公开(公告)号：US20040219288A1

公开(公告)日：2004-11-04

申请号：US10856836

申请日：2004-06-01

Applicant: TOKYO ELECTRON LIMITED

Inventor： Shinichi Hayashi ,  Hirofumi Ookuma ,  Kouichi Suefuji

IPC: B05D001/00 ,  B05C011/02 ,  B05C013/00

CPC classification number: H01L21/6715

Abstract: A processing solution is supplied from processing-solution suppliers onto the surfaces of targets to be processed while a flow rate of the processing solution is being adjusted. The processing solution is fed from a processing-solution supply source at a specific pressure via a processing-solution pressure-up feeder. The pressure of the processing solution fed via the processing-solution pressure-up feeder is adjust to another specific pressure or more at least when the processing-solution suppliers are operating simultaneously. A flow-rate detector detects the flow rate of the processing solution supplied from each processing-solution supplier. A pressure detector detects the pressure of the processing solution fed via the processing-solution pressure-up feeder. The flow-rate adjuster and the pressure adjuster are controlled based on prestored control data and detection signals from the flow-rate detector and the pressure detector so that the same amount of processing solution is supplied to the targets from the processing-solution suppliers.

公开(公告)号：US20040115346A1

公开(公告)日：2004-06-17

申请号：US10670176

申请日：2003-09-23

Inventor： Scott J. Woolley ,  William W. Weil ,  Ian J. Buckley ,  James N. McBride

IPC: B05D007/22 ,  B05C011/02 ,  B05C005/00

CPC classification number: B65B51/023 ,  B05C5/0216 ,  B05C13/025 ,  B05D1/005 ,  B05D1/26 ,  B65B7/2871

Abstract: A machine for applying sealant material to non-circular closures using a rotating chuck connected to a rotational motor and a fixedly mounted dispensing apparatus. The chuck is also moved in at least one linear direction in a plane normal to the rotational axis of the chuck. The rotational motor may be connected to the chuck using various mechanisms while minimizing the moving mass of the machine. Sealant applicators are also disclosed that are mounted on a turret and use independently controlled motors, or fully integrated servomotors to rotate the chuck.

Abstract translation: 一种使用连接到旋转马达的旋转卡盘和固定安装的分配装置将密封剂材料施加到非圆形封闭件的机器。 卡盘也在与卡盘的旋转轴线垂直的平面中沿至少一个线性方向移动。 旋转马达可以使用各种机构连接到卡盘，同时最小化机器的运动质量。 还公开了安装在转台上并使用独立控制的电动机或完全集成的伺服电动机来旋转卡盘的密封剂施加器。

公开(公告)号：US20040069217A1

公开(公告)日：2004-04-15

申请号：US10617009

申请日：2003-07-10

Applicant: NexPress Solutions LLC

Inventor： Jeffrey R. Murray ,  Michel F. Molaire ,  Colin M. Davey

IPC: B05C011/02

CPC classification number: B05C13/02 ,  B05C3/09 ,  G03G5/10

Abstract: A cleaning brush and method for removing a coating solution from the inner end of a flexible, tubular substrate to be fitted over a mandrel or drum. After a tubular substrate is dipped endwise in a coating solution, some solution coats the inner face of the substrate at one end. By using moderate deformation of the substrate, changes to the profile of the cleaning brush, or both, the cleaning brush is fitted inside the end of the tubular substrate without damaging the substrate. The cleaning brush engages and cleans the substrate's inner surface. The substrate is then free from any coating so as to readily fit on the mandrel or drum.

Abstract translation: 一种清洁刷和方法，用于从柔性管状基底的内端移除涂覆溶液以装配在心轴或滚筒上。 将管状基材端接浸渍在涂布溶液中后，一些溶液在一端涂覆基材的内表面。 通过使用基板的适度变形，清洁刷或其两者的轮廓的改变安装在管状基板的端部内部，而不会损坏基板。 清洁刷接合并清洁基板的内表面。 然后，基材不含任何涂层，以便容易地装配在心轴或滚筒上。

公开(公告)号：US20040045500A1

公开(公告)日：2004-03-11

申请号：US10237839

申请日：2002-09-09

Applicant: Stora Enso North America Corp.

Inventor： Wayne A. Damrau

IPC: B05C011/02

CPC classification number: B05C5/0283 ,  B05C5/0254 ,  D21H23/50

Abstract: A jet type coater with a nozzle orifice is provided with an adjustable, internal filter or screen in the head of the coater. The filter has orifices or slots which are formed by relatively movable members and is adjustable to a size smaller than that of the nozzle orifice, to keep the nozzle orifice unclogged and functioning. The internal filter is also easily clearable on the run without shutdown and cleanable with coating liquid and/or water.

Abstract translation: 具有喷嘴孔的喷射型涂布机在涂布机的头部设置有可调节的内部过滤器或筛网。 过滤器具有由相对可动构件形成并且可调节至小于喷嘴孔的尺寸的孔或槽，以保持喷嘴孔不被堵塞并起作用。 内部过滤器在运行中也很容易清除，无需关闭，并可用涂布液和/或水进行清洁。

公开(公告)号：US20030113458A1

公开(公告)日：2003-06-19

申请号：US10024999

申请日：2001-12-18

Applicant: Kimberly Clark Worldwide, Inc.

Inventor： Daniel Hoo ,  Brian James Gingras ,  Clayton Taylor Gann ,  Robert Eugene Krautkramer ,  Anthony Mark Gambaro ,  James Monroe Perkins

IPC: B05C011/02 ,  B05C005/00 ,  B05D003/12

CPC classification number: D06B15/02 ,  D06B1/02 ,  D06B1/148

Abstract: A method of wetting a web of material is described, which in general provides for applying a wetting solution to the web, and passing the web of material between a set of press rolls. The wetting solution may be applied at an add-on greater than 25%, and the web may travel at a speed of at least 60 meters per minute.

Abstract translation: 描述了一种润湿材料网的方法，其通常提供将润湿溶液施加到幅材上，并将材料幅材在一组压辊之间通过。 润湿溶液可以以大于25％的添加剂施加，并且幅材可以以至少60米/分钟的速度行进。

公开(公告)号：US20020110640A1

公开(公告)日：2002-08-15

申请号：US09270781

申请日：1999-03-17

Inventor： KIYOHISA TATEYAMA ,  KIMIO MOTODA ,  NORIYUKI ANAI

IPC: B05C011/02 ,  B05C013/00

CPC classification number: B05C11/08 ,  B05D1/005 ,  B05D3/104 ,  G03F7/16 ,  G03F7/161

Abstract: A coating apparatus has a spin chuck for attracting and holding a semiconductor wafer in a horizontal state by means of vacuum. A movable beam is arranged above the spin chuck. The movable beam includes first and second nozzles integrally formed. The first nozzle is used for supplying a photo-resist liquid while the second nozzle is used for supplying a solvent for the photo-resist liquid. When a coating process is performed, the movable beam above the wafer is horizontally moved in one direction. The solvent is first supplied onto the wafer from the second nozzle, and the coating or photo-resist liquid is then supplied from the first nozzle, following the solvent. Wettability of the wafer relative to the photo-resist is increased by the solvent, prior to supply of the photo-resist liquid.

Abstract translation: 涂布装置具有用于通过真空吸引并保持水平状态的半导体晶片的旋转卡盘。 可移动光束布置在旋转卡盘上方。 可动梁包括一体形成的第一和第二喷嘴。 第一喷嘴用于供应光致抗蚀剂液体，而第二喷嘴用于供应用于光致抗蚀剂液体的溶剂。 当执行涂覆处理时，晶片上方的可移动光束在一个方向上水平移动。 首先从第二喷嘴将溶剂供应到晶片上，然后在溶剂之后从第一喷嘴提供涂层或光致抗蚀剂液体。 在提供光致抗蚀剂液体之前，晶片相对于光致抗蚀剂的润湿性由溶剂增加。

公开(公告)号：US20020041925A1

公开(公告)日：2002-04-11

申请号：US09767482

申请日：2001-01-23

Applicant: SCIENTEC RESEARCH PTY. LTD

Inventor： Michael Francis O'Donoghue ,  James Allan Morris

IPC: A61L002/00 ,  B05D003/12 ,  B05C011/02

CPC classification number: A61K9/0092 ,  A61J3/005 ,  A61J3/078 ,  A61K9/0024 ,  A61K9/2893 ,  A61K9/4833 ,  Y10S977/836 ,  Y10S977/89

Abstract: The invention generally provides a method of coating a material, the method including the following steps: (a) forming a generally elongate coating structure (15), the coating structure having an internal cavity (17) extending at least substantially along its length, and wherein the internal cavity of the coating structure is capable of receiving a core material (21); (b) inserting a core material (21) into the internal cavity (17) of the coating structure (15); (c) compressing the coating structure at a first location (44) along its length so as generally to form a seal at that location; and (d) compressing the coating structure at a second location along its length (45).

Abstract translation: 本发明通常提供一种涂覆材料的方法，该方法包括以下步骤：（a）形成大致细长的涂层结构（15），所述涂层结构具有至少基本沿其长度延伸的内腔（17），以及 其中所述涂层结构的内腔能够容纳芯材料（21）; （b）将芯材（21）插入涂层结构（15）的内腔（17）中; （c）沿着其长度在第一位置（44）处压缩涂层结构，以便通常在该位置处形成密封; 和（d）沿其长度（45）在第二位置压缩涂层结构。

公开(公告)号：US20020037366A1

公开(公告)日：2002-03-28

申请号：US09508520

申请日：2000-03-27

Inventor： HIROYUKI ARIOKA

IPC: B05D003/12 ,  B05D001/02 ,  B05C011/02 ,  B05C013/00 ,  B05C005/00

CPC classification number: B05C11/08 ,  B05B15/50 ,  G03F7/162

Abstract: There are provided a spin coating method and an apparatus for forming a thin film having a uniform thickness on a substrate at a low cost in a process for manufacturing semiconductors, optical disks and the like. A coating solution is dropped onto the surface of a substrate (2) to be coated, mounted on a horizontal turn table (3) through a discharge nozzle (4) and the substrate is turned to form a thin film. After the coating solution is dropped through the nozzle, a stand-by nozzle tip (4a) is soaked and held in a nozzle soaking solution (10) having a composition near or equivalent to that of the coating solution. The crystal deposition of the solute is suppressed. Inter alia, the present invention is useful when a solution containing a solute having high crystallizability is coated.

Abstract translation: 在半导体，光盘等的制造方法中，提供了一种旋涂法和用于在基板上以低成本形成具有均匀厚度的薄膜的装置。 将涂布液滴落到待涂布的基板（2）的表面上，通过排出喷嘴（4）安装在水平转台（3）上，并将基板转动以形成薄膜。 在涂布溶液通过喷嘴滴下之后，将备用喷嘴尖端（4a）浸泡并保持在具有与涂布溶液接近或相当的组成的喷嘴浸泡溶液（10）中。 抑制溶质的晶体沉积。 特别地，当含有具有高结晶性的溶质的溶液被涂覆时，本发明是有用的。

公开(公告)号：US20020020345A1

公开(公告)日：2002-02-21

申请号：US09883461

申请日：2001-06-15

Inventor： Dave Kormos

IPC: B05C011/02

CPC classification number: E04F21/165 ,  B65H35/0046 ,  E04F21/026

Abstract: A method for applying drywall mud to drywall tape allowing for lengthy stoppages in a drywall application process comprises threading the drywall tape through mud in a container. When the drywall process is interrupted, a strip of material is attached to at least one surface of the drywall tape between the roll and the container. The strip of material is substantially longer than the distance across the container and has a tensile strength substantially unaffected by prolonged exposure to drywall mud. The drywall tape with attached material is drawn through the container until both ends of the strip of material extend outside the container on opposite sides thereof. The container is sealed and the apparatus, with tape still threaded through the container may now be left for a prolonged period of time. When it is desired to re-commence the drywall process, the drywall tape and applied material is drawn through the slots until the material exits the container and is torn off and discarded, leaving a free end of drywall tape outside the container available for grasping and pulling more drywall tape. The material is conveniently adhesive tape. An apparatus for conveniently applying mud to drywall tape is also provided.

Abstract translation: 将干墙泥浆施加到干墙胶带上的方法，其允许在干墙施工过程中长时间停止，包括将干墙带穿过容器中的泥浆。 当干式墙工艺被中断时，一条材料条被连接到辊与容器之间的干墙带的至少一个表面上。 材料条基本上比穿过容器的距离长，并且拉伸强度基本上不受长时间暴露于干墙泥浆的影响。 带有附着材料的干墙带被拉过容器，直到材料带的两端在其相对侧的容器外面延伸。 容器被密封，并且带子仍然穿过容器的装置现在可以放置较长时间。 当需要重新开始干墙工艺时，干墙带和施加的材料通过槽被拉出，直到材料离开容器并被撕掉并丢弃，留下容器外部的干式墙带自由端可用于抓握和 拉更多的干墙胶带。 该材料是方便的胶带。 还提供了用于方便地将泥浆施加到干墙带的设备。

公开(公告)号：US20010050041A1

公开(公告)日：2001-12-13

申请号：US09575965

申请日：2000-05-23

Inventor： TIMOTHY J. REARDON ,  CRAIG P. MEUCHEL ,  THOMAS H. OBERLITNER

IPC: B05C011/02

CPC classification number: H01L21/6715 ,  G11B7/26 ,  H01L21/67075 ,  H01L21/6708 ,  H01L21/67086 ,  H01L21/68707 ,  H01L21/68785 ,  Y10S134/902

Abstract: A semiconductor processor for spray coating wafers or other semiconductor articles. The processor has a compartment in which are mounted a wafer transfer, coating station and thermal treatment station. The coating station has a spray processing vessel in which a movable spray-head and rotatable wafer holder. The spray station has coating viscosity control features. An ultrasonic resonating spray-head is precisely supplied with coating from a metering pump. The heat treatment station heat cures the coating and then cools the wafer. The system allows coatings to be applied in relatively uniform conformational layers upon irregular surfaces.

Abstract translation: 一种用于喷涂硅片或其他半导体产品的半导体处理器。 处理器具有隔室，其中安装有晶片转移，涂覆站和热处理站。 涂装站具有喷雾处理容器，其中可移动喷头和可转动的晶片保持器。 喷涂站具有涂层粘度控制功能。 超声波共振喷头从计量泵精确地提供涂层。 热处理站热固化涂层，然后冷却晶片。 该系统允许在不规则表面上以相对均匀的构象层施加涂层。