ELECTRON-EMITTING DEVICE, ELECTRON SOURCE, IMAGE DISPLAY APPARATUS, AND METHOD FOR MANUFACTURING ELECTRON-EMITTING DEVICE
    1.
    发明申请
    ELECTRON-EMITTING DEVICE, ELECTRON SOURCE, IMAGE DISPLAY APPARATUS, AND METHOD FOR MANUFACTURING ELECTRON-EMITTING DEVICE 审中-公开
    电子发射装置,电子源,图像显示装置和制造电子发射装置的方法

    公开(公告)号:US20090153013A1

    公开(公告)日:2009-06-18

    申请号:US12331236

    申请日:2008-12-09

    IPC分类号: H01J1/02 H01J9/02

    摘要: A method for manufacturing an electron-emitting device according to the present invention includes a step of preparing a carbon layer containing conductive metallic particles, a step of oxidizing a portion the conductive metallic particles, and a step of forming a dipole layer on a surface of the carbon layer. An electron-emitting device according to the present invention is manufactured by the manufacturing method for the electron-emitting device. An electron source according to the present invention includes a plurality of the electron-emitting devices. An image display apparatus according to the present invention includes the electron source and a image forming member which forms an image by an electron emitted from the electron source.

    摘要翻译: 根据本发明的制造电子发射器件的方法包括制备含有导电金属颗粒的碳层,氧化导电金属颗粒的一部分的步骤和在偶极子层的表面上形成偶极层的步骤 碳层。 根据本发明的电子发射器件通过电子发射器件的制造方法制造。 根据本发明的电子源包括多个电子发射器件。 根据本发明的图像显示装置包括电子源和通过从电子源发射的电子形成图像的图像形成部件。

    MEMS-based two-dimensional e-beam nano lithography device and method for making the same
    3.
    发明授权
    MEMS-based two-dimensional e-beam nano lithography device and method for making the same 有权
    基于MEMS的二维电子束纳米光刻装置及其制造方法

    公开(公告)号:US07012266B2

    公开(公告)日:2006-03-14

    申请号:US10350642

    申请日:2003-01-24

    申请人: Sungho Jin

    发明人: Sungho Jin

    IPC分类号: H01J37/065

    摘要: In accordance with the present invention, apparatus for performing electron beam lithography on selected portions of a substrate having a resist covered surface comprises a plurality of nanoscale electron emitters for emitting directional beams of electrons and, for each emitter, a directional control element to direct the emitted beam toward the selected portions. In a preferred embodiment the emitters comprise carbon nanotubes, and the directional control elements comprise micro-electro-mechanical disks in a two-dimensional array. In an alternative embodiment the directional control elements are electrodes.

    摘要翻译: 根据本发明,用于在具有抗蚀剂覆盖表面的衬底的选定部分上进行电子束光刻的装置包括用于发射电子的定向束的多个纳米级电子发射器,并且对于每个发射器,定向控制元件引导 向所选择的部分发射光束。 在优选实施例中,发射器包括碳纳米管,并且方向控制元件包括二维阵列中的微机电盘。 在替代实施例中,方向控制元件是电极。

    Current controlling element
    4.
    发明授权
    Current controlling element 失效
    电流控制元件

    公开(公告)号:US06476336B1

    公开(公告)日:2002-11-05

    申请号:US09688622

    申请日:2000-10-16

    IPC分类号: H01L4100

    CPC分类号: H01L41/0973 H01J2201/30

    摘要: An actuator having a fixed portion, a vibrating portion supported on the fixed portion so as to undergo vibrations, and an actuating portion including a first and a second electrodes formed on both sides or one side of a deformable layer is provided. The actuator generates displacement motion by holding the electric potential of the first electrode at a constant value and variably controlling the electric potential of the second electrode. A cathode for emitting electrons is formed on the actuator. The current controlling element changes the position of the cathode with respect to the plate by the displacement motion of the actuator to control a current value taken out of the plate.

    摘要翻译: 具有固定部分的致动器,支撑在固定部分上以进行振动的振动部分,以及包括形成在可变形层的两侧或一侧上的第一和第二电极的致动部分。 致动器通过将第一电极的电位保持在恒定值并可变地控制第二电极的电位而产生位移运动。 在致动器上形成用于发射电子的阴极。 电流控制元件通过致动器的位移运动来改变阴极相对于板的位置,以控制从板取出的电流值。

    MEMS-based two-dimensional e-beam nano lithography device and method for making the same
    6.
    发明申请
    MEMS-based two-dimensional e-beam nano lithography device and method for making the same 有权
    基于MEMS的二维电子束纳米光刻装置及其制造方法

    公开(公告)号:US20040036398A1

    公开(公告)日:2004-02-26

    申请号:US10350642

    申请日:2003-01-24

    发明人: Sungho Jin

    IPC分类号: H01J001/02

    摘要: In accordance with the present invention, apparatus for performing electron beam lithography on selected portions of a substrate having a resist covered surface comprises a plurality of nanoscale electron emitters for emitting directional beams of electrons and, for each emitter, a directional control element to direct the emitted beam toward the selected portions. In a preferred embodiment the emitters comprise carbon nanotubes, and the directional control elements comprise micro-electro-mechanical disks in a two-dimensional array. In an alternative embodiment the directional control elements are electrodes.

    摘要翻译: 根据本发明,用于在具有抗蚀剂覆盖表面的衬底的选定部分上进行电子束光刻的装置包括用于发射电子的定向束的多个纳米级电子发射器,并且对于每个发射器,定向控制元件引导 向所选择的部分发射光束。 在优选实施例中,发射器包括碳纳米管,并且方向控制元件包括二维阵列中的微机电盘。 在替代实施例中,方向控制元件是电极。

    Active matrix vacuum fluorescent display using pixel isolation
    7.
    发明授权
    Active matrix vacuum fluorescent display using pixel isolation 失效
    有源矩阵真空荧光显示采用像素隔离

    公开(公告)号:US5541478A

    公开(公告)日:1996-07-30

    申请号:US205462

    申请日:1994-03-04

    IPC分类号: H01J29/46 H01J31/15 H01J1/62

    摘要: An active matrix transistor array substrate for a reconfigurable vacuum fluorescent display comprising a set of individually addressable pixels and an isolation grid surrounding each pixel of the set and isolating each pixel of the set from all other pixels of the set. The isolation grid is especially advantageous in a high density active matrix display for preventing one pixel that is switched off from inhibiting a neighboring pixel that is switched on from fully illuminating.

    摘要翻译: 一种用于可重新配置的真空荧光显示器的有源矩阵晶体管阵列基板,包括一组单独可寻址的像素和围绕该组的每个像素的隔离栅格,并将该集合的每个像素与该集合的所有其它像素隔离。 隔离栅格在高密度有源矩阵显示器中是特别有利的,用于防止关闭的一个像素禁止从完全照明接通的相邻像素。