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公开(公告)号：US06542224B2
公开(公告)日：2003-04-01
申请号：US09943466
申请日：2001-08-30
IPC分类号： G03B2758
CPC分类号： G03F7/70716 , G03F7/70216 , G03F7/708
摘要： A lithographic stage includes a platen having a top face and a bottom face and a holder for holding an optical component on the top face of the platen. The platen is made of a light-weight material such as high purity fused silica or ultra low expansion glass. The bottom face of the platen may further include means for connecting to a positioning device in an extreme ultraviolet lithography system.
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公开(公告)号：US06576380B2
公开(公告)日：2003-06-10
申请号：US10242911
申请日：2002-09-13
IPC分类号： G03F900
CPC分类号： G21K1/062 , B82Y10/00 , B82Y40/00 , G02B17/06 , G03F1/24 , G03F1/60 , G03F7/702 , G03F7/70233 , G03F7/70283 , G03F7/70891 , G03F7/70958 , Y10S438/947 , Y10S438/974
摘要： The present invention relates to reflective masks and their use for reflecting extreme ultraviolet soft x-ray photons to enable the use of extreme ultraviolet soft x-ray radiation projection lithographic methods and systems for producing integrated circuits and forming patterns with extremely small feature dimensions. The projection lithographic method includes providing an illumination sub-system for producing and directing an extreme ultraviolet soft x-ray radiation &lgr; from an extreme ultraviolet soft x-ray source; providing a mask sub-system illuminated by the extreme ultraviolet soft x-ray radiation &lgr; produced by the illumination sub-system and providing the mask sub-system includes providing a patterned reflective mask for forming a projected mask pattern when illuminated by radiation &lgr;. Providing the patterned reflective mask includes providing a Ti doped high purity SiO2 glass wafer with a patterned absorbing overlay overlaying the reflective multilayer coated Ti doped high purity SiO2 glass defect free wafer surface that has an Ra roughness≦0.15 nm. The method includes providing a projection sub-system and a print media subject wafer which has a radiation sensitive wafer surface wherein the projection sub-system projects the projected mask pattern from the patterned reflective mask onto the radiation sensitive wafer surface.
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3.发明授权公开(公告)号：US06931097B1
公开(公告)日：2005-08-16
申请号：US10048138
申请日：2000-07-10
IPC分类号： C03B8/04 , C03B20/00 , C03C17/36 , G02B5/08 , G02B5/10 , G02B5/26 , G02B5/28 , G02B17/06 , G03F1/00 , G03F1/24 , G03F1/60 , G03F7/20 , G21K1/06 , G21K5/02 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B2201/07 , C03B2201/42 , G02B5/0891 , G02B17/0615 , G02B17/0636 , G03F1/24 , G03F1/60 , G03F7/702 , G03F7/70233 , G03F7/70283 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/064 , G21K2201/067
摘要： The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system (36) for producing and directing an extreme ultraviolet soft x-ray radiation λ from an extreme ultraviolet soft x-ray source (38); a mask stage (22) illuminated by the extreme ultraviolet soft x-ray radiation λ produced by illumination stage and the mask stage (22) includes a pattern when illuminated by radiation λ. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface (32) and printed media subject wafer which has a radiation sensitive surface.
摘要翻译： 用于制造集成电路和具有极小特征尺寸的图案的投影光刻方法包括用于产生和引导来自极紫外线软X射线源（38）的极紫外线软X射线辐射λ的照明子系统（36） ; 由照明级产生的极紫外线软X射线辐射λ照射的掩模台（22）和掩模台（22）包括当被辐射λ照射时的图案。 保护子系统包括具有辐射敏感表面的反射多层涂覆的Ti掺杂的高纯度SiO 2玻璃无缺陷表面（32）和印刷媒体对象晶片。
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4.发明授权Extreme ultraviolet soft x-ray projection lithographic method and mask devices 有权极紫外线软X射线投影光刻法和掩模装置公开(公告)号：US06465272B1
公开(公告)日：2002-10-15
申请号：US09615621
申请日：2000-07-13
IPC分类号： H01L2100
CPC分类号： G21K1/062 , B82Y10/00 , B82Y40/00 , G02B17/06 , G03F1/24 , G03F1/60 , G03F7/702 , G03F7/70233 , G03F7/70283 , G03F7/70891 , G03F7/70958 , Y10S438/947 , Y10S438/974
摘要： The present invention relates to reflective masks and their use for reflecting extreme ultraviolet soft x-ray photons to enable the use of extreme ultraviolet soft x-ray radiation projection lithographic methods and systems for producing integrated circuits and forming patterns with extremely small feature dimensions. The projection lithographic method includes providing an illumination sub-system for producing and directing an extreme ultraviolet soft x-ray radiation &lgr; from an extreme ultraviolet soft x-ray source; providing a mask sub-system illuminated by the extreme ultraviolet soft x-ray radiation &lgr; produced by the illumination sub-system and providing the mask sub-system includes providing a patterned reflective mask for forming a projected mask pattern when illuminated by radiation &lgr;. Providing the patterned reflective mask includes providing a Ti doped high purity SiO2 glass wafer with a patterned absorbing overlay overlaying the reflective multilayer coated Ti doped high purity SiO2 glass defect free wafer surface that has an Ra roughness≦0.15 nm. The method includes providing a projection sub-system and a print media subject wafer which has a radiation sensitive wafer surface wherein the projection sub-system projects the projected mask pattern from the patterned reflective mask onto the radiation sensitive wafer surface.
摘要翻译： 本发明涉及反射掩模及其用于反射极紫外软x射线光子的用途，以使得能够使用极紫外线软X射线辐射投影光刻方法和系统来生产集成电路并形成具有极小特征尺寸的图案。 投影光刻方法包括提供用于产生和引导来自极紫外线软X射线源的极紫外线软X射线辐射羔羊的照明子系统; 提供由由照明子系统产生的极紫外线软X射线辐射灯照亮的掩模子系统，并提供掩模子系统包括提供用于在被辐射线照射时形成投影掩模图案的图案化反射掩模。 提供图案化的反射掩模包括提供Ti掺杂的高纯SiO 2玻璃晶片，其具有覆盖反射多层涂覆的Ti掺杂的高纯度SiO 2玻璃无缺陷晶片表面的图案化吸收层，其具有Ra粗糙度<= 0.15nm。 该方法包括提供具有辐射敏感晶片表面的投影子系统和打印介质对象晶片，其中投影子系统将投影的掩模图案从图案化反射掩模投影到辐射敏感晶片表面上。
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公开(公告)号：US06776006B2
公开(公告)日：2004-08-17
申请号：US09943252
申请日：2001-08-30
IPC分类号： C03B23025
CPC分类号： B24B1/00 , B24B13/06 , C03B19/1453 , C03B19/1469 , C03B23/0252
摘要： A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material; sagging a plate of the glass material over the top face of the piece to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce an EUV polished mirror.
摘要翻译： 一种用于制造EUV光刻元件镜的方法，包括下垂玻璃材料的板以产生EUV镜面空白; 并抛光EUV镜面空白的顶面以产生抛光的EUV镜。 一种用于制造EUV光刻元件镜的方法，包括：研磨一片玻璃材料的顶面; 将玻璃材料的板材放在该件的顶面上以产生EUV镜子坯料; 并抛光EUV镜面空白的顶面以产生EUV抛光镜。
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6.发明授权Optical collimating/polarizing device, method of making same and frequency stabilized laser using same 失效光学准直/偏振装置，使用它的制造相同的和频率稳定的激光的方法
公开(公告)号：US5425046A
公开(公告)日：1995-06-13
申请号：US896977
申请日：1992-06-11
申请人： Claude L. Davis, Jr.
发明人： Claude L. Davis, Jr.
CPC分类号： H01S3/005 , C03C14/006 , G02B27/28 , G02B27/30 , G02B5/3025
摘要： An integral optical train comprising a plurality of optical components including a polarized glass element and a light-altering optical element. The polarized glass element may be a glass containing elongated particles of a silver halide selected from the group consisting of AgCl, AgBr and AgI, and the optical element may be a lens or a mirror.
摘要翻译： 一种包括多个光学部件的整体光学系列，包括偏光玻璃元件和变光元件。 偏光玻璃元件可以是包含选自AgCl，AgBr和AgI的卤化银的细长颗粒的玻璃，并且光学元件可以是透镜或反射镜。
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公开(公告)号：US06176588B1
公开(公告)日：2001-01-23
申请号：US09461067
申请日：1999-12-14
IPC分类号： G02B508
CPC分类号： G02B7/182
摘要： An inexpensive lightweight mirror blank having good dimensional stability, and a method of making the same is provided. The mirror blank includes an extruded ceramic honeycomb core and a faceplate bonded or otherwise affixed to the front surface of the core. The extruded honeycomb core is comprised of a matrix of cell walls defining an array of cells, with the number of cells being greater than about 16 cells per square inch, to render the core extremely light in weight yet sufficiently rigid and strong to support the optical faceplate. The faceplate is formed from a material that is capable of being polished to an optical surface. An optional back plate can be bonded or otherwise affixed to the back surface of the core in order to improve stiffness and mechanical stability of the mirror blank.
摘要翻译： 提供了具有良好的尺寸稳定性的便宜的轻质镜面坯料及其制造方法。 镜面坯料包括挤出的陶瓷蜂窝芯和与芯的前表面粘合或以其他方式固定的面板。 挤出的蜂窝芯由限定细胞阵列的细胞壁阵列组成，其中细胞数量大于约16个细胞/平方英寸，以使得核心重量非常轻，但足够刚性和强度以支持光学 面板。 面板由能够被抛光到光学表面的材料形成。 可选的背板可以粘合或以其他方式固定到芯的后表面，以便提高镜坯的刚度和机械稳定性。
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公开(公告)号：US5627676A
公开(公告)日：1997-05-06
申请号：US348499
申请日：1994-12-02
CPC分类号： G02B5/3008 , C03C14/006 , C03C3/11 , G02B5/3083
摘要： A birefringent waveplate that is composed of an integral, transparent, glass body, the glass body consisting of non-absorbing crystalline particles dispersed in a glassy matrix, the dispersed crystalline particles being selected from the group consisting of copper chloride, copper bromide and mixtures thereof, the dispersed crystalline particles having a high aspect ratio and being oriented and aligned along a common axis, whereby the waveplate is rendered birefringent so that polarized components of light transmitted through the waveplate have a phase shift introduced.
摘要翻译： 一种双折射波片，其由整体透明的玻璃体组成，玻璃体由分散在玻璃状基质中的非吸收结晶颗粒组成，分散的结晶颗粒选自氯化铜，溴化铜及其混合物 分散的结晶颗粒具有高的纵横比并且沿共同的轴线取向和取向，由此使波片变得双折射，从而透过波片的光的偏振分量具有引入的相移。
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