公开(公告)号：US06556281B1

公开(公告)日：2003-04-29

申请号：US09575998

申请日：2000-05-23

Applicant: Pradeep Kumar Govil ,  Jorge Ivaldi

Inventor： Pradeep Kumar Govil ,  Jorge Ivaldi

IPC: G03B2758

CPC classification number: G03F7/70216 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70783

Abstract: A flexible chuck for supporting a substrate during lithographic processing is described. This flexible chuck includes an electrode layer, a piezoelectric layer disposed on the electrode layer, and a substrate support layer disposed above the piezoelectric layer. By providing electrical signals to the piezoelectric layer through the electrode layer, the support layer can be flexed, thereby changing surface topography on a substrate disposed on the flexible chuck. The contact layer can include projections, each of the projections corresponding to a respective electrode within the electrode layer. Furthermore, the substrate support layer can be formed of a conductive material and thus serve as the ground layer. Alternatively, separate substrate support and ground layers can be provided. The flexible chuck in accordance with the instant invention can be a vacuum chuck. Also described is a method of monitoring topographic changes in a flexible chuck in accordance with the instant invention.

Abstract translation: 描述了在光刻处理期间用于支撑衬底的柔性卡盘。 该柔性卡盘包括电极层，设置在电极层上的压电层和设置在压电层上方的基板支撑层。 通过通过电极层向压电层提供电信号，支撑层可以弯曲，从而改变设置在柔性卡盘上的基板上的表面形貌。 接触层可以包括突起，每个突起对应于电极层内的相应电极。 此外，基板支撑层可以由导电材料形成，因此用作接地层。 或者，可以提供单独的衬底支撑和接地层。 根据本发明的柔性卡盘可以是真空卡盘。 还描述了根据本发明监测柔性卡盘中的地形变化的方法。

公开(公告)号：US06847434B2

公开(公告)日：2005-01-25

申请号：US10314419

申请日：2002-12-09

Applicant: Joseph Laganza ,  Jorge Ivaldi ,  Florence Luo

Inventor： Joseph Laganza ,  Jorge Ivaldi ,  Florence Luo

IPC: G03F1/14 ,  G03F7/20 ,  G03B27/62 ,  G03B27/42 ,  G03B27/52 ,  G03F9/00

CPC classification number: G03F1/64 ,  G03F7/70933 ,  G03F7/70983

Abstract: A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.

Abstract translation: 一种用于在光刻系统中保持防护薄膜组件和掩模版之间的清洗的光学间隙的方法和装置。 掩模版和防护薄膜之间的框架保持被清除的光学间隙。 框架限定第一和第二相对表面。 第一相对表面限定第一开口，并且被配置为与防护薄膜组合。 第二相对表面限定第二开口，并且被配置为与掩模版配合以包围防护薄膜组件和掩模版之间的光学间隙。 框架的至少一个边缘具有穿过其中的开口。 多孔烧结材料通过框架的边缘填充每个开口。

公开(公告)号：US20060078407A1

公开(公告)日：2006-04-13

申请号：US11282474

申请日：2005-11-21

Applicant: Santiago del Puerto ,  Michael DeMarco ,  Glenn Friedman ,  Jorge Ivaldi ,  James McClay

Inventor： Santiago del Puerto ,  Michael DeMarco ,  Glenn Friedman ,  Jorge Ivaldi ,  James McClay

IPC: H01L21/677

CPC classification number: G03F7/70741 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/66 ,  G03F7/70808 ,  H01L21/67005 ,  H01L21/67751 ,  H01L21/67772 ,  H01L21/67778 ,  Y10S414/14

Abstract: A substrate protection and transport system and method for transitioning a substrate from atmospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes that support a substrate. The cassette can include a base portion and top portion, and can include a seal. Each cassette has at least one vent and at least one filter. The system further includes a box having a base and lid. The box holds one or more cassette-substrate arrangements. A storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. The entry-exit module can include a shuttle and/or elevator for transporting the cassette-substrate arrangement. During transitioning, the filter(s) and vent(s) restrict particles within the loadlock from entering the cassette-substrate arrangement and reaching a surface of the substrate.

Abstract translation: 一种用于在光刻工具中将基板从大气压转换成真空的衬底保护和输送系统和方法。 该系统包括支撑衬底的一个或多个可移除衬底输送盒。 盒可以包括基部和顶部，并且可以包括密封。 每个盒具有至少一个排气口和至少一个过滤器。 该系统还包括具有底座和盖子的盒子。 盒子保持一个或多个盒式衬底布置。 还提供了一种具有用于保持盒 - 盒 - 衬底布置的搁架的存放架。 此外，提供具有负载锁的入口模块，用于将盒式基板装置从大气压转换成真空。 出入口模块可以包括用于运送盒式基板装置的梭和/或电梯。 在过渡期间，过滤器和排气口限制负载锁中的颗粒进入盒 - 衬底布置并到达衬底的表面。

公开(公告)号：US20050151955A1

公开(公告)日：2005-07-14

申请号：US11034053

申请日：2005-01-13

Applicant: Joseph Laganza ,  Jorge Ivaldi ,  Florence Luo

Inventor： Joseph Laganza ,  Jorge Ivaldi ,  Florence Luo

IPC: G03F1/14 ,  G03F7/20 ,  G03B27/62

CPC classification number: G03F1/64 ,  G03F7/70933 ,  G03F7/70983

Abstract: A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.

Abstract translation: 一种用于在光刻系统中保持防护薄膜组件和掩模版之间的清洗的光学间隙的方法和装置。 掩模版和防护薄膜之间的框架保持被清除的光学间隙。 框架限定第一和第二相对表面。 第一相对表面限定第一开口，并且被配置为与防护薄膜组合。 第二相对表面限定第二开口，并且被配置为与掩模版配合以包围防护薄膜组件和掩模版之间的光学间隙。 框架的至少一个边缘具有穿过其中的开口。 多孔烧结材料通过框架的边缘填充每个开口。

公开(公告)号：US07339653B2

公开(公告)日：2008-03-04

申请号：US11671647

申请日：2007-02-06

Applicant: Joseph Laganza ,  Jorge Ivaldi

Inventor： Joseph Laganza ,  Jorge Ivaldi

IPC: G03B27/62 ,  G03B27/32 ,  G03B27/58

CPC classification number: G03F7/70983 ,  G03F1/64

Abstract: A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.

Abstract translation: 描述了一种用于在光刻系统中保持光学结构之间的光学间隙的方法和装置。 框架限定第一和第二相对表面。 第一相对表面限定第一开口，第二相对表面限定第二开口。 多个间隔构件在围绕第一开口的第一相对表面上间隔开。 间隔构件具有被配置为与第一光学结构的表面配合的基本上共平面。 粘合剂密封第一相对表面和第一光学结构之间的第一开口周围的空间。 因此，框架包围第一光学结构和第二光学结构之间的光学间隙。

公开(公告)号：US20070127000A1

公开(公告)日：2007-06-07

申请号：US11671647

申请日：2007-02-06

Applicant: Joseph Laganza ,  Jorge Ivaldi

Inventor： Joseph Laganza ,  Jorge Ivaldi

IPC: G03B27/52

CPC classification number: G03F7/70983 ,  G03F1/64

Abstract: A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.

Abstract translation: 描述了一种用于在光刻系统中保持光学结构之间的光学间隙的方法和装置。 框架限定第一和第二相对表面。 第一相对表面限定第一开口，第二相对表面限定第二开口。 多个间隔构件在围绕第一开口的第一相对表面上间隔开。 间隔构件具有被配置为与第一光学结构的表面配合的基本上共平面。 粘合剂密封第一相对表面和第一光学结构之间的第一开口周围的空间。 因此，框架包围第一光学结构和第二光学结构之间的光学间隙。

公开(公告)号：US20050088637A1

公开(公告)日：2005-04-28

申请号：US10986077

申请日：2004-11-12

Applicant: Joseph Laganza ,  Jorge Ivaldi

Inventor： Joseph Laganza ,  Jorge Ivaldi

IPC: G03F7/20 ,  G03B27/42

CPC classification number: G03F7/70983 ,  G03F1/64

Abstract: A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.

Abstract translation: 描述了一种用于在光刻系统中保持光学结构之间的光学间隙的方法和装置。 框架限定第一和第二相对表面。 第一相对表面限定第一开口，第二相对表面限定第二开口。 多个间隔构件在围绕第一开口的第一相对表面上间隔开。 间隔构件具有被配置为与第一光学结构的表面配合的基本上共平面。 粘合剂密封第一相对表面和第一光学结构之间的第一开口周围的空间。 因此，框架包围第一光学结构和第二光学结构之间的光学间隙。

公开(公告)号：US06822731B1

公开(公告)日：2004-11-23

申请号：US10464840

申请日：2003-06-18

Applicant: Joseph Laganza ,  Jorge Ivaldi

Inventor： Joseph Laganza ,  Jorge Ivaldi

IPC: G03B2762

CPC classification number: G03F7/70983 ,  G03F1/64

Abstract: A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.

Abstract translation: 描述了一种用于在光刻系统中保持光学结构之间的光学间隙的方法和装置。 框架限定第一和第二相对表面。 第一相对表面限定第一开口，第二相对表面限定第二开口。 多个间隔构件在围绕第一开口的第一相对表面上间隔开。 间隔构件具有被配置为与第一光学结构的表面配合的基本上共平面。 粘合剂密封第一相对表面和第一光学结构之间的第一开口周围的空间。 因此，框架包围第一光学结构和第二光学结构之间的光学间隙。

公开(公告)号：US06757110B2

公开(公告)日：2004-06-29

申请号：US10156005

申请日：2002-05-29

Applicant: Harry Sewell ,  Jorge Ivaldi ,  John Shamaly

Inventor： Harry Sewell ,  Jorge Ivaldi ,  John Shamaly

IPC: G02B900

CPC classification number: G03F7/70225

Abstract: The present invention relates to a lithography apparatus using catadioptric exposure optics that projects high quality images without image flip. The lithography apparatus includes a reticle stage, a wafer stage, and a catadioptric exposure optics located between the reticle stage and the wafer stage. The catadioptric exposure optics projects an image from the reticle stage onto the wafer stage. The projected image has the same image orientation as the image from the reticle stage. In other words, the catadioptric exposure optics does not perform image flip. The reticle stage lies on a first plane and the wafer stage lies on a second plane, where the first plane is orthogonal to the second plane. In another embodiment of the present invention, the catadioptric exposure optics projects an even number of reflections. The projected image is of high precision and lacks aberrations such as perspective warping and obscured areas. The invention can be combined with a dual wafer stage and with a dual isolation system.

Abstract translation: 本发明涉及一种使用反射折射曝光光学器件的光刻设备，该光学设备投影高质量的图像而无需图像翻转。 光刻设备包括刻线台，晶片台和位于标线片台和晶片台之间的反射折射曝光光学元件。 反射折射曝光光学镜将投影图像从标线片阶段投影到晶片台上。 投影图像具有与来自标线片舞台的图像相同的图像取向。 换句话说，反射折射曝光光学元件不执行图像翻转。 标线台位于第一平面上，晶片台位于第二平面上，其中第一平面与第二平面正交。 在本发明的另一个实施例中，反射折射曝光光学器件投射偶数次的反射。 投影图像精度高，缺乏透视扭曲和遮蔽区域等畸变。 本发明可以与双晶片台和双隔离系统组合。

公开(公告)号：US07173689B2

公开(公告)日：2007-02-06

申请号：US10986077

申请日：2004-11-12

Applicant: Joseph Laganza ,  Jorge Ivaldi

Inventor： Joseph Laganza ,  Jorge Ivaldi

IPC: G03B27/32 ,  G03B27/58 ,  G03B27/62

CPC classification number: G03F7/70983 ,  G03F1/64

Abstract: A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.

Abstract translation: 描述了一种用于在光刻系统中保持光学结构之间的光学间隙的方法和装置。 框架限定第一和第二相对表面。 第一相对表面限定第一开口，第二相对表面限定第二开口。 多个间隔构件在围绕第一开口的第一相对表面上间隔开。 间隔构件具有被配置为与第一光学结构的表面配合的基本上共平面。 粘合剂密封第一相对表面和第一光学结构之间的第一开口周围的空间。 因此，框架包围第一光学结构和第二光学结构之间的光学间隙。