摘要:
A resonator device (200) comprises a base (206) comprising an anchor (204) and a vibration unit (212) connected to the anchor (204). The vibration unit (212) is configured to have a first vibration mode (218) and a second vibration mode (216) different from the first vibration mode (218). According to an embodiment, the vibration unit (212) is configured such that the first vibration mode (218) and the second vibration mode (216) destructively interfere at the anchor (204).
摘要:
A resonator including a resonant element having a bulk and columns of a material having a Young's modulus with a temperature coefficient having a sign opposite to that of the bulk.
摘要:
A resonator device (200) comprises a base (206) comprising an anchor (204) and a vibration unit (212) connected to the anchor (204). The vibration unit (212) is configured to have a first vibration mode (218) and a second vibration mode (216) different from the first vibration mode (218). According to an embodiment, the vibration unit (212) is configured such that the first vibration mode (218) and the second vibration mode (216) destructively interfere at the anchor (204).
摘要:
A resonator includes a substantially disk shaped portion having a plurality of axes of symmetry and is configured to resonate in a plurality of resonant modes by symmetrically deforming about the plurality of axes of symmetry.
摘要:
An object of the invention is to provide a coupling element of an MEMS filter with design flexibility and minimization of mass loading effects. The invention provides a structure wherein the mass loading effects are not reflected on the MEMS filter characteristic by using a nanosize coupling element with a very small mass compared to a microsize MEMS resonator, such as a carbon nanotube (CNT), as a coupling element part.
摘要:
A micro-electromechanical resonator comprising a material having anisotropic directional elasticity characteristics. A shape of the resonator is such that a first distance in a first direction from a centroid of the resonator to a first point on a peripheral edge of the resonator is greater than a second distance in a second direction from the centroid to a second different point on the edge. This is true for every first direction and every second direction wherein the material has a lesser modulus of elasticity in the first direction than the second direction.
摘要:
A micro-electromechanical resonator comprising a material having anisotropic directional elasticity characteristics. A shape of the resonator is such that a first distance in a first direction from a centroid of the resonator to a first point on a peripheral edge of the resonator is greater than a second distance in a second direction from the centroid to a second different point on the edge. This is true for every first direction and every second direction wherein the material has a lesser modulus of elasticity in the first direction than the second direction.
摘要:
A resonator includes a substantially disk shaped portion having a plurality of axes of symmetry and is configured to resonate in a plurality of resonant modes by symmetrically deforming about the plurality of axes of symmetry.
摘要:
An object of the invention is to provide a coupling element of an MEMS filter with design flexibility and minimization of mass loading effects. The invention provides a structure wherein the mass loading effects are not reflected on the MEMS filter characteristic by using a nanosize coupling element with a very small mass compared to a microsize MEMS resonator, such as a carbon nanotube (CNT), as a coupling element part.
摘要:
A nanoresonator device with high quality factor and method for fabricating the same is disclosed herein. The nanoresonator device generally includes an input electrode, an output electrode, a nanoresonator anchored at its motionless nodal points of its resonance modes by support beam(s) and/or anchor. The nanoresonator device can be fabricated on various wafers including a silicon on insulator (SOI) wafer, which includes an insulating layer and a heavily doped silicon layer. The nano structures with high quality factor can be patterned on a film utilizing nano fabrication tools and the patterned structures can be utilized as a mask to form permanent nano structures on the silicon layer by reactive ion etching (RIE). The insulating layer can be removed to form the anchor beams and a cavity by wet etching utilizing an etching solution.