧化硅颗粒沉积在沉积表面上以形成均匀的 二氧化钛掺杂二氧化硅。 本发明提供了不含条纹变化的均匀玻璃基底，并提供有益的极紫外光刻反射光学器件。

公开(公告)号：US20030136153A1

公开(公告)日：2003-07-24

申请号：US10339927

申请日：2003-01-10

Inventor： Floyd E. Marley ,  Daniel R. Sempolinski ,  Merrill F. Sproul

IPC: C03B005/02 ,  C03B019/06 ,  C03B001/00 ,  C01B033/12

CPC classification number: C03B19/1484 ,  C03B2207/62 ,  C03B2207/70

Abstract: Methods and apparatus for producing fused silica members having high internal transmission are disclosed. The apparatus and methods are capable of producing fused silica having internal transmission of at least 99.65%/cm at 193 nm.

公开(公告)号：US20030131626A1

公开(公告)日：2003-07-17

申请号：US10262395

申请日：2002-10-01

Applicant: Schott Glas

Inventor： Lars Ortmann ,  Matthias Schmidt ,  Gordon von der Gonna ,  Rolf Martin

IPC: C03B019/06

CPC classification number: C03B19/1423 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/36 ,  C03B2207/60 ,  C03B2207/70

Abstract: For improving the refractive index homogeneity of quartz glass bodies, at least one burner is disposed movably in a melting device with respect to the quartz glass object which is to be produced. The burner has three essentially concentrically disposed groups of nozzles for metering the raw material, supplying the hydrogen and supplying the oxygen. Corresponding to the changes in the distribution of OH and H2 between the center and the edge of the quartz glass object, the volumes of hydrogen and/or oxygen of the burner gases flowing change as a function of the burner position with respect to the quartz glass object in order to bury the mixing ratio in the burner gas.

Abstract translation: 为了提高石英玻璃体的折射率均匀性，至少一个燃烧器相对于待生产的石英玻璃物体可移动地设置在熔化装置中。 燃烧器具有三个基本上同心设置的喷嘴组，用于计量原料，供应氢气和供应氧气。 对应于石英玻璃物体的中心和边缘之间的OH和H2的分布变化，燃烧器气体的氢气和/或氧气的体积相对于石英玻璃作为燃烧器位置的函数而变化 以便将燃烧器气体中的混合比掩埋。

公开(公告)号：US20030061832A1

公开(公告)日：2003-04-03

申请号：US10145177

申请日：2002-05-13

Inventor： Hu Chun Yi ,  Jacques Y. Guigne ,  John J. Moore

IPC: C03B019/06

CPC classification number: C03B19/108 ,  C03B19/1005 ,  C03B2201/60 ,  C03B2201/62 ,  C03C14/004 ,  C03C2214/20 ,  C03C2214/30

Abstract: The present invention is directed to the preparation of in-situ formation of a series of glass-ceramic composites by the Self-propagating High temperature Synthesis (SHS) technique with advantages of processing simplicity as well as the potential of cost savings. The materials produced by the technique contain crystalline TiB2 phase and have either a pure glassy matrix or a glass matrix with partial devitrification based on the Al2O3nullCaO system. The materials can potentially be used for infrared light transmission and for other high temperature applications. These materials can also be produced with relatively high porosity.

Abstract translation: 本发明涉及通过自蔓延高温合成（SHS）技术制备一系列玻璃 - 陶瓷复合材料的原位形成，其优点是加工简单以及节约成本的潜力。 通过该技术生产的材料含有晶体TiB 2相，并且具有基于Al2O3-CaO系统的部分失透的纯玻璃质基体或玻璃基体。 这些材料可以用于红外光透射和其他高温应用。 这些材料也可以以相对高的孔隙率制造。