SOLID-STATE IMAGING DEVICE AND METHOD FOR PRODUCING THE SAME
    2.
    发明申请
    SOLID-STATE IMAGING DEVICE AND METHOD FOR PRODUCING THE SAME 有权
    固态成像装置及其制造方法

    公开(公告)号:US20090075417A1

    公开(公告)日:2009-03-19

    申请号:US12179433

    申请日:2008-07-24

    申请人: Maki SAITO

    发明人: Maki SAITO

    IPC分类号: H01L21/00

    摘要: In the solid-state imaging device of the present invention having a photoelectric conversion section and a charge transfer section equipped with a charge transfer electrode for transferring an electric charge generated in the photoelectric conversion section, the charge transfer electrode has an alternate arrangement of a first layer electrode comprising a first layer electrically conducting film and a second layer electrode comprising a second layer electrically conducting film, which are formed on a gate oxide film comprising a laminate film consisting of a silicon oxide film and a metal oxide thin film, and the first layer electrode and the second layer electrode are separated by insulation with an interelectrode insulating film comprising a sidewall insulating film formed by a CVD process to cover the lateral wall of the first layer electrode.

    摘要翻译: 在具有光电转换部分和配备有用于转移在光电转换部分中产生的电荷的电荷转移电极的电荷转移部分的本发明的固态成像装置中,电荷转移电极具有第一 其包括第一层导电膜和包括第二层导电膜的第二层电极,所述第二层电极形成在包括由氧化硅膜和金属氧化物薄膜构成的层压膜的栅极氧化物膜上,并且所述第一层导电膜 层间电极和第二层电极通过绝缘体分离,该电极间绝缘膜包括通过CVD工艺形成的侧壁绝缘膜以覆盖第一层电极的侧壁。

    Method of producing a solid state imaging device including using a metal oxide etching stopper
    3.
    发明授权
    Method of producing a solid state imaging device including using a metal oxide etching stopper 有权
    包括使用金属氧化物蚀刻阻挡件的固态成像装置的制造方法

    公开(公告)号:US07772017B2

    公开(公告)日:2010-08-10

    申请号:US12179433

    申请日:2008-07-24

    申请人: Maki Saito

    发明人: Maki Saito

    摘要: In the solid-state imaging device of the present invention having a photoelectric conversion section and a charge transfer section equipped with a charge transfer electrode for transferring an electric charge generated in the photoelectric conversion section, the charge transfer electrode has an alternate arrangement of a first layer electrode comprising a first layer electrically conducting film and a second layer electrode comprising a second layer electrically conducting film, which are formed on a gate oxide film comprising a laminate film consisting of a silicon oxide film and a metal oxide thin film, and the first layer electrode and the second layer electrode are separated by insulation with an interelectrode insulating film comprising a sidewall insulating film formed by a CVD process to cover the lateral wall of the first layer electrode.

    摘要翻译: 在具有光电转换部分和配备有用于转移在光电转换部分中产生的电荷的电荷转移电极的电荷转移部分的本发明的固态成像装置中,电荷转移电极具有第一 其包括第一层导电膜和包括第二层导电膜的第二层电极,所述第二层电极形成在包括由氧化硅膜和金属氧化物薄膜构成的层压膜的栅极氧化物膜上,并且所述第一层导电膜 层间电极和第二层电极通过绝缘体分离,该电极间绝缘膜包括通过CVD工艺形成的侧壁绝缘膜以覆盖第一层电极的侧壁。

    Solid-state imaging device and method for producing the same
    5.
    发明授权
    Solid-state imaging device and method for producing the same 有权
    固态成像装置及其制造方法

    公开(公告)号:US07420235B2

    公开(公告)日:2008-09-02

    申请号:US11499697

    申请日:2006-08-07

    申请人: Maki Saito

    发明人: Maki Saito

    摘要: In the solid-state imaging device of the present invention having a photoelectric conversion section and a charge transfer section equipped with a charge transfer electrode for transferring an electric charge generated in the photoelectric conversion section, the charge transfer electrode has an alternate arrangement of a first layer electrode including a first layer electrically conducting film and a second layer electrode including a second layer electrically conducting film, which are formed on a gate oxide film including a laminate film consisting of a silicon oxide film and a metal oxide thin film, and the first layer electrode and the second layer electrode are separated by insulation with an interelectrode insulating film including a sidewall insulating film formed by a CVD process to cover the lateral wall of the first layer electrode.

    摘要翻译: 在具有光电转换部分和配备有用于转移在光电转换部分中产生的电荷的电荷转移电极的电荷转移部分的本发明的固态成像装置中,电荷转移电极具有第一 包括第一层导电膜的层状电极和包括第二层导电膜的第二层电极,其形成在包括由氧化硅膜和金属氧化物薄膜构成的层压膜的栅极氧化膜上,第一层 层间电极和第二层电极通过绝缘体分离,其中电极间绝缘膜包括通过CVD工艺形成的侧壁绝缘膜以覆盖第一层电极的侧壁。

    Solid-state imaging device and method for producing the same
    6.
    发明申请
    Solid-state imaging device and method for producing the same 有权
    固态成像装置及其制造方法

    公开(公告)号:US20070034981A1

    公开(公告)日:2007-02-15

    申请号:US11499697

    申请日:2006-08-07

    申请人: Maki Saito

    发明人: Maki Saito

    IPC分类号: H01L31/06

    摘要: In the solid-state imaging device of the present invention having a photoelectric conversion section and a charge transfer section equipped with a charge transfer electrode for transferring an electric charge generated in the photoelectric conversion section, the charge transfer electrode has an alternate arrangement of a first layer electrode comprising a first layer electrically conducting film and a second layer electrode comprising a second layer electrically conducting film, which are formed on a gate oxide film comprising a laminate film consisting of a silicon oxide film and a metal oxide thin film, and the first layer electrode and the second layer electrode are separated by insulation with an interelectrode insulating film comprising a sidewall insulating film formed by a CVD process to cover the lateral wall of the first layer electrode.

    摘要翻译: 在具有光电转换部分和配备有用于转移在光电转换部分中产生的电荷的电荷转移电极的电荷转移部分的本发明的固态成像装置中,电荷转移电极具有第一 其包括第一层导电膜和包括第二层导电膜的第二层电极,所述第二层电极形成在包括由氧化硅膜和金属氧化物薄膜构成的层压膜的栅极氧化物膜上,并且所述第一层导电膜 层间电极和第二层电极通过绝缘体分离,该电极间绝缘膜包括通过CVD工艺形成的侧壁绝缘膜以覆盖第一层电极的侧壁。

    Driving-gate charge-coupled device
    7.
    发明授权
    Driving-gate charge-coupled device 失效
    驱动门电荷耦合器件

    公开(公告)号:US6091092A

    公开(公告)日:2000-07-18

    申请号:US373237

    申请日:1995-01-05

    CPC分类号: H01L31/1122 H01L27/14831

    摘要: The invention relates to a charge-coupled device. Such devices comprise at least one insulated conducting gate (3) connecting two semiconductor zones. According to the invention, each insulated conducting gate (3) has a width progressively increasing from the first semiconductor zone (1) to the second semiconductor zone (2). The width of each gate (3) is sufficiently narrow for the potential well created by the application of a voltage V to the gate to have a depth increasing progressively from the first zone (1) to the second zone (2), thus enabling the charges to be driven away. The invention applies to any type of charge-coupled device and particularly to photodiodes.

    摘要翻译: PCT No.PCP / FR94 / 00506 Sec。 371 1995年1月5日第 102(e)日期1995年1月5日PCT提交1994年5月3日PCT公布。 出版物WO94 / 27322 日期:1994年11月24日本发明涉及电荷耦合器件。 这种装置包括连接两个半导体区域的至少一个绝缘导电栅极(3)。 根据本发明,每个绝缘导电栅极(3)的宽度从第一半导体区域(1)逐渐增加到第二半导体区域(2)。 每个栅极(3)的宽度对于通过向栅极施加电压V以使深度从第一区域(1)逐渐增加到第二区域(2)而产生的势阱足够窄,从而使得 收费被赶走。 本发明适用于任何类型的电荷耦合器件,特别适用于光电二极管。