公开(公告)号：US20040231584A1

公开(公告)日：2004-11-25

申请号：US10797579

申请日：2004-03-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Eun-sung Lee ,  Sung-hoon Choa ,  Min-seog Choi

IPC: B05C013/00

CPC classification number: H01L21/6715

Abstract: A spin coating apparatus for coating photoresist has a spin chuck and a nozzle part. The spin chuck has a mount part on which a wafer is mounted and an extended projection part on which edge-bead is formed. The nozzle part is for depositing photoresist onto the wafer mounted on the mount part of the spin chuck. By using the spin coating apparatus, edge-bead is formed on the extended projection part, and not on the wafer.

Abstract translation: 用于涂覆光致抗蚀剂的旋涂装置具有旋转卡盘和喷嘴部分。 旋转卡盘具有其上安装有晶片的安装部分和形成有边缘珠的延伸突起部分。 喷嘴部分用于将光致抗蚀剂沉积到安装在旋转卡盘的安装部分上的晶片上。 通过使用旋涂装置，在延伸的突出部分上而不是在晶片上形成边缘珠。

公开(公告)号：US20040052959A1

公开(公告)日：2004-03-18

申请号：US10416193

申请日：2003-10-10

Inventor： Didier Dauchelle ,  Hugues Baudin ,  Patrice Lucas ,  Laurent Gacher ,  Yves Prigent

IPC: B05D001/18 ,  B05C011/02 ,  B05C013/00 ,  B05C021/00

CPC classification number: C23C2/00

Abstract: The subject of the invention is a process for the continuous dip-coating of a metal strip (1) in a tank (11) containing a liquid metal bath (12), in which process the metal strip (1) is made to run continuously through a duct (13), the lower part (13a) of which is immersed in the liquid metal bath (12) in order to define with the surface of the said bath a liquid seal (14). A natural flow of the liquid metal from the surface of the liquid seal (14) is set up in two overflow compartments (25, 29) made in the said duct (13) and each having an internal wall which extends the duct (13) in its lower part and the level of liquid metal in the said compartments is maintained at a level below the surface of the liquid seal (14). Another subject of the invention is a plant for implementing the process.

Abstract translation: 本发明的主题是一种用于在包含液态金属浴（12）的罐（11）中连续浸涂金属带（1）的方法，其中使金属条（1）连续地运行 通过管道（13），其下部（13a）浸没在液体金属浴（12）中，以便与所述浴的表面限定液体密封（14）。 来自液体密封件（14）表面的液体金属的自然流动被设置在在所述管道（13）中制成的两个溢流隔室（25,29）中，并且每个具有延伸管道（13）的内壁， 在其下部，并且所述隔室中的液态金属的水平保持在液体密封件（14）的表面以下的水平。 本发明的另一主题是用于实施该方法的设备。

公开(公告)号：US20040011283A1

公开(公告)日：2004-01-22

申请号：US10620053

申请日：2003-07-14

Inventor： Derek J. Gochnour ,  Leonard E. Mess

IPC: B05C013/00

CPC classification number: H05K13/00 ,  H01L2924/3511 ,  H05K3/284

Abstract: A method and apparatus for preventing board warpage during the application and curing or drying of liquid epoxies, or the like, on printed circuit boards using a clamping fixture assembly, which includes at least one clamping fixture support and at least one clamping fixture overlay. If desired, a plurality of printed circuit boards may be processed using an appropriate clamping fixture assembly. Furthermore, the clamping fixture may be constructed so a slight bow or curvature thereof can counter either a convex or concave bow or curvature of the printed circuit board. In the method, at least one printed circuit board is mounted to a clamping fixture support whereby a clamping fixture overlay is placed on top of the first printed circuit board.

Abstract translation: 一种用于在使用夹紧夹具组件的印刷电路板上施加和固化或干燥液体环氧树脂等期间防止板翘曲的方法和装置，其包括至少一个夹紧夹具支架和至少一个夹紧固定盖。 如果需要，可以使用适当的夹具组件来处理多个印刷电路板。 此外，夹持夹具可以被构造成轻微的弓形或其曲率可以对抗印刷电路板的凸形或凹形弓形或曲率。 在该方法中，至少一个印刷电路板安装到夹具固定支架上，由此夹紧夹具覆盖物放置在第一印刷电路板的顶部上。

公开(公告)号：US20030075102A1

公开(公告)日：2003-04-24

申请号：US10279145

申请日：2002-10-23

Inventor： Ronald A. Crocker

IPC: B05C013/00

CPC classification number: H01L21/68764 ,  B05B13/0264 ,  C23C14/505 ,  H01L21/68707 ,  H05K3/0091

Abstract: The present invention is a substrate inverting apparatus mounted to a substrate-coating machine. The apparatus is used for inverting a substrate within a vacuum chamber. The apparatus includes a substrate holding means for holding the substrate substantially rigidly relative to the substrate holding means. The apparatus further includes an actuating means mounted to the substrate-coating machine for inverting the substrate holding means.

Abstract translation: 本发明是安装在基板涂布机上的基板翻转装置。 该装置用于使真空室内的基板反转。 该装置包括用于相对于基板保持装置基本上刚性地保持基板的基板保持装置。 该装置还包括安装到基板涂覆机用于翻转基板保持装置的致动装置。

公开(公告)号：US20020179014A1

公开(公告)日：2002-12-05

申请号：US10195357

申请日：2002-07-16

Inventor： Tue Nguyen

IPC: B05C013/00

CPC classification number: C23C16/4585 ,  C23C16/042

Abstract: A replaceable shielding apparatus provides a cost effective way of shielding a portion of a workpiece during processing. The apparatus includes a replaceable shield, made of comparable weight as the workpiece for allowing replacement of the shield in the same way as the replacement of the workpiece. With this feature, the replacement of the shield is a routine process and would not interfere much with the workpiece operation. The invention further includes a shield clamp for clamping the shield onto the workpiece. In a preferred embodiment, the invention further includes a non-reactive gas inlet for creating a pressurized cavity in the vicinity of the shielded portion of the workpiece.

Abstract translation: 可替换的屏蔽装置提供了在加工期间屏蔽工件的一部分的成本有效的方法。 该装置包括可替换的屏蔽件，其具有与工件相当的重量，用于允许以与更换工件相同的方式更换屏蔽件。 使用此功能，更换屏蔽件是常规工艺，不会干扰工件操作。 本发明还包括用于将屏蔽件夹持到工件上的屏蔽夹。 在优选实施例中，本发明还包括用于在工件的屏蔽部分附近产生加压腔的非反应性气体入口。

公开(公告)号：US20020088395A1

公开(公告)日：2002-07-11

申请号：US10001795

申请日：2001-12-05

Applicant: Japan Alumibody Maintenance Co., Ltd.

Inventor： Tomio Asahi

IPC: B05C013/00

CPC classification number: B05B13/02 ,  B05B16/60 ,  Y10S55/46

Abstract: A coating booth for film having a table on which a film to be coated is mounted, an air intake which is provided in the ceiling of the booth and through which open air is cleaned and introduced into the inside of the booth, and an exhaust system which sucks up the introduced air from the side walls of the table to make a substantially horizontal air flow inside the table and discharges the air outside, wherein the table has a substantially horizontal tabletop with a plurality of suction holes so that a film mounted thereon are held by suction by the action of the air flow inside the table.

Abstract translation: 一种用于胶片的涂装室，其上安装有待涂覆的薄膜的台面，设置在展位的天花板中并通过其清洁并引入室内的空气的排气系统 其从桌子的侧壁吸入引入的空气，以在桌子内部形成基本上水平的空气流并将空气排出到外部，其中桌子具有大致水平的台面，其具有多个吸孔，使得其上安装的薄膜是 通过吸盘内的气流动作保持在桌子内。

公开(公告)号：US20020017237A1

公开(公告)日：2002-02-14

申请号：US09907522

申请日：2001-07-16

Applicant: Semitool, Inc.

Inventor： Paul Z. Wirth ,  Steven L. Peace

IPC: B05C013/00 ,  B05C013/02 ,  B05C021/00 ,  H01L021/31 ,  H01L021/469 ,  B25J001/00 ,  B65G049/07 ,  B05C003/00 ,  B05C019/02

CPC classification number: B08B3/04 ,  H01L21/32134 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/6708 ,  H01L21/67086 ,  H01L21/6715 ,  Y10S118/90 ,  Y10S438/906 ,  Y10S438/913

Abstract: A system for processing a workpiece includes a base having a bowl or recess for holding a liquid. A process reactor or head holds a workpiece between an upper rotor and a lower rotor. A head lifter lowers the head holding the workpiece into contact with the liquid. The head spins the workpiece during or after contact with the liquid. The upper and lower rotors have side openings for loading and unloading a workpiece into the head. The rotors are axially moveable to align the side openings.

Abstract translation: 用于处理工件的系统包括具有用于保持液体的碗或凹部的底座。 工艺反应器或头部将工件保持在上转子和下转子之间。 头部升降器降低了将工件保持与液体接触的头部。 头部在与液体接触期间或之后旋转工件。 上下转子具有用于将工件装载和卸载到头部中的侧开口。 转子可轴向移动以对准侧开口。

公开(公告)号：US20020007785A1

公开(公告)日：2002-01-24

申请号：US09797217

申请日：2001-02-28

Applicant: Applied Materials, Inc.

Inventor： Rudolf Gujer ,  Thomas K. Cho ,  Tetsuya Ishikawa

IPC: C23C016/00 ,  B05C013/00

CPC classification number: C23C16/4409 ,  C23C16/4412 ,  C23C16/45561 ,  C23C16/4586

Abstract: A semiconductor wafer processing substrate support assembly, comprises a substrate support platform having a centrally disposed recess, coupled to a base disposed above the centrally disposed recess, a plate disposed above the base, and a substrate support disposed above the plate. The substrate support assembly further comprises a plurality of o-rings having a plurality of lobes, wherein a first lobed o-ring of the plurality of lobed o-rings is disposed between the support platform and the base, a second lobed o-ring is disposed between the base and the plate, and a third lobed o-ring is disposed between the plate and the substrate support. Moreover, the plurality of lobed o-rings are utilized in the support assembly for reducing the number of o-rings required in the support assembly.

Abstract translation: 半导体晶片处理基板支撑组件包括具有中心设置的凹部的基板支撑平台，其联接到设置在中心设置的凹部上方的基座，设置在基座上方的板和设置在板上方的基板支撑。 所述基板支撑组件还包括多个具有多个凸角的O形环，其中所述多个凸起的O形环的第一凸起的O形环设置在所述支撑平台和所述基座之间，第二凸起的O形环是 设置在基座和板之间，并且第三叶片O形环设置在板和基板支撑件之间。 此外，在支撑组件中使用多个凸起的O形环以减少支撑组件中所需的O形圈的数量。

公开(公告)号：US20010054389A1

公开(公告)日：2001-12-27

申请号：US09879934

申请日：2001-06-14

Inventor： Yasumi Sago ,  Masayoshi Ikeda ,  Kazuaki Kaneko ,  Hiroki Date

IPC: C23C016/00 ,  B05C013/00

CPC classification number: H01L21/6831 ,  C23C16/4586 ,  H01J2237/2001

Abstract: This invention presents an ESC mechanism for chucking an object electro-statically on a chucking surface, comprising a stage having a dielectric block of which surface is the chucking surface, and a chucking electrode provided in the dielectric block. A temperature controller is provided with the stage for controlling temperature of the object. A chucking power source to apply voltage to the chucking electrode is provided so that the object is chucked. The chucking surface has concaves of which openings are shut by the chucked object. A heat-exchange gas introduction system that introduces heat-exchange gas into the concaves is provided. The concaves include a heat-exchange concave for promoting heat-exchange between the stage and the object under increased pressure, and a gas-diffusion concave for making the introduced gas diffuse to the heat-exchange concave. The gas-diffusion concave is deeper than the heat-exchange concave. This invention also presents a surface processing apparatus, comprising a process chamber in which a surface of an object is processed, and the electro-static chucking mechanism of the same composition.

Abstract translation: 本发明提供一种用于将电子静电夹持在夹持表面上的ESC机构，包括具有表面为夹持表面的介质块的台和设置在该介质块中的夹持电极。 温度控制器设置有用于控制物体的温度的台。 提供用于向夹持电极施加电压的夹持电源，以便夹持该物体。 卡盘表面具有通过夹持物体关闭开口的凹陷。 提供了将热交换气体引入凹部的热交换气体导入系统。 凹部包括用于在增压下促进台与物体之间的热交换的热交换凹部，以及用于使引入的气体扩散到热交换凹部的气体扩散凹部。 气体扩散凹部比热交换凹部深。 本发明还提供了一种表面处理装置，其包括处理物体的表面的处理室和相同组成的静电夹持机构。

公开(公告)号：US20010022988A1

公开(公告)日：2001-09-20

申请号：US09804040

申请日：2001-03-13

Inventor： Marlene Schwarz ,  Jan Weber ,  Henrik Hansen ,  Paul Lubinsky

IPC: B05D003/00 ,  B05C013/00 ,  B05C021/00

CPC classification number: B05B13/025 ,  A61L27/28 ,  A61L27/54 ,  A61L29/08 ,  A61L29/16 ,  A61L31/08 ,  A61L31/10 ,  A61L2300/252 ,  A61L2300/258 ,  A61L2300/606 ,  B05B13/02 ,  B05B13/0257 ,  B05D1/22 ,  C23C14/50 ,  C23C16/458

Abstract: Methods and devices for protecting and/or coating medical devices are disclosed. In one embodiment, a method is disclosed that includes surrounding a medical device with a cage, the medical device having a surface. The method further includes attaching the medical device to the cage with at least one securement, suspending the medical device in an air stream, the air stream substantially devoid of suspending particles, and coating at least a portion of said surface of said suspended medical device with a first coating material.

Abstract translation: 公开了用于保护和/或涂覆医疗装置的方法和装置。 在一个实施例中，公开了一种包括用保持架围绕医疗装置的方法，该医疗装置具有表面。 该方法还包括将医疗装置连接到具有至少一个固定件的保持器，将医疗装置悬挂在空气流中，空气流基本上没有悬浮颗粒，并且将所述悬挂的医疗装置的所述表面的至少一部分涂覆到 第一涂料。