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公开(公告)号：US06556281B1
公开(公告)日：2003-04-29
申请号：US09575998
申请日：2000-05-23
申请人： Pradeep Kumar Govil , Jorge Ivaldi
发明人： Pradeep Kumar Govil , Jorge Ivaldi
IPC分类号： G03B2758
CPC分类号： G03F7/70216 , G03F7/707 , G03F7/70708 , G03F7/70783
摘要： A flexible chuck for supporting a substrate during lithographic processing is described. This flexible chuck includes an electrode layer, a piezoelectric layer disposed on the electrode layer, and a substrate support layer disposed above the piezoelectric layer. By providing electrical signals to the piezoelectric layer through the electrode layer, the support layer can be flexed, thereby changing surface topography on a substrate disposed on the flexible chuck. The contact layer can include projections, each of the projections corresponding to a respective electrode within the electrode layer. Furthermore, the substrate support layer can be formed of a conductive material and thus serve as the ground layer. Alternatively, separate substrate support and ground layers can be provided. The flexible chuck in accordance with the instant invention can be a vacuum chuck. Also described is a method of monitoring topographic changes in a flexible chuck in accordance with the instant invention.
摘要翻译： 描述了在光刻处理期间用于支撑衬底的柔性卡盘。 该柔性卡盘包括电极层，设置在电极层上的压电层和设置在压电层上方的基板支撑层。 通过通过电极层向压电层提供电信号，支撑层可以弯曲，从而改变设置在柔性卡盘上的基板上的表面形貌。 接触层可以包括突起，每个突起对应于电极层内的相应电极。 此外，基板支撑层可以由导电材料形成，因此用作接地层。 或者，可以提供单独的衬底支撑和接地层。 根据本发明的柔性卡盘可以是真空卡盘。 还描述了根据本发明监测柔性卡盘中的地形变化的方法。
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公开(公告)号：US09136751B2
公开(公告)日：2015-09-15
申请号：US13617543
申请日：2012-09-14
CPC分类号： H02K41/03 , G03F7/70758 , G03F7/70941 , H02K11/01 , H02K2201/18
摘要： A magnetic shield having non-magnetic gaps provides reduced magnetic cross-talk for a linear motor array in a precision positioning system. Redirecting the leakage flux limits the cross-talk and associated deleterious effects. Such preferred magnetic circuit paths for the leakage are affixed to the moving magnet system of the linear motor. Embodiments of the preferred flux leakage paths are realized by providing a ferromagnetic shield separated by a non-magnetic gap between the permanent magnets and the back-irons. In another embodiment, the ferromagnetic shield separation includes diamagnetic materials.
摘要翻译： 具有非磁隙的磁屏蔽为精密定位系统中的线性电机阵列提供了减少的磁串扰。 重新定向漏磁通量限制了串扰和相关的有害影响。 用于泄漏的优选磁路路径被固定到线性电动机的移动磁体系统。 优选的磁通泄漏路径的实施例通过提供由永磁体和后铁之间的非磁隙隔开的铁磁屏蔽来实现。 在另一个实施例中，铁磁屏蔽分离包括抗磁性材料。
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公开(公告)号：US20100165311A1
公开(公告)日：2010-07-01
申请号：US12622665
申请日：2009-11-20
CPC分类号： H02K41/03 , G03F7/70758 , G03F7/70941 , H02K11/01 , H02K2201/18
摘要： A magnetic shield having non-magnetic gaps provides reduced magnetic cross-talk for a linear motor array in a precision positioning system. Redirecting the leakage flux limits the cross-talk and associated deleterious effects. Such preferred magnetic circuit paths for the leakage are affixed to the moving magnet system of the linear motor. Embodiments of the preferred flux leakage paths are realized by providing a ferromagnetic shield separated by a non-magnetic gap between the permanent magnets and the back-irons. In another embodiment, the ferromagnetic shield separation includes diamagnetic materials.
摘要翻译： 具有非磁隙的磁屏蔽为精密定位系统中的线性电机阵列提供了减少的磁串扰。 重新定向漏磁通量限制了串扰和相关的有害影响。 用于泄漏的优选磁路路径被固定到线性电动机的移动磁体系统。 优选的磁通泄漏路径的实施例通过提供由永磁体和后铁之间的非磁隙隔开的铁磁屏蔽来实现。 在另一个实施例中，铁磁屏蔽分离包括抗磁性材料。
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公开(公告)号：US09130443B2
公开(公告)日：2015-09-08
申请号：US12622665
申请日：2009-11-20
CPC分类号： H02K41/03 , G03F7/70758 , G03F7/70941 , H02K11/01 , H02K2201/18
摘要： A magnetic shield having non-magnetic gaps provides reduced magnetic cross-talk for a linear motor array in a precision positioning system. Redirecting the leakage flux limits the cross-talk and associated deleterious effects. Such preferred magnetic circuit paths for the leakage are affixed to the moving magnet system of the linear motor. Embodiments of the preferred flux leakage paths are realized by providing a ferromagnetic shield separated by a non-magnetic gap between the permanent magnets and the back-irons. In another embodiment, the ferromagnetic shield separation includes diamagnetic materials.
摘要翻译： 具有非磁隙的磁屏蔽为精密定位系统中的线性电机阵列提供了减少的磁串扰。 重新定向漏磁通量限制了串扰和相关的有害影响。 用于泄漏的优选磁路路径被固定到线性电动机的移动磁体系统。 优选的磁通泄漏路径的实施例通过提供由永磁体和后铁之间的非磁隙隔开的铁磁屏蔽来实现。 在另一个实施例中，铁磁屏蔽分离包括抗磁性材料。
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5.发明授权Method and system for selective linewidth optimization during a lithographic process 有权光刻过程中选择性线宽优化的方法和系统公开(公告)号：US06509952B1
公开(公告)日：2003-01-21
申请号：US09575997
申请日：2000-05-23
IPC分类号： G03B2768
CPC分类号： G03F7/70625 , G03F7/70141 , G03F7/703 , G03F7/70641 , G03F7/707 , G03F9/7026
摘要： Particular types of distortion within a lithographic system may be characterized by linewidth control parameters. Linewidth control parameters of any given line or feature within a printed pattern vary as a result of optical capabilities of the lithography apparatus used, particular characteristics of the reticle, focus setting, light dose fluctuations, etc. The instant invention uses focus offset coefficients to change the focus at points within a slot to compensate for the linewidth control parameter variations introduced by the factors contributing to such variations. Additionally, different focuses can be set dynamically along the scan for a particular slot point. A set, or sets, of focus offset coefficients is generated for a particular lithography apparatus, depending on the number of linewidth control parameters for which correction is desired.
摘要翻译： 光刻系统中的特定类型的失真可以通过线宽控制参数来表征。 作为所使用的光刻设备的光学能力，掩模版的特定特征，聚焦设置，光剂量波动等的结果，印刷图案中的任何给定线或特征的线宽控制参数变化。本发明使用聚焦偏移系数来改变 在时隙内的点处的焦点以补偿由这些变化造成的因素引起的线宽控制参数变化。 另外，可以沿着特定时隙点的扫描动态设置不同的焦点。 根据需要校正的线宽控制参数的数量，针对特定光刻设备产生聚焦偏移系数的集合或集合。
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