公开(公告)号：US3684673A

公开(公告)日：1972-08-15

申请号：US3684673D

申请日：1970-06-29

申请人： HAMMOND MACHINERY BUILDERS INC

发明人： COLWELL LESTER V

IPC分类号： B23H5/08 ,  B23P1/00 ,  B23P1/02

CPC分类号： B23H5/08 ,  Y10S204/12

摘要： THE INVENTION RELATES TO AN ELECTROCHEMICAL GRINDING MACHINE OF THE TYPE HAVING (1) A DRIVING UNIT DRIVING A GRINDING DEVICE IN CONTACT WITH AN ELECTROCHEMICALLY ERODABLE WORKPIECES, SAID GRINDING DEVICE COMPRISING ELECTRICALLY NON-CONDUCTIVE, OR SUBSTANTIALLY NON-CONDUCTIVE, ABRASIVE GRAIN EMBEDDED IN AND PROJECTING FROM A ELECTRICALLY CONDUCTIVE MATRIX, (2) MEASNS FOR SUPPLYING AN ELECTROLYTE TO THE ZONE (INTERSTICES BETWEEN THE ABRASIVE GRAINS) BETWEEN THE GRINDING DEVICE AND THE WORKPIECES AND (3) FIRST POTENTIAL SOURCE MEANS FOR SUPPLYING AN ELECTRICAL POTENTIAL BETWEEN SAID GRINDING DEVICE AND SAID WORKPIECE. ACCORDING TO THE INVENTION SUCH MACHINE IS FURTHER PROVIDED WITH (1) A CLEANING ELECTRODE FOR CLEANING SAID GRINDING DEVICE, (2) FURTHER POTENTIAL SOURCE MEANS FOR APPLYING AN ELECTRICAL POTENTIAL BETWEEN SAID CLEANING ELECRODE AND SAID GRINDIG DEVICE AND (3) A SENSING ELECTRODE AND CIRCUITRY THEREFOR TO ANALYZE AND CONTROL THE CONDITIONS ON THE GRINDING DEVICE. SAID CLEANING ELECTRODE IS SPACED FROM SAID WORKPIECE IN A DIRECTION PARALLEL TO THE WORKING FACE OF SAID GRINDING DEVICE AND IS SPACED FROM SAID GRINDING DEVICE IN A DIRECTION PERPENDICULAR TO THE WORKING FACE THEREOF. SAID LAST-NAMED POTENTIAL SOURCE MEANS IS RESPONSIVE TO THE CONDITIONS DETECTED BY THE SENSING ELECTRODE AND CIRCUITY THEREFOR TO CONTROL THE DURATION OF CURRENT FLOW FROM THE LAST-NAMED POTENTIAL SOURCE MEANS TO THE CLEANING ELECTODE. THE LAST-NAMED POTENTIAL SOURCE MEANS MAY BE OF EITHER FLUCTUATING OR INTERMITTENT NATURE AND OF EITHER CONSTANT OR ALTERNATING POLARITY. THE SPACING OG THE CLEANING ELECTRODE FROM THE GRINDING DEVICE, THE CONDUCTIVITY OF THE ELECTROLYTE, THE MAGNITUDE AND POLARITY OF SAID FURTHER POTENTIAL SOURCE MEANS EITHER STEADY OR PULSED, ARE ALL CHOSEN AND BALANCED TO EFFECT SUFFICIENT SPARKING BETWEEN SAID CLEANING ELECTRODE AND SAID GRINDING DEVICE TO KEEP SAID GRINDING DEVICE AT LEAST SUBSTANTIALLY FREE OF WASTE MATERIAL WHICH CAN OTHEREWISE ACCUMULATE THEREON BUT WITHOUT APPRECIABLY ERODING SAID GRINDING DEVICE. WHERE A DEPLATING MODE OF CLEANING IS PREFERRED, APPROPRIATE PARAMESTERS ARE SELECTED TO THE EFFECT THE DESIRED DEPLATING BUT WITHOUT EXCESSIVELY EXPOSING THE ABRASIVE GRAIN.

公开(公告)号：US4512859A

公开(公告)日：1985-04-23

申请号：US453174

申请日：1982-12-27

申请人： Kiyoshi Inoue

发明人： Kiyoshi Inoue

IPC分类号： B24B31/00 ,  B24B31/116 ,  B24B31/14 ,  B24B7/00

CPC分类号： B24B31/14 ,  B24B31/116 ,  Y10S204/12

摘要： A novel method of polishing a workpiece surface comprises passing over the surface in elastically compressive abrasive contact therewith a mass of discrete, elastically deformable pieces each individually consisting of a matrix of elastomeric material containing finely divided abrasive particles substantially uniformly distributed at least along a surface region of the individual piece.

摘要翻译： 一种抛光工件表面的新方法包括使表面弹性压缩研磨接触其中一批离散的，可弹性变形的碎片，每个碎片各自由弹性材料基体组成，该基体包含至少沿表面区域基本上均匀分布的细碎磨粒 的单件。

公开(公告)号：US4142955A

公开(公告)日：1979-03-06

申请号：US833323

申请日：1977-09-14

申请人： Joseph W. Rich ,  Richard C. Bergman ,  Charles E. Treanor

发明人： Joseph W. Rich ,  Richard C. Bergman ,  Charles E. Treanor

IPC分类号： B01D59/34 ,  B01J19/12 ,  C01C3/08 ,  B01J1/10

CPC分类号： C01C3/08 ,  B01D59/34 ,  B01J19/121 ,  C01P2002/82 ,  Y10S204/12

摘要： When using CO as the absorbing and lasing species for vibration-vibration energy transfer and subsequent vibration-vibration pumping, CO can be made to dissociate and subsequently form C.sub.2 with isotope separation, or CO may be made to chemically react with N.sub.2 to produce CN with isotope separation.

公开(公告)号：US06726815B1

公开(公告)日：2004-04-27

申请号：US09937926

申请日：2001-12-26

申请人： Hans Artmann ,  Wilhelm Frey ,  Franz Laermer

发明人： Hans Artmann ,  Wilhelm Frey ,  Franz Laermer

IPC分类号： C25B900

CPC分类号： C25F7/00 ,  Y10S204/12

摘要： An electrochemical etching cell (1) is proposed for etching an etching body (15) made at least superficially of an etching material. The etching cell (1) has at least one chamber filled with an electrolyte, and is provided with a first electrode (13), which at least superficially has a first electrode material, and with a second electrode (13′) which at least superficially has a second electrode material. Furthermore, the etching body (15) is in contact, at least region-wise, with the electrolyte. In this context, the first electrode material and the second electrode material are selected such that, after the etching, the etching body (15) is not contaminated and/or is not impaired in its properties by the electrode materials. In particular, the electrode materials are the same materials as the etching material. Also proposed is a method for etching an etching body (15) using this etching cell (1), the first and/or the second electrode (13, 13′) being used as a sacrificial electrode. The proposed etching cell is particularly suitable for etching silicon wafers in a CMOS-compatible production line.

摘要翻译： 提出一种用于蚀刻蚀刻材料至少表面蚀刻的蚀刻体（15）的电化学蚀刻单元（1）。 蚀刻单元（1）具有填充有电解质的至少一个室，并且设置有至少表面具有第一电极材料的第一电极（13）和至少表面上的第二电极（13'） 具有第二电极材料。 此外，蚀刻体（15）至少在区域上与电解质接触。 在这种情况下，选择第一电极材料和第二电极材料，使得在蚀刻之后，蚀刻体（15）不被电极材料污染和/或不损害其性能。 特别地，电极材料与蚀刻材料相同。 还提出了使用该蚀刻单元（1）蚀刻蚀刻体（15）的方法，第一和/或第二电极（13,13'）用作牺牲电极。 所提出的蚀刻单元特别适用于在CMOS兼容的生产线中蚀刻硅晶片。

公开(公告)号：US20010002001A1

公开(公告)日：2001-05-31

申请号：US09765549

申请日：2001-01-19

发明人： Reiko Irie ,  Masayuki Suda ,  Toshihiko Sakuhara ,  Tstsuaki Ataka

IPC分类号： B23H007/14

CPC分类号： B23H1/00 ,  B23H9/00 ,  C25D1/00 ,  C25D1/10 ,  Y10S204/12

摘要： A machining solution for removal-machining an object to be machined 103 is introduced to an inside of a machining solution container 101, and a predetermined voltage is applied to between the machining electrode 104 and the object to be machined 103 to cause electrochemical reaction thereby fabricating a part cast mold. Then the machining solution is changed to a machining solution for metal layer formation to effect additional machining on a surface of the cast mold, forming a metal layer. Then the machining solution is changed to a machining solution for part formation to effect additional machining inside the cast mold, forming a part. Finally the machining solution is changed to a machining solution for dissolving metal layer to dissolve the metal layer to taking out the inside part, fabricating a part.

摘要翻译： 将用于去除加工对象物的加工解决方案103引入到加工液容器101的内部，并且将预定电压施加到加工电极104与待加工物体103之间以引起电化学反应，从而制造 零件铸模。 然后将加工溶液改变为用于金属层形成的加工溶液，以在铸模的表面上进行额外的加工，形成金属层。 然后将加工溶液改为用于部件形成的加工溶液，以在铸模内进行额外的加工，形成部件。 最后，将加工溶液变为用于溶解金属层以溶解金属层以取出内部的加工溶液，制造部件。

公开(公告)号：US06589402B2

公开(公告)日：2003-07-08

申请号：US09765549

申请日：2001-01-19

申请人： Reiko Irie ,  Masayuki Suda ,  Toshihiko Sakuhara ,  Tatsuaki Ataka

发明人： Reiko Irie ,  Masayuki Suda ,  Toshihiko Sakuhara ,  Tatsuaki Ataka

IPC分类号： C25D1700

CPC分类号： B23H1/00 ,  B23H9/00 ,  C25D1/00 ,  C25D1/10 ,  Y10S204/12

摘要： A part fabricating apparatus has a holder for holding an object to be machined immersed in an electrolytic solution. A machining electrode subjects a surface of the object to an electrochemical reaction to electrolytically machine the surface of the object. The machining electrode has a sharp-edged tip and is coated with an insulator except for the sharp-edged tip. A spacing changing unit detects and changes a spacing between the surface of the object and the machining electrode. A potential/current control unit controls a potential/current on the machining electrode. An electrolytic solution changing unit supplies a first electrolytic solution for subjecting the surface of the object to be machined to a removal process to fabricate a cast mold, supplies a second electrolytic solution for depositing a first metal on a surface of the cast mold to form a first metal layer, and supplies a third electrolytic solution for depositing a second metal inside the cast mold to form a part.

摘要翻译： 零件制造装置具有用于将待加工物体保持浸入电解液中的保持器。 加工电极使物体的表面进行电化学反应，以电解加工物体的表面。 加工电极具有锋利边缘的尖端，并且除了锋利的尖端之外还涂覆有绝缘体。 间隔改变单元检测并改变物体的表面与加工电极之间的间隔。 电位/电流控制单元控制加工电极上的电位/电流。 电解液更换单元提供用于对被加工物的表面进行处理的第一电解液进行去除工艺以制造铸模，在铸模的表面上提供用于沉积第一金属的第二电解液，以形成 第一金属层，并且在铸模内部提供用于沉积第二金属的第三电解溶液以形成部分。

公开(公告)号：US06221228B1

公开(公告)日：2001-04-24

申请号：US09204636

申请日：1998-12-02

申请人： Reiko Irie ,  Masayuki Suda ,  Toshihiko Sakuhara ,  Tatsuaki Ataka

发明人： Reiko Irie ,  Masayuki Suda ,  Toshihiko Sakuhara ,  Tatsuaki Ataka

IPC分类号： C25D110

CPC分类号： B23H1/00 ,  B23H9/00 ,  C25D1/00 ,  C25D1/10 ,  Y10S204/12

摘要： A part fabricating method comprises the steps of machining an object to fabricate a part cast mold, depositing a first metal on a surface of the cast mold to form a first metal layer, and depositing a second metal different in kind from the first metal inside the cast mold to form a part. The first metal layer is then selectively removed to take out the part formed inside the cast mold.

摘要翻译： 一种部件制造方法包括以下步骤：加工物体以制造部件铸模，在铸模的表面上沉积第一金属以形成第一金属层，以及将与第一金属不同种类的第二金属从第一金属 铸造模具组成部分。 然后选择性地去除第一金属层以取出在铸模内部形成的部分。

公开(公告)号：US3914170A

公开(公告)日：1975-10-21

申请号：US34292473

申请日：1973-03-19

申请人： UNITED AIRCRAFT CORP

发明人： BALLARD NORMAN D ,  ZUBECKIS JOHN

IPC分类号： B23H3/02 ,  C25D17/00

CPC分类号： B23H3/02 ,  Y10S204/12

摘要： Destructive erosion of the tips of cathodes used in electrochemical machining operations, which is due to reverse current flow through the workpiece and cathode during nonmachining operations, is prevented by continuously passing a small DC current through the workpiece and cathode in the same direction as the normal current flow during machining operations. The voltage drop produced by the current flow may also be used to indicate the occurrence of a fault such as a lower than normal gap resistance between the cathode and workpiece during nonmachining operations and thereby prevent actuation of the main power supply until the fault is corrected.

摘要翻译： 在电加工操作中使用的阴极尖端的破坏性侵蚀是由于在非加工操作期间通过工件和阴极的反向电流流动而被阻止的，通过连续地将小的DC电流通过工件和阴极沿与正常方向相同的方向 加工过程中的电流。 由电流产生的电压降也可用于指示在非机械加工操作期间发生故障，例如阴极和工件之间的正常间隙电阻低于此，从而防止主电源的致动，直到故障为止 纠正

公开(公告)号：US3849273A

公开(公告)日：1974-11-19

申请号：US32100473

申请日：1973-01-04

申请人： JOHNSON G

发明人： JOHNSON G

IPC分类号： B23H9/02 ,  B23P1/00 ,  B23P1/04

CPC分类号： B23H9/02 ,  B23H9/10 ,  Y10S204/12

摘要： A method of and apparatus for radiussing the edge or edges of a metallic aerofoil blade by electrolytic machining wherein the electrolyte is flowed towards the edge to be machined from a hollow electrode.

公开(公告)号：US3835016A

公开(公告)日：1974-09-10

申请号：US26907672

申请日：1972-07-05

申请人： PEUGEOT & RENAULT

发明人： BOURDOLLE H ,  LACROIX S ,  PINOT J ,  FLEURY J ,  PEUILLOT G

IPC分类号： B23H5/08 ,  B23P1/02 ,  B23P1/10 ,  B23P1/12

CPC分类号： B23H5/08 ,  Y10S204/12

摘要： A device for electrochemical grinding by removing material from the surface of a conducting workpiece, comprising a conformator tool including two separate members, a first member for a quick attack of a rough shaped workpiece, comprising a support, one front-end of which is shaped as the compliment of the sectional contour to be obtained along the outer periphery of the workpiece, which operates during a first step of the operation; a high electrolyte flow output supply; a high density current electricity source; and the second member is an electrolytic grinder operating at the rear part of the support, for grinding the workpiece to the desired final shape, the rear part of the support constituting a damming bulk for the electrolyte.