NANOMECHANICAL RESONATOR ARRAY AND PRODUCTION METHOD THEREOF
    9.
    发明申请
    NANOMECHANICAL RESONATOR ARRAY AND PRODUCTION METHOD THEREOF 有权
    NANOMANAN共振器阵列及其生产方法

    公开(公告)号:US20160087600A1

    公开(公告)日:2016-03-24

    申请号:US14785535

    申请日:2013-04-19

    申请人: KOC UNIVERSITESI

    IPC分类号: H03H9/24 B82B1/00 H03B5/30

    摘要: In the present invention, a nanomechanical resonator array (1), which is suitable being used in an oscillator and production method of said nanomechanical resonator array are developed. Said resonator array (1) comprises at least two resonators (2), which are in the size of nanometers, which are vertically arrayed and which are preferably in the form of nano-wire or nano-tube; at least one coupling membrane (3), which mechanically couples said resonators (2) from their one ends, and at least one clamping element (4), which supports mechanical coupling by clamping said coupling membrane (3). Said resonator array (1) can be actuated and its displacements can be sensed. The present invention develops a predictive model of the frequency response of an oscillator comprising the said resonator array (1) for electrostatic actuation and capacitive readout. An oscillator comprised of multiple resonator arrays (1) with different frequency responses connected to a frequency manipulation circuitry can be used as well. For silicon-based systems, said production method comprises the steps of patterning two windows on device silicon layer exposing it to plasma etching using Bosch process; carrying out a further oxidation to form nanowires in an oxide envelop; depositing further sacrificial material. Actuation and readout electrode integration comprises steps of electrode material deposition; self-aligned mask material deposition, chemical mechanical polishing; electrode material etch; releasing nanowires by etching sacrificial material and oxide envelope. For non-silicon-based systems, said production method comprises the steps of structural and sacrificial material deposition; patterning and anisotropic etching of both materials; isotropic etching of sacrificial material.

    摘要翻译: 在本发明中,开发了适用于振荡器的纳米机械谐振器阵列(1)和所述纳米机械谐振器阵列的制造方法。 所述谐振器阵列(1)包括至少两个垂直排列的纳米尺寸的谐振器(2),其优选地是纳米线或纳米管的形式; 至少一个耦合膜(3),其将所述谐振器(2)从其一端机械耦合,以及至少一个夹紧元件(4),其通过夹紧所述耦合膜(3)来支撑机械耦合。 可以致动所述谐振器阵列(1),并且可以感测其位移。 本发明开发了包括用于静电驱动和电容读出的所述谐振器阵列(1)的振荡器的频率响应的预测模型。 也可以使用包括具有连接到频率操纵电路的不同频率响应的多个谐振器阵列(1)的振荡器。 对于基于硅的系统,所述制造方法包括以下步骤:在器件硅层上图案化两个窗口,将其暴露于使用Bosch工艺的等离子体蚀刻; 进行进一步氧化以在氧化物包层中形成纳米线; 沉积更多的牺牲材料。 驱动和读出电极整合包括电极材料沉积的步骤; 自对准掩模材料沉积,化学机械抛光; 电极材料蚀刻; 通过蚀刻牺牲材料和氧化物包层释放纳米线。 对于非硅系统,所述生​​产方法包括结构和牺牲材料沉积步骤; 两种材料的图案化和各向异性蚀刻; 牺牲材料的各向同性蚀刻。

    Volume wave resonator using excitation/detection of vibrations
    10.
    发明授权
    Volume wave resonator using excitation/detection of vibrations 有权
    体积波谐振器使用激发/检测振动

    公开(公告)号:US09246472B2

    公开(公告)日:2016-01-26

    申请号:US14131341

    申请日:2012-07-06

    摘要: The invention relates to an acoustic volume wave resonator including a mounting, a resonating substrate, and a diaphragm. The mounting comprises an internal cavity and an internal electrode, so as to form a gap area between the internal electrode and a portion of the diaphragm. The resonating substrate is configured to generate longitudinal mode acoustic waves vibrating at the work frequency of the resonator, when an electrostatic field having a sinusoidal component at a work frequency is generated in the gap area by applying a differential voltage between the diaphragm or the first surface of the resonating substrate on the one hand and the internal electrode on the other hand.

    摘要翻译: 本发明涉及包括安装件,谐振基板和隔膜的声体积波谐振器。 安装件包括内部空腔和内部电极,以在内部电极和隔膜的一部分之间形成间隙区域。 谐振衬底被配置为当通过在隔膜或第一表面之间施加差分电压而在间隙区域中产生具有工作频率的正弦分量的静电场时,产生在谐振器的工作频率下振动的纵向模式声波 一方面是共振衬底,另一方面是内部电极。