Abstract:
Provided is an electron beam scanning method for forming an electric field for appropriately guiding electrons emitted from a pattern to the outside of the pattern, and also provided is a scanning electron microscope. When an electron beam for forming charge is irradiated to a sample, a first electron beam is irradiated to a first position (1) and a second position (2) having the center (104) of a pattern formed on the sample as a symmetrical point, and is then additionally irradiated to two central positions (3, 4) between the first and second irradiation position, the two central positions (3, 4) being on the same radius centered on the symmetrical point as are the first and second positions. Further, after that, the irradiation of the first electron beam to the central positions between existing scanning positions on the radius is repeated.
Abstract:
A multi-level conductive matrix structure for separating rows and columns of sub-pixels on the faceplate of a flat panel display device. In one embodiment, the present invention is formed partially of a first plurality of conductive ridges which are disposed on the faceplate between respective adjacent rows of sub-pixel regions. The present invention is further formed of a second plurality of conductive ridges which are orthogonally oriented with respect to and integral with the first plurality of conductive ridges such that a matrix structure is formed. In the conductive matrix of the present invention, the second plurality of conductive ridges have a height which is greater than the height of the first plurality of conductive ridges such that a multi-level conductive matrix is formed. However, the height of the second plurality of conductive ridges decreases to approximately the height of the first plurality of conductive ridges at respective intersections of the first and second plurality of conductive ridges. In so doing, the present invention provides a multi-level conductive matrix for separating rows and columns of sub-pixels on the faceplate of a flat panel display device.
Abstract:
A field emission device (200, 300, 400, 500) includes a supporting substrate (210, 310, 410, 510), a cathode (215, 315, 415, 515) formed thereon, a plurality of electron emitters (270, 370, 470, 570) and a plurality of gate extraction electrodes (250, 350, 450, 550) proximately disposed to the plurality of electron emitters (270, 370, 470, 570) for effecting electron emission therefrom, a major dielectric surface (248, 348, 448, 548) disposed between the plurality of gate extraction electrodes (250, 350, 450, 550), a charge dissipation layer (252, 352, 452, 552) formed on the major dielectric surface (248, 348, 448, 548), and an anode (280, 380, 480, 580) spaced from the gate extraction electrodes (250, 350, 450, 550).
Abstract:
Provided is an electron beam scanning method for forming an electric field for appropriately guiding electrons emitted from a pattern to the outside of the pattern, and also provided is a scanning electron microscope. When an electron beam for forming charge is irradiated to a sample, a first electron beam is irradiated to a first position (1) and a second position (2) having the center (104) of a pattern formed on the sample as a symmetrical point, and is then additionally irradiated to two central positions (3, 4) between the first and second irradiation position, the two central positions (3, 4) being on the same radius centered on the symmetrical point as are the first and second positions. Further, after that, the irradiation of the first electron beam to the central positions between existing scanning positions on the radius is repeated.
Abstract:
A flat-panel display having a backplate structure (330), a faceplate structure (320), and a spacer (340) situated between the two plate structures is configured so that the electric potential field along the spacer approximates the potential field that would be present at the same location in free space, i.e., in the absence of the spacer, between the two plate structures. Consequently, the presence of the spacer does not significantly affect the trajectories of electrons moving from the backplate structure to the faceplate structures. Alternatively, the spacer is arranged to produce electron deflection that largely compensates for undesired electron deflection which occurs during earlier electron travel from the backplate structure to the faceplate structure. The net electron deflection is small.
Abstract:
A flat panel display has a faceplate structure, a backplate structure, a focusing structure, and a plurality of spacers. The backplate structure includes an electron emitting structure which faces the faceplate structure. The focusing structure has a first surface coupled to the electron emitting structure, and a second surface which extends away from the electron emitting structure. The electrical end of the combination of the focusing structure and the electron emitting structure is located at an imaginary plane located intermediate the first and second surfaces of the focusing structure. A spacers is located between the focusing structure and the light emitting structure. The spacer is typically located within a corresponding groove in the focusing structure such that the electrical end of the spacer is coincident with the electrical end of the combination of the focusing structure and the electron emitting structure. In other embodiments, the electrical end of the spacer is located above the electrical end of the combination of the focusing structure and the electron emitting structure. In these embodiments, a face electrode on the spacer compensates for the resulting voltage distribution.
Abstract:
A support structure is provided that enables the use of high-voltage phosphors in field-emission flat panel displays, to maintain the vacuum gap between the cathode and the anode at a constant distance and to prevent distortion of the transparent view screen and backing plate of the display. A number of independent techniques each contributes to the solution of the problem of secondary electron emission. One technique is to alter the geometry of the triple junction of the support structure, the cathode, and the vacuum gap, thereby reducing the electrostatic field created at the triple junction. Reducing the electrostatic field reduces the initial primary electron bombardment originating at the triple junction. Altering the geometry of the support surface with respect to the field lines present at the triple junction also increases the probability that impinging electrons will impact at or nearly at right angles, and will also tend to be directed by the field lines back into the "pocket" created by the shaping of the support structure edge, preventing secondary electrons from escaping and traveling along the structure surface to the anode. In accordance with another technique, the support structure is fluted so as to reduce the average coefficient of secondary electron emission, to trap a proportion of secondary electrons, and to limit the number of hops of other secondary electrons. In another technique, a high resistivity conductive layer is formed at the triple junction in order to reduce the field potential at the triple junction. A similar conductive layer may be formed at the opposite junction of the support structure, the anode, and the vacuum gap. A high resistivity conductive material coated on the surface of the insulating spacer can be used to decrease the charge relaxation time of the insulator, thereby maintaining a constant field potential over the surface of the insulator, reducing areas of high field potential which will tend to accelerate secondary electron emissions. In accordance with other techniques, the support structure is made of a non-porous material and may be coated with a coating having low secondary emission characteristics.
Abstract:
A field emission display (100) includes a dielectric layer (132) having a plurality of emitter wells (134), a plurality of electron emitters (136) disposed one each within the plurality of emitter wells (134), a plurality of conductive rows (138, 140, 142) disposed on the dielectric layer (132) and having sacrificial portions (154), an ion shield (139) disposed on the dielectric layer (132) and spaced apart from the sacrificial portions (154) of the plurality of conductive rows (138, 140, 142), and an anode (121) opposing the plurality of electron emitters (136) and defining a projected area (122) at the plurality of conductive rows (138, 140, 142). The sacrificial portions (154) of the plurality of conductive rows (138, 140, 142) extend beyond the projected area (122) of the anode (121).
Abstract:
An image forming apparatus using an electron source which has matrix-wired electron-emitting devices connected with wiring electrodes of conductive material, and a fluorescent member as an image forming member with an accelerating electrode on its inner surface side, opposite to the electron-emitting devices. The wiring electrodes include a wiring electrode where a semiconductive support member (spacer) is provided via a conductive connection member and a wiring electrode where the semiconductive support member is not provided. The height of the upper surface of the conductive connection member on which the semiconductive support member is provided and that of the upper surface of the wiring electrode where the semiconductive support member is not provided are the same, to prevent shift of electron-beam trajectories around the semiconductive support member, due to disturbance of electric-field distribution.
Abstract:
The intensity at which electrons emitted by a first plate structure (10) in a flat-panel display strike a second plate structure (12) for causing it to emit light is controlled so as to reduce image degradation that could otherwise arise from undesired electron-trajectory changes caused by effects such as the presence of a spacer system (14) between the plate structures. An electron-emissive region (20) in the first plate structure typically contains multiple laterally separated electron-emissive portions (201 and 202) for selectively emitting electrons. An electron-focusing system in the first plate structure has corresponding focus openings (42P1 and 42P2) through which electrons emitted by the electron-emissive portions respectively pass. Upon being struck by the so-emitted electrons, a light-emissive region (22) in the second plate structure emits light to produce at least part of a dot of the display's image.